HK15086A - Light sensitive composition based on o-naphtoquinone diazides and light sensitive copying material produced therefrom - Google Patents

Light sensitive composition based on o-naphtoquinone diazides and light sensitive copying material produced therefrom

Info

Publication number
HK15086A
HK15086A HK150/86A HK15086A HK15086A HK 15086 A HK15086 A HK 15086A HK 150/86 A HK150/86 A HK 150/86A HK 15086 A HK15086 A HK 15086A HK 15086 A HK15086 A HK 15086A
Authority
HK
Hong Kong
Prior art keywords
light sensitive
diazides
naphtoquinone
material produced
composition based
Prior art date
Application number
HK150/86A
Other languages
English (en)
Inventor
Paul Stahlhofen
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of HK15086A publication Critical patent/HK15086A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
  • Light Receiving Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Holo Graphy (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photoreceptors In Electrophotography (AREA)
HK150/86A 1981-01-14 1986-02-27 Light sensitive composition based on o-naphtoquinone diazides and light sensitive copying material produced therefrom HK15086A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3100856A DE3100856A1 (de) 1981-01-14 1981-01-14 Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial

Publications (1)

Publication Number Publication Date
HK15086A true HK15086A (en) 1986-03-07

Family

ID=6122558

Family Applications (1)

Application Number Title Priority Date Filing Date
HK150/86A HK15086A (en) 1981-01-14 1986-02-27 Light sensitive composition based on o-naphtoquinone diazides and light sensitive copying material produced therefrom

Country Status (14)

Country Link
US (1) US4628020A (xx)
EP (1) EP0056092B1 (xx)
JP (1) JPS57142635A (xx)
KR (1) KR880002517B1 (xx)
AT (1) ATE8940T1 (xx)
AU (1) AU7929982A (xx)
BR (1) BR8200166A (xx)
CA (1) CA1213599A (xx)
DE (2) DE3100856A1 (xx)
FI (1) FI820087L (xx)
HK (1) HK15086A (xx)
MY (1) MY8600249A (xx)
SG (1) SG95585G (xx)
ZA (1) ZA8238B (xx)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3230171A1 (de) * 1982-08-13 1984-02-16 Hoechst Ag, 6230 Frankfurt Waessrig-alkalische loesung und verfahren zum entwickeln von positiv-arbeitenden reproduktionsschichten
JPS60134235A (ja) * 1983-12-23 1985-07-17 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
DE3420039A1 (de) * 1984-05-29 1985-12-12 Hoechst Ag, 6230 Frankfurt 2,3-bis(dialkylaminophenyl)chinoxaline und ihre verwendung in elektrophotographischen aufzeichnungsmaterialien
DE3729034A1 (de) * 1987-08-31 1989-03-09 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden und hiermit hergestelltes lichtempfindliches kopiermaterial
JP2700918B2 (ja) * 1989-04-26 1998-01-21 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5019478A (en) * 1989-10-30 1991-05-28 Olin Hunt Specialty Products, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
US5196517A (en) * 1989-10-30 1993-03-23 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use as photoactive compounds
US5219714A (en) * 1989-10-30 1993-06-15 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
JP2761786B2 (ja) * 1990-02-01 1998-06-04 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5225318A (en) * 1990-07-02 1993-07-06 Ocg Microelectronic Materials, Inc. Selected photoactive methylolated cyclohexanol compounds and their use in forming positive resist image patterns
US5151340A (en) * 1990-07-02 1992-09-29 Ocg Microelectronic Materials, Inc. Selected photoactive methylolated cyclohexanol compounds and their use in radiation-sensitive mixtures
JP5048452B2 (ja) 2007-10-23 2012-10-17 本田技研工業株式会社 車両用燃料タンクの給油口装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE497135A (xx) * 1949-07-23
NL185407B (nl) * 1953-03-11 Mitsui Petrochemical Ind Werkwijze voor het polymeriseren of copolymeriseren van 1-alkenen alsmede katalysatorsamenstelling voor toepassing van deze werkwijze.
US3802885A (en) * 1967-08-15 1974-04-09 Algraphy Ltd Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
US3785825A (en) * 1971-07-19 1974-01-15 Polychrome Corp Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate
JPS5421089B2 (xx) * 1973-05-29 1979-07-27
US4005437A (en) * 1975-04-18 1977-01-25 Rca Corporation Method of recording information in which the electron beam sensitive material contains 4,4'-bis(3-diazo-3-4-oxo-1-naphthalene sulfonyloxy)benzil
DE2828037A1 (de) * 1978-06-26 1980-01-10 Hoechst Ag Lichtempfindliches gemisch

Also Published As

Publication number Publication date
ATE8940T1 (de) 1984-08-15
US4628020A (en) 1986-12-09
JPS57142635A (en) 1982-09-03
EP0056092A1 (de) 1982-07-21
BR8200166A (pt) 1982-11-03
DE3100856A1 (de) 1982-08-12
SG95585G (en) 1987-03-27
DE3165432D1 (en) 1984-09-13
KR880002517B1 (ko) 1988-11-26
FI820087L (fi) 1982-07-15
ZA8238B (en) 1982-11-24
JPH0145901B2 (xx) 1989-10-05
CA1213599A (en) 1986-11-04
EP0056092B1 (de) 1984-08-08
AU7929982A (en) 1982-07-22
MY8600249A (en) 1986-12-31
KR830009509A (ko) 1983-12-21

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