FR2353878B1 - - Google Patents
Info
- Publication number
- FR2353878B1 FR2353878B1 FR7624848A FR7624848A FR2353878B1 FR 2353878 B1 FR2353878 B1 FR 2353878B1 FR 7624848 A FR7624848 A FR 7624848A FR 7624848 A FR7624848 A FR 7624848A FR 2353878 B1 FR2353878 B1 FR 2353878B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB22806/76A GB1566802A (en) | 1976-06-02 | 1976-06-02 | Photosensitive imaging material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2353878A1 FR2353878A1 (en) | 1977-12-30 |
| FR2353878B1 true FR2353878B1 (en) | 1981-06-12 |
Family
ID=10185356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7624848A Granted FR2353878A1 (en) | 1976-06-02 | 1976-08-13 | PHOTOSENSITIVE ELEMENT OF IMAGE FORMATION |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS6024932B2 (en) |
| BE (1) | BE854534A (en) |
| CA (1) | CA1104867A (en) |
| DE (1) | DE2723613A1 (en) |
| FR (1) | FR2353878A1 (en) |
| GB (1) | GB1566802A (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4138262A (en) * | 1976-09-20 | 1979-02-06 | Energy Conversion Devices, Inc. | Imaging film comprising bismuth image-forming layer |
| GB2029423A (en) * | 1978-08-25 | 1980-03-19 | Agfa Gevaert Nv | Photo-polymerisable materials and recording method |
| US4282309A (en) * | 1979-01-24 | 1981-08-04 | Agfa-Gevaert, N.V. | Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer |
| JPS58116531A (en) * | 1981-12-29 | 1983-07-11 | Fujitsu Ltd | Negative type resist material |
| IE56082B1 (en) * | 1982-11-01 | 1991-04-10 | Microsi Inc | Photobleachable compositions |
| US4677049A (en) * | 1983-09-28 | 1987-06-30 | General Electric Company | Spin castable photobleachable layer forming compositions |
| EP0225464A3 (en) * | 1985-12-10 | 1989-06-07 | International Business Machines Corporation | Composite resist structures |
| IE59915B1 (en) * | 1986-07-25 | 1994-04-20 | Microsi Inc | Contrast enhancement layer compositions, alkylnitrones, and use |
| EP0280197A3 (en) * | 1987-02-23 | 1990-05-23 | Oki Electric Industry Company, Limited | Process for forming photoresist pattern |
| JPH0177132U (en) * | 1987-11-11 | 1989-05-24 | ||
| FR2935144B1 (en) * | 2008-08-25 | 2011-12-16 | Rhodia Operations | USE OF A NOVOLAQUE RESIN FOR INCREASING THE ACID RESISTANCE OF A POLYAMIDE COMPOSITION |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1447010C3 (en) * | 1963-07-04 | 1975-05-28 | Hoechst Ag, 6000 Frankfurt | Presensitized printing plate for the production of flat and letterpress forms and process for the production of the printing forms |
| BE792434A (en) * | 1971-12-08 | 1973-03-30 | Energy Conversion Devices Inc | IMAGE FORMATER AND IMAGE PRODUCTION PROCESS |
| BE792433A (en) * | 1971-12-08 | 1973-03-30 | Energy Conversion Devices Inc | MATERIAL FOR THE FORMATION OF IMAGES AND METHOD FOR PRODUCING AN IMAG |
| US3966317A (en) * | 1974-04-08 | 1976-06-29 | Energy Conversion Devices, Inc. | Dry process production of archival microform records from hard copy |
| JPS5821257B2 (en) * | 1974-04-25 | 1983-04-28 | 富士写真フイルム株式会社 | Red-spotted moth |
-
1976
- 1976-06-02 GB GB22806/76A patent/GB1566802A/en not_active Expired
- 1976-08-13 FR FR7624848A patent/FR2353878A1/en active Granted
-
1977
- 1977-05-12 BE BE1008128A patent/BE854534A/en not_active IP Right Cessation
- 1977-05-19 JP JP52058637A patent/JPS6024932B2/en not_active Expired
- 1977-05-24 CA CA279,040A patent/CA1104867A/en not_active Expired
- 1977-05-25 DE DE19772723613 patent/DE2723613A1/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52148304A (en) | 1977-12-09 |
| DE2723613A1 (en) | 1977-12-15 |
| BE854534A (en) | 1977-11-14 |
| GB1566802A (en) | 1980-05-08 |
| CA1104867A (en) | 1981-07-14 |
| JPS6024932B2 (en) | 1985-06-15 |
| FR2353878A1 (en) | 1977-12-30 |
| DE2723613C2 (en) | 1989-11-30 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |