JPS57161742A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS57161742A
JPS57161742A JP4606881A JP4606881A JPS57161742A JP S57161742 A JPS57161742 A JP S57161742A JP 4606881 A JP4606881 A JP 4606881A JP 4606881 A JP4606881 A JP 4606881A JP S57161742 A JPS57161742 A JP S57161742A
Authority
JP
Japan
Prior art keywords
ethylenically unsaturated
unsaturated compound
free
radical generating
diphenylimidazolyl dimer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4606881A
Other languages
Japanese (ja)
Inventor
Toshio Tanaka
Yoshio Kato
Satoshi Imahashi
Toshihiko Kajima
Hisashi Uhara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP4606881A priority Critical patent/JPS57161742A/en
Priority to US06/360,961 priority patent/US4459349A/en
Priority to DE19823211312 priority patent/DE3211312A1/en
Publication of JPS57161742A publication Critical patent/JPS57161742A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE:To obtain the entitled composition having a high-sensitivity photopolymerization initiation effect and high storage stability, by mixing an ethylenically unsaturated compound, a 2-polycyclic aryl-4,5-diphenylimidazolyl dimer, and a specified free radical generating agent. CONSTITUTION:(A) An ethylenically unsaturated compound, such as cyclohexyl acrylate, 30-80wt%, forming a polymer by chain-growing addition polymerization initiated by free radicals, (B) 2-polycyclic aryl-4,5-diphenylimidazolyl dimer having an aryl group of an aromatic condensed ring having >=2 substituents at the second positions of the imidazolyl ring, (C) >=1 free-radical generating agents selected from a group of dimedone, rhodanine, N-naphtylglycine, 7-dialkylaminocoumarin, diarylthiourea, p-dialkylaminobenzoate, etc. in the mol ratio of B:C of 2:1-1:5 in an amount of mixture of 0.3-15wt%, and (D) 0-60wt% thermoplastic binder.
JP4606881A 1981-03-27 1981-03-27 Photosensitive resin composition Pending JPS57161742A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP4606881A JPS57161742A (en) 1981-03-27 1981-03-27 Photosensitive resin composition
US06/360,961 US4459349A (en) 1981-03-27 1982-03-23 Photosensitive resin composition
DE19823211312 DE3211312A1 (en) 1981-03-27 1982-03-26 PHOTO-SENSITIVE RESIN COMPOSITION

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4606881A JPS57161742A (en) 1981-03-27 1981-03-27 Photosensitive resin composition

Publications (1)

Publication Number Publication Date
JPS57161742A true JPS57161742A (en) 1982-10-05

Family

ID=12736677

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4606881A Pending JPS57161742A (en) 1981-03-27 1981-03-27 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS57161742A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6022129A (en) * 1983-07-18 1985-02-04 Agency Of Ind Science & Technol Recording material sensitive to visible light
JPS61188534A (en) * 1985-02-18 1986-08-22 Sekisui Chem Co Ltd Photosensitive resin composition
JPS61188533A (en) * 1985-02-18 1986-08-22 Sekisui Chem Co Ltd Photosensitive resin composition
JPS63138345A (en) * 1986-11-21 1988-06-10 イーストマン　コダック　カンパニー Photographic image forming system
JPS63142345A (en) * 1986-11-21 1988-06-14 イーストマン　コダック　カンパニー High image forming composition containing azinium activating agent
JPH02161439A (en) * 1988-12-15 1990-06-21 Daicel Chem Ind Ltd Photosensitizer and photopolymerizable composition

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4963420A (en) * 1972-06-02 1974-06-19
JPS55127550A (en) * 1979-03-23 1980-10-02 Toyobo Co Ltd Photosensitive resin composition

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4963420A (en) * 1972-06-02 1974-06-19
JPS55127550A (en) * 1979-03-23 1980-10-02 Toyobo Co Ltd Photosensitive resin composition

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6022129A (en) * 1983-07-18 1985-02-04 Agency Of Ind Science & Technol Recording material sensitive to visible light
JPS61188534A (en) * 1985-02-18 1986-08-22 Sekisui Chem Co Ltd Photosensitive resin composition
JPS61188533A (en) * 1985-02-18 1986-08-22 Sekisui Chem Co Ltd Photosensitive resin composition
JPS63138345A (en) * 1986-11-21 1988-06-10 イーストマン　コダック　カンパニー Photographic image forming system
JPS63142345A (en) * 1986-11-21 1988-06-14 イーストマン　コダック　カンパニー High image forming composition containing azinium activating agent
JPH02161439A (en) * 1988-12-15 1990-06-21 Daicel Chem Ind Ltd Photosensitizer and photopolymerizable composition

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