JPS57196229A - Plasma developable photosensitive composition and formation and development of image - Google Patents

Plasma developable photosensitive composition and formation and development of image

Info

Publication number
JPS57196229A
JPS57196229A JP7994081A JP7994081A JPS57196229A JP S57196229 A JPS57196229 A JP S57196229A JP 7994081 A JP7994081 A JP 7994081A JP 7994081 A JP7994081 A JP 7994081A JP S57196229 A JPS57196229 A JP S57196229A
Authority
JP
Japan
Prior art keywords
development
formation
image
photosensitive composition
developable photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7994081A
Other languages
Japanese (ja)
Other versions
JPH0149928B2 (en
Inventor
Emu Ruisu Jieemusu
Efu Matsukuinaanii Yuujin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horizons Research Inc
Original Assignee
Horizons Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horizons Research Inc filed Critical Horizons Research Inc
Priority to JP7994081A priority Critical patent/JPS57196229A/en
Publication of JPS57196229A publication Critical patent/JPS57196229A/en
Publication of JPH0149928B2 publication Critical patent/JPH0149928B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP7994081A 1981-05-26 1981-05-26 Plasma developable photosensitive composition and formation and development of image Granted JPS57196229A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7994081A JPS57196229A (en) 1981-05-26 1981-05-26 Plasma developable photosensitive composition and formation and development of image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7994081A JPS57196229A (en) 1981-05-26 1981-05-26 Plasma developable photosensitive composition and formation and development of image

Publications (2)

Publication Number Publication Date
JPS57196229A true JPS57196229A (en) 1982-12-02
JPH0149928B2 JPH0149928B2 (en) 1989-10-26

Family

ID=13704311

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7994081A Granted JPS57196229A (en) 1981-05-26 1981-05-26 Plasma developable photosensitive composition and formation and development of image

Country Status (1)

Country Link
JP (1) JPS57196229A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037548A (en) * 1983-06-27 1985-02-26 テキサス　インスツルメンツ　インコ−ポレイテツド Plasma developable negative resist compound for electron beam, x ray and optical lithography and manufacture thereof
JPS63250125A (en) * 1987-04-06 1988-10-18 Nec Yamagata Ltd Manufacture of semiconductor device

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3899338A (en) * 1972-02-09 1975-08-12 Horizons Inc Photosensitive material suitable for use as a photoresist
JPS5179342A (en) * 1974-12-26 1976-07-10 Fuji Photo Film Co Ltd
JPS529091A (en) * 1975-07-03 1977-01-24 Du Pont Photoopolymerizable composition
JPS52104914A (en) * 1976-02-28 1977-09-02 Mitsubishi Paper Mills Ltd Light polymer azo image forming material and method of treating same
JPS5340537A (en) * 1976-09-25 1978-04-13 Sumitomo Bakelite Co Flexible photoconductor and method of menufatctring the same
JPS557841A (en) * 1978-06-30 1980-01-21 Kanegafuchi Chem Ind Co Ltd Graft polymer for reinforcing vinyl chloride resin

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3899338A (en) * 1972-02-09 1975-08-12 Horizons Inc Photosensitive material suitable for use as a photoresist
JPS5179342A (en) * 1974-12-26 1976-07-10 Fuji Photo Film Co Ltd
JPS529091A (en) * 1975-07-03 1977-01-24 Du Pont Photoopolymerizable composition
JPS52104914A (en) * 1976-02-28 1977-09-02 Mitsubishi Paper Mills Ltd Light polymer azo image forming material and method of treating same
JPS5340537A (en) * 1976-09-25 1978-04-13 Sumitomo Bakelite Co Flexible photoconductor and method of menufatctring the same
JPS557841A (en) * 1978-06-30 1980-01-21 Kanegafuchi Chem Ind Co Ltd Graft polymer for reinforcing vinyl chloride resin

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037548A (en) * 1983-06-27 1985-02-26 テキサス　インスツルメンツ　インコ−ポレイテツド Plasma developable negative resist compound for electron beam, x ray and optical lithography and manufacture thereof
JPH0438346B2 (en) * 1983-06-27 1992-06-24
JPS63250125A (en) * 1987-04-06 1988-10-18 Nec Yamagata Ltd Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPH0149928B2 (en) 1989-10-26

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