JPS55127550A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS55127550A
JPS55127550A JP3470779A JP3470779A JPS55127550A JP S55127550 A JPS55127550 A JP S55127550A JP 3470779 A JP3470779 A JP 3470779A JP 3470779 A JP3470779 A JP 3470779A JP S55127550 A JPS55127550 A JP S55127550A
Authority
JP
Japan
Prior art keywords
resin composition
photosensitive resin
heterocyclic organic
condensed ring
organic mercaptan
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3470779A
Other languages
Japanese (ja)
Other versions
JPS59818B2 (en
Inventor
Minoru Wada
Minoru Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP54034707A priority Critical patent/JPS59818B2/en
Publication of JPS55127550A publication Critical patent/JPS55127550A/en
Publication of JPS59818B2 publication Critical patent/JPS59818B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE:To obtain a photosensitive resin composition with high ultraviolet-polymerization activity by adding a specified imidazolyl ring dimer and a heterocyclic organic mercaptan compound to a radical-polymerizable ethylenic unsaturated compound. CONSTITUTION:An imidazolyl ring dimer represented by the formula (where Aryl is a condensed ring of two or more aromatic rings and the condensed ring may have a substituent) and a heterocyclic organic mercaptan compound such as 2-mercaptobenzimidazole are combined and used as a photopolymerization initiator. This initiator is mixed with a monomer such as trimethylolpropane acrylate, a binder, a pigment, etc., and the resulting coating material is coated onto a support such as a polyester film, dried, and covered with an overcoat layer to obtain a photosensitive material having high photopolymerizability and high storage stability. This material is esp. suitable for use in manufacture of a letterpress printing plate and materials related to electronics.
JP54034707A 1979-03-23 1979-03-23 Photosensitive resin composition Expired JPS59818B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54034707A JPS59818B2 (en) 1979-03-23 1979-03-23 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54034707A JPS59818B2 (en) 1979-03-23 1979-03-23 Photosensitive resin composition

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2170981A Division JPS56139508A (en) 1981-02-16 1981-02-16 Photopolymer composition

Publications (2)

Publication Number Publication Date
JPS55127550A true JPS55127550A (en) 1980-10-02
JPS59818B2 JPS59818B2 (en) 1984-01-09

Family

ID=12421817

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54034707A Expired JPS59818B2 (en) 1979-03-23 1979-03-23 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS59818B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57148740A (en) * 1981-03-10 1982-09-14 Toyobo Co Ltd Image duplicating material
JPS57161742A (en) * 1981-03-27 1982-10-05 Toyobo Co Ltd Photosensitive resin composition
JPS5845210A (en) * 1981-09-09 1983-03-16 Toyobo Co Ltd Photo-sensitive resin composition
US4994536A (en) * 1987-06-23 1991-02-19 Rhone-Poulenc Chimie Thermally stable bisimido copolymerizates
US5221723A (en) * 1987-06-23 1993-06-22 Ciba-Geigy Corporation Thermally stable bisimido copolymerizates
WO2007052470A1 (en) 2005-11-01 2007-05-10 Konica Minolta Medical & Graphic, Inc. Lithographic printing plate material, lithographic printing plate, method for preparing lithographic printing plate, and method for printing by lithographic printing plate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60124423U (en) * 1984-01-30 1985-08-22 株式会社　伊藤喜工作所 partition device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3445234A (en) * 1962-10-31 1969-05-20 Du Pont Leuco dye/hexaarylbiimidazole imageforming composition
JPS4838403A (en) * 1971-09-17 1973-06-06

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3445234A (en) * 1962-10-31 1969-05-20 Du Pont Leuco dye/hexaarylbiimidazole imageforming composition
JPS4838403A (en) * 1971-09-17 1973-06-06

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57148740A (en) * 1981-03-10 1982-09-14 Toyobo Co Ltd Image duplicating material
JPH0210936B2 (en) * 1981-03-10 1990-03-12 Toyo Boseki Kk
JPS57161742A (en) * 1981-03-27 1982-10-05 Toyobo Co Ltd Photosensitive resin composition
JPS5845210A (en) * 1981-09-09 1983-03-16 Toyobo Co Ltd Photo-sensitive resin composition
US4994536A (en) * 1987-06-23 1991-02-19 Rhone-Poulenc Chimie Thermally stable bisimido copolymerizates
US5221723A (en) * 1987-06-23 1993-06-22 Ciba-Geigy Corporation Thermally stable bisimido copolymerizates
WO2007052470A1 (en) 2005-11-01 2007-05-10 Konica Minolta Medical & Graphic, Inc. Lithographic printing plate material, lithographic printing plate, method for preparing lithographic printing plate, and method for printing by lithographic printing plate

Also Published As

Publication number Publication date
JPS59818B2 (en) 1984-01-09

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