NL7711723A - Voorstraling gevoelig element. - Google Patents

Voorstraling gevoelig element.

Info

Publication number
NL7711723A
NL7711723A NL7711723A NL7711723A NL7711723A NL 7711723 A NL7711723 A NL 7711723A NL 7711723 A NL7711723 A NL 7711723A NL 7711723 A NL7711723 A NL 7711723A NL 7711723 A NL7711723 A NL 7711723A
Authority
NL
Netherlands
Prior art keywords
sensitive element
radiation sensitive
radiation
sensitive
Prior art date
Application number
NL7711723A
Other languages
English (en)
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of NL7711723A publication Critical patent/NL7711723A/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
NL7711723A 1976-10-27 1977-10-26 Voorstraling gevoelig element. NL7711723A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US73597976A 1976-10-27 1976-10-27
US78090777A 1977-03-24 1977-03-24

Publications (1)

Publication Number Publication Date
NL7711723A true NL7711723A (nl) 1978-05-02

Family

ID=27112970

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7711723A NL7711723A (nl) 1976-10-27 1977-10-26 Voorstraling gevoelig element.

Country Status (9)

Country Link
JP (1) JPS5356018A (nl)
CA (1) CA1116919A (nl)
CH (1) CH630767A5 (nl)
DE (1) DE2747947C2 (nl)
FR (1) FR2369590A1 (nl)
GB (1) GB1588368A (nl)
IT (1) IT1089005B (nl)
NL (1) NL7711723A (nl)
SE (1) SE435106B (nl)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO159729C (no) * 1978-11-01 1989-02-01 Coates Brothers & Co Fremgangsmaate for fremstilling av et moenster av loddemetall paa et lag elektrisk ledende metall baaret av et ikke-ledende underlag.
DE3136818C2 (de) * 1980-09-19 1990-08-02 Hitachi Chemical Co., Ltd., Tokio/Tokyo Verwendung eines lichtempfindlichen Gemisches und eines lichtempfindlichen Aufzeichnungsmaterials zur Bildung einer Lötmaske
JPS5764734A (en) * 1980-10-08 1982-04-20 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
JPS5969752A (ja) * 1982-10-14 1984-04-20 Sekisui Chem Co Ltd 光重合可能な画像形成用組成物
JPS63158157U (nl) * 1987-04-07 1988-10-17
US5196296A (en) * 1989-10-06 1993-03-23 Nippon Steel Corporation Epoxy acrylate resins and photosensitive resin compositions therefrom
EP0822448B1 (en) * 1996-08-02 2000-11-02 E.I. Du Pont De Nemours And Company Flexible, flame-retardant, photoimageable composition for coating printed circuits
CN1324402C (zh) 2001-10-30 2007-07-04 钟渊化学工业株式会社 感光性树脂组合物、使用该组合物的感光性薄膜及层压体

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA614181A (en) * 1961-02-07 J. Mcgraw William Photopolymerizable compositions, elements and processes
US3261686A (en) * 1963-04-23 1966-07-19 Du Pont Photopolymerizable compositions and elements
DE1950120A1 (de) * 1968-10-09 1970-04-30 Du Pont Heterogene fotopolymerisierbare Masse
US3682800A (en) * 1969-07-25 1972-08-08 Toray Industries Method for producing acrylonitrile copolymers
US3657088A (en) * 1969-12-17 1972-04-18 Bayer Ag Moulding and coating masses hardenable by uv irradiation
GB1312492A (en) * 1969-12-19 1973-04-04 Mccall Corp Crosslinked polymers and process therefor
US3887450A (en) * 1971-02-04 1975-06-03 Dynachem Corp Photopolymerizable compositions containing polymeric binding agents
JPS498281A (nl) * 1972-05-11 1974-01-24
JPS5537869B2 (nl) * 1973-02-12 1980-09-30
JPS5335722B2 (nl) * 1973-08-29 1978-09-28
DE2344680A1 (de) * 1973-09-05 1975-03-20 Bruno Prof Dr Vollmert Photopolymerisierbare mischung und deren verwendung zur herstellung von reliefdruckplatten
JPS5179342A (nl) * 1974-12-26 1976-07-10 Fuji Photo Film Co Ltd

Also Published As

Publication number Publication date
CA1116919A (en) 1982-01-26
DE2747947C2 (de) 1983-12-22
FR2369590A1 (fr) 1978-05-26
SE7712054L (sv) 1978-04-28
GB1588368A (en) 1981-04-23
JPS5356018A (en) 1978-05-22
CH630767A5 (en) 1982-06-30
JPS5751655B2 (nl) 1982-11-02
DE2747947A1 (de) 1978-05-03
FR2369590B1 (nl) 1981-11-13
IT1089005B (it) 1985-06-10
SE435106B (sv) 1984-09-03

Similar Documents

Publication Publication Date Title
NL186474C (nl) Beeldvormingselement.
NL170464C (nl) Fotografisch element.
NL7709936A (nl) Lichtgevoelige kopieermassa.
SE430713B (sv) Fastsettningselement
NL7704948A (nl) Calibreertoestel.
NL7707518A (nl) Verwarmingselementen.
NL7707065A (nl) Scintillatiedetector.
NL7707522A (nl) Temperatuurvoelerelement.
NL7713490A (nl) Tempeerinrichting.
NL7705779A (nl) Fotogevoelig element.
NL165851C (nl) Voor straling gevoelige afdeklaag.
NL7709935A (nl) Lichtgevoelige kopieermassa.
NL7808060A (nl) Halfgeleiderelement.
NL7709672A (nl) Stralingsdetector.
NL7706047A (nl) Bevestigingselement.
NO774081L (no) Straaledannende system.
NL7712151A (nl) Fotodetector.
NL7701379A (nl) Licht-uitzendend halfgeleiderelement.
NL190032C (nl) Scintillatiedetector.
NL7709724A (nl) Radiometer.
NL7711723A (nl) Voorstraling gevoelig element.
NO774182L (no) Detektor.
SE7703707L (sv) Sekerhetselement
NL185587C (nl) Temperatuurvoeler.
NL7702398A (nl) Stralingsdetektieinrichting.

Legal Events

Date Code Title Description
BC A request for examination has been filed
A85 Still pending on 85-01-01
BV The patent application has lapsed