JPS536105A - Photoosensitive material for photo mask and method of producing photo mask using same - Google Patents

Photoosensitive material for photo mask and method of producing photo mask using same

Info

Publication number
JPS536105A
JPS536105A JP7952076A JP7952076A JPS536105A JP S536105 A JPS536105 A JP S536105A JP 7952076 A JP7952076 A JP 7952076A JP 7952076 A JP7952076 A JP 7952076A JP S536105 A JPS536105 A JP S536105A
Authority
JP
Japan
Prior art keywords
photo mask
photoosensitive
same
producing
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7952076A
Other languages
Japanese (ja)
Other versions
JPS6041340B2 (en
Inventor
Masatoshi Satou
Itsuo Fujii
Satoshi Takeuchi
Satoru Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Fujifilm Holdings Corp
Original Assignee
Dai Nippon Printing Co Ltd
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd, Fuji Photo Film Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP51079520A priority Critical patent/JPS6041340B2/en
Publication of JPS536105A publication Critical patent/JPS536105A/en
Publication of JPS6041340B2 publication Critical patent/JPS6041340B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
JP51079520A 1976-07-06 1976-07-06 Photomask manufacturing method Expired JPS6041340B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51079520A JPS6041340B2 (en) 1976-07-06 1976-07-06 Photomask manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51079520A JPS6041340B2 (en) 1976-07-06 1976-07-06 Photomask manufacturing method

Publications (2)

Publication Number Publication Date
JPS536105A true JPS536105A (en) 1978-01-20
JPS6041340B2 JPS6041340B2 (en) 1985-09-17

Family

ID=13692244

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51079520A Expired JPS6041340B2 (en) 1976-07-06 1976-07-06 Photomask manufacturing method

Country Status (1)

Country Link
JP (1) JPS6041340B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928156A (en) * 1982-12-29 1984-02-14 Konishiroku Photo Ind Co Ltd Manufacture of exposure mask
JPS62160101A (en) * 1986-01-09 1987-07-16 Kurita Water Ind Ltd Separation device
JPH04108518A (en) * 1989-12-11 1992-04-09 Gie Anjou Rech Sa Water treatment equipment with tangent filteration loop

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH049331Y2 (en) * 1985-09-13 1992-03-09
JPH02108869U (en) * 1989-06-07 1990-08-29
JPH0384762U (en) * 1989-12-15 1991-08-28
US6303262B1 (en) 1998-06-18 2001-10-16 Mitsubishi Paper Mills Ltd. Photomask material, photomask and methods for the production thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928156A (en) * 1982-12-29 1984-02-14 Konishiroku Photo Ind Co Ltd Manufacture of exposure mask
JPH0548464B2 (en) * 1982-12-29 1993-07-21 Konishiroku Photo Ind
JPS62160101A (en) * 1986-01-09 1987-07-16 Kurita Water Ind Ltd Separation device
JPH04108518A (en) * 1989-12-11 1992-04-09 Gie Anjou Rech Sa Water treatment equipment with tangent filteration loop

Also Published As

Publication number Publication date
JPS6041340B2 (en) 1985-09-17

Similar Documents

Publication Publication Date Title
JPS52120834A (en) Material for and method of forming image
JPS52120835A (en) Material for and method of forming image
JPS52149979A (en) Mask structure for xxray lithography and method of manufacture thereof
JPS5379466A (en) Method of forming negative mask
JPS534602A (en) Photoosensitive film for microophotogravure and method of producing same
JPS54158917A (en) Method of producing photographic material
JPS5339736A (en) Image forming film and method of producing same as well as method of forming image using same
JPS52126178A (en) Photomask and method of manufacture thereof
JPS5333701A (en) Method of forming mask image
JPS52148304A (en) Photoosensitive image forming material and method of same
JPS5358226A (en) Photosensitive film and method of producing same
JPS536105A (en) Photoosensitive material for photo mask and method of producing photo mask using same
JPS5351458A (en) Method of manufacturing capacttor and apparatus therefor
GB2007860B (en) Impaging material and method of producing image thereon
JPS5316404A (en) Method of and material for forming pile
JPS5322735A (en) Photographic film base and method of producing same
JPS5224704A (en) Photo resist and method of making same
JPS5342264A (en) Method of producing thermoshrinking film
JPS5355380A (en) Method of producing polytetraluoroethylene film
JPS5370674A (en) Method of producing photomask
JPS52141704A (en) Photo mask and method of making same
JPS52128130A (en) Method of producing color photographic photosensitive material
JPS5479026A (en) Method of producing photographic photosensitive material
JPS52155879A (en) Method of producing flamable material form wastes
JPS52135358A (en) Method of producing porous sheettlike material