KR870010420A - 광중합성 조성물 및 이를 함유하는 광중합성 기록물질 - Google Patents

광중합성 조성물 및 이를 함유하는 광중합성 기록물질 Download PDF

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KR870010420A
KR870010420A KR870003860A KR870003860A KR870010420A KR 870010420 A KR870010420 A KR 870010420A KR 870003860 A KR870003860 A KR 870003860A KR 870003860 A KR870003860 A KR 870003860A KR 870010420 A KR870010420 A KR 870010420A
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South Korea
Prior art keywords
photopolymerizable
compound
photopolymerizable composition
recording material
hydrogen
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KR870003860A
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English (en)
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프롬멜트 한스-디터
요에르그 베.폴만 한스
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베틀라우퍼. 오일러
훽스트 아크티엔게젤샤프트
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Publication of KR870010420A publication Critical patent/KR870010420A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymerisation Methods In General (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)

Abstract

내용 없음

Description

광중합성 조성물 및 이를 함유하는 광중합성 기록물질
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (13)

  1. 필수 성분으로서 a)중합성 결합제, b) 적어도 하나의 말단 에틸렌성 이중결합을 갖는 화합물 및 c) 광개시제로서 N-헤테로사이클릭 화합물을 함유하고 일반식(I) 및 (II)중의 어느 하나에 상응하는 할로겐 화합물을 추가로 함유하는 광중합성 조성물.
    상기 식에서,
    X1는 염소 또는 브롬이고,
    X2및 X3는 동일하거나 상이하며, X1, 수소 또는 알킬 그룹을 나타내고,
    Y 및 Z는 동일하거나 상이하며, X1, 수소 CN 또는 (A)n-(B)n-D이고,
    A는 페닐렌그룹이며,
    n은 0 또는 1이고,
    B는 CO 또는 SO2이며,
    D는 R, OR, NHR, N, H2, NR2또는 CX1X2X3이고,
    R은 알킬, 사이클로알킬, 아릴, 또는 헤테로일 라디칼이며,
    W는 1내지 3개의 헤테로 원자를 갖고, 임의로 치환체를 가지며, 임의로 융합된 방향족 환을 갖는 5 또는 6원 헤테로 사이클릭환이고,
    m은 1 또는 2이다.
  2. 제1항에 있어서, N-헤테로사이클릭 화합물이 아크리딘, 펜아진 또는 퀴놀린 화합물인 광중합성 조성물.
  3. 제2항에 있어서, N-헤테로 사이클릭 화합물이 9-위치에서 아릴-치환된 아크리딘 인광중합성 조성물.
  4. 제1항에 있어서, 일반식(I)의 할로겐 화합물이 트리브로모메틸-페닐설폰, 2,2-디브로모말론산디아미드,,-디브로모--시아노메틸-페닐설폰,,-디브로모--벤조일메틸-페닐설폰, 또는,-디브로모말론산-비스 -N-메틸아미드인 광중합성 조성물.
  5. 제1항에 있어서, 일반식(II)의 할로겐 화합물이 2-위치에서 치환된 4,6-비드(트리클로로메틸)-S-트리아진 또는 2-트리브로모메틸퀴놀린 광중합성 조성물.
  6. 제1항에 있어서, 2-위치에서의 치환체가 알킬 또는 아릴 라디칼인 광중합성 조성물.
  7. 제1항에 있어서, 일반식(I) 및 (II)의 화합물을 각각 0.01 내지 3.0중량%의 양으로 함유하는 광중합성 조성물.
  8. 제1항에 있어서, 염료 또는 염료와 류코염료와의 혼합물을 추가로 함유하는 광중합성 조성물.
  9. 제1항에 있어서, 중합성 결합제가 물에 불용성이고 알카리성 수용액에 가용성인 광중합성 조성물.
  10. 제9항에 있어서, 중합체 결합제의 산가가 50 내지 350인 광중합성 조성물.
  11. 필수성분으로서 a) 중합성결합제, b) 적어도 하나의 말단 에틸렌성 이중결합을 갖는 화합물 및 c) 광개시제로서 N-헤테로 사이클릭 화합물을 함유하고 일반식(I) 및 (II)중의 어느 하나에 상응하는 할로겐 화합물을 추가로 함유하는 광중합성층 및 지지체로 이루어진 광중합성 기록물질.
    상기 식에서,
    X1는 염소 또는 브롬이고,
    X2및 X3는 동일하거나 상이하며, X1, 수소 또는 알킬 그룹을 나타내고,
    Y 및 Z는 동일하거나 상이하며, X1, 수소 CN 또는 (A)n-(B)n-D이고,
    A는 페닐렌그룹이며,
    n은 0 또는 1이고,
    B는 CO 또는 SO2이며,
    D는 R, OR, NHR, N, H2, NR2또는 CX1X2X3이고,
    R은 알킬, 사이클로알킬, 아릴, 또는 헤테로일 라디칼이며,
    W는 1내지 3개의 헤테로 원자를 갖고, 임의로 치환체를 가지며, 임의로 융합된 방향족 환을 갖는 5 또는 6원 헤테로 사이클릭환이고,
    m은 1 또는 2이다.
  12. 제11항에 있어서, 지지체가 알루미늄, 구리 또는 알루미늄 합금 또는 구리합금인 표면을 갖는 광중합성 기록물질.
  13. 제12항에 있어서, 지지체가 투명한 플라스틱 필름인 광중합성 기록물질.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR870003860A 1986-04-23 1987-04-22 광중합성 조성물 및 이를 함유하는 광중합성 기록물질 KR870010420A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19863613632 DE3613632A1 (de) 1986-04-23 1986-04-23 Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
DE3613632.8 1986-04-23

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KR870010420A true KR870010420A (ko) 1987-11-30

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US (1) US5057398A (ko)
EP (1) EP0243784B1 (ko)
JP (1) JP2845873B2 (ko)
KR (1) KR870010420A (ko)
DE (2) DE3613632A1 (ko)

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Also Published As

Publication number Publication date
EP0243784A2 (de) 1987-11-04
JP2845873B2 (ja) 1999-01-13
EP0243784A3 (en) 1988-12-07
US5057398A (en) 1991-10-15
DE3780689D1 (de) 1992-09-03
JPS62276542A (ja) 1987-12-01
EP0243784B1 (de) 1992-07-29
DE3613632A1 (de) 1987-10-29

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