JPS52148304A - Photoosensitive image forming material and method of same - Google Patents

Photoosensitive image forming material and method of same

Info

Publication number
JPS52148304A
JPS52148304A JP5863777A JP5863777A JPS52148304A JP S52148304 A JPS52148304 A JP S52148304A JP 5863777 A JP5863777 A JP 5863777A JP 5863777 A JP5863777 A JP 5863777A JP S52148304 A JPS52148304 A JP S52148304A
Authority
JP
Japan
Prior art keywords
photoosensitive
same
image forming
forming material
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5863777A
Other languages
Japanese (ja)
Other versions
JPS6024932B2 (en
Inventor
Reoporudo Raridon Aaben
Emanueru Kokerenba Andoritsuku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert NV
Original Assignee
Agfa Gevaert NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert NV filed Critical Agfa Gevaert NV
Publication of JPS52148304A publication Critical patent/JPS52148304A/en
Publication of JPS6024932B2 publication Critical patent/JPS6024932B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
JP52058637A 1976-06-02 1977-05-19 photosensitive imaging material Expired JPS6024932B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB22806 1976-06-02
GB22806/76A GB1566802A (en) 1976-06-02 1976-06-02 Photosensitive imaging material

Publications (2)

Publication Number Publication Date
JPS52148304A true JPS52148304A (en) 1977-12-09
JPS6024932B2 JPS6024932B2 (en) 1985-06-15

Family

ID=10185356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52058637A Expired JPS6024932B2 (en) 1976-06-02 1977-05-19 photosensitive imaging material

Country Status (6)

Country Link
JP (1) JPS6024932B2 (en)
BE (1) BE854534A (en)
CA (1) CA1104867A (en)
DE (1) DE2723613A1 (en)
FR (1) FR2353878A1 (en)
GB (1) GB1566802A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58116531A (en) * 1981-12-29 1983-07-11 Fujitsu Ltd Negative type resist material
JPS62138843A (en) * 1985-12-10 1987-06-22 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Composite resist structural body
JPS62234148A (en) * 1982-11-01 1987-10-14 マイクロサイ，インコーポレイテッド Light fading layer for enhancing contrast
JPS6352129A (en) * 1986-07-25 1988-03-05 マイクロサイ，インコーポレイテッド Composition for contrast intensifying layer, alkylnitrons and use thereof

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4138262A (en) * 1976-09-20 1979-02-06 Energy Conversion Devices, Inc. Imaging film comprising bismuth image-forming layer
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4282309A (en) * 1979-01-24 1981-08-04 Agfa-Gevaert, N.V. Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer
US4677049A (en) * 1983-09-28 1987-06-30 General Electric Company Spin castable photobleachable layer forming compositions
EP0280197A3 (en) * 1987-02-23 1990-05-23 Oki Electric Industry Company, Limited Process for forming photoresist pattern
JPH0177132U (en) * 1987-11-11 1989-05-24
FR2935144B1 (en) * 2008-08-25 2011-12-16 Rhodia Operations USE OF A NOVOLAQUE RESIN FOR INCREASING THE ACID RESISTANCE OF A POLYAMIDE COMPOSITION

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1447010C3 (en) * 1963-07-04 1975-05-28 Hoechst Ag, 6000 Frankfurt Presensitized printing plate for the production of flat and letterpress forms and process for the production of the printing forms
BE792434A (en) * 1971-12-08 1973-03-30 Energy Conversion Devices Inc IMAGE FORMATER AND IMAGE PRODUCTION PROCESS
BE792433A (en) * 1971-12-08 1973-03-30 Energy Conversion Devices Inc MATERIAL FOR THE FORMATION OF IMAGES AND METHOD FOR PRODUCING AN IMAG
US3966317A (en) * 1974-04-08 1976-06-29 Energy Conversion Devices, Inc. Dry process production of archival microform records from hard copy
JPS5821257B2 (en) * 1974-04-25 1983-04-28 富士写真フイルム株式会社 Red-spotted moth

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58116531A (en) * 1981-12-29 1983-07-11 Fujitsu Ltd Negative type resist material
JPH0360109B2 (en) * 1981-12-29 1991-09-12 Fujitsu Ltd
JPS62234148A (en) * 1982-11-01 1987-10-14 マイクロサイ，インコーポレイテッド Light fading layer for enhancing contrast
JPS62138843A (en) * 1985-12-10 1987-06-22 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Composite resist structural body
JPS6352129A (en) * 1986-07-25 1988-03-05 マイクロサイ，インコーポレイテッド Composition for contrast intensifying layer, alkylnitrons and use thereof

Also Published As

Publication number Publication date
BE854534A (en) 1977-11-14
GB1566802A (en) 1980-05-08
FR2353878B1 (en) 1981-06-12
DE2723613A1 (en) 1977-12-15
FR2353878A1 (en) 1977-12-30
JPS6024932B2 (en) 1985-06-15
CA1104867A (en) 1981-07-14
DE2723613C2 (en) 1989-11-30

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