NL7711723A - RADIATION SENSITIVE ELEMENT. - Google Patents

RADIATION SENSITIVE ELEMENT.

Info

Publication number
NL7711723A
NL7711723A NL7711723A NL7711723A NL7711723A NL 7711723 A NL7711723 A NL 7711723A NL 7711723 A NL7711723 A NL 7711723A NL 7711723 A NL7711723 A NL 7711723A NL 7711723 A NL7711723 A NL 7711723A
Authority
NL
Netherlands
Prior art keywords
sensitive element
radiation sensitive
radiation
sensitive
Prior art date
Application number
NL7711723A
Other languages
Dutch (nl)
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of NL7711723A publication Critical patent/NL7711723A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
NL7711723A 1976-10-27 1977-10-26 RADIATION SENSITIVE ELEMENT. NL7711723A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US73597976A 1976-10-27 1976-10-27
US78090777A 1977-03-24 1977-03-24

Publications (1)

Publication Number Publication Date
NL7711723A true NL7711723A (en) 1978-05-02

Family

ID=27112970

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7711723A NL7711723A (en) 1976-10-27 1977-10-26 RADIATION SENSITIVE ELEMENT.

Country Status (9)

Country Link
JP (1) JPS5356018A (en)
CA (1) CA1116919A (en)
CH (1) CH630767A5 (en)
DE (1) DE2747947C2 (en)
FR (1) FR2369590A1 (en)
GB (1) GB1588368A (en)
IT (1) IT1089005B (en)
NL (1) NL7711723A (en)
SE (1) SE435106B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO159729C (en) * 1978-11-01 1989-02-01 Coates Brothers & Co PROCEDURE FOR MANUFACTURING A PATTERN METAL PATTERN ON A LAYER ELECTRIC CONDUCTIVE METAL BEARED BY A NON-CONDUCTIVE SUBSTRATE.
DE3136818C2 (en) * 1980-09-19 1990-08-02 Hitachi Chemical Co., Ltd., Tokio/Tokyo Use of a photosensitive mixture and a photosensitive recording material for forming a solder mask
JPS5764734A (en) * 1980-10-08 1982-04-20 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element
DE3114931A1 (en) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt POLYMERIZABLE MIXTURE BY RADIATION AND PHOTOPOLYMERIZABLE COPY MATERIAL MADE THEREOF
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
JPS5969752A (en) * 1982-10-14 1984-04-20 Sekisui Chem Co Ltd Photopolymerizable composition for forming image
JPS63158157U (en) * 1987-04-07 1988-10-17
US5196296A (en) * 1989-10-06 1993-03-23 Nippon Steel Corporation Epoxy acrylate resins and photosensitive resin compositions therefrom
DE69703419T2 (en) * 1996-08-02 2001-06-21 Du Pont Flexible, flame retardant photopolymerizable composition for coating printed circuit boards
KR100589067B1 (en) 2001-10-30 2006-06-14 가부시키가이샤 가네카 Photosensitive resin composition and photosensitive films and laminates made by using the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA614181A (en) * 1961-02-07 J. Mcgraw William Photopolymerizable compositions, elements and processes
US3261686A (en) * 1963-04-23 1966-07-19 Du Pont Photopolymerizable compositions and elements
DE1950120A1 (en) * 1968-10-09 1970-04-30 Du Pont Heterogeneous photopolymerizable mass
US3682800A (en) * 1969-07-25 1972-08-08 Toray Industries Method for producing acrylonitrile copolymers
US3657088A (en) * 1969-12-17 1972-04-18 Bayer Ag Moulding and coating masses hardenable by uv irradiation
GB1312492A (en) * 1969-12-19 1973-04-04 Mccall Corp Crosslinked polymers and process therefor
US3887450A (en) * 1971-02-04 1975-06-03 Dynachem Corp Photopolymerizable compositions containing polymeric binding agents
JPS498281A (en) * 1972-05-11 1974-01-24
JPS5537869B2 (en) * 1973-02-12 1980-09-30
JPS5335722B2 (en) * 1973-08-29 1978-09-28
DE2344680A1 (en) * 1973-09-05 1975-03-20 Bruno Prof Dr Vollmert Photopolymerisable relief printing plates - copolymer of monounsatd. acids esters and nitroiles crosslinked by divinyl compounds
JPS5179342A (en) * 1974-12-26 1976-07-10 Fuji Photo Film Co Ltd

Also Published As

Publication number Publication date
GB1588368A (en) 1981-04-23
JPS5356018A (en) 1978-05-22
DE2747947C2 (en) 1983-12-22
JPS5751655B2 (en) 1982-11-02
CH630767A5 (en) 1982-06-30
FR2369590A1 (en) 1978-05-26
FR2369590B1 (en) 1981-11-13
SE7712054L (en) 1978-04-28
SE435106B (en) 1984-09-03
IT1089005B (en) 1985-06-10
DE2747947A1 (en) 1978-05-03
CA1116919A (en) 1982-01-26

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Legal Events

Date Code Title Description
BC A request for examination has been filed
A85 Still pending on 85-01-01
BV The patent application has lapsed