SE7712054L - RADIATION SENSITIVE ELEMENT - Google Patents

RADIATION SENSITIVE ELEMENT

Info

Publication number
SE7712054L
SE7712054L SE7712054A SE7712054A SE7712054L SE 7712054 L SE7712054 L SE 7712054L SE 7712054 A SE7712054 A SE 7712054A SE 7712054 A SE7712054 A SE 7712054A SE 7712054 L SE7712054 L SE 7712054L
Authority
SE
Sweden
Prior art keywords
composition
weight
polymerised
sensitive element
halogen
Prior art date
Application number
SE7712054A
Other languages
Unknown language ( )
Swedish (sv)
Other versions
SE435106B (en
Inventor
J E Gervay
Y P Pilette
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of SE7712054L publication Critical patent/SE7712054L/en
Publication of SE435106B publication Critical patent/SE435106B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

The radiation-sensitive element consists of a carrier which carries a layer of a composition which can be photo-polymerised. The composition consists of (1) at least one compound which can be addition polymerised and is ethylenically unsaturated, (2) an initiator which can be activated in the ultraviolet to visible range of the spectrum, and (3) at least 20% by weight of a binding agent which can be polymerised and itself contains at least 5% by weight of acrylonitrile, there being at least 5% by weight of halogen, related to the total weight of the composition, in said composition, the halogen being bonded in a covalent manner to at least one component of the composition. The element is flame-retarding and can be used as a photoresist or as a soldering mask.
SE7712054A 1976-10-27 1977-10-26 RADIATORY SENSITIVE ELEMENT, INCLUDING A SUBSTRATE WITH A LAYER OF PHOTOPOLYMERIZABLE, FLAMMETRATING COMPOSITION SE435106B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US73597976A 1976-10-27 1976-10-27
US78090777A 1977-03-24 1977-03-24

Publications (2)

Publication Number Publication Date
SE7712054L true SE7712054L (en) 1978-04-28
SE435106B SE435106B (en) 1984-09-03

Family

ID=27112970

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7712054A SE435106B (en) 1976-10-27 1977-10-26 RADIATORY SENSITIVE ELEMENT, INCLUDING A SUBSTRATE WITH A LAYER OF PHOTOPOLYMERIZABLE, FLAMMETRATING COMPOSITION

Country Status (9)

Country Link
JP (1) JPS5356018A (en)
CA (1) CA1116919A (en)
CH (1) CH630767A5 (en)
DE (1) DE2747947C2 (en)
FR (1) FR2369590A1 (en)
GB (1) GB1588368A (en)
IT (1) IT1089005B (en)
NL (1) NL7711723A (en)
SE (1) SE435106B (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO159729C (en) * 1978-11-01 1989-02-01 Coates Brothers & Co PROCEDURE FOR MANUFACTURING A PATTERN METAL PATTERN ON A LAYER ELECTRIC CONDUCTIVE METAL BEARED BY A NON-CONDUCTIVE SUBSTRATE.
DE3136818C2 (en) * 1980-09-19 1990-08-02 Hitachi Chemical Co., Ltd., Tokio/Tokyo Use of a photosensitive mixture and a photosensitive recording material for forming a solder mask
JPS5764734A (en) * 1980-10-08 1982-04-20 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element
DE3114931A1 (en) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt POLYMERIZABLE MIXTURE BY RADIATION AND PHOTOPOLYMERIZABLE COPY MATERIAL MADE THEREOF
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
JPS5969752A (en) * 1982-10-14 1984-04-20 Sekisui Chem Co Ltd Photopolymerizable composition for forming image
JPS63158157U (en) * 1987-04-07 1988-10-17
US5196296A (en) * 1989-10-06 1993-03-23 Nippon Steel Corporation Epoxy acrylate resins and photosensitive resin compositions therefrom
DE69703419T2 (en) * 1996-08-02 2001-06-21 Du Pont Flexible, flame retardant photopolymerizable composition for coating printed circuit boards
CN1324402C (en) 2001-10-30 2007-07-04 钟渊化学工业株式会社 Photosensitive resin composition and photosensitive films and laminates made by using the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA614181A (en) * 1961-02-07 J. Mcgraw William Photopolymerizable compositions, elements and processes
US3261686A (en) * 1963-04-23 1966-07-19 Du Pont Photopolymerizable compositions and elements
DE1950120A1 (en) * 1968-10-09 1970-04-30 Du Pont Heterogeneous photopolymerizable mass
US3682800A (en) * 1969-07-25 1972-08-08 Toray Industries Method for producing acrylonitrile copolymers
US3657088A (en) * 1969-12-17 1972-04-18 Bayer Ag Moulding and coating masses hardenable by uv irradiation
GB1312492A (en) * 1969-12-19 1973-04-04 Mccall Corp Crosslinked polymers and process therefor
US3887450A (en) * 1971-02-04 1975-06-03 Dynachem Corp Photopolymerizable compositions containing polymeric binding agents
JPS498281A (en) * 1972-05-11 1974-01-24
JPS5537869B2 (en) * 1973-02-12 1980-09-30
JPS5335722B2 (en) * 1973-08-29 1978-09-28
DE2344680A1 (en) * 1973-09-05 1975-03-20 Bruno Prof Dr Vollmert Photopolymerisable relief printing plates - copolymer of monounsatd. acids esters and nitroiles crosslinked by divinyl compounds
JPS5179342A (en) * 1974-12-26 1976-07-10 Fuji Photo Film Co Ltd

Also Published As

Publication number Publication date
JPS5751655B2 (en) 1982-11-02
SE435106B (en) 1984-09-03
DE2747947A1 (en) 1978-05-03
GB1588368A (en) 1981-04-23
IT1089005B (en) 1985-06-10
FR2369590B1 (en) 1981-11-13
CA1116919A (en) 1982-01-26
JPS5356018A (en) 1978-05-22
CH630767A5 (en) 1982-06-30
FR2369590A1 (en) 1978-05-26
NL7711723A (en) 1978-05-02
DE2747947C2 (en) 1983-12-22

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