SE435214B - ELEMENTS AND PROCEDURE FOR PREPARING AN IMAGE USING A DRY PROCESS - Google Patents

ELEMENTS AND PROCEDURE FOR PREPARING AN IMAGE USING A DRY PROCESS

Info

Publication number
SE435214B
SE435214B SE7704316A SE7704316A SE435214B SE 435214 B SE435214 B SE 435214B SE 7704316 A SE7704316 A SE 7704316A SE 7704316 A SE7704316 A SE 7704316A SE 435214 B SE435214 B SE 435214B
Authority
SE
Sweden
Prior art keywords
preparing
procedure
image
elements
dry process
Prior art date
Application number
SE7704316A
Other languages
Swedish (sv)
Inventor
T Moriya
T Yamagata
Original Assignee
Kimoto Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Kk filed Critical Kimoto Kk
Publication of SE435214B publication Critical patent/SE435214B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
    • H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
SE7704316A 1976-04-14 1977-04-14 ELEMENTS AND PROCEDURE FOR PREPARING AN IMAGE USING A DRY PROCESS SE435214B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4208376A JPS52126220A (en) 1976-04-14 1976-04-14 Dry image forming material and method of forming image

Publications (1)

Publication Number Publication Date
SE435214B true SE435214B (en) 1984-09-10

Family

ID=12626139

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7704316A SE435214B (en) 1976-04-14 1977-04-14 ELEMENTS AND PROCEDURE FOR PREPARING AN IMAGE USING A DRY PROCESS

Country Status (12)

Country Link
JP (1) JPS52126220A (en)
BE (1) BE853618A (en)
CA (1) CA1094377A (en)
CH (1) CH628160A5 (en)
DD (1) DD130507A5 (en)
DE (1) DE2716422C2 (en)
FR (1) FR2371706A1 (en)
GB (1) GB1563010A (en)
IT (1) IT1094789B (en)
NL (1) NL185425C (en)
SE (1) SE435214B (en)
SU (1) SU948301A3 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5479027A (en) * 1977-12-05 1979-06-23 Kimoto Kk Dry picture forming material
JPS54179986U (en) * 1978-06-07 1979-12-19
EP0042632A1 (en) * 1980-06-20 1981-12-30 Agfa-Gevaert N.V. Recording material and method for the production of metal images
JPS5858546A (en) * 1981-10-02 1983-04-07 Kimoto & Co Ltd Photosensitive mask material for photoengraving
JPS59198445A (en) * 1983-04-27 1984-11-10 Kimoto & Co Ltd Image forming material by stripping
JPS60238826A (en) * 1984-05-14 1985-11-27 Kimoto & Co Ltd Image forming material
JPS61243603A (en) * 1985-04-19 1986-10-29 岡村　一 Candle stand
DE69524589D1 (en) * 1995-08-08 2002-01-24 Agfa Gevaert Nv Process for forming metallic images
EP0762214A1 (en) * 1995-09-05 1997-03-12 Agfa-Gevaert N.V. Photosensitive element comprising an image forming layer and a photopolymerisable layer
JP2001284350A (en) * 2000-03-31 2001-10-12 Nitto Denko Corp Pattern-forming method and adhesive sheet for peeling off thin film
JP2009032912A (en) * 2007-07-27 2009-02-12 Sony Corp Method of manufacturing semiconductor device, and method of manufacturing organic light-emitting device
JP6744213B2 (en) * 2013-10-30 2020-08-19 ネーデルランドセ・オルガニサティ・フォール・トゥーヘパスト−ナトゥールウェテンスハッペライク・オンデルズーク・テーエヌオー Substrate with electrical circuit pattern, method and system for providing same

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2999016A (en) * 1955-03-24 1961-09-05 Keuffel & Esser Co Drawing material
BE626528A (en) * 1961-10-23
DE1447012B2 (en) * 1963-07-20 1972-12-21 Kalle Ag, 6202 Wiesbaden-Biebrich NEGATIVE WORKING, SENSITIZED COPPER-ALUMINUM BIMETAL PLATE
DE1572153B2 (en) * 1966-06-27 1971-07-22 E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) PHOTOPOLYMERIZABLE RECORDING MATERIAL
DE1597644C3 (en) * 1966-11-03 1973-09-20 Teeg Research Inc., Detroit, Mich. (V.St.A.) Process for the production of deer images
DE1671625A1 (en) * 1967-01-24 1971-09-16 Kalle Ag Composite material for the production of multi-metal printing forms
ZA711869B (en) * 1970-05-27 1971-12-29 Gen Electric Aqueous electrocoating solutions and method of making and using same
JPS4837643A (en) * 1971-09-15 1973-06-02
JPS5821257B2 (en) * 1974-04-25 1983-04-28 富士写真フイルム株式会社 Red-spotted moth
JPS516530A (en) * 1974-07-04 1976-01-20 Toray Industries GAZOKEISEIZ AIRYO

Also Published As

Publication number Publication date
NL185425B (en) 1989-11-01
DE2716422A1 (en) 1977-11-03
JPS52126220A (en) 1977-10-22
IT1094789B (en) 1985-08-02
NL7704083A (en) 1977-10-18
CA1094377A (en) 1981-01-27
AU1946676A (en) 1978-06-29
FR2371706B1 (en) 1980-04-25
BE853618A (en) 1977-08-01
NL185425C (en) 1990-04-02
GB1563010A (en) 1980-03-19
CH628160A5 (en) 1982-02-15
FR2371706A1 (en) 1978-06-16
DE2716422C2 (en) 1987-10-01
DD130507A5 (en) 1978-04-05
JPS5613305B2 (en) 1981-03-27
SU948301A3 (en) 1982-07-30

Similar Documents

Publication Publication Date Title
SE446740B (en) PROCEDURE FOR PREPARING MURAMYLDIPEPTIDE DERIVATIVES
SE440791B (en) PROCEDURE FOR PREPARING LIGNIT CO
SE7702352L (en) PROCEDURE AND DEVICE FOR DECORATING CYLINDRICAL FOREMALS
SE440501B (en) PROCEDURE FOR PREPARING SUBSTITUTED PHENYLAMIDOXIMES
NO773548L (en) PROCEDURE FOR PREPARING SPIRO-HYDANTO INTERVENTIVES
JPS5352425A (en) Method and device for drying photographic material
FI64194B (en) FRAMEWORK AND FRAMEWORK FOR FIXING
FI772870A (en) FOERFARANDE OCH ANORDNING FOER SPRAYTORKNING AV VAETSKEFORMIGA PRODUKTER
SE435214B (en) ELEMENTS AND PROCEDURE FOR PREPARING AN IMAGE USING A DRY PROCESS
SE7704689L (en) INSULIN PROCEDURE PROCEDURE
SE425398B (en) PREPARING A PHOTOGRAPHABLE CONDENSATION POLYMS AND USE THEREOF
JPS52155531A (en) Dry photo resist developing method
SE433212B (en) PROCEDURE FOR PREPARING 4-HYDROXY-APORPHINE DERIVATIVES
NO150559C (en) 4-HALOGEN-DIHYDROPYRANE COMPOUNDS AND PROCEDURES FOR PREPARING THEREOF
SE431871B (en) PROCEDURE FOR PREPARING 2-BROMO-6-FLUORO-N-2-IMIDAZOLIDINYLIDEENBENAMINE
SE433219B (en) PROCEDURE FOR PREPARING 3-HALOGENE METHYLPHEALOSPOR COMPOUNDS
SE443140B (en) PROCEDURE FOR PREPARING CARBOSTYRIC DERIVATIVES
SE421125B (en) PROCEDURE FOR PREPARING 5-M-TOLYLOXIURACIL
SE7709806L (en) PROCEDURE FOR PREPARING PEPTIDES
SE417315B (en) PROCEDURE FOR PREPARING N- (MERCAPTOACYL) -HISTIDINES
FI773632A (en) SAETTING OVER ANCHNING BEHANDLING AV VAETSKEHALTIGA AEMNESBLANDNINGAR SAERSKILT FIBERSUSPENSIONER
NO770313L (en) PROCEDURE FOR AA ACCELERATE THE DRYING OF OFFSET PRINTS
SE425490B (en) PROCEDURE FOR PREPARING BIS-PENICILLANOYLOXY ALKANES
SE431751B (en) PROCEDURE FOR PREPARING N-PROPARGYL-PIPERONYLAMINE HYDROCHLORIDE
FI772723A (en) FOERFARANDE FOER FRAMSTAELLNING AV MOENSTERBELAEGGNING FOER SKIDOR OCH SKIDOR FOERSEDDA MED BELAEGGNING

Legal Events

Date Code Title Description
NUG Patent has lapsed

Ref document number: 7704316-4

Effective date: 19921108

Format of ref document f/p: F