JPS57192420A - Photopolymer composition - Google Patents
Photopolymer compositionInfo
- Publication number
- JPS57192420A JPS57192420A JP6446581A JP6446581A JPS57192420A JP S57192420 A JPS57192420 A JP S57192420A JP 6446581 A JP6446581 A JP 6446581A JP 6446581 A JP6446581 A JP 6446581A JP S57192420 A JPS57192420 A JP S57192420A
- Authority
- JP
- Japan
- Prior art keywords
- component
- components
- amino group
- total
- aliphatic amino
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: The titled highly adhesive, highly sensitive composition as an etching resist, consisting essentially of a film property-imparting polymer of a vinyl copolymer compound containing an aliphatic amino group-containing monomer as a copolymer component and an organic halide.
CONSTITUTION: The titled composition is obtained by mixing the following components: (A) a film property-imparting polymer comprising a vinyl copolymer compound containing an aliphatic amino group-containing monomer of the formula, wherein n is 0W3, R1W3 are each H or methyl, R4W5 are each a 1W4C alkyl or form a 4W7-membered saturated alicyclic ring together with the N atom (e.g., dimethylaminoethyl methacrylate) as a copolymer component, (B) an ethylenically unsaturated compound, (C) a sensitizer or sensitizer system which can generate free radicals by actinic rays, and (D) an organic halide (e.g., trimethylpropane triacrylate). Said components are used in the following amounts: component A 30W80pts.wt., component B 70W20pts.wt., component C 0.5W10pts.wt. per 100pts.wt. total of components A and B and component D 0.2W10pts.wt. per 100pts.wt. total of components A and B.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6446581A JPS57192420A (en) | 1981-04-27 | 1981-04-27 | Photopolymer composition |
US06/370,295 US4454219A (en) | 1981-04-27 | 1982-04-20 | Photosensitive resin composition comprised of a polymer obtained from an aliphatic amino group-containing monomer as a comonomer |
DE19823215513 DE3215513C3 (en) | 1981-04-27 | 1982-04-26 | Photosensitive resin composition |
DE3249708A DE3249708C3 (en) | 1981-04-27 | 1982-04-26 | Photosensitive element of a support and a photosensitive layer |
GB8211964A GB2100278B (en) | 1981-04-27 | 1982-04-26 | Photosensitive resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6446581A JPS57192420A (en) | 1981-04-27 | 1981-04-27 | Photopolymer composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57192420A true JPS57192420A (en) | 1982-11-26 |
JPH0411856B2 JPH0411856B2 (en) | 1992-03-02 |
Family
ID=13259001
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6446581A Granted JPS57192420A (en) | 1981-04-27 | 1981-04-27 | Photopolymer composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57192420A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5823812A (en) * | 1981-08-03 | 1983-02-12 | Mitsui Toatsu Chem Inc | Ultraviolet-curing resin composition |
JPS5893046A (en) * | 1981-11-28 | 1983-06-02 | Hitachi Chem Co Ltd | Photosensitive element |
JPS58102230A (en) * | 1981-12-15 | 1983-06-17 | Hitachi Chem Co Ltd | Photosensitive resin compositon |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5117285A (en) * | 1974-08-05 | 1976-02-12 | Asahi Chemical Ind | HIKARIJUGOSEISOSEIBUTSU |
JPS529424A (en) * | 1975-07-11 | 1977-01-25 | Toyobo Co Ltd | Photosensitive compositions |
JPS5638458A (en) * | 1979-09-05 | 1981-04-13 | Toray Ind Inc | Formation of resist pattern |
JPS5655941A (en) * | 1979-10-12 | 1981-05-16 | Toray Ind Inc | Photosensitive material |
-
1981
- 1981-04-27 JP JP6446581A patent/JPS57192420A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5117285A (en) * | 1974-08-05 | 1976-02-12 | Asahi Chemical Ind | HIKARIJUGOSEISOSEIBUTSU |
JPS529424A (en) * | 1975-07-11 | 1977-01-25 | Toyobo Co Ltd | Photosensitive compositions |
JPS5638458A (en) * | 1979-09-05 | 1981-04-13 | Toray Ind Inc | Formation of resist pattern |
JPS5655941A (en) * | 1979-10-12 | 1981-05-16 | Toray Ind Inc | Photosensitive material |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5823812A (en) * | 1981-08-03 | 1983-02-12 | Mitsui Toatsu Chem Inc | Ultraviolet-curing resin composition |
JPH0121162B2 (en) * | 1981-08-03 | 1989-04-20 | Mitsui Toatsu Chemicals | |
JPS5893046A (en) * | 1981-11-28 | 1983-06-02 | Hitachi Chem Co Ltd | Photosensitive element |
JPS58102230A (en) * | 1981-12-15 | 1983-06-17 | Hitachi Chem Co Ltd | Photosensitive resin compositon |
JPH0334056B2 (en) * | 1981-12-15 | 1991-05-21 | Hitachi Chemical Co Ltd |
Also Published As
Publication number | Publication date |
---|---|
JPH0411856B2 (en) | 1992-03-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5321923A (en) | Photopolymerizable composition | |
JPS5369284A (en) | Photopolymerizable composition | |
ES8308089A1 (en) | Photopolymerisation process. | |
ES8308090A1 (en) | Photopolymerisation process. | |
GB1425274A (en) | Photosensitive compositions | |
ES8303486A1 (en) | Radiation polymerizable composition for forming heat-resistant relief structures on electrical devices such as semiconductors and capacitors. | |
JPS5678834A (en) | Photographic sensitive material | |
JPS5744143A (en) | Composition and method for forming micropattern | |
JPS6452138A (en) | Silver halide photographic sensitive material | |
DE3473357D1 (en) | PHOTOPOLYMERIZABLE LAMINATE | |
JPS5780451A (en) | Hardening of gelatin | |
JP2000231194A5 (en) | ||
JPS57192420A (en) | Photopolymer composition | |
JPS56137347A (en) | Photosensitive composition for dry development | |
JPS57202534A (en) | Negative type resist composition | |
DE3751453T2 (en) | Gas phase-applied photoresists made from anionically polymerizable monomers. | |
JPS5762047A (en) | Image-forming material | |
JPS5324782A (en) | Forming method of high molecular film patterns by negative resist | |
JPS57161742A (en) | Photosensitive resin composition | |
JPS57146247A (en) | Water-soluble photoresist | |
JPS5515149A (en) | Forming method of resist for microfabrication | |
JPS531284A (en) | Photosensitive compositions | |
JPS524242A (en) | Electronic photo sensitive agent | |
JPS5312942A (en) | Films for agricultural applications | |
JPS5258782A (en) | Photo-polymerizable composition |