BR8200166A - Mistura sensivel a luz e material para copias sensivel a luz preparado da mesma - Google Patents

Mistura sensivel a luz e material para copias sensivel a luz preparado da mesma

Info

Publication number
BR8200166A
BR8200166A BR8200166A BR8200166A BR8200166A BR 8200166 A BR8200166 A BR 8200166A BR 8200166 A BR8200166 A BR 8200166A BR 8200166 A BR8200166 A BR 8200166A BR 8200166 A BR8200166 A BR 8200166A
Authority
BR
Brazil
Prior art keywords
light
sensitive
mixture
prepared same
diazide
Prior art date
Application number
BR8200166A
Other languages
English (en)
Inventor
Paul Stahlhofen
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8200166A publication Critical patent/BR8200166A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Light Receiving Elements (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Holo Graphy (AREA)
BR8200166A 1981-01-14 1982-01-13 Mistura sensivel a luz e material para copias sensivel a luz preparado da mesma BR8200166A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3100856A DE3100856A1 (de) 1981-01-14 1981-01-14 Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial

Publications (1)

Publication Number Publication Date
BR8200166A true BR8200166A (pt) 1982-11-03

Family

ID=6122558

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8200166A BR8200166A (pt) 1981-01-14 1982-01-13 Mistura sensivel a luz e material para copias sensivel a luz preparado da mesma

Country Status (14)

Country Link
US (1) US4628020A (pt)
EP (1) EP0056092B1 (pt)
JP (1) JPS57142635A (pt)
KR (1) KR880002517B1 (pt)
AT (1) ATE8940T1 (pt)
AU (1) AU7929982A (pt)
BR (1) BR8200166A (pt)
CA (1) CA1213599A (pt)
DE (2) DE3100856A1 (pt)
FI (1) FI820087L (pt)
HK (1) HK15086A (pt)
MY (1) MY8600249A (pt)
SG (1) SG95585G (pt)
ZA (1) ZA8238B (pt)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3230171A1 (de) * 1982-08-13 1984-02-16 Hoechst Ag, 6230 Frankfurt Waessrig-alkalische loesung und verfahren zum entwickeln von positiv-arbeitenden reproduktionsschichten
JPS60134235A (ja) * 1983-12-23 1985-07-17 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
DE3420039A1 (de) * 1984-05-29 1985-12-12 Hoechst Ag, 6230 Frankfurt 2,3-bis(dialkylaminophenyl)chinoxaline und ihre verwendung in elektrophotographischen aufzeichnungsmaterialien
DE3729034A1 (de) * 1987-08-31 1989-03-09 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden und hiermit hergestelltes lichtempfindliches kopiermaterial
JP2700918B2 (ja) * 1989-04-26 1998-01-21 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5219714A (en) * 1989-10-30 1993-06-15 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
US5019478A (en) * 1989-10-30 1991-05-28 Olin Hunt Specialty Products, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
US5196517A (en) * 1989-10-30 1993-03-23 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use as photoactive compounds
JP2761786B2 (ja) * 1990-02-01 1998-06-04 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5151340A (en) * 1990-07-02 1992-09-29 Ocg Microelectronic Materials, Inc. Selected photoactive methylolated cyclohexanol compounds and their use in radiation-sensitive mixtures
US5225318A (en) * 1990-07-02 1993-07-06 Ocg Microelectronic Materials, Inc. Selected photoactive methylolated cyclohexanol compounds and their use in forming positive resist image patterns
JP5048452B2 (ja) 2007-10-23 2012-10-17 本田技研工業株式会社 車両用燃料タンクの給油口装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE907739C (de) * 1949-07-23 1954-02-18 Kalle & Co Ag Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen und dafuer verwendbares lichtempfindliches Material
NL185407B (nl) * 1953-03-11 Mitsui Petrochemical Ind Werkwijze voor het polymeriseren of copolymeriseren van 1-alkenen alsmede katalysatorsamenstelling voor toepassing van deze werkwijze.
US3802885A (en) * 1967-08-15 1974-04-09 Algraphy Ltd Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
US3785825A (en) * 1971-07-19 1974-01-15 Polychrome Corp Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate
JPS5421089B2 (pt) * 1973-05-29 1979-07-27
US4005437A (en) * 1975-04-18 1977-01-25 Rca Corporation Method of recording information in which the electron beam sensitive material contains 4,4'-bis(3-diazo-3-4-oxo-1-naphthalene sulfonyloxy)benzil
DE2828037A1 (de) * 1978-06-26 1980-01-10 Hoechst Ag Lichtempfindliches gemisch

Also Published As

Publication number Publication date
EP0056092A1 (de) 1982-07-21
DE3100856A1 (de) 1982-08-12
DE3165432D1 (en) 1984-09-13
JPH0145901B2 (pt) 1989-10-05
SG95585G (en) 1987-03-27
AU7929982A (en) 1982-07-22
EP0056092B1 (de) 1984-08-08
MY8600249A (en) 1986-12-31
CA1213599A (en) 1986-11-04
US4628020A (en) 1986-12-09
KR830009509A (ko) 1983-12-21
KR880002517B1 (ko) 1988-11-26
HK15086A (en) 1986-03-07
ATE8940T1 (de) 1984-08-15
ZA8238B (en) 1982-11-24
FI820087L (fi) 1982-07-15
JPS57142635A (en) 1982-09-03

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Legal Events

Date Code Title Description
B15K Others concerning applications: alteration of classification

Ipc: G03F 7/022 (2006.01)