KR830009509A - 감광성 조성물 - Google Patents
감광성 조성물 Download PDFInfo
- Publication number
- KR830009509A KR830009509A KR1019820000117A KR820000117A KR830009509A KR 830009509 A KR830009509 A KR 830009509A KR 1019820000117 A KR1019820000117 A KR 1019820000117A KR 820000117 A KR820000117 A KR 820000117A KR 830009509 A KR830009509 A KR 830009509A
- Authority
- KR
- South Korea
- Prior art keywords
- photosensitive composition
- groups
- diazide
- sulfonic acid
- photosensitive
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims 7
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 239000012670 alkaline solution Substances 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 239000011230 binding agent Substances 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 150000002989 phenols Chemical class 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (6)
- 감광성 화합물로서, 다음 일반식(Ⅰ)에 상응하고 하나의 벤젠환상에 총 3개 이하의 DO기가 존재하는 나프토퀴는-디아자이드-설폰산 에스테르인, 케토그룹 함유 다가페놀의 1,2-나프토퀴논-2-디아자이드-4- 또는 5-설폰산 에스테르를 함유하는 감광성 조성물.상기 일반식에서D는 1,2-나프토퀴논-2-디아자이드-5-설포닐 또는 -4-설포닐기이고R1,R2,R3,R′1,R′2및 R′3는 수소원자 또는 할로겐원자, 탄소수 1 내지 4의 알킬기 또는 구조식 DO의 기이고n은 2 내지 18이다.
- 제1항에 있어서, 물에 불용이고 수용성 알칼리 용액에 용해 또는 적어도 팽윤되는 결합제를 추가로 함유하는 감광성 조성물.
- 제1항에 있어서, 비 휘발성 성분의 함량에 대해 3 내지 50% 중량의 나프토퀴논-디아자이드-설폰산에스테르를 함유하는 감광성 조성물.
- 제1항에 있어서, 각각의 경우에 R1,R2및 R3또는 R′1,R′2및 R′3기의 적어도 하나가 DO기이 일반식(Ⅰ) 화합물을 함유하는 감광성 조성물.
- 제4항에 있어서, R1및 R′1가 DO기이고 R2,R3,R′2및 R′3이 수소 원자인 일반식(Ⅰ) 화합물을 함유하는 조성물.
- 제1항에 있어서, n은 6 내지 14인 일반식(Ⅰ) 화합물을 함유하는 감광성 조성물.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3100856A DE3100856A1 (de) | 1981-01-14 | 1981-01-14 | Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial |
DEP3100856.9 | 1981-01-14 | ||
DE3100856,9 | 1981-01-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR830009509A true KR830009509A (ko) | 1983-12-21 |
KR880002517B1 KR880002517B1 (ko) | 1988-11-26 |
Family
ID=6122558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR8200117A KR880002517B1 (ko) | 1981-01-14 | 1982-01-13 | 감광성 조성물 |
Country Status (14)
Country | Link |
---|---|
US (1) | US4628020A (ko) |
EP (1) | EP0056092B1 (ko) |
JP (1) | JPS57142635A (ko) |
KR (1) | KR880002517B1 (ko) |
AT (1) | ATE8940T1 (ko) |
AU (1) | AU7929982A (ko) |
BR (1) | BR8200166A (ko) |
CA (1) | CA1213599A (ko) |
DE (2) | DE3100856A1 (ko) |
FI (1) | FI820087L (ko) |
HK (1) | HK15086A (ko) |
MY (1) | MY8600249A (ko) |
SG (1) | SG95585G (ko) |
ZA (1) | ZA8238B (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3230171A1 (de) * | 1982-08-13 | 1984-02-16 | Hoechst Ag, 6230 Frankfurt | Waessrig-alkalische loesung und verfahren zum entwickeln von positiv-arbeitenden reproduktionsschichten |
JPS60134235A (ja) * | 1983-12-23 | 1985-07-17 | Japan Synthetic Rubber Co Ltd | ポジ型感光性樹脂組成物 |
DE3420039A1 (de) * | 1984-05-29 | 1985-12-12 | Hoechst Ag, 6230 Frankfurt | 2,3-bis(dialkylaminophenyl)chinoxaline und ihre verwendung in elektrophotographischen aufzeichnungsmaterialien |
DE3729034A1 (de) * | 1987-08-31 | 1989-03-09 | Hoechst Ag | Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden und hiermit hergestelltes lichtempfindliches kopiermaterial |
JP2700918B2 (ja) * | 1989-04-26 | 1998-01-21 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
US5019478A (en) * | 1989-10-30 | 1991-05-28 | Olin Hunt Specialty Products, Inc. | Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures |
US5196517A (en) * | 1989-10-30 | 1993-03-23 | Ocg Microelectronic Materials, Inc. | Selected trihydroxybenzophenone compounds and their use as photoactive compounds |
US5219714A (en) * | 1989-10-30 | 1993-06-15 | Ocg Microelectronic Materials, Inc. | Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures |
JP2761786B2 (ja) * | 1990-02-01 | 1998-06-04 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
US5225318A (en) * | 1990-07-02 | 1993-07-06 | Ocg Microelectronic Materials, Inc. | Selected photoactive methylolated cyclohexanol compounds and their use in forming positive resist image patterns |
US5151340A (en) * | 1990-07-02 | 1992-09-29 | Ocg Microelectronic Materials, Inc. | Selected photoactive methylolated cyclohexanol compounds and their use in radiation-sensitive mixtures |
JP5048452B2 (ja) | 2007-10-23 | 2012-10-17 | 本田技研工業株式会社 | 車両用燃料タンクの給油口装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE510152A (ko) * | 1949-07-23 | |||
BE526866A (ko) * | 1953-03-11 | |||
US3802885A (en) * | 1967-08-15 | 1974-04-09 | Algraphy Ltd | Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base |
US3647443A (en) * | 1969-09-12 | 1972-03-07 | Eastman Kodak Co | Light-sensitive quinone diazide polymers and polymer compositions |
US3785825A (en) * | 1971-07-19 | 1974-01-15 | Polychrome Corp | Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate |
JPS5421089B2 (ko) * | 1973-05-29 | 1979-07-27 | ||
US4005437A (en) * | 1975-04-18 | 1977-01-25 | Rca Corporation | Method of recording information in which the electron beam sensitive material contains 4,4'-bis(3-diazo-3-4-oxo-1-naphthalene sulfonyloxy)benzil |
DE2828037A1 (de) * | 1978-06-26 | 1980-01-10 | Hoechst Ag | Lichtempfindliches gemisch |
-
1981
- 1981-01-14 DE DE3100856A patent/DE3100856A1/de not_active Withdrawn
- 1981-10-27 DE DE8181109001T patent/DE3165432D1/de not_active Expired
- 1981-10-27 EP EP81109001A patent/EP0056092B1/de not_active Expired
- 1981-10-27 AT AT81109001T patent/ATE8940T1/de not_active IP Right Cessation
-
1982
- 1982-01-05 ZA ZA8238A patent/ZA8238B/xx unknown
- 1982-01-08 AU AU79299/82A patent/AU7929982A/en not_active Abandoned
- 1982-01-08 CA CA000393813A patent/CA1213599A/en not_active Expired
- 1982-01-11 US US06/338,640 patent/US4628020A/en not_active Expired - Fee Related
- 1982-01-12 FI FI820087A patent/FI820087L/fi not_active Application Discontinuation
- 1982-01-12 JP JP57002347A patent/JPS57142635A/ja active Granted
- 1982-01-13 BR BR8200166A patent/BR8200166A/pt unknown
- 1982-01-13 KR KR8200117A patent/KR880002517B1/ko active
-
1985
- 1985-12-13 SG SG955/85A patent/SG95585G/en unknown
-
1986
- 1986-02-27 HK HK150/86A patent/HK15086A/xx unknown
- 1986-12-30 MY MY249/86A patent/MY8600249A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
EP0056092B1 (de) | 1984-08-08 |
FI820087L (fi) | 1982-07-15 |
DE3165432D1 (en) | 1984-09-13 |
BR8200166A (pt) | 1982-11-03 |
SG95585G (en) | 1987-03-27 |
KR880002517B1 (ko) | 1988-11-26 |
JPS57142635A (en) | 1982-09-03 |
ZA8238B (en) | 1982-11-24 |
AU7929982A (en) | 1982-07-22 |
MY8600249A (en) | 1986-12-31 |
JPH0145901B2 (ko) | 1989-10-05 |
ATE8940T1 (de) | 1984-08-15 |
EP0056092A1 (de) | 1982-07-21 |
HK15086A (en) | 1986-03-07 |
CA1213599A (en) | 1986-11-04 |
DE3100856A1 (de) | 1982-08-12 |
US4628020A (en) | 1986-12-09 |
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