JPS5758140A - Image forming material - Google Patents
Image forming materialInfo
- Publication number
- JPS5758140A JPS5758140A JP13390180A JP13390180A JPS5758140A JP S5758140 A JPS5758140 A JP S5758140A JP 13390180 A JP13390180 A JP 13390180A JP 13390180 A JP13390180 A JP 13390180A JP S5758140 A JPS5758140 A JP S5758140A
- Authority
- JP
- Japan
- Prior art keywords
- image forming
- forming material
- polymerizable compound
- ethylenic unsatd
- toughness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
PURPOSE:To improve the flexibility and toughness of a cured resist film by using a bifunctional(meth)acrylate of specific structure as an ethylenic unsatd. polymerizable compound for an image forming material permitting strip developing. CONSTITUTION:The image forming material permiting strip developing is produced by providing a photopolymeriable composition layer contg. an ethylenic unsatd. polymerizable compound, a film-formable high polymer material and a photopolymerization initiator on a transparent substrate. This image forming material uses the compound expressed by the formula as part or the whole of its ethylenic unsatd. polymerizable compound. The compound expressed by the formulaIimproves the flexibility and toughness of a cured resist film, and makes it possible to set the adhesive force of the photocurable composition layer in an unexposed and uncured state within a range suitable for tinting resist.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13390180A JPS5758140A (en) | 1980-09-25 | 1980-09-25 | Image forming material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13390180A JPS5758140A (en) | 1980-09-25 | 1980-09-25 | Image forming material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5758140A true JPS5758140A (en) | 1982-04-07 |
JPS645287B2 JPS645287B2 (en) | 1989-01-30 |
Family
ID=15115743
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13390180A Granted JPS5758140A (en) | 1980-09-25 | 1980-09-25 | Image forming material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5758140A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5989367A (en) * | 1982-11-15 | 1984-05-23 | Mitsui Petrochem Ind Ltd | Coating curing resin composition |
JPS59159155A (en) * | 1983-03-01 | 1984-09-08 | Hitachi Chem Co Ltd | Photosensitive resin composition |
JPH02105155A (en) * | 1988-10-14 | 1990-04-17 | Nippon Synthetic Chem Ind Co Ltd:The | Photosensitive resin composition |
-
1980
- 1980-09-25 JP JP13390180A patent/JPS5758140A/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5989367A (en) * | 1982-11-15 | 1984-05-23 | Mitsui Petrochem Ind Ltd | Coating curing resin composition |
JPH0553837B2 (en) * | 1982-11-15 | 1993-08-11 | Mitsui Petrochemical Ind | |
JPS59159155A (en) * | 1983-03-01 | 1984-09-08 | Hitachi Chem Co Ltd | Photosensitive resin composition |
JPH02105155A (en) * | 1988-10-14 | 1990-04-17 | Nippon Synthetic Chem Ind Co Ltd:The | Photosensitive resin composition |
Also Published As
Publication number | Publication date |
---|---|
JPS645287B2 (en) | 1989-01-30 |
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