KR870004087A - 광중합가능 조성물 - Google Patents

광중합가능 조성물 Download PDF

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Publication number
KR870004087A
KR870004087A KR1019860008781A KR860008781A KR870004087A KR 870004087 A KR870004087 A KR 870004087A KR 1019860008781 A KR1019860008781 A KR 1019860008781A KR 860008781 A KR860008781 A KR 860008781A KR 870004087 A KR870004087 A KR 870004087A
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KR
South Korea
Prior art keywords
group
photopolymerizable composition
heterocyclic
compound
photopolymerizable
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Application number
KR1019860008781A
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English (en)
Inventor
프레멀드 한스-디터르
침크에이 헤이크
Original Assignee
웨틀라우퍼, 외일러
훽스트 아크티엔게젤샤프트
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Application filed by 웨틀라우퍼, 외일러, 훽스트 아크티엔게젤샤프트 filed Critical 웨틀라우퍼, 외일러
Publication of KR870004087A publication Critical patent/KR870004087A/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)

Abstract

내용 없음

Description

광중합가능 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (8)

  1. 필수성분으로서, (a) 중합성 결합제 ; (b) 적어도 하나의 에틸렌계 불포화 말단 이중 결합을 함유하고 표준압에서 비점이 100℃ 이상인 중합가능 화합물, 및 (c) 광개시제로서의 삼환성 N-헤테로 사이클릭 화합물로 이루어지며, N-헤테로 사이클릭 화합물이 하기 일반식(Ⅰ)의 2,3-디하이드로-1H-사이클로펜타(b) 퀴놀린인, 광중합가능 조성물.
    상기 식에서, R1은 치환되거나 비치환된 m-가 카르보 사이클릭 또는 헤테로 사이클릭 방향족 라디칼이고, R2는 수소원자, 알킬그룹, 아릴그룹, 아르알킬그룹 또는 아르알케닐그룹이고, R3및 R4는 같거나 다를 수 있으며, 각각 수소 또는 할로겐원자, 알킬그룹 또는 알콕시그룹을 나타내고, n은 0 또는 1이며, m은 1 또는 2이다.
  2. 제1항에 있어서, R1이 치환되거나 비치환된 페닐그룹인 광중합가능 조성물.
  3. 제1항에 있어서, R2가 메틸, 페닐 또는 스티릴그룹인 광중합가능 조성물.
  4. 제1항에 있어서, R3가 수소, 염소 또는 브롬원자인 광중합가능 조성물.
  5. 제1항에 있어서, N-헤테로 사이클릭 화합물의 함량이 조성물의 비-휘발성 성분에 관계하여 함유되는 광중합가능 조성물.
  6. 제1항에 있어서, 중합가능 화합물이 다가 지방족 알콜의 아크릴산 또는 메타크릴산 에스테르인 광중합가능 조성물.
  7. 제1항에 있어서, 알칼리성 수용액중에 가용성인 수-불용성 결합제가 함유되는 광중합가능 조성물.
  8. 층지지체 및 그 위에 도포된, 필수성분으로서, 중합성 결합제, 적어도 하나의 에틸렌계 불포화 말단 이중결합을 함유하고 표준압에서 비점이 100℃ 이상인 중합가능 화합물, 및 광개시제로서의 삼환성 N-헤테로 사이클릭 화합물[여기에서 상기 N-헤테로 사이클릭 화합물이 일반식(Ⅰ)의 2,3-디하이드로-1H-사이클로펜타(b) 퀴놀린이다]로 구성된 광중합가능 층으로 이루어진 광중합가능 기록재료.
    상기 식에서, R1은 치환되거나 비치환된 m-가 카르보 사이클릭 또는 헤테로 사이클릭 방향족 라디칼이고, R2는 수소원자, 알킬그룹, 아릴그룹, 아르알킬그룹 또는 아르알케닐그룹이고, R3및 R4는 같거나 다를 수 있으며, 각각 수소 또는 할로겐원자, 알킬그룹 또는 알콕시그룹이고, n은 0 또는 1이며, m은 1 또는 2이다.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019860008781A 1985-10-21 1986-10-20 광중합가능 조성물 KR870004087A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19853537380 DE3537380A1 (de) 1985-10-21 1985-10-21 Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
DEP3537380.6 1985-10-21

Publications (1)

Publication Number Publication Date
KR870004087A true KR870004087A (ko) 1987-05-07

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Application Number Title Priority Date Filing Date
KR1019860008781A KR870004087A (ko) 1985-10-21 1986-10-20 광중합가능 조성물

Country Status (6)

Country Link
US (1) US4737445A (ko)
EP (1) EP0220589B1 (ko)
JP (1) JPS62100503A (ko)
KR (1) KR870004087A (ko)
CA (1) CA1288629C (ko)
DE (2) DE3537380A1 (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3613632A1 (de) * 1986-04-23 1987-10-29 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
JPH0827539B2 (ja) * 1987-09-28 1996-03-21 富士写真フイルム株式会社 光重合性組成物
DE3843205A1 (de) * 1988-12-22 1990-06-28 Hoechst Ag Photopolymerisierbare verbindungen, diese enthaltendes photopolymerisierbares gemisch und daraus hergestelltes photopolymerisierbares aufzeichnungsmaterial
US5128235A (en) * 1989-04-21 1992-07-07 E. I. Du Pont De Nemours And Company Method of forming a three-dimensional object comprising additives imparting reduction of shrinkage to photohardenable compositions
JPH02292773A (ja) * 1989-05-02 1990-12-04 Pioneer Electron Corp 複数ディスク収納プレーヤ
JPH04170546A (ja) * 1990-11-01 1992-06-18 Fuji Photo Film Co Ltd 光重合性組成物
EP2273968A1 (en) * 2008-05-16 2011-01-19 The Procter & Gamble Company Compositions and methods incorporating photocatalysts
WO2011060110A1 (en) 2009-11-13 2011-05-19 The Procter & Gamble Company Compositions and methods incorporating photocatalysts

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2088413B1 (ko) * 1970-05-08 1974-03-08 Ibm
DE2039861C3 (de) * 1970-08-11 1973-12-13 Kalle Ag, 6202 Wiesbaden-Biebrich Photopolymensierbare Kopier masse
DE2850585A1 (de) * 1978-11-22 1980-06-04 Hoechst Ag Photopolymerisierbares gemisch
DE3248247A1 (de) * 1982-12-28 1984-06-28 Basf Ag, 6700 Ludwigshafen Farbstoff enthaltende schicht einer photopolymerisierbaren mischung und verfahren zur herstellung von relief- und druckformen

Also Published As

Publication number Publication date
EP0220589A3 (en) 1989-11-02
DE3686123D1 (de) 1992-08-27
DE3537380A1 (de) 1987-04-23
EP0220589B1 (de) 1992-07-22
EP0220589A2 (de) 1987-05-06
CA1288629C (en) 1991-09-10
JPS62100503A (ja) 1987-05-11
US4737445A (en) 1988-04-12

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