CH628160A5 - Dry-system element for producing pictures - Google Patents

Description

The invention relates to a drying system element for image production, which consists of a base, a thin metal layer and a light-sensitive layer. After exposing the element to a desired pattern, the light-sensitive layer is peeled off and a light barrier pattern is obtained from the metal on the base, which corresponds to the light-sensitive part.

The element consists of a base, a thin layer of metal or a metal compound and a photosensitive layer which is a photosensitive material which is benzophenone, a quinine compound, a diazo compound or an amido compound, and a polymeric binder, the photosensitive layer being the Tends to reduce the interfacial adhesion between the metal or metal compound layer and the photosensitive layer after exposure. The invention further relates to a method for producing an image with the aid of such an element, in which the element is exposed and then the photosensitive layer is peeled off to give the image pattern of metal or metal compound on the base corresponding to the exposed part.

Various methods for the production of images on documents have already been proposed, for example (a) by exposing an element which consists of a base and a light-sensitive coating, the light-sensitive substances such as silver halide, light-sensitive polymers or by the action of light polymerizable Contains monomers, or (b) by exposing an element containing a light-guiding layer and performing pigment dye development. However, there are various disadvantages with this known method: for example, when using silver halide, development, fixing, washing with water and drying are required. When using photosensitive polymers or photopolymerizable monomers, development, etching and drying are necessary. When using light-conducting material, activation, use of a toner and fixation by heat are necessary. This means that the known methods require a specific chemical treatment and / or devices which require high costs and, moreover, involve environmental pollution by chemicals.

The disadvantages described above can be avoided by the element according to the invention. This element also has a high gamma value, a high contrast and a good resolution, so that you can get an image with an improved light barrier effect.

It is also possible to use the new element to produce an electrically conductive pattern on a base.

The drying system element resulting in an image advantageously comprises a tough base with a smooth surface, a

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thin layer of metal or a metal compound (next - generally vacuum evaporation is referred to as "metal layer") and a photosensitive layer is preferred to electrolytic or electroless plating, a layer containing a polymeric binder that is used as a film Wide range of metals can be used and a benzophenone, a quinone compound. The process is carried out in a simple manner with a high density, a diazonium or azido compound as the photosensitive speed and little or no material which makes waste material available, this photosensitive layer being carried out.

The photosensitive layer consists of a polymeric layer and the photosensitive layer when exposed to a binder and a photosensitive substance. Reduce there. Therefore, if the element is exposed through a mask with a layer of the base from the base according to the print exposure according to the desired pattern, the io treatment is reduced, the binder should have good film-film interface adhesion between the metal layer and the light-emitting properties and have a high film strength, sensitized part of the photosensitive layer, preferably a material that is not bulky is used, while the adhesion with respect to the non-photosensitive, so that a stack of elements remains unchanged in the handmade part. If then the light reception and storage do not block each other.

sensitive layer is peeled off, a metal pattern remains on Examples of binders of the base which are suitable according to the invention and which comprise the part made sensitive to light, various synthetic resins, for example poly-speaking, and the part made non-sensitive to the metal-vinyl chloride, vinyl chloride / vinyl acetate copolymers, Vinyl layer is removed. In this regard, it is essential that chloride / vinylidene chloride copolymers, vinyl chloride / vinyl - the adhesion of the binder to the metal layer is stronger than acetate / maleic anhydride, acrylonitrile or vinyl alcohol ester - that of the metal layer on the base. 20 polymeric, vinyl chloride / vinylidene chloride / acrylonitrile, vinyl

Various acetate or methyl methacrylate polymers, acrylic acid esters / materials can be used as the base according to the invention, to which a thin metal layer of methyl methacrylate or styrene copolymers, thermoplastic, can be applied, for example a film-forming polyester or mixed polyester such as polyethylene terephthalate, moplastic polymer material, Glass or metal. Examples and ethylene terephthalate / isophthalate copolymers, alcohol for such a thermoplastic material are various soluble polyamides, polyurethanes, polybutyral and polyvinylal synthetic resins, for example polyesters, such as polyethylene alcohol; Cellulose derivatives such as acetyl cellulose, acetyl butyl cellulose terephthalate, a polycarbonate, polyolefins such as polypropylene, loose, nitrocellulose and ethyl cellulose, as well as rubber-polyvinyl chloride, polystyrene, polymethyl methacrylate and their derivatives such as cyclized rubber and rubber chloride. The copolymers, in addition cellulose derivatives, e.g. Diacetylcel- se polymeric materials can be used alone or in a mixture of -Iulose, triacetylcellulose, propylcellulose and mixed cellulose.

ester. Other sheet-like materials, such as paper, tissue and the binder are in general in the form of a solution of nonwoven webs which have been coated with the above-mentioned film-coated materials in a suitable organic solvent, the materials can also, for example, in methyl ethyl ketone, toluene, cyclohexanol , be used. Methanol, ethanol, isopropanol, methyl cellosolve, ethyl cell

The material for the underlay can be made with various additives and cellosolve acetate.

sentences, e.g. with pigments, dyes and when choosing the solvent, care should be taken

Fillers to be writing properties, opacity that the solvent is able to effect the light and coloring used. dissolve sensitizing material, but not the un-

Dissolve and swell the thin metal layer on the surface of the base material.

can for example be done by vacuum plating e.g. by 40 If polyvinyl alcohol is used as the binder, evaporation in vacuo or cathodic dusting, it is also possible to use an aqueous solution. Polyvinyl-less plating or by a combination of electrolytyl chloride and polyurethane can also be applied in the form of a schematic plating with these processes. The emulsion or dispersion are used.

The thickness of the metal layer is preferably more than 10 [i. Suitable light-sensitizing agents are

Thinner layers have not listed effectively sufficient light standing, for example.

Barrier effect, so that the image formed on the base is then hardly visible. While the upper limit is for a) benzophenone

Layer thickness is not critical, but in general b) quinone compounds:

Thickness up to 1000 [*, preferably between 20 and 500 jx 1,4-naphthoquinone, 2-methyl-l, 4-naphthoquinone, anthrachi-used. For special applications, such as pressure switch 50 non> 2-methylanthraquinone, 2-ethylanthraquinone, 2-chloran-ions, metal layers of more than 1000 mm with thrachinone and p-toluchinone, especially the first two successes, can be used. Links.

c) diazonium compounds:

Among the various metals which are suitable for evaporative 4- (p-tolyl-mercapto) -2,5-diethoxybenzene diazonium zinc chloride, aluminum and zinc are particularly 55-, sodium sulfate or tetrafluoroborate, 4- (p- Tolylmercapto) -der preferred. Similarly preferred metals are silver, gold, 2,5-dimethoxybenzene diazonium zinc chloride, 4- (p-methylbenzene and nickel, but other metals such as chromium, zoylamino (-2,5-diethoxybenzene diazonium zinc chloride, 4- (p-Me cobalt , Iron, germanium, magnesium, manganese, platinum and thoxybenzoylamino) -2,5-diethoxybenzene diazonium zinc chloride, tin. Suitable metal compounds for a 4-morpholino-2,5-butoxybenzene diazonium zinc chloride or -te-ne vacuum plating are cadmium sulfide, magnesium fluoride 60 trafluoroborate , 4-morpholinobenzene diazonium tetrafluoroborate, and titanium dioxide. 4-pyrrolidino-3-methylbenzene diazonium tetrafluoroborate,

Electroless plating can be carried out in the usual way by pN, N-dimethylaminobenzene diazonium zinc chloride, pN, N-di-by making the pad sensitive and activating ethylaminobenzene diazonium zinc chloride or tetrafluoroborate, then immersed in an aqueous solution which is pN-ethyl -N-hydroxyaminobenzene diazonium zinc chloride, 1,2-contains a metal salt and a reducing agent in order to deposit a metal 65 diazonaphthol-5-sulfonic acid sodium salt and the zinc chloride tall layer on the base. For this purpose are salt of a condensate of 4-diazodiphenylamine-sulfuric acid copper, nickel, cobalt, gold, palladium, silver and nickel formaldehyde.

Suitable for cobalt and nickel-phosphorus alloys. d) Azido compounds:

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2,6-di (4'-azidobenzal) cyclohexanone. short wavelength emitting light source can be used

The combination of light-sensitizing agents, for example, a carbon arc lamp, a high-

and binder must be such that the interfacial adhesion pressure mercury arc lamp or a fluorescent argon

preferred between the metal layer and the light-sensitive lamp, but tungsten lamps, xenon lamps

part of the light-sensitive layer after exposure of the egg arc lamp, mercury arc lamp or metal halide

mentes is sufficiently reduced. Arc lamps are used. The cheapest light source is

Sunlight is preferred for the benzophenone and quinone compounds. The time during which the resulting binder is: polyvinyl chloride, vinyl chloride, vinyl acetate element is exposed to light, varies depending on the copolymer, vinyl chloride / vinyl acetate / maleic acid, the type of light-sensitive layer, the wavelength,

drid, acrylonitrile or vinyl alcohol terpolymers, vinyl chloride / 10 which is emitted by the light source and the distance from

Vinylidene chloride copolymers, vinyl chloride / vinylidene chloride light source. It was found that, for example, 30 Se-rid / acrylonitrile filter polymers and nitrocellulose, since these materials announce a sufficient exposure time for a 3.0 KW

lien provide a particularly good picture. You can also use a Cellu carbon arc lamp at a distance of 50 centimeters.

loose derivative or a rubber derivative can be used, both are.

for example acetyl cellulose, acetyl butyl cellulose, ethyl cellulose, etc. The invention is described below with reference to the enclosed

se, cyclized rubber and rubber chloride. explained drawings, in which Figure 1 is a transverse

For the diazonium and azido compounds, a polyvinyl sectional view of an imaging element is shown. Figure 2

butyral is suitable in addition to the polymeric materials, which shows the state of the light-sensitive layer, which is stripped after exposure to benzophenone and the quinone compounds for exposure to an image or a pattern of which were named. In addition, thermoplastic polyester 20 metal can be obtained on the base.

and -polyester, alcohol-soluble polyamides, polyvinylalko- In Figure 1, the image-providing element 10 consists of hol, acrylic acid ester / methyl methacrylate or styrene mixed poly- a base 12, a metal layer 14 and a light-

mers, polyurethane emulsions and polyvinyl chloride emulsions sensitive layer 16, which are used as a photosensitive. Contains material and a polymeric binder. The element

The proportion of light-sensitive material which is used 25 ^ d by the light L through a mask M with a coating related to the binder is between 1% desired negative patterns exposed, whereby the interface and 20%, in particular between 5 and 10 wt .-% with benzo adhesion between the photosensitized part and the phenone or quinone compounds and between 0.1 to 10%, metal layer is reduced. After the layer has been stripped off, preferably 1 to 6% by weight in the case of diazonium or azido, a metal pattern 18 is then correspondingly bonded on the base. A large amount of the photosensitive member thus sensitized and a metal pattern 20 cause discoloration of the photosensitive layer on the photosensitive layer in accordance with which the photosensitivity drops. formed part not sensitized to light. In other words, a solvent solution, an aqueous solution or one of their words, there is a positive pattern and emulsion on the base, the light-sensitizing agent and that on the light-sensitive layer a negative pattern. Containing binder, can be on the metal layer on the substrate. A metal pattern formed in this way on the substrate can be used for conventional applications by conventional coating processes including Um-, for broom, fall and light pressure rolling processes, for example as an intermediate product or second original, as a litho-The solids content of such a coating material can fluctuate in graphic plate, as film printing, as a printed circuit, as a function of the application method used original copy for demonstration and projection, as an electrode for. The proportion to be applied is generally 40 electroluminescent processes and as a label.

between 5 and 30% by weight. The coating material is in a ",, ...,. . ,,, ,,,.

,, ^, .. A, ... , .. ..., It was also found that the loss was applied in such an amount that the dry photosensitive ".....,. , 0,,. ,. c. , __

",. , ^, rv <rû- • oi- Interface liability between the photosensitive

Layer a thickness of 0.5 to 100 u, preferably 2 to 20 li.,,, »» ^ •, •,,

^ r b ^ part and the metal layer is recovered if that

45 Photosensitive element of a heat treatment Any dye and pig can be subjected to the coating material. It is therefore possible to enter an element after heating, provided that this does not contain the transparent element which has been exposed to a desired speed and the light sensitivity of the resulting light pattern, the entire light-sensitive layer to the contrary. In particular, layer made to expose again and then the light is suitably added a base pigment, whereby 50 sensitive layer is peeled off to form from the metal layer on a matte layer, which is a surface suitable for drawing ink and the base a reverse image corresponding to the original printing ink delivers. To receive the finished product originally made non-photosensitive.

can finally be done by hand or with a typewriter.

can be written in order to obtain a desired pattern, the mung temperature and the heating-up time are not so great, as a metal image on the base after exposure of the element 55 that the unexposed photosensitiser is decomposed too much is obtained. If desired, the element according to the invention can therefore be either a

Invention can be provided with a support layer on the photosensitive negative-positive process or a positive-positive process layer in order to select the mechanical strength of the to improve a desired metal pattern on the subtractive layer. It is preferred to produce the chase

Utilization of a transparent material, for example of fileo The invention has been explained above in particular with reference to a film-like element made of thermoplastic polyesters, polypropylene, polyamide, but it should be pointed out that polyvinyl chloride or cellulose esters, transparent material, indicate that Image-providing drying system element also in paper or paper saturated with synthetic resins. any complicated three-dimensional shape

The element forming the image according to the invention can; for example through the following stages:

exposed by a desired pattern and the photosensitive 65

peeled layer, whereby an image of the metal corresponds- (a) precipitation of a thin metal layer on a three-

the exposed portion is formed on the base. dimensional body,

An ultraviolet or visible light (b) can be applied as a light source.

628 160

Chen composition on the metal layer and drying to obtain a photosensitive layer, and

(c) writing down a desired light sign pattern on the photosensitive layer.

The element obtained in this way is exposed, 5 then the photosensitive layer is peeled off and a light barrier metal pattern is obtained on the three-dimensional body. The product is particularly suitable for display and electroluminescent purposes.

The invention is illustrated further by the following examples. In these examples, the percentages are given in percent by weight.

example 1

20 g of a copolymer of 86% vinyl chloride, 13% vinyl acetate and 1% maleic anhydride (manufactured by Union Carbide Corporation New York under the name "Vinylite VMOH") and 0.8 g of 4- (p-tolylmercap- to) -2,5-diethoxybenzene diazonium zinc chloride from Kabu-shiki Kaisha Daito Kogyosho, Tokyo, Japan with the trade name "WH-1500 were dissolved in 80 g of methyl ethyl ketone and a photosensitive composition containing 20.6% solids was obtained.

A layer of 100 [x aluminum was deposited on the surface of a 100 μm thick film of polyethyleneterephthalate by evaporation in vacuo, over which the photosensitive composition was applied with a wire bar and dried at 90 ° C. to a 5 [x thick photosensitive layer to get the imaging element.

A negative original was placed on the photosensitive layer and the assembly was exposed to light from a carbon arc lamp at a distance of 80 cm for 30 seconds. Immediately after the photosensitive layer was peeled off, a sharp negative aluminum pattern was obtained on the polyester film and a positive pattern on the photosensitive layer.

The negative pattern has a resolution of 72 / mm, a transmission density of 3.5, a gamma value for the contrast effect of 20 and good point reproducibility. The 40 product was suitable for use as a film.

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composition applied with a wire bar and dried at 90 ° C for 2 minutes to a 10 [x layer.

A positive original was placed on the photosensitive layer and the assembly was exposed using a Ricopy SM 1500 electrographic machine from Ricoh Co., Ltd., Tokyo, Japan, equipped with a 1500 W mercury arc lamp, with a pressure exposure of a display device out of 10 was worked. After peeling off the photosensitive layer, a sharp negative aluminum pattern was obtained on the base.

Example 4

20 g of a copolymer of 87% vinyl chloride and 13% vinyl acetate from Union Carbide Corporation with the trade name "Vinylite VYHH" and 0.8 g of 4- (p-tolyl-mercapto) -2,5-diethoxybenzene diazonium zinc chloride were mixed in a mixture of 40 g Methyl ethyl ketone and 40 g of toluene dissolved to produce a 20.63% light-sensitive composition.

The photosensitive composition was coated with a wire bar on a 50 m | x layer of silver deposited on a glass plate and dried with hot air at 90 ° C for 2 minutes to obtain a 9 | x photosensitive layer.

According to the procedure of Example 1, the element thus produced was exposed through a positive original, whereby a negative silver pattern on the glass plate was obtained after the photosensitive layer was peeled off.

Example 5

A polyethylene terephthalate film with a thickness of 100 | x was immersed in the following sensitizing bath for 3 minutes and washed completely with water, then immersed in the subsequently described activation bath and completely washed with running water, then immersed in the subsequently described plating bath for 2 minutes to obtain a nickel-phosphorus alloy layer of 50 m | i thickness:

Sensitive bathroom:

Example 2

A photosensitive composition was prepared according to the procedure of Example 1, except that 0.8 g of 4- (p-methoxybenzoylamino) -2,5-diethoxybenzoldiazonium zinc chloride was used.

On the surface of a 12 [x thick film made of polyethylene terephthalate, an 80 m [x thick layer of zinc was deposited by evaporation in vacuo, to which the photosensitive composition was applied with a wire bar and at 90 ° C. for one minute to a 9 [x thick layer was dried.

The element thus produced was exposed as in Example 1 to obtain a sharp negative zinc pattern on the base and a positive pattern on the photosensitive layer.

SnCl2 HCl h2o

temperature

60

Example 3

20 g of a copolymer as used in Example 1 and 2.0 g of 1,4-naphthoquinone were mixed in a mixture of 40.0 g of methyl ethyl ketone, 35 g of toluene and 5 g of cyclohexanone to prepare a 21.5% photosensitive Composition solved. 65

A 50 mm thick aluminum layer was deposited on the surface of a 75 [x diacetyl cellulose film by evaporation in vacuo, on which the light-sensitive additive

45

Activation bath:

PdCl3 so HCl h2o

temperature

55 plating bath:

NiS04

Sodium citrate

Sodium-

hypophosphite

Sodium acetate

Ammonium chloride h2o

10 g 40 ml 1000 ml 25 ° C

0.5 g 5 ml 1000 ml 23 ° C

40 g 24 g

20 g 14 g 5g to make up to 100 ml

The photosensitive composition prepared in Example 2 was applied to this alloy layer. The element made in this way was processed using a positive original with the machine of Example 3 in a

628 160

exposed to a display value of 5. A sharp negative alloy pattern was obtained on the polyester film after the photosensitive layer was peeled off.

Example 6

20 g of a copolymer as used in Example 1 and 2 g of benzophenone were dissolved in 50 g of methyl ethyl ketone to prepare a photosensitive composition.

A 100 μm aluminum layer was applied to one side of a 100 μm polyethylene terephthalate film by vacuum evaporation. The other side was coated with a mixture of 10 g of a yellow fluorescent pigment, 5 g of a linear polyester resin, 38 ml of methyl ethyl ketone and 15 ml of cyclohexanone and dried to a 10 x yellow coating. The photosensitive composition was applied to the aluminum layer through a wire bar and dried as in Example 2. A positive original was placed on the coating and exposed with the machine used in Example 3 at a display value of 2. After the coating was peeled off, a negative aluminum pattern in silver was obtained on a film which emitted yellow fluorescence. Such a product is suitable for advertising purposes.

Example 7

A 400 m | x aluminum layer was applied to one side of a 188 | x polyethylene terephthalate film by vacuum evaporation and then coated with a photosensitive composition as described in Example 1.

A negative white screen with a screen size of 300 per inch was placed on the light-sensitive layer and the arrangement was exposed with a pneumatic printer at a distance of 80 cm for 30 seconds so that a 3 KW carbon arc lamp was provided. The photosensitive layer was then peeled off to obtain a positive aluminum screen on the film.

This product was suitable for use as a transparent electrode of a flexible electroluminescent film.

Example 8

A 20.75% photosensitive composition was prepared by mixing 20 g of a copolymer as used in Example 1 with one gram of 2,5-di (4'-azidobenzene) cyclohexanone, 40 g of methyl ethylkenone and 40 g toluene. A 100 ml aluminum layer was applied to one side of a 100 m polyethylene terephthalate film by evaporation in vacuo, to which the photosensitive composition was applied and dried at 90 ° C. for 1 minute to obtain a 4 × coating.

Then, a solution of 15 g of acetyl-butyl cellulose in 80 g of toluene and 25 g of methanol was applied and dried at 90 ° C for 2 minutes to obtain a 15 [x reinforcement. The product was exposed together with a positive original using the device used in Example 3 at a display value of 1.5. After peeling off the applied layers, a negative aluminum pattern was obtained on the polyester film and a positive pattern on the photosensitive layer.

Example 9

Japanese tissue paper from Mitsubishi Paper Mills, Ltd., Tokyo, Japan, with the trade name “Kyokuryu”, was applied to the light-sensitive layer with an acrylic ester emulsion in proportions of 30 g / m22 and dried at 60 ° C. for 3 minutes. The acrylic ester emulsion was a product of the company

Chuo Rika Kogyo Kabushiki Kaisha, Tokyo, Japan, with the trade name «B52H».

Letters were written on the page with the Japanese tissue paper using the typewriter and exposed for 30 seconds using the device used in Example 1. After the photosensitive layer was peeled off, a negative aluminum pattern of the typewriter letters was obtained on the polyester film.

Example 10

A photosensitive composition was obtained by dissolving 20 g of polyvinyl alcohol (manufactured by loa Gosei Chemical Industry Co., Ltd., Tokyo, Japan, under the trade name "NH-20") and 0.8 g of 4- (p-tolyl mercapto) -2,5-diethoxy-benzenediazonium tetrafluoroborate in 180 g of water with a solids content of 10.36%.

Aluminum was deposited by evaporation in a thickness of 100 m | x on a biaxially oriented polypropylene film with a thickness of 50 | x. The photosensitive composition was applied to the aluminum layer and dried by hot air at 100 ° C for 1 minute to a photosensitive layer with a thickness of 3 [X. A positive original was placed on the light-sensitive layer and the arrangement was exposed to light from a 2 KW xenon arc lamp from a distance of 100 cm for 3 minutes. The photosensitive layer was peeled off and a negative aluminum pattern was obtained on the film and a positive pattern on the photosensitive layer.

Example 11

On one side of a 50 | x polyethylene terephthalate film, which was colored with carbon black, a 70 mjx aluminum layer was deposited by evaporation in vacuo. The other side was coated with a pressure-sensitive acrylic adhesive from Nippon Carbide Industries Co., Ltd., Tokyo, Japan, with the trade name "Nissetsu PE115A", in a thickness of 30 jx, and a release paper film was applied thereon.

A photosensitive composition prepared as in Example 1 was applied to the aluminum layer with a wire bar and dried with hot air at 90 ° C. for 1 minute. A 5 | x photosensitive layer was obtained.

A negative original was placed on the element produced in this way and the arrangement was exposed according to the method of Example 1. After peeling off the photosensitive layer, a positive pattern in silver ink was obtained on the black film. The product can be attached as a sample at the desired location when the dispensing film is removed.

Example 12

A photosensitive composition containing 10.18% solids was prepared by dissolving 10 g polyvinyl butylal with 3% acetyl groups, 65 ± 3% butyral groups and 35 ± hydroxyl groups and 0.2 g 4- (p-TolyImercapto) -2 , 5-diethoxybenzene diazonium zinc chloride in a mixture of 45 g of methyl ethyl ketone, 27 g of toluene and 18 g of cyclohexanone.

A 100 μm layer of aluminum was deposited on a 100 μm polyethylene terephthalate film by vacuum evaporation, onto which the photosensitive composition was applied with a wire bar and dried at 90 ° C. for 1 minute to obtain a 5 × light-sensitive layer.

In the device used in Example 3, the exposure of the element was carried out together with a positive original at a pressure value of 5, and the photosensitive layer was then peeled off by a negative one

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50

55

60

65

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Get aluminum patterns on the film. The product was negative pattern to get on the film. As the photosensitive - suitable for use as a lithographic plate. layer was reinforced by the layered film and therefore had improved mechanical strength, the example 13 extraction process was easy to carry out and the remaining ele

A photosensitive composition was suitable for use in larger formats by 5 ment. The positive pattern formed on dissolving 0.4 g of 1,2-diazonaphthol-5-sulfonic acid sodium in the photosensitive layer is suitable for salt in 50 g of polyvinyl chloride emulsion from Nisshin Chemi- various uses.

cal Industries Co., Ltd., Tokyo, Japan, with the trade name "Vinylblane 320". On a 100 [x polyethylene t

rephthalate film was aluminum in a thickness of 100 mfi 10 Example 14

deposited by evaporation in vacuo and then an image-forming element prepared after shipping with the photosensitive composition coated from Example 6 was dried using a positive and dried at 100 ° C for 30 minutes. A light original was obtained with the device used in Example 3 with a sensitive layer of 3 × thickness. exposed to a pressure exposure of 10. The exposed element

A 12 (x poly-15 was heated to 90 ° C for 30 seconds on the photosensitive layer and then the entire ethylene terephthalate film using a 30 (x layer photosensitive surface again with the device made of acrylic adhesive from Nippon Carbide Industries Co., one Pressure exposure of the display values of 10. 20 Ltd., commercially available under the name "Nissetsu PE115A" - minutes after the second exposure, the photosensitive element was brought in to obtain an image-providing element, after which the layer was peeled off and a positive result was obtained Alumi method of Example 1, the element was exposed and anium pattern on the backing film and a negative pattern then peeled off the photosensitive layer to a ne on the photosensitive layer.

C.

1 sheet of drawings

Claims (10)

628 160 PATENT CLAIMS 1. Drying system element for image production, characterized in that it consists of a base, a thin layer of a metal or a metal compound and a light-sensitive layer which contains a polymeric binder and a light-sensitizing agent, the ben-zophenone, a quinine compound, is a diazonium compound or an amido compound, and the photosensitive layer has the property of reducing the interfacial adhesion between the layer of metal or metal compound and the photosensitive layer after exposure of the element. 2. Drying system element according to claim 1, characterized in that the thin layer of metal or metal compound is a layer applied by evaporation in a vacuum, a layer applied by electroless plating or a combination of such layers with an electrolytically plated layer. 3. drying system element according to claims 1 and 2, characterized in that a film-forming synthetic resin, soluble in water or organic solvents, a cellulose derivative or a rubber derivative is present as the binder. 4. drying system element according to claims 1 to 3, characterized in that the quinone compound is 1,4- 25 naphthoquinone, 2-methyl-l, 4-naphthoquinone, anthraquinone, 2-methylanthraquinone, 2-ethylanthraquinone, 2-chloroanthraquinone or p-toluchinone. 5. drying system element according to claims 1 to 4, characterized in that the diazonium compound 30 4- (p-tolylmercapto) -2,5-diethoxybenzene diazonium zinc chloride, sodium sulfate or tetrafluoroborate, 4- (p-tolylmercapto) -2,5-dimethoxybenzene diazonium zinc chloride, 4- (p- Methylbenzoyl-amino) -2,5-diethoxybenzoI-diazonium zinc chloride, 4- (p-meth-oxybenzoylamino) -2,5-diethoxybenzene diazonium zinc chloride, 35 4-morpholino-2,5 butoxybenzene diazonium zinc chloride or tetrafluoroboronium, 4-morphobiazonium, 4-morphobiazonium rat, 4-pyrrolidino-3-methylbenzene-diazonium tetrafluoroborate, pN, N-dimethylaminobenzene-diazonium zinc chloride, pN, N-diethylaminobenzene-diazonium zinc chloride or -tetrafluorbo- 4 <> rat, pN-ethyl-N-hydroxyaminobenzene-diazonium, Diazonaphtol-5-sulfonic acid sodium salt or zinc chloride salt of a condensate of 4-diazodiphenylamine sulfuric acid and formaldehyde. 6. drying system element according to claims 1 to 45 5, characterized in that the azido compound is 2,6-di- (4'-azidobenzal) cyclohexanone. 7. Drying system element according to claim 1, characterized in that the light-sensitive layer contains a benzophenone or quinone compound. 50 8. drying system element according to claim 1, characterized in that the light-sensitive layer is a diazonium compound or azido compound and polyvinyl chloride, vinyl chloride / vinyl acetate mixed polymers, vinyl chloride / vinyl acetate / maleic anhydride, acrylonitrile or vinyl alcohol ester 55 polymers, vinyl chloride / vinylidene chloride mixed polymers, vinyl chloride / vinylidene chloride / vinylidene chloride Acrylonitrile filter polymers, nitrocellulose, acetylcellulose, acetylbutylcellulose, ethylcellulose, cyclized rubber, rubber chloride, polyvinyl butyral, a thermoplastic linear polyester or mixed polyester, a 60 alcohol-soluble polyamide, polyvinyl alcohol, acrylic acid ester / methyl methacrylate or containing styrene mixed polymer. 9. A process for producing an image, characterized in that an element is exposed according to claim 1, then the light-sensitive layer is removed in order to obtain an image pattern of metal or metal compound on the base corresponding to the part of the element which has been made light-sensitive. 10. A method for producing an image, characterized in that an element according to claim 1 is exposed, the element is subjected to a heat treatment after exposure, then the entire surface of the photosensitive layer is exposed again and the photosensitive layer is then peeled off in order to form an image pattern on the base to be obtained from metal or a metal compound which corresponds to the part which was originally made insensitive to light.