GB1524264A - Photopolymerizable compositions - Google Patents

Photopolymerizable compositions

Info

Publication number
GB1524264A
GB1524264A GB2770376A GB2770376A GB1524264A GB 1524264 A GB1524264 A GB 1524264A GB 2770376 A GB2770376 A GB 2770376A GB 2770376 A GB2770376 A GB 2770376A GB 1524264 A GB1524264 A GB 1524264A
Authority
GB
United Kingdom
Prior art keywords
parts
photopolymerizable compositions
july
per
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2770376A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of GB1524264A publication Critical patent/GB1524264A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

1524264 Photopolymerizable compositions E I DU PONT DE NEMOURS & CO 2 July 1976 [3 July 1975] 27703/76 Heading C3V Photopolymerizable compositions, which do not lose light-sensitivity on storage and which produce flexible polymeric products on exposure, comprise an organic polymeric binder (e.g. a methyl methacrylate polymer); 5-90 parts (per 100 parts by weight of the composition) of an addition polymerizable compound of the formula where R is H or methyl and X is phenylene or -(CH2)n-2- where m and n are each 2-10; and 0À001-20 parts (per 100 parts by weight of the polymerizable compound) of a photoinitiator.
GB2770376A 1975-07-03 1976-07-02 Photopolymerizable compositions Expired GB1524264A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US59310675A 1975-07-03 1975-07-03

Publications (1)

Publication Number Publication Date
GB1524264A true GB1524264A (en) 1978-09-13

Family

ID=24373410

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2770376A Expired GB1524264A (en) 1975-07-03 1976-07-02 Photopolymerizable compositions

Country Status (5)

Country Link
JP (2) JPS529091A (en)
BE (1) BE843723A (en)
DE (1) DE2628562B2 (en)
FR (1) FR2316627A1 (en)
GB (1) GB1524264A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2628562B2 (en) * 1975-07-03 1979-03-01 E.I. Du Pont De Nemours And Co., Wilmington, Del. (V.St.A.) Photopolymerizable compositions and their use
DE2933827A1 (en) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München METHOD FOR PRODUCING HIGH-TEMPERATURE-RESISTANT RELIEF STRUCTURES AND THE USE THEREOF.
DE2952697A1 (en) * 1979-12-29 1981-07-02 Hoechst Ag, 6230 Frankfurt POLYMERIZABLE MIXTURE BY RADIATION AND RADIATION-SENSITIVE COPY MATERIAL MADE THEREFOR
US4322490A (en) * 1980-11-17 1982-03-30 Eastman Kodak Company Photopolymerizable compositions featuring improved monomers
JPS57196229A (en) * 1981-05-26 1982-12-02 Horizons Research Inc Plasma developable photosensitive composition and formation and development of image
JP2826331B2 (en) * 1988-12-15 1998-11-18 ダイセル化学工業株式会社 Photopolymerizable composition
JPH038314A (en) * 1989-06-06 1991-01-16 Matsushita Electric Ind Co Ltd Aluminum case for electrolytic capacitor

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE604100A (en) * 1960-06-03
GB1235769A (en) * 1969-03-20 1971-06-16 Ppg Industries Inc Highly radiation-sensitive telomerized polyesters
JPS5034444B2 (en) * 1971-08-20 1975-11-08
JPS5340537B2 (en) * 1974-12-27 1978-10-27
DE2628562B2 (en) * 1975-07-03 1979-03-01 E.I. Du Pont De Nemours And Co., Wilmington, Del. (V.St.A.) Photopolymerizable compositions and their use

Also Published As

Publication number Publication date
JPS529091A (en) 1977-01-24
FR2316627A1 (en) 1977-01-28
DE2628562B2 (en) 1979-03-01
FR2316627B1 (en) 1981-10-30
DE2628562A1 (en) 1977-01-27
BE843723A (en) 1977-01-03
JPS5540485A (en) 1980-03-21

Similar Documents

Publication Publication Date Title
ATE17743T1 (en) RUBBER ELASTIC RADIATION POLYMERIZABLE COMPOUND CONTAINING ETHYLENICALLY UNSATURATED POLYURETHANES.
KR880011211A (en) Polymeric compounds and radiation-polymerizable mixtures containing them
JPS5531875A (en) Dental material
GB1135280A (en) Photopolymerizable compositions and elements
JPS55118030A (en) Photopolymerizable composition
JPS52134692A (en) Photopolymerizable composition
ES2141183T3 (en) USE OF HALOGENATED HYDROCARBON SOLVENTS.
ES8504391A1 (en) Photopolymerizable composition, material coated therewith, and use thereof.
ATE40644T1 (en) PHOTOPOLYMERIZABLE COMPOSITIONS.
JPS5314800A (en) Curable resin composition
FR2332290A1 (en) ACRYLIC ESTERS BASED MASSES, POLYMERIZABLE BY MEANS OF ULTRA-VIOLET RAYS
GB1278780A (en) Photodimerisation and photopolymerisation of bis-maleimides
GB1450288A (en) Photopolymerizable compositon
GB1524264A (en) Photopolymerizable compositions
ATE2288T1 (en) PHOTOPOLYMERIZABLE COMPOUND.
GB1489467A (en) Photosensitive resin compositions
JPS5269460A (en) Sealing compositions
ES483178A1 (en) Improvements in unsaturated polyester resins and methods of making them.
ES467061A1 (en) Benzamides and their use as insecticides
JPS57161742A (en) Photosensitive resin composition
IL64666A0 (en) N-sulphenylated biurets,their preparation and their use as fungicides
KR920008538A (en) Borate open reagents for photopolymerizable compositions
JPS546029A (en) Anaerobic adhesive composition
GB1532196A (en) Photopolymerisable element
JPS52150493A (en) Ultraviolet light curing resin compositions

Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee