BE854534A - COPY PROCEDURE AND MATERIAL USED IN IT - Google Patents

COPY PROCEDURE AND MATERIAL USED IN IT

Info

Publication number
BE854534A
BE854534A BE1008128A BE1008128A BE854534A BE 854534 A BE854534 A BE 854534A BE 1008128 A BE1008128 A BE 1008128A BE 1008128 A BE1008128 A BE 1008128A BE 854534 A BE854534 A BE 854534A
Authority
BE
Belgium
Prior art keywords
material used
copy procedure
copy
procedure
Prior art date
Application number
BE1008128A
Other languages
Dutch (nl)
Original Assignee
Agfa Gevaert Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert Nv filed Critical Agfa Gevaert Nv
Publication of BE854534A publication Critical patent/BE854534A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Laminated Bodies (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
BE1008128A 1976-06-02 1977-05-12 COPY PROCEDURE AND MATERIAL USED IN IT BE854534A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB22806/76A GB1566802A (en) 1976-06-02 1976-06-02 Photosensitive imaging material

Publications (1)

Publication Number Publication Date
BE854534A true BE854534A (en) 1977-11-14

Family

ID=10185356

Family Applications (1)

Application Number Title Priority Date Filing Date
BE1008128A BE854534A (en) 1976-06-02 1977-05-12 COPY PROCEDURE AND MATERIAL USED IN IT

Country Status (6)

Country Link
JP (1) JPS6024932B2 (en)
BE (1) BE854534A (en)
CA (1) CA1104867A (en)
DE (1) DE2723613A1 (en)
FR (1) FR2353878A1 (en)
GB (1) GB1566802A (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4138262A (en) * 1976-09-20 1979-02-06 Energy Conversion Devices, Inc. Imaging film comprising bismuth image-forming layer
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4282309A (en) * 1979-01-24 1981-08-04 Agfa-Gevaert, N.V. Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer
JPS58116531A (en) * 1981-12-29 1983-07-11 Fujitsu Ltd Negative type resist material
IE56081B1 (en) * 1982-11-01 1991-04-10 Microsi Inc A method of producing images of enhanced contrast in photoresists
US4677049A (en) * 1983-09-28 1987-06-30 General Electric Company Spin castable photobleachable layer forming compositions
EP0225464A3 (en) * 1985-12-10 1989-06-07 International Business Machines Corporation Composite resist structures
IE59915B1 (en) * 1986-07-25 1994-04-20 Microsi Inc Contrast enhancement layer compositions, alkylnitrones, and use
EP0280197A3 (en) * 1987-02-23 1990-05-23 Oki Electric Industry Company, Limited Process for forming photoresist pattern
JPH0177132U (en) * 1987-11-11 1989-05-24
FR2935144B1 (en) * 2008-08-25 2011-12-16 Rhodia Operations USE OF A NOVOLAQUE RESIN FOR INCREASING THE ACID RESISTANCE OF A POLYAMIDE COMPOSITION

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1447010C3 (en) * 1963-07-04 1975-05-28 Hoechst Ag, 6000 Frankfurt Presensitized printing plate for the production of flat and letterpress forms and process for the production of the printing forms
BE792434A (en) * 1971-12-08 1973-03-30 Energy Conversion Devices Inc IMAGE FORMATER AND IMAGE PRODUCTION PROCESS
BE792433A (en) * 1971-12-08 1973-03-30 Energy Conversion Devices Inc MATERIAL FOR THE FORMATION OF IMAGES AND METHOD FOR PRODUCING AN IMAG
US3966317A (en) * 1974-04-08 1976-06-29 Energy Conversion Devices, Inc. Dry process production of archival microform records from hard copy
JPS5821257B2 (en) * 1974-04-25 1983-04-28 富士写真フイルム株式会社 Red-spotted moth

Also Published As

Publication number Publication date
DE2723613C2 (en) 1989-11-30
FR2353878B1 (en) 1981-06-12
GB1566802A (en) 1980-05-08
JPS6024932B2 (en) 1985-06-15
JPS52148304A (en) 1977-12-09
FR2353878A1 (en) 1977-12-30
CA1104867A (en) 1981-07-14
DE2723613A1 (en) 1977-12-15

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: AGFA-GEVAERT N.V.

Effective date: 19900531