JPS5622312A - Photosensitive polyamide composition - Google Patents
Photosensitive polyamide compositionInfo
- Publication number
- JPS5622312A JPS5622312A JP9792279A JP9792279A JPS5622312A JP S5622312 A JPS5622312 A JP S5622312A JP 9792279 A JP9792279 A JP 9792279A JP 9792279 A JP9792279 A JP 9792279A JP S5622312 A JPS5622312 A JP S5622312A
- Authority
- JP
- Japan
- Prior art keywords
- acrylamide
- meth
- composition
- polyamide composition
- hexamethylenebisacrylamide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Graft Or Block Polymers (AREA)
- Polymerisation Methods In General (AREA)
Abstract
PURPOSE: Titled composition being excellent in photosensitivity and useful as a photo-curable coating or the like, prepared by adding butyl(meth)acrylamide, etc., to a composition comprising a soluble polyamide and N,N'-hexamethylenebisacrylamide.
CONSTITUTION: The photosensitive polyamide composition of the purpose is obtained by mixing a composition comprising (a) 45W99pts.wt. of a soluble polyamide and (b) 55W1pt.wt. of an N,N'-hexamethylenebisacrylamide with 50W1,200pts.wt. per 100pts.wt. of (b), of (c) at least one unsaturated compound selected from the group consisting of N-tert-butyl(meth)acrylamide, (meth)acrylamide, N-methylol(meth)acrylamide and diacetoneacrylamide.
USE: Photoresist, resin plate for printing, photocurable adhesive, etc.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9792279A JPS5622312A (en) | 1979-07-30 | 1979-07-30 | Photosensitive polyamide composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9792279A JPS5622312A (en) | 1979-07-30 | 1979-07-30 | Photosensitive polyamide composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5622312A true JPS5622312A (en) | 1981-03-02 |
Family
ID=14205177
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9792279A Pending JPS5622312A (en) | 1979-07-30 | 1979-07-30 | Photosensitive polyamide composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5622312A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02282492A (en) * | 1989-04-21 | 1990-11-20 | Eagle Ind Co Ltd | Production of bonded body of electrocast part and metallic part |
EP1291718A3 (en) * | 2001-09-11 | 2003-10-15 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
KR100366075B1 (en) * | 1995-11-17 | 2004-05-20 | 삼성에스디아이 주식회사 | Polymer for use in photosensitive composition and method for producing the same |
-
1979
- 1979-07-30 JP JP9792279A patent/JPS5622312A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02282492A (en) * | 1989-04-21 | 1990-11-20 | Eagle Ind Co Ltd | Production of bonded body of electrocast part and metallic part |
KR100366075B1 (en) * | 1995-11-17 | 2004-05-20 | 삼성에스디아이 주식회사 | Polymer for use in photosensitive composition and method for producing the same |
EP1291718A3 (en) * | 2001-09-11 | 2003-10-15 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
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