JPS5622312A - Photosensitive polyamide composition - Google Patents

Photosensitive polyamide composition

Info

Publication number
JPS5622312A
JPS5622312A JP9792279A JP9792279A JPS5622312A JP S5622312 A JPS5622312 A JP S5622312A JP 9792279 A JP9792279 A JP 9792279A JP 9792279 A JP9792279 A JP 9792279A JP S5622312 A JPS5622312 A JP S5622312A
Authority
JP
Japan
Prior art keywords
acrylamide
meth
composition
polyamide composition
hexamethylenebisacrylamide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9792279A
Other languages
Japanese (ja)
Inventor
Izumi Sakamoto
Minoru Mitsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unitika Ltd
Original Assignee
Unitika Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unitika Ltd filed Critical Unitika Ltd
Priority to JP9792279A priority Critical patent/JPS5622312A/en
Publication of JPS5622312A publication Critical patent/JPS5622312A/en
Pending legal-status Critical Current

Links

Landscapes

  • Graft Or Block Polymers (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE: Titled composition being excellent in photosensitivity and useful as a photo-curable coating or the like, prepared by adding butyl(meth)acrylamide, etc., to a composition comprising a soluble polyamide and N,N'-hexamethylenebisacrylamide.
CONSTITUTION: The photosensitive polyamide composition of the purpose is obtained by mixing a composition comprising (a) 45W99pts.wt. of a soluble polyamide and (b) 55W1pt.wt. of an N,N'-hexamethylenebisacrylamide with 50W1,200pts.wt. per 100pts.wt. of (b), of (c) at least one unsaturated compound selected from the group consisting of N-tert-butyl(meth)acrylamide, (meth)acrylamide, N-methylol(meth)acrylamide and diacetoneacrylamide.
USE: Photoresist, resin plate for printing, photocurable adhesive, etc.
COPYRIGHT: (C)1981,JPO&Japio
JP9792279A 1979-07-30 1979-07-30 Photosensitive polyamide composition Pending JPS5622312A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9792279A JPS5622312A (en) 1979-07-30 1979-07-30 Photosensitive polyamide composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9792279A JPS5622312A (en) 1979-07-30 1979-07-30 Photosensitive polyamide composition

Publications (1)

Publication Number Publication Date
JPS5622312A true JPS5622312A (en) 1981-03-02

Family

ID=14205177

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9792279A Pending JPS5622312A (en) 1979-07-30 1979-07-30 Photosensitive polyamide composition

Country Status (1)

Country Link
JP (1) JPS5622312A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02282492A (en) * 1989-04-21 1990-11-20 Eagle Ind Co Ltd Production of bonded body of electrocast part and metallic part
EP1291718A3 (en) * 2001-09-11 2003-10-15 Fuji Photo Film Co., Ltd. Photopolymerizable composition
KR100366075B1 (en) * 1995-11-17 2004-05-20 삼성에스디아이 주식회사 Polymer for use in photosensitive composition and method for producing the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02282492A (en) * 1989-04-21 1990-11-20 Eagle Ind Co Ltd Production of bonded body of electrocast part and metallic part
KR100366075B1 (en) * 1995-11-17 2004-05-20 삼성에스디아이 주식회사 Polymer for use in photosensitive composition and method for producing the same
EP1291718A3 (en) * 2001-09-11 2003-10-15 Fuji Photo Film Co., Ltd. Photopolymerizable composition

Similar Documents

Publication Publication Date Title
JPS52134692A (en) Photopolymerizable composition
JPS53104638A (en) Coating composition and preparation of abrasion resistant synthetic resin molded artticle using the same
JPS5365381A (en) Photopolymerizable composition
DE2964562D1 (en) Photopolymerisable composition
JPS5622312A (en) Photosensitive polyamide composition
JPS5228875A (en) Mask
JPS535283A (en) Resin coated sheet
JPS5310648A (en) Photosensitive resin compositions
JPS5354239A (en) Method of bonding photosensitive flexographic plate and rubber backingmaterial
JPS5416591A (en) Photosensitive resin composition
JPS5287482A (en) Resin-coated sheet
JPS57161742A (en) Photosensitive resin composition
JPS52150493A (en) Ultraviolet light curing resin compositions
JPS5399292A (en) Heat decomposable photosensitive resin composition
JPS5495688A (en) Photopolymerizable composition
JPS5420092A (en) Resin mortar
JPS52111935A (en) Method of forming paint film on metal by ultraviolet curing.
JPS5429975A (en) Photo mask
JPS55717A (en) Photo-setting resin composition
JPS53109585A (en) Photopolymerizable composition
JPS5323341A (en) Tack masking film
JPS536389A (en) Manufacture of resin composites
JPS531232A (en) Preparation of adhesive resin emulsion having improved flow characteristics
JPS5349027A (en) Coating composition
JPS5429346A (en) Preparation of relief pattern