FR2369590A1 - Element sensible a des radiations d'une combustibilite reduite - Google Patents

Element sensible a des radiations d'une combustibilite reduite

Info

Publication number
FR2369590A1
FR2369590A1 FR7732230A FR7732230A FR2369590A1 FR 2369590 A1 FR2369590 A1 FR 2369590A1 FR 7732230 A FR7732230 A FR 7732230A FR 7732230 A FR7732230 A FR 7732230A FR 2369590 A1 FR2369590 A1 FR 2369590A1
Authority
FR
France
Prior art keywords
weight
composition
radiation
relates
element sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7732230A
Other languages
English (en)
French (fr)
Other versions
FR2369590B1 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of FR2369590A1 publication Critical patent/FR2369590A1/fr
Application granted granted Critical
Publication of FR2369590B1 publication Critical patent/FR2369590B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR7732230A 1976-10-27 1977-10-26 Element sensible a des radiations d'une combustibilite reduite Granted FR2369590A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US73597976A 1976-10-27 1976-10-27
US78090777A 1977-03-24 1977-03-24

Publications (2)

Publication Number Publication Date
FR2369590A1 true FR2369590A1 (fr) 1978-05-26
FR2369590B1 FR2369590B1 (enrdf_load_stackoverflow) 1981-11-13

Family

ID=27112970

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7732230A Granted FR2369590A1 (fr) 1976-10-27 1977-10-26 Element sensible a des radiations d'une combustibilite reduite

Country Status (9)

Country Link
JP (1) JPS5356018A (enrdf_load_stackoverflow)
CA (1) CA1116919A (enrdf_load_stackoverflow)
CH (1) CH630767A5 (enrdf_load_stackoverflow)
DE (1) DE2747947C2 (enrdf_load_stackoverflow)
FR (1) FR2369590A1 (enrdf_load_stackoverflow)
GB (1) GB1588368A (enrdf_load_stackoverflow)
IT (1) IT1089005B (enrdf_load_stackoverflow)
NL (1) NL7711723A (enrdf_load_stackoverflow)
SE (1) SE435106B (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2490838A1 (fr) * 1980-09-19 1982-03-26 Hitachi Chemical Co Ltd Composition de resine photosensible et element photosensible obtenu a l'aide de cette resine
FR2491639A1 (fr) * 1980-10-08 1982-04-09 Hitachi Chemical Co Ltd Composition de resine photosensible et element photosensible obtenu a l'aide de cette resine
EP0822448A1 (en) * 1996-08-02 1998-02-04 E.I. Du Pont De Nemours And Company Flexible, flame-retardant, photoimageable composition for coating printed circuits
US7141614B2 (en) 2001-10-30 2006-11-28 Kaneka Corporation Photosensitive resin composition and photosensitive films and laminates made by using the same

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO159729C (no) * 1978-11-01 1989-02-01 Coates Brothers & Co Fremgangsmaate for fremstilling av et moenster av loddemetall paa et lag elektrisk ledende metall baaret av et ikke-ledende underlag.
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
JPS5969752A (ja) * 1982-10-14 1984-04-20 Sekisui Chem Co Ltd 光重合可能な画像形成用組成物
JPS63158157U (enrdf_load_stackoverflow) * 1987-04-07 1988-10-17
US5196296A (en) * 1989-10-06 1993-03-23 Nippon Steel Corporation Epoxy acrylate resins and photosensitive resin compositions therefrom

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3261686A (en) * 1963-04-23 1966-07-19 Du Pont Photopolymerizable compositions and elements
FR2020258A1 (enrdf_load_stackoverflow) * 1968-10-09 1970-07-10 Du Pont
DE2062563A1 (de) * 1969-12-19 1971-09-02 Mccall Corp Vernetzbare Polymerisate und Ver fahren zu ihrer Herstellung
DE2344680A1 (de) * 1973-09-05 1975-03-20 Bruno Prof Dr Vollmert Photopolymerisierbare mischung und deren verwendung zur herstellung von reliefdruckplatten
DE2558528A1 (de) * 1974-12-26 1976-07-08 Fuji Photo Film Co Ltd Aufzeichnungsmaterial

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA614181A (en) * 1961-02-07 J. Mcgraw William Photopolymerizable compositions, elements and processes
US3682800A (en) * 1969-07-25 1972-08-08 Toray Industries Method for producing acrylonitrile copolymers
US3657088A (en) * 1969-12-17 1972-04-18 Bayer Ag Moulding and coating masses hardenable by uv irradiation
US3887450A (en) * 1971-02-04 1975-06-03 Dynachem Corp Photopolymerizable compositions containing polymeric binding agents
JPS498281A (enrdf_load_stackoverflow) * 1972-05-11 1974-01-24
JPS5537869B2 (enrdf_load_stackoverflow) * 1973-02-12 1980-09-30
JPS5335722B2 (enrdf_load_stackoverflow) * 1973-08-29 1978-09-28

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3261686A (en) * 1963-04-23 1966-07-19 Du Pont Photopolymerizable compositions and elements
FR2020258A1 (enrdf_load_stackoverflow) * 1968-10-09 1970-07-10 Du Pont
DE2062563A1 (de) * 1969-12-19 1971-09-02 Mccall Corp Vernetzbare Polymerisate und Ver fahren zu ihrer Herstellung
DE2344680A1 (de) * 1973-09-05 1975-03-20 Bruno Prof Dr Vollmert Photopolymerisierbare mischung und deren verwendung zur herstellung von reliefdruckplatten
DE2558528A1 (de) * 1974-12-26 1976-07-08 Fuji Photo Film Co Ltd Aufzeichnungsmaterial

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2490838A1 (fr) * 1980-09-19 1982-03-26 Hitachi Chemical Co Ltd Composition de resine photosensible et element photosensible obtenu a l'aide de cette resine
FR2491639A1 (fr) * 1980-10-08 1982-04-09 Hitachi Chemical Co Ltd Composition de resine photosensible et element photosensible obtenu a l'aide de cette resine
EP0822448A1 (en) * 1996-08-02 1998-02-04 E.I. Du Pont De Nemours And Company Flexible, flame-retardant, photoimageable composition for coating printed circuits
US7141614B2 (en) 2001-10-30 2006-11-28 Kaneka Corporation Photosensitive resin composition and photosensitive films and laminates made by using the same

Also Published As

Publication number Publication date
CH630767A5 (en) 1982-06-30
DE2747947C2 (de) 1983-12-22
NL7711723A (nl) 1978-05-02
IT1089005B (it) 1985-06-10
SE435106B (sv) 1984-09-03
JPS5356018A (en) 1978-05-22
GB1588368A (en) 1981-04-23
SE7712054L (sv) 1978-04-28
JPS5751655B2 (enrdf_load_stackoverflow) 1982-11-02
CA1116919A (en) 1982-01-26
FR2369590B1 (enrdf_load_stackoverflow) 1981-11-13
DE2747947A1 (de) 1978-05-03

Similar Documents

Publication Publication Date Title
FR2369590A1 (fr) Element sensible a des radiations d'une combustibilite reduite
BR8103185A (pt) Composicao fotossensivel e elemento foto-resistor
EP0340652A3 (en) Dye sensitized photographic imaging system
FR2388304A1 (fr) Elements photosensibles exempts d'argent, contenant une nitrofuryldihydropyridine, a action positive
SE7612232L (sv) Stralningsherdbara beleggningskompositioner innefattande merkaptoalkylkisel och vinylmonomer
ATE25135T1 (de) Polymerisierbare fluessigkeit.
EP0354458A3 (de) Fotoinitiatoren kombinierter Struktur
ATE15727T1 (de) Unter einfluss von ultraviolettem licht loesbares druckempfindliches klebemittel.
ATE262158T1 (de) Minenschutzboden für ein panzerfahrzeug
KR920004450A (ko) 광중합성 조성물 및 이 조성물을 사용하여 제조한 광중합성 기록물질
KR840001488A (ko) 광민감 인쇄판용 신디오택틱 폴리부타디엔 조성물
TR199801200T1 (xx) Bir 2-imidazolin-5-on i�eren yeni fonjisit bile�im.
KR870010420A (ko) 광중합성 조성물 및 이를 함유하는 광중합성 기록물질
SE7604116L (sv) Skyddsbeleggning pa stalyta
DE69031545D1 (de) Einen Photoinitiator enthaltende Zusammensetzungen, lichthärtbare Zusammensetzungen und lichtempfindliche Mikrokapseln
ES468294A1 (es) Procedimiento para la obtencion de medios de revestimiento fotopolimerizables.
ATE232992T1 (de) Flüssige photoempfindliche zusammensetzung
MX9404061A (es) Composiciones curables mediante radiacion.
NL188360C (nl) Afdichting voor een op de zeebodem opstelbare poot van een platform.
ATE9581T1 (de) 2-chlor-4-trifluormethyl-thiazolcarbothiolsaeure und ihre verwendung als antidota.
ES441081A1 (es) Un procedimiento para la polimerizacion de un sistema foto- polimerizable.
KR850000470A (ko) 포토 이니시에이터로서의 알파-할로겐화 방향족 화합물
JPS57192420A (en) Photopolymer composition
JPS5417014A (en) Radiation sensitive composite
Mindeli et al. The Effect of Extreme Conditions on the Structure of\ Mild\ Steel

Legal Events

Date Code Title Description
ST Notification of lapse