KR870010420A - 광중합성 조성물 및 이를 함유하는 광중합성 기록물질 - Google Patents

광중합성 조성물 및 이를 함유하는 광중합성 기록물질 Download PDF

Info

Publication number
KR870010420A
KR870010420A KR870003860A KR870003860A KR870010420A KR 870010420 A KR870010420 A KR 870010420A KR 870003860 A KR870003860 A KR 870003860A KR 870003860 A KR870003860 A KR 870003860A KR 870010420 A KR870010420 A KR 870010420A
Authority
KR
South Korea
Prior art keywords
photopolymerizable
compound
photopolymerizable composition
recording material
hydrogen
Prior art date
Application number
KR870003860A
Other languages
English (en)
Inventor
프롬멜트 한스-디터
요에르그 베.폴만 한스
Original Assignee
베틀라우퍼. 오일러
훽스트 아크티엔게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 베틀라우퍼. 오일러, 훽스트 아크티엔게젤샤프트 filed Critical 베틀라우퍼. 오일러
Publication of KR870010420A publication Critical patent/KR870010420A/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymerisation Methods In General (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)

Abstract

내용 없음

Description

광중합성 조성물 및 이를 함유하는 광중합성 기록물질
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (13)

  1. 필수 성분으로서 a)중합성 결합제, b) 적어도 하나의 말단 에틸렌성 이중결합을 갖는 화합물 및 c) 광개시제로서 N-헤테로사이클릭 화합물을 함유하고 일반식(I) 및 (II)중의 어느 하나에 상응하는 할로겐 화합물을 추가로 함유하는 광중합성 조성물.
    상기 식에서,
    X1는 염소 또는 브롬이고,
    X2및 X3는 동일하거나 상이하며, X1, 수소 또는 알킬 그룹을 나타내고,
    Y 및 Z는 동일하거나 상이하며, X1, 수소 CN 또는 (A)n-(B)n-D이고,
    A는 페닐렌그룹이며,
    n은 0 또는 1이고,
    B는 CO 또는 SO2이며,
    D는 R, OR, NHR, N, H2, NR2또는 CX1X2X3이고,
    R은 알킬, 사이클로알킬, 아릴, 또는 헤테로일 라디칼이며,
    W는 1내지 3개의 헤테로 원자를 갖고, 임의로 치환체를 가지며, 임의로 융합된 방향족 환을 갖는 5 또는 6원 헤테로 사이클릭환이고,
    m은 1 또는 2이다.
  2. 제1항에 있어서, N-헤테로사이클릭 화합물이 아크리딘, 펜아진 또는 퀴놀린 화합물인 광중합성 조성물.
  3. 제2항에 있어서, N-헤테로 사이클릭 화합물이 9-위치에서 아릴-치환된 아크리딘 인광중합성 조성물.
  4. 제1항에 있어서, 일반식(I)의 할로겐 화합물이 트리브로모메틸-페닐설폰, 2,2-디브로모말론산디아미드,,-디브로모--시아노메틸-페닐설폰,,-디브로모--벤조일메틸-페닐설폰, 또는,-디브로모말론산-비스 -N-메틸아미드인 광중합성 조성물.
  5. 제1항에 있어서, 일반식(II)의 할로겐 화합물이 2-위치에서 치환된 4,6-비드(트리클로로메틸)-S-트리아진 또는 2-트리브로모메틸퀴놀린 광중합성 조성물.
  6. 제1항에 있어서, 2-위치에서의 치환체가 알킬 또는 아릴 라디칼인 광중합성 조성물.
  7. 제1항에 있어서, 일반식(I) 및 (II)의 화합물을 각각 0.01 내지 3.0중량%의 양으로 함유하는 광중합성 조성물.
  8. 제1항에 있어서, 염료 또는 염료와 류코염료와의 혼합물을 추가로 함유하는 광중합성 조성물.
  9. 제1항에 있어서, 중합성 결합제가 물에 불용성이고 알카리성 수용액에 가용성인 광중합성 조성물.
  10. 제9항에 있어서, 중합체 결합제의 산가가 50 내지 350인 광중합성 조성물.
  11. 필수성분으로서 a) 중합성결합제, b) 적어도 하나의 말단 에틸렌성 이중결합을 갖는 화합물 및 c) 광개시제로서 N-헤테로 사이클릭 화합물을 함유하고 일반식(I) 및 (II)중의 어느 하나에 상응하는 할로겐 화합물을 추가로 함유하는 광중합성층 및 지지체로 이루어진 광중합성 기록물질.
    상기 식에서,
    X1는 염소 또는 브롬이고,
    X2및 X3는 동일하거나 상이하며, X1, 수소 또는 알킬 그룹을 나타내고,
    Y 및 Z는 동일하거나 상이하며, X1, 수소 CN 또는 (A)n-(B)n-D이고,
    A는 페닐렌그룹이며,
    n은 0 또는 1이고,
    B는 CO 또는 SO2이며,
    D는 R, OR, NHR, N, H2, NR2또는 CX1X2X3이고,
    R은 알킬, 사이클로알킬, 아릴, 또는 헤테로일 라디칼이며,
    W는 1내지 3개의 헤테로 원자를 갖고, 임의로 치환체를 가지며, 임의로 융합된 방향족 환을 갖는 5 또는 6원 헤테로 사이클릭환이고,
    m은 1 또는 2이다.
  12. 제11항에 있어서, 지지체가 알루미늄, 구리 또는 알루미늄 합금 또는 구리합금인 표면을 갖는 광중합성 기록물질.
  13. 제12항에 있어서, 지지체가 투명한 플라스틱 필름인 광중합성 기록물질.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR870003860A 1986-04-23 1987-04-22 광중합성 조성물 및 이를 함유하는 광중합성 기록물질 KR870010420A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3613632.8 1986-04-23
DE19863613632 DE3613632A1 (de) 1986-04-23 1986-04-23 Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial

Publications (1)

Publication Number Publication Date
KR870010420A true KR870010420A (ko) 1987-11-30

Family

ID=6299275

Family Applications (1)

Application Number Title Priority Date Filing Date
KR870003860A KR870010420A (ko) 1986-04-23 1987-04-22 광중합성 조성물 및 이를 함유하는 광중합성 기록물질

Country Status (5)

Country Link
US (1) US5057398A (ko)
EP (1) EP0243784B1 (ko)
JP (1) JP2845873B2 (ko)
KR (1) KR870010420A (ko)
DE (2) DE3613632A1 (ko)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6355539A (ja) * 1986-05-30 1988-03-10 Toyobo Co Ltd 画像形成材料および画像形成方法
US4845011A (en) * 1987-10-23 1989-07-04 Hoechst Celanese Corporation Visible light photoinitiation compositions
JPH0237349A (ja) * 1988-07-27 1990-02-07 Kimoto & Co Ltd 感光性組成物
JPH0820734B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 感光性組成物及びそれを用いた光重合性組成物
DE3831782A1 (de) * 1988-09-19 1990-03-29 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3832032A1 (de) * 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JP2721843B2 (ja) * 1989-03-23 1998-03-04 関西ペイント株式会社 プリント配線板の製造方法
JP2599003B2 (ja) * 1989-10-16 1997-04-09 富士写真フイルム株式会社 感光性組成物
DE4007428A1 (de) * 1990-03-09 1991-09-12 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
KR100290514B1 (ko) * 1992-09-29 2001-09-17 후지다 히로미찌 감광성착색조성물,그리고색필터및색필터의제조방법
US5407783A (en) * 1993-07-22 1995-04-18 E. I. Du Pont De Nemours And Company Photoimageable compositions containing substituted 1, 2 dihalogenated ethanes for enhanced printout image
JPH08240908A (ja) * 1994-12-29 1996-09-17 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物、それを用いた感光性平版印刷版、および平版印刷用版材の製造方法
US5814431A (en) * 1996-01-10 1998-09-29 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
US20070263060A1 (en) * 2005-01-14 2007-11-15 Mikhail Laksin Hybrid Energy Curable Solvent-Based Liquid Printing Inks
KR101345930B1 (ko) * 2009-03-13 2013-12-27 히타치가세이가부시끼가이샤 감광성 수지 조성물, 및 이를 이용한 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 프린트 배선판의 제조 방법

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1522499A1 (de) * 1966-05-31 1969-09-11 Kalle Ag Verfahren zum Herstellen von Offsetdruckformen
DE1597785A1 (de) * 1967-08-31 1970-06-18 Kalle Ag Druckplatte mit photoaktiver Schicht
DE1298414B (de) * 1967-11-09 1969-06-26 Kalle Ag Lichtempfindliches Gemisch
GB1248036A (en) * 1968-01-12 1971-09-29 Agfa Gevaert Photopolymerisation of ethylenically unsaturated organic compounds
DE2027467C3 (de) * 1970-06-04 1974-08-15 Kalle Ag, 6202 Wiesbaden-Biebrich Photopolymerisierbare Kopiermasse
DE2039861C3 (de) * 1970-08-11 1973-12-13 Kalle Ag, 6202 Wiesbaden-Biebrich Photopolymensierbare Kopier masse
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
JPS5148516B2 (ko) * 1973-02-07 1976-12-21
US3959100A (en) * 1973-11-08 1976-05-25 Scm Corporation Photopolymerizable coating compositions containing activated halogenated azine photoinitiator and process for making same
CH621416A5 (ko) * 1975-03-27 1981-01-30 Hoechst Ag
US4065315A (en) * 1976-04-26 1977-12-27 Dynachem Corporation Phototropic dye system and photosensitive compositions containing the same
JPS5928206B2 (ja) * 1976-05-04 1984-07-11 富士写真フイルム株式会社 光重合性組成物
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
JPS5474728A (en) * 1977-11-28 1979-06-15 Fuji Photo Film Co Ltd Photosensitive composition
US4212970A (en) * 1977-11-28 1980-07-15 Fuji Photo Film Co., Ltd. 2-Halomethyl-5-vinyl-1,3,4-oxadiazole compounds
JPS5928328B2 (ja) * 1977-11-29 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JPS54151024A (en) * 1978-05-18 1979-11-27 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS6053300B2 (ja) * 1978-08-29 1985-11-25 富士写真フイルム株式会社 感光性樹脂組成物
JPS5577742A (en) * 1978-12-08 1980-06-11 Fuji Photo Film Co Ltd Photosensitive composition
DE3021590A1 (de) * 1980-06-09 1981-12-17 Hoechst Ag, 6000 Frankfurt 4-halogen-5-(halogenmethyl-phenyl)-oxazol-derivate, ein verfahren zu ihrer herstellung und sie enthaltenden strahlungsempfindliche massen
DE3021599A1 (de) * 1980-06-09 1981-12-24 Hoechst Ag, 6000 Frankfurt 2-(halogenmethyl-phenyl)-4-halogenoxazol-derivate, ein verfahren zu ihrer herstellung und sie enthaltende strahlungsempfindliche massen
JPS5815503A (ja) * 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd 光重合性組成物
JPH0230322B2 (ja) * 1981-09-04 1990-07-05 Mitsubishi Chem Ind Hikarijugoseisoseibutsu
US4535052A (en) * 1983-05-02 1985-08-13 E. I. Du Pont De Nemours And Company Constrained n-alkylamino aryl ketones as sensitizers for photopolymer compositions
GB8321813D0 (en) * 1983-08-12 1983-09-14 Vickers Plc Radiation sensitive compounds
JPS6063532A (ja) * 1983-08-16 1985-04-11 Fuji Photo Film Co Ltd 光重合性組成物
JPS6060104A (ja) * 1983-09-12 1985-04-06 Fuji Photo Film Co Ltd 光重合性組成物
DE3333450A1 (de) * 1983-09-16 1985-04-11 Hoechst Ag, 6230 Frankfurt Trihalogenmethylgruppen enthaltende carbonylmethylenheterocyclen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindungen enthaelt
JPS60159742A (ja) * 1984-01-30 1985-08-21 Fuji Photo Film Co Ltd 光重合性組成物
JPH0697339B2 (ja) * 1984-02-02 1994-11-30 富士写真フイルム株式会社 光重合性組成物
DE3537380A1 (de) * 1985-10-21 1987-04-23 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
JPS62212643A (ja) * 1986-03-14 1987-09-18 Fuji Photo Film Co Ltd 光重合性組成物

Also Published As

Publication number Publication date
EP0243784B1 (de) 1992-07-29
EP0243784A2 (de) 1987-11-04
EP0243784A3 (en) 1988-12-07
JP2845873B2 (ja) 1999-01-13
US5057398A (en) 1991-10-15
JPS62276542A (ja) 1987-12-01
DE3613632A1 (de) 1987-10-29
DE3780689D1 (de) 1992-09-03

Similar Documents

Publication Publication Date Title
KR870010420A (ko) 광중합성 조성물 및 이를 함유하는 광중합성 기록물질
KR870007225A (ko) 광중합성 조성물 및 이를 함유하는 광중합성 기록물질
KR920004450A (ko) 광중합성 조성물 및 이 조성물을 사용하여 제조한 광중합성 기록물질
KR910000991A (ko) 화학발광선을 생성시키기 위한 조성물 및 그이 생성 방법
GB1465142A (en) Photoconductive compositions
KR890004201A (ko) 포지티브 방사선-감수성 혼합물
ATE14592T1 (de) Polymerstabilisatoren.
AR246979A1 (es) Compuestos de 1-amino-8-hidroxi-3,6- o -4,6-disulfo-2,7-dis-(fenilazo)- o -(naftilazo)- o -(fenil/naftilazo) hidrosolubles, procedimientos para su preparacion y preparados que los contienen.
KR870001489A (ko) 3-아미노알릴리덴말로니트릴 uv흡수 화합물을 함유하는 사진재료
TR21759A (tr) Suebstituee edilmis fenilsuelfoniluere tuerevleri,bunlarin meydana getirilmesine mahsus usul ve herbisid olarak kullanimlari ve bunlarin meydana getirilmesine mahsus yeni ara ueruenler
GB1534927A (en) Yellow dye-releasing mono-azo compounds
JP2001249458A5 (ko)
KR840007421A (ko) 모노아조 화합물의 제조방법
KR840004203A (ko) 하이드라존의 전이-금속 착화합물의 제조방법
DE69614833D1 (de) Entzündungshemmende benzoesäurederivate
JPS5724941A (en) Color photographic sensitive material
ES2043799T3 (es) Materiales fosforescentes.
GB1076368A (en) Light-sensitive copying material
KR870004087A (ko) 광중합가능 조성물
GB1335474A (en) Azo dyestuffs their manufacture and use
ATE154142T1 (de) Im mittleren grünbereich sensibilisierende farbstoffe für photographische materialien
KR900018751A (ko) 전자사진 광 수용체
US3782948A (en) Photographic material containing nitro compounds for the silver dyestuff bleaching process
JPH0415264B2 (ko)
US3342603A (en) Non-silver photosensitive printout compositions

Legal Events

Date Code Title Description
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid