JPS52126220A - Dry image forming material and method of forming image - Google Patents

Dry image forming material and method of forming image

Info

Publication number
JPS52126220A
JPS52126220A JP4208376A JP4208376A JPS52126220A JP S52126220 A JPS52126220 A JP S52126220A JP 4208376 A JP4208376 A JP 4208376A JP 4208376 A JP4208376 A JP 4208376A JP S52126220 A JPS52126220 A JP S52126220A
Authority
JP
Japan
Prior art keywords
image
forming
dry
forming material
dry image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4208376A
Other languages
English (en)
Other versions
JPS5613305B2 (ja
Inventor
Takeo Moriya
Toshio Yamagata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimoto Co Ltd
Original Assignee
Kimoto Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co Ltd filed Critical Kimoto Co Ltd
Priority to JP4208376A priority Critical patent/JPS52126220A/ja
Priority to AU19466/76A priority patent/AU493849B2/en
Priority to GB46816/76A priority patent/GB1563010A/en
Priority to CA266,883A priority patent/CA1094377A/en
Priority to BE176737A priority patent/BE853618A/xx
Priority to IT23664/78A priority patent/IT1094789B/it
Priority to SE7704316A priority patent/SE435214B/xx
Priority to FR7711275A priority patent/FR2371706A1/fr
Priority to NLAANVRAGE7704083,A priority patent/NL185425C/xx
Priority to DD7700198405A priority patent/DD130507A5/xx
Priority to SU772470055A priority patent/SU948301A3/ru
Priority to CH463577A priority patent/CH628160A5/de
Priority to DE2716422A priority patent/DE2716422C2/de
Publication of JPS52126220A publication Critical patent/JPS52126220A/ja
Priority to US05/934,478 priority patent/US4205989A/en
Publication of JPS5613305B2 publication Critical patent/JPS5613305B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
    • H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
JP4208376A 1976-04-14 1976-04-14 Dry image forming material and method of forming image Granted JPS52126220A (en)

Priority Applications (14)

Application Number Priority Date Filing Date Title
JP4208376A JPS52126220A (en) 1976-04-14 1976-04-14 Dry image forming material and method of forming image
AU19466/76A AU493849B2 (en) 1976-04-14 1976-11-10 Dry system image producing element
GB46816/76A GB1563010A (en) 1976-04-14 1976-11-10 System image producing element
CA266,883A CA1094377A (en) 1976-04-14 1976-11-30 Dry system image producing element having a photosensitive layer on a metal layer
FR7711275A FR2371706A1 (fr) 1976-04-14 1977-04-14 Element producteur d'images par voie seche
IT23664/78A IT1094789B (it) 1976-04-14 1977-04-14 Elemento per la produzione di immagini mediante un sistema a secco
SE7704316A SE435214B (sv) 1976-04-14 1977-04-14 Element och forfarande for framstellning av en bild med anvendning av en torr process
BE176737A BE853618A (fr) 1976-04-14 1977-04-14 Element producteur d'image par voie seche
NLAANVRAGE7704083,A NL185425C (nl) 1976-04-14 1977-04-14 Werkwijze voor het vormen van een beeld langs droge weg.
DD7700198405A DD130507A5 (de) 1976-04-14 1977-04-14 Trockensystemelement zur bildherstellung
SU772470055A SU948301A3 (ru) 1976-04-14 1977-04-14 Светочувствительный материал дл получени изображений
CH463577A CH628160A5 (en) 1976-04-14 1977-04-14 Dry-system element for producing pictures
DE2716422A DE2716422C2 (de) 1976-04-14 1977-04-14 Lichtempfindliches Aufzeichnungsmaterial
US05/934,478 US4205989A (en) 1976-04-14 1978-08-17 Dry system image producing element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4208376A JPS52126220A (en) 1976-04-14 1976-04-14 Dry image forming material and method of forming image

Publications (2)

Publication Number Publication Date
JPS52126220A true JPS52126220A (en) 1977-10-22
JPS5613305B2 JPS5613305B2 (ja) 1981-03-27

Family

ID=12626139

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4208376A Granted JPS52126220A (en) 1976-04-14 1976-04-14 Dry image forming material and method of forming image

Country Status (12)

Country Link
JP (1) JPS52126220A (ja)
BE (1) BE853618A (ja)
CA (1) CA1094377A (ja)
CH (1) CH628160A5 (ja)
DD (1) DD130507A5 (ja)
DE (1) DE2716422C2 (ja)
FR (1) FR2371706A1 (ja)
GB (1) GB1563010A (ja)
IT (1) IT1094789B (ja)
NL (1) NL185425C (ja)
SE (1) SE435214B (ja)
SU (1) SU948301A3 (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5479027A (en) * 1977-12-05 1979-06-23 Kimoto Kk Dry picture forming material
JPS54179986U (ja) * 1978-06-07 1979-12-19
JPS59198445A (ja) * 1983-04-27 1984-11-10 Kimoto & Co Ltd 剥離による画像形成材料
JPS60238826A (ja) * 1984-05-14 1985-11-27 Kimoto & Co Ltd 画像形成材料
JP2001284350A (ja) * 2000-03-31 2001-10-12 Nitto Denko Corp パターン形成方法および薄膜剥離除去用接着シート
JP2009032912A (ja) * 2007-07-27 2009-02-12 Sony Corp 半導体装置の製造方法および有機発光装置の製造方法
JP2016538591A (ja) * 2013-10-30 2016-12-08 ネーデルランドセ・オルガニサティ・フォール・トゥーヘパスト−ナトゥールウェテンスハッペライク・オンデルズーク・テーエヌオー 電気回路パターンを備える基板、それを提供するための方法およびシステム

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0042632A1 (en) * 1980-06-20 1981-12-30 Agfa-Gevaert N.V. Recording material and method for the production of metal images
JPS5858546A (ja) * 1981-10-02 1983-04-07 Kimoto & Co Ltd 製版用感光性マスク材料
JPS61243603A (ja) * 1985-04-19 1986-10-29 岡村　一 ロ−ソク立
EP0758103B1 (en) * 1995-08-08 2001-12-12 Agfa-Gevaert N.V. Process of forming a metal image
EP0762214A1 (en) * 1995-09-05 1997-03-12 Agfa-Gevaert N.V. Photosensitive element comprising an image forming layer and a photopolymerisable layer

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS467484A (ja) * 1970-05-27 1971-12-22
JPS4837643A (ja) * 1971-09-15 1973-06-02
JPS516530A (ja) * 1974-07-04 1976-01-20 Toray Industries Gazokeiseizairyo

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2999016A (en) * 1955-03-24 1961-09-05 Keuffel & Esser Co Drawing material
BE626528A (ja) * 1961-10-23
DE1447012B2 (de) * 1963-07-20 1972-12-21 Kalle Ag, 6202 Wiesbaden-Biebrich Negativ arbeitende, sensibilisierte kupfer-aluminium-bimetallplatte
DE1572153B2 (de) * 1966-06-27 1971-07-22 E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) Fotopolymerisierbares aufzeichnungsmaterial
DE1597644C3 (de) * 1966-11-03 1973-09-20 Teeg Research Inc., Detroit, Mich. (V.St.A.) Verfahren zur Herstellung von Rehefbildern
DE1671625A1 (de) * 1967-01-24 1971-09-16 Kalle Ag Verbundmaterial fuer die Herstellung von Mehrmetalldruckformen
JPS5821257B2 (ja) * 1974-04-25 1983-04-28 富士写真フイルム株式会社 キンゾクガゾウケイセイザイリヨウ

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS467484A (ja) * 1970-05-27 1971-12-22
JPS4837643A (ja) * 1971-09-15 1973-06-02
JPS516530A (ja) * 1974-07-04 1976-01-20 Toray Industries Gazokeiseizairyo

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5479027A (en) * 1977-12-05 1979-06-23 Kimoto Kk Dry picture forming material
JPS5620533B2 (ja) * 1977-12-05 1981-05-14
JPS54179986U (ja) * 1978-06-07 1979-12-19
JPS59198445A (ja) * 1983-04-27 1984-11-10 Kimoto & Co Ltd 剥離による画像形成材料
JPH0349099B2 (ja) * 1983-04-27 1991-07-26 Kimoto Kk
JPS60238826A (ja) * 1984-05-14 1985-11-27 Kimoto & Co Ltd 画像形成材料
JP2001284350A (ja) * 2000-03-31 2001-10-12 Nitto Denko Corp パターン形成方法および薄膜剥離除去用接着シート
JP2009032912A (ja) * 2007-07-27 2009-02-12 Sony Corp 半導体装置の製造方法および有機発光装置の製造方法
JP2016538591A (ja) * 2013-10-30 2016-12-08 ネーデルランドセ・オルガニサティ・フォール・トゥーヘパスト−ナトゥールウェテンスハッペライク・オンデルズーク・テーエヌオー 電気回路パターンを備える基板、それを提供するための方法およびシステム
US10349525B2 (en) 2013-10-30 2019-07-09 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Substrate comprising an electrical circuit pattern, method and system for providing same

Also Published As

Publication number Publication date
CA1094377A (en) 1981-01-27
NL185425C (nl) 1990-04-02
DD130507A5 (de) 1978-04-05
JPS5613305B2 (ja) 1981-03-27
DE2716422C2 (de) 1987-10-01
GB1563010A (en) 1980-03-19
NL7704083A (nl) 1977-10-18
SE435214B (sv) 1984-09-10
CH628160A5 (en) 1982-02-15
BE853618A (fr) 1977-08-01
FR2371706B1 (ja) 1980-04-25
IT1094789B (it) 1985-08-02
DE2716422A1 (de) 1977-11-03
FR2371706A1 (fr) 1978-06-16
AU1946676A (en) 1978-06-29
NL185425B (nl) 1989-11-01
SU948301A3 (ru) 1982-07-30

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