JP2000231194A5 - - Google Patents
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- Publication number
- JP2000231194A5 JP2000231194A5 JP1999240600A JP24060099A JP2000231194A5 JP 2000231194 A5 JP2000231194 A5 JP 2000231194A5 JP 1999240600 A JP1999240600 A JP 1999240600A JP 24060099 A JP24060099 A JP 24060099A JP 2000231194 A5 JP2000231194 A5 JP 2000231194A5
- Authority
- JP
- Japan
- Prior art keywords
- resist film
- photoresist composition
- positive photoresist
- alkyl group
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000001875 compounds Chemical class 0.000 claims 2
- 229920002120 photoresistant polymer Polymers 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
Claims (2)
一般式（Ｉ） −ＳＯ2−Ｏ−Ｒ
（ここでＲは、置換基を有していてもよい、アルキル基、環状アルキル基又はアルケニル基を表す。）で表される基を含む繰り返し単位を含有し、酸の作用によりアルカリ現像液に対する溶解速度が増加する樹脂を含有することを特徴とするポジ型フォトレジスト組成物。A compound capable of generating an acid upon irradiation with actinic rays or radiation, and a compound represented by the general formula (I) —SO 2 —OR
(Wherein R represents an alkyl group, a cyclic alkyl group or an alkenyl group which may have a substituent), and contains a repeating unit containing a group represented by A positive photoresist composition comprising a resin having an increased dissolution rate.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24060099A JP3995369B2 (en) | 1998-12-07 | 1999-08-26 | Positive photoresist composition |
| US09/456,827 US6576392B1 (en) | 1996-12-07 | 1999-12-06 | Positive photoresist composition |
| KR1019990055067A KR100610165B1 (en) | 1998-12-07 | 1999-12-06 | Positive photoresist composition |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34719398 | 1998-12-07 | ||
| JP10-347193 | 1998-12-07 | ||
| JP24060099A JP3995369B2 (en) | 1998-12-07 | 1999-08-26 | Positive photoresist composition |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000231194A JP2000231194A (en) | 2000-08-22 |
| JP2000231194A5 true JP2000231194A5 (en) | 2005-07-07 |
| JP3995369B2 JP3995369B2 (en) | 2007-10-24 |
Family
ID=26534811
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24060099A Expired - Fee Related JP3995369B2 (en) | 1996-12-07 | 1999-08-26 | Positive photoresist composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3995369B2 (en) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6482567B1 (en) * | 2000-08-25 | 2002-11-19 | Shipley Company, L.L.C. | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same |
| JP4438218B2 (en) * | 2000-11-16 | 2010-03-24 | Ｊｓｒ株式会社 | Radiation sensitive resin composition |
| JP4186497B2 (en) * | 2001-04-12 | 2008-11-26 | 東レ株式会社 | Positive radiation-sensitive composition and method for producing resist pattern using the same |
| JP4007581B2 (en) * | 2002-04-19 | 2007-11-14 | 富士フイルム株式会社 | Positive resist composition |
| KR100955006B1 (en) * | 2002-04-26 | 2010-04-27 | 후지필름 가부시키가이샤 | Positive resist composition |
| KR100467698B1 (en) * | 2002-09-05 | 2005-01-24 | 삼성에스디아이 주식회사 | Cylindrical type lithium secondary battery and the fabrication method of the same |
| JP4996060B2 (en) * | 2004-05-12 | 2012-08-08 | キヤノン株式会社 | Charge control agent containing polymer having sulfonate group and amide group, toner for developing electrostatic image using the same, image forming method and image forming apparatus |
| US7795363B2 (en) | 2004-05-12 | 2010-09-14 | Canon Kabushiki Kaisha | Polymer having a sulfonic group or a sulfonate group and an amide group and method of producing same |
| US7537879B2 (en) * | 2004-11-22 | 2009-05-26 | Az Electronic Materials Usa Corp. | Photoresist composition for deep UV and process thereof |
| JP5331624B2 (en) * | 2009-09-04 | 2013-10-30 | 富士フイルム株式会社 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same |
| KR101706409B1 (en) | 2009-09-30 | 2017-02-13 | 제이에스알 가부시끼가이샤 | Polymer, radiation-sensitive composition, monomer, and manufacturing method therefor |
| KR20140033027A (en) * | 2011-04-01 | 2014-03-17 | 더 리서치 파운데이션 오브 스테이트 유니버시티 오브 뉴욕 | Stabilized acid amplifiers |
| US9772558B2 (en) * | 2013-09-24 | 2017-09-26 | International Business Machines Corporation | Sulfonic acid ester containing polymers for organic solvent based dual-tone photoresists |
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1999
- 1999-08-26 JP JP24060099A patent/JP3995369B2/en not_active Expired - Fee Related