JPS536105A - Photoosensitive material for photo mask and method of producing photo mask using same - Google Patents
Photoosensitive material for photo mask and method of producing photo mask using sameInfo
- Publication number
- JPS536105A JPS536105A JP7952076A JP7952076A JPS536105A JP S536105 A JPS536105 A JP S536105A JP 7952076 A JP7952076 A JP 7952076A JP 7952076 A JP7952076 A JP 7952076A JP S536105 A JPS536105 A JP S536105A
- Authority
- JP
- Japan
- Prior art keywords
- photo mask
- photoosensitive
- same
- producing
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51079520A JPS6041340B2 (en) | 1976-07-06 | 1976-07-06 | Photomask manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51079520A JPS6041340B2 (en) | 1976-07-06 | 1976-07-06 | Photomask manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS536105A true JPS536105A (en) | 1978-01-20 |
JPS6041340B2 JPS6041340B2 (en) | 1985-09-17 |
Family
ID=13692244
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51079520A Expired JPS6041340B2 (en) | 1976-07-06 | 1976-07-06 | Photomask manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6041340B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5928156A (en) * | 1982-12-29 | 1984-02-14 | Konishiroku Photo Ind Co Ltd | Manufacture of exposure mask |
JPS62160101A (en) * | 1986-01-09 | 1987-07-16 | Kurita Water Ind Ltd | Separation device |
JPH04108518A (en) * | 1989-12-11 | 1992-04-09 | Gie Anjou Rech Sa | Water treatment equipment with tangent filteration loop |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH049331Y2 (en) * | 1985-09-13 | 1992-03-09 | ||
JPH02108869U (en) * | 1989-06-07 | 1990-08-29 | ||
JPH0384762U (en) * | 1989-12-15 | 1991-08-28 | ||
US6303262B1 (en) | 1998-06-18 | 2001-10-16 | Mitsubishi Paper Mills Ltd. | Photomask material, photomask and methods for the production thereof |
-
1976
- 1976-07-06 JP JP51079520A patent/JPS6041340B2/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5928156A (en) * | 1982-12-29 | 1984-02-14 | Konishiroku Photo Ind Co Ltd | Manufacture of exposure mask |
JPH0548464B2 (en) * | 1982-12-29 | 1993-07-21 | Konishiroku Photo Ind | |
JPS62160101A (en) * | 1986-01-09 | 1987-07-16 | Kurita Water Ind Ltd | Separation device |
JPH04108518A (en) * | 1989-12-11 | 1992-04-09 | Gie Anjou Rech Sa | Water treatment equipment with tangent filteration loop |
Also Published As
Publication number | Publication date |
---|---|
JPS6041340B2 (en) | 1985-09-17 |
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