CH628160A5 - Dry-system element for producing pictures - Google Patents
Dry-system element for producing pictures Download PDFInfo
- Publication number
- CH628160A5 CH628160A5 CH463577A CH463577A CH628160A5 CH 628160 A5 CH628160 A5 CH 628160A5 CH 463577 A CH463577 A CH 463577A CH 463577 A CH463577 A CH 463577A CH 628160 A5 CH628160 A5 CH 628160A5
- Authority
- CH
- Switzerland
- Prior art keywords
- layer
- light
- diazonium
- compound
- chloride
- Prior art date
Links
- -1 quinine compound Chemical class 0.000 claims description 48
- 229910052751 metal Inorganic materials 0.000 claims description 43
- 239000002184 metal Substances 0.000 claims description 43
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims description 23
- 239000011230 binding agent Substances 0.000 claims description 15
- 238000001035 drying Methods 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 claims description 13
- 239000011592 zinc chloride Substances 0.000 claims description 11
- 235000005074 zinc chloride Nutrition 0.000 claims description 11
- 239000012954 diazonium Substances 0.000 claims description 10
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- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 5
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- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 claims 1
- 229930192627 Naphthoquinone Natural products 0.000 claims 1
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- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000013047 polymeric layer Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
- G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
- H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4208376A JPS52126220A (en) | 1976-04-14 | 1976-04-14 | Dry image forming material and method of forming image |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH628160A5 true CH628160A5 (en) | 1982-02-15 |
Family
ID=12626139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH463577A CH628160A5 (en) | 1976-04-14 | 1977-04-14 | Dry-system element for producing pictures |
Country Status (12)
| Country | Link |
|---|---|
| JP (1) | JPS52126220A (enExample) |
| BE (1) | BE853618A (enExample) |
| CA (1) | CA1094377A (enExample) |
| CH (1) | CH628160A5 (enExample) |
| DD (1) | DD130507A5 (enExample) |
| DE (1) | DE2716422C2 (enExample) |
| FR (1) | FR2371706A1 (enExample) |
| GB (1) | GB1563010A (enExample) |
| IT (1) | IT1094789B (enExample) |
| NL (1) | NL185425C (enExample) |
| SE (1) | SE435214B (enExample) |
| SU (1) | SU948301A3 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5479027A (en) * | 1977-12-05 | 1979-06-23 | Kimoto Kk | Dry picture forming material |
| JPS54179986U (enExample) * | 1978-06-07 | 1979-12-19 | ||
| EP0042632A1 (en) * | 1980-06-20 | 1981-12-30 | Agfa-Gevaert N.V. | Recording material and method for the production of metal images |
| JPS5858546A (ja) * | 1981-10-02 | 1983-04-07 | Kimoto & Co Ltd | 製版用感光性マスク材料 |
| JPS59198445A (ja) * | 1983-04-27 | 1984-11-10 | Kimoto & Co Ltd | 剥離による画像形成材料 |
| JPS60238826A (ja) * | 1984-05-14 | 1985-11-27 | Kimoto & Co Ltd | 画像形成材料 |
| DE69524589D1 (de) * | 1995-08-08 | 2002-01-24 | Agfa Gevaert Nv | Verfahren zur Bildung von metallischen Bildern |
| EP0762214A1 (en) * | 1995-09-05 | 1997-03-12 | Agfa-Gevaert N.V. | Photosensitive element comprising an image forming layer and a photopolymerisable layer |
| JP2001284350A (ja) * | 2000-03-31 | 2001-10-12 | Nitto Denko Corp | パターン形成方法および薄膜剥離除去用接着シート |
| EP1551037A1 (de) * | 2004-01-05 | 2005-07-06 | Alcan Technology & Management Ltd. | Flexibler Träger mit elektrisch leitfähiger Struktur |
| RU2353528C1 (ru) * | 2007-06-19 | 2009-04-27 | Общество с ограниченной ответственностью "Джи Би Эй" | Способ изготовления печатных форм для офсетной печати |
| JP2009032912A (ja) * | 2007-07-27 | 2009-02-12 | Sony Corp | 半導体装置の製造方法および有機発光装置の製造方法 |
| JP6744213B2 (ja) * | 2013-10-30 | 2020-08-19 | ネーデルランドセ・オルガニサティ・フォール・トゥーヘパスト−ナトゥールウェテンスハッペライク・オンデルズーク・テーエヌオー | 電気回路パターンを備える基板、それを提供するための方法およびシステム |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2999016A (en) * | 1955-03-24 | 1961-09-05 | Keuffel & Esser Co | Drawing material |
| DE1252060B (enExample) * | 1961-10-23 | |||
| DE1447012B2 (de) * | 1963-07-20 | 1972-12-21 | Kalle Ag, 6202 Wiesbaden-Biebrich | Negativ arbeitende, sensibilisierte kupfer-aluminium-bimetallplatte |
| DE1572153B2 (de) * | 1966-06-27 | 1971-07-22 | E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) | Fotopolymerisierbares aufzeichnungsmaterial |
| DE1597644C3 (de) * | 1966-11-03 | 1973-09-20 | Teeg Research Inc., Detroit, Mich. (V.St.A.) | Verfahren zur Herstellung von Rehefbildern |
| DE1671625A1 (de) * | 1967-01-24 | 1971-09-16 | Kalle Ag | Verbundmaterial fuer die Herstellung von Mehrmetalldruckformen |
| ZA711869B (en) * | 1970-05-27 | 1971-12-29 | Gen Electric | Aqueous electrocoating solutions and method of making and using same |
| JPS4837643A (enExample) * | 1971-09-15 | 1973-06-02 | ||
| JPS5821257B2 (ja) * | 1974-04-25 | 1983-04-28 | 富士写真フイルム株式会社 | キンゾクガゾウケイセイザイリヨウ |
| JPS516530A (ja) * | 1974-07-04 | 1976-01-20 | Toray Industries | Gazokeiseizairyo |
-
1976
- 1976-04-14 JP JP4208376A patent/JPS52126220A/ja active Granted
- 1976-11-10 GB GB46816/76A patent/GB1563010A/en not_active Expired
- 1976-11-30 CA CA266,883A patent/CA1094377A/en not_active Expired
-
1977
- 1977-04-14 DE DE2716422A patent/DE2716422C2/de not_active Expired
- 1977-04-14 SU SU772470055A patent/SU948301A3/ru active
- 1977-04-14 FR FR7711275A patent/FR2371706A1/fr active Granted
- 1977-04-14 SE SE7704316A patent/SE435214B/xx not_active IP Right Cessation
- 1977-04-14 CH CH463577A patent/CH628160A5/de not_active IP Right Cessation
- 1977-04-14 BE BE176737A patent/BE853618A/xx not_active IP Right Cessation
- 1977-04-14 DD DD7700198405A patent/DD130507A5/xx unknown
- 1977-04-14 IT IT23664/78A patent/IT1094789B/it active
- 1977-04-14 NL NLAANVRAGE7704083,A patent/NL185425C/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| GB1563010A (en) | 1980-03-19 |
| DE2716422A1 (de) | 1977-11-03 |
| AU1946676A (en) | 1978-06-29 |
| IT1094789B (it) | 1985-08-02 |
| JPS52126220A (en) | 1977-10-22 |
| JPS5613305B2 (enExample) | 1981-03-27 |
| DD130507A5 (de) | 1978-04-05 |
| CA1094377A (en) | 1981-01-27 |
| NL185425C (nl) | 1990-04-02 |
| BE853618A (fr) | 1977-08-01 |
| DE2716422C2 (de) | 1987-10-01 |
| SU948301A3 (ru) | 1982-07-30 |
| NL185425B (nl) | 1989-11-01 |
| NL7704083A (nl) | 1977-10-18 |
| FR2371706B1 (enExample) | 1980-04-25 |
| FR2371706A1 (fr) | 1978-06-16 |
| SE435214B (sv) | 1984-09-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased | ||
| PL | Patent ceased |