KR100366075B1 - Polymer for use in photosensitive composition and method for producing the same - Google Patents

Polymer for use in photosensitive composition and method for producing the same Download PDF

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KR100366075B1
KR100366075B1 KR1019950041850A KR19950041850A KR100366075B1 KR 100366075 B1 KR100366075 B1 KR 100366075B1 KR 1019950041850 A KR1019950041850 A KR 1019950041850A KR 19950041850 A KR19950041850 A KR 19950041850A KR 100366075 B1 KR100366075 B1 KR 100366075B1
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polymer
acrylamide
photosensitive composition
mol
producing
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KR970028830A (en
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임익철
유승준
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삼성에스디아이 주식회사
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE: Provided are a polymer for use in photosensitive composition, which has excellent sensitivity and adhesion and is easy to etch, and a method for producing the same. CONSTITUTION: The polymer is represented by the formula I. The polymer is produced by the method comprising the steps of (i) mixing acrylamide, 0.01-20 mol%(based on the acrylamide) of diacetone acrylamide, 0.1-40 mol% of vinyl acetate, 0.01-1 mol% of initiator, and water to form a mixture, and stirring the mixture under nitrogen atmosphere to form a reactant solution, and (ii) reacting the solution at 50-70 deg.C for 3-5 hours. The initiator is selected from the group consisting of potassium persulfate, sodium persulfate, and ammonium persulfate.

Description

감광성 조성물에 사용되는 고분자 및 그 제조방법Polymers Used in Photosensitive Compositions and Methods for Manufacturing the Same

본 발명은 감광성 조성물에 사용되는 고분자 및 그 제조방법애 관한 것으로서, 보다 상세하기로는 감도 및 접착력이 우수하면서 에칭이 용이한, 감광성 조성물에 사용되는 새로운 고분자 및 그 제조방법에 관한 것이다.The present invention relates to a polymer used in the photosensitive composition and a method of manufacturing the same, and more particularly, to a new polymer used in the photosensitive composition and excellent in sensitivity and adhesion, and easy to etch, and a method for producing the same.

칼라 음극선관의 패널 내면에는 외광의 흡수를 위하여 일정간격으로 형성된 블랙 매트릭스 패턴, 이 블랙 매트리스 패턴사이로 전자빔과의 충돌에 의해 각색광을 발하게 하는 형광체층, 전자빔과의 충돌에 의해 형광체가 발하는 광중에서 패널의 내부로 향하는 빛을 패널의 외부, 즉 화상이 표시되는 쪽으로 반사시켜 주기 위해 상기 형광체층과 소정간격으로 이격되게 형성된 알루미늄 증착막 등이 있다.On the inner surface of the color cathode ray tube, a black matrix pattern formed at regular intervals for absorbing external light, a phosphor layer that emits a variety of light by collision with an electron beam between the black mattress patterns, and a light emitted by the phosphor by collision with an electron beam. In order to reflect the light directed toward the inside of the panel to the outside of the panel, that is, the image is displayed, there is an aluminum deposition film or the like formed spaced apart from the phosphor layer at a predetermined interval.

상기 각 요소중에서 블랙 매트릭스는 감광성 수지의 감광 원리를 이용하여 혹연으로 이루어진 광흡수막을 만드는 공정에 의해 형성된다. 이를 위해서는 먼저 고분자, 감광제, 순수 등으로 이루어진 감광액 수지 조성물을 세정된 패널의 내면에 도포하여 건조시키고, 이후 새도우 마스크를 사용하여 노광 및 현상하는 것에 의하여 감광성 수지 패턴을 형성시킨다. 형성된 감광성 수지 패턴의 상부에 흑연을 도포하고 감광성 수지 패턴 및 이의 상부에 형성된 흑연을 에칭, 제거함으로 블랙 매트릭스 패턴을 형성한다.Among the above elements, the black matrix is formed by a process of making a light absorption film made of alum by using the photosensitive principle of the photosensitive resin. To this end, a photosensitive resin composition composed of a polymer, a photosensitive agent, pure water, and the like is first applied to the inner surface of the cleaned panel and dried, and then exposed to light and developed using a shadow mask to form a photosensitive resin pattern. The black matrix pattern is formed by applying graphite on the formed photosensitive resin pattern and etching and removing the photosensitive resin pattern and the graphite formed thereon.

형성된 블랙 매트리스 페턴의 상부에 새도우 마스크를 사용하여 적색, 녹색, 청색의 각각 형광체 패턴을 차례로 형성시키는 것에 의하여 형광체층을 완성하는 것이다.The phosphor layer is completed by sequentially forming respective phosphor patterns of red, green, and blue using a shadow mask on the formed black mattress pattern.

상기 블랙 매트리스 및 형광체 패턴을 형성하기 위한 감광성 조성물에 사용되는 고분자에는 수용성 고분자인 PAD{poly(acrylamide-diacetoneacrylamide)}, PVP{polyvinylpyrrolidone} 및 PVA{polyvinylalcohol}와 난용성 고분자인 PVAc{polyvinylacetate} 등이 공지되어 있다.The polymers used in the photosensitive composition for forming the black mattress and the phosphor pattern include PAD {poly (acrylamide-diacetoneacrylamide)}, PVP {polyvinylpyrrolidone} and PVA {polyvinylalcohol} and PVAc {polyvinylacetate} which are poorly soluble polymers. Known.

PAD는 일반적으로 광에 대한 감도가 뛰어나지만 상반칙불괘특성을 가지고 있어서 일정조도 또는 일정 노광시간이하애서는 광반응이 충분하지 못해서 패턴 형성이 불량한 문제점이 있다. 또한 PAD와 PVP는 비스아지드화계 감광제와는 광반응을 하지만 크롬계 감광제와는 거의 광반응을 하지 못하는 것으로 알려져 있다. 따라서 비스아지드화계 감광제를 사용하는 블랙 매트릭스 패턴 형성용 감광성 조성물에는 사용가능하지만, 크롬계 감광제를 사용하는 형광체 패턴 형성용 감광성 조성물에는 사용이 불가능하다.In general, PAD has excellent sensitivity to light, but has an irregularity irregularity characteristic, so that light reaction is not sufficient under a constant illuminance or a predetermined exposure time, thereby causing poor pattern formation. PAD and PVP are also known to photoreact with bisazide-based photosensitizers, but rarely photoresist with chromium-based photosensitizers. Therefore, although it can be used for the photosensitive composition for black-matrix pattern formation which uses a bis azide type photosensitive agent, it cannot be used for the photosensitive composition for phosphor pattern formation which uses a chromium-type photosensitive agent.

한편, PVA는 상반칙불괘특성이 없고 접착력이 우수한 것으로 알려져 있다. 그리고 크롬계 감광제와는 광반응을 하지만 비스아지드화계 감광제와는 거의 광반응을 하지 못한다고 알려져 있다. 따라서 PVA는 형광체 패턴을 형성시키는 경우에만 사용가능하다.On the other hand, PVA is known to have no contradictory irregularities and excellent adhesion. It is known that photoreaction with chromium-based photosensitizers occurs but photoreaction with bisazide-based photosensitizers is rare. Therefore, PVA can be used only when forming a phosphor pattern.

상기에서 알 수 있는 바와 같이, 지금까지 알려져 있는 고분자 화합물들은 각각의 사용범위가 한정적이라는 단점을 가지고 있다.As can be seen from the above, the polymer compounds known to date have a disadvantage in that each use range is limited.

따라서 본 발명자들은 많은 연구끝애 상기의 문제점을 해결하여 여러가지 특성을 상호보완하여 광범위하게 사용가능한 고분자를 제조하기애 이르렀다.Accordingly, the present inventors have solved the above problems after many studies, and have made various polymers to produce a polymer that can be widely used.

즉, 본 발명의 목적은 감도 및 접착력이 우수하면서 에칭이 용이한, 감광성 조성물에 사용되는 새로운 고분자를 제공하는 것이며, 다른 목적은 이 고분자의 제조방법을 제공하는 것이다.That is, an object of the present invention is to provide a new polymer for use in the photosensitive composition which is excellent in sensitivity and adhesion and easy to etch, and another object is to provide a method for producing the polymer.

상기 목적을 달성하기 위하여 감광성 조성물에 사용되는 하기 구조식(I)의 고분자가 제공된다.In order to achieve the above object, a polymer of the following structural formula (I) to be used in the photosensitive composition is provided.

본 발명의 다른 목적은 아크릴아미드, 이를 기준으로 하여 0.01내지 20몰%의 디아세톤 아크릴아미드, 0.1내지 40몰%의 비닐 아세테이트, 0.1 내지 1몰%의 개시제 및 물을 혼합하여 질소분위기하에서 교반하는 단계:Another object of the present invention is to mix acrylamide, 0.01 to 20 mole percent diacetone acrylamide, 0.1 to 40 mole percent vinyl acetate, 0.1 to 1 mole percent initiator and water, and stir under nitrogen atmosphere. step:

상기 반응용액을 50 내지 70℃의 온도에서 3 내지 5시간동안 반응시키는 단계를 포함하고 있는 것을 특징으로 하는 구조식 (1)의 고분자 화합물의 제조방법에 의해서 달성된다.It is achieved by the method for producing a polymer compound of formula (1) characterized in that it comprises the step of reacting the reaction solution at a temperature of 50 to 70 ℃ for 3 to 5 hours.

바람직하기로는, 아크릴아미드를 기준으로 하여 상기 디아세톤 아크릴아미드의 함량이 0.1내지 10몰%이고 상기 비닐 아세테이트의 함량이 0.3내지 30몰%이다.Preferably, the content of diacetone acrylamide is 0.1 to 10 mol% and the content of vinyl acetate is 0.3 to 30 mol% based on acrylamide.

반응에 사용된 개시제로는 과황산칼륨(K2S2O8), 과황산나트륨(Na2S2O8) 및 과황산암모늄((NH4)2S2O8)중에서 선택된 적어도 하나이다.The initiator used in the reaction is at least one selected from potassium persulfate (K 2 S 2 O 8 ), sodium persulfate (Na 2 S 2 O 8 ) and ammonium persulfate ((NH 4 ) 2 S 2 O 8 ).

전술한 바와 같이, 본 발명의 고분자 수지는 음극선관의 블랙 매트리스 및 형광체 패턴 형성시 감광성 조성물애 사용되는 화합물로서 종래의 PAD에 비닐 아세테이트를 함께 공중합하여 제조한 새로운 수용성 고분자이다. 이를 반응도식으로 나타내면 다음과 같다.As described above, the polymer resin of the present invention is a new water-soluble polymer prepared by copolymerizing vinyl acetate together with a conventional PAD as a compound used in a photosensitive composition when forming a black mattress and a phosphor pattern of a cathode ray tube. This is represented by the reaction scheme as follows.

이하, 본 발명에 따른 구조식 (I)의 고분자 화합물 즉,PADV{poly(acrylamide-diacetoneacrylamide-vinylacetate)}와 제조방법을 상세히 설명하기로 한다.Hereinafter, the polymer compound of Structural Formula (I) according to the present invention, that is, PADV {poly (acrylamide-diacetoneacrylamide-vinylacetate)} and a manufacturing method will be described in detail.

먼저, 교반기, 콘덴서 및 온도계가 장착된 플라스크내에 아크릴아미드와, 이를 기준으로 하여 0.01 내지 20몰%, 바람직하게는 0.1내지 10몰%의 디아세톤 아크릴아미드, 0.1 내지 40몰%, 바람직하게는 0.3내지 30몰%의 비닐아세테이트, 0.1 내지 1몰%의 개시재 및 순수를 넣고 질소분위기하에서 교반한다. 이 때 질소를 계속 공급함으로써 반응 플라스크내의 산소가 완전히 제거된다.First, acrylamide in a flask equipped with a stirrer, a condenser and a thermometer, and 0.01 to 20 mol%, preferably 0.1 to 10 mol% of diacetone acrylamide, 0.1 to 40 mol%, preferably 0.3, based on this. To 30 mol% of vinyl acetate, 0.1 to 1 mol% of starting material and pure water are added and stirred under a nitrogen atmosphere. At this time, by continuously supplying nitrogen, oxygen in the reaction flask is completely removed.

상기 반응 용액을 50 내지 70℃의 온도에서 3 내지 5시간동안 반응시킨다.The reaction solution is reacted for 3 to 5 hours at a temperature of 50 to 70 ℃.

제1도는 PAD와 PADV의 IR 분석결과이다. PAD에서 -CONH-, -CONH2에 대한 피크가 1670∼1640cm-1근처에 나타나 있고, PADV에서 -OCOCH3에 대한 피크가 약 1735cm-1와 1000∼1300cm-1근처에 나타나 있다.1 shows the IR analysis results of PAD and PADV. In the peak for the PAD -CONH-, -CONH 2, and it appeared near 1670~1640cm -1, which in the peak PADV for -OCOCH 3 appears near 1735cm -1 and about 1000~1300cm -1.

제2도는 PAD와 PADV에 대한 IR 피크의 상대적인 차이를 나타낸 도면인데, 1735cm-1와 1670cm-1에서 급격한 변화가 있는 것으로 볼 때 PAD와 PADV의 구조를 확인할 수 있다.2 is a diagram showing a relative difference between IR peaks for PAD and PADV. As shown in FIG. 2, there is a sharp change in 1735 cm -1 and 1670 cm -1 , the structure of PAD and PADV can be confirmed.

이하, 본 발명의 바람직한 실시예를 참고하여 구체적으로 설명하기로 하는데, 본 발명이 하기의 실시예로만 한정되는 것은 아니다.Hereinafter, with reference to a preferred embodiment of the present invention will be described in detail, the present invention is not limited only to the following examples.

(실시예)(Example)

교반기, 콘덴서 및 온도계가 장착된 둥근 바닥의 4구 플라스크에 아크릴아미드 30g, 디아세톤 아크릴아미드 10%, 비닐아세테이트 30g, 과황산칼륨 0.5g 및 순수 700g를 넣는다. 질소분위기하애서 1시간동안 교반하여 산소를 완전히 제거시킨 다음, 반응용액의 온도를 55℃로 상승시키고, 이 온도에서 3시간동안 교반하여 PADV를 제조하였다In a round bottom four-necked flask equipped with a stirrer, a condenser and a thermometer, 30 g of acrylamide, 10% diacetone acrylamide, 30 g of vinyl acetate, 0.5 g of potassium persulfate and 700 g of pure water are added. After stirring for 1 hour under nitrogen atmosphere to completely remove oxygen, the temperature of the reaction solution was raised to 55 ° C. and stirred at this temperature for 3 hours to prepare PADV.

본발명의 고분자 화합물은 비스아지드화계 및 크롬계 감광제와 모두 광반응을 하기 때문에 이를 이용하여 블랙 매트릭스 및 형광체 패턴을 형성시킬 수 있을 뿐만 아니라, 에칭이 용이하고 광에 대한 감도 및 접착력이 우수하여 이를 이용하여 제조된 수지 패턴은 양호하다.Since the polymer compound of the present invention performs photoreaction with both bisazide and chromium photosensitizers, it is possible not only to form a black matrix and a phosphor pattern using the same, but also to easily etch and to have excellent sensitivity and adhesion to light. The resin pattern produced using this is good.

제1도는 PAD와 본 발명에 따른 PADV의 IR 분석결과이며,1 is an IR analysis of the PAD and PADV according to the present invention,

제2도는 PAD와 PADV애 대한 IR 피크의 상대적인 차이를 나타낸 도면이다.2 shows the relative difference between IR peaks for PAD and PADV.

Claims (3)

감광성 조성물애 사용되는 하기 구조식 (1)의 고분자.The polymer of the following structural formula (1) used in the photosensitive composition. 아크릴아미드, 이를 기준으로 하여 0.01 내지 20몰%의 디아세톤 아크릴아미드, 0.1 내지 40몰%의 비닐 아세테이트, 0.01 내지 1몰%의 개시제 및 물을 혼합하여 질소분위기하에서 쿄반하는 단계:Mixing acrylamide, 0.01 to 20 mole% diacetone acrylamide, 0.1 to 40 mole% vinyl acetate, 0.01 to 1 mole% initiator and water, based on this and kneading under nitrogen atmosphere: 상기 반응용액을 50 내지 70℃의 온도에서 3 내지 5시간동안 반응시키는 단계를 포함하고 있는 것을 특징으로 하는 구조식 (I)의 고분자의 제조방법.Method for producing a polymer of formula (I) characterized in that it comprises the step of reacting the reaction solution for 3 to 5 hours at a temperature of 50 to 70 ℃. 제2항에 있어서, 상기 개시제가 과황산칼륨, 과황산나트륨, 과황산암모늄으로 이루어진 군으로부터 선택된 적어도 하나인 것을 특징으로 하는 구조식 (I)의 고분자의 제조방법.The method according to claim 2, wherein the initiator is at least one selected from the group consisting of potassium persulfate, sodium persulfate, and ammonium persulfate.
KR1019950041850A 1995-11-17 1995-11-17 Polymer for use in photosensitive composition and method for producing the same KR100366075B1 (en)

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5622312A (en) * 1979-07-30 1981-03-02 Unitika Ltd Photosensitive polyamide composition
JPS5660431A (en) * 1979-10-24 1981-05-25 Hitachi Ltd Photosensitive composition and pattern forming method
US4296193A (en) * 1980-01-16 1981-10-20 Kimoto & Co., Ltd. Photosensitive positive diazo material with copolymer of acrylamide and diacetoneacrylamide and a process for developing to form color relief image
US4789621A (en) * 1985-03-05 1988-12-06 Advance Process Supply Company Screen emulsions comprised of diacetone acrylamide
JPS6413540A (en) * 1987-07-08 1989-01-18 Hitachi Ltd Photosensitive composition and pattern forming method using same
JPH05202196A (en) * 1992-01-29 1993-08-10 Hitachi Ltd Photochromic material
JPH06181032A (en) * 1992-12-14 1994-06-28 Hitachi Ltd Photosensitive composition and pattern forming method using it

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5622312A (en) * 1979-07-30 1981-03-02 Unitika Ltd Photosensitive polyamide composition
JPS5660431A (en) * 1979-10-24 1981-05-25 Hitachi Ltd Photosensitive composition and pattern forming method
US4296193A (en) * 1980-01-16 1981-10-20 Kimoto & Co., Ltd. Photosensitive positive diazo material with copolymer of acrylamide and diacetoneacrylamide and a process for developing to form color relief image
US4789621A (en) * 1985-03-05 1988-12-06 Advance Process Supply Company Screen emulsions comprised of diacetone acrylamide
JPS6413540A (en) * 1987-07-08 1989-01-18 Hitachi Ltd Photosensitive composition and pattern forming method using same
JPH05202196A (en) * 1992-01-29 1993-08-10 Hitachi Ltd Photochromic material
JPH06181032A (en) * 1992-12-14 1994-06-28 Hitachi Ltd Photosensitive composition and pattern forming method using it

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