BR112018068761A2 - método para processamento de uma placa para impressão litográfica - Google Patents

método para processamento de uma placa para impressão litográfica

Info

Publication number
BR112018068761A2
BR112018068761A2 BR112018068761A BR112018068761A BR112018068761A2 BR 112018068761 A2 BR112018068761 A2 BR 112018068761A2 BR 112018068761 A BR112018068761 A BR 112018068761A BR 112018068761 A BR112018068761 A BR 112018068761A BR 112018068761 A2 BR112018068761 A2 BR 112018068761A2
Authority
BR
Brazil
Prior art keywords
processing
printing plate
lithographic printing
gum
solution
Prior art date
Application number
BR112018068761A
Other languages
English (en)
Inventor
Bogunovic Iris
Vervloet Ludo
Moriame Philippe
Original Assignee
Agfa Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Nv filed Critical Agfa Nv
Publication of BR112018068761A2 publication Critical patent/BR112018068761A2/pt

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/08—Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Materials For Photolithography (AREA)

Abstract

método para processamento de uma placa de impressão litográfica compreendendo a revelação com uma solução alcalina e gomagem com uma primeira solução de goma e subsequentemente, com uma segunda solução de goma, em que ambas as soluções de goma são providas em uma configuração de cascata, pelo que a segunda solução de goma trasborda para a primeira solução de goma.
BR112018068761A 2016-03-16 2017-02-03 método para processamento de uma placa para impressão litográfica BR112018068761A2 (pt)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
EP16160627 2016-03-16
EP16160576 2016-03-16
EP16160616 2016-03-16
EP16160591 2016-03-16
EP16168969 2016-05-10
PCT/EP2017/052407 WO2017157570A1 (en) 2016-03-16 2017-02-03 Method for processing a lithographic printing plate

Publications (1)

Publication Number Publication Date
BR112018068761A2 true BR112018068761A2 (pt) 2019-01-22

Family

ID=57909645

Family Applications (7)

Application Number Title Priority Date Filing Date
BR112018068761A BR112018068761A2 (pt) 2016-03-16 2017-02-03 método para processamento de uma placa para impressão litográfica
BR112018068694A BR112018068694A2 (pt) 2016-03-16 2017-02-03 método para processar uma chapa de impressão litográfica
BR112018068709A BR112018068709A2 (pt) 2016-03-16 2017-02-03 método para processar uma chapa de impressão litográfica
BR112018068728A BR112018068728A2 (pt) 2016-03-16 2017-02-03 método e aparelho para o processamento de uma chapa de impressão litográfica
BR112018068745A BR112018068745A2 (pt) 2016-03-16 2017-02-03 processo e aparelho para processar uma chapa de impressão litográfica
BR112018068758A BR112018068758A2 (pt) 2016-03-16 2017-02-03 método e aparelho para processar uma chapa de impressão litográfica
BR112018068753A BR112018068753A2 (pt) 2016-03-16 2017-02-03 método para processar uma chapa de impressão litográfica

Family Applications After (6)

Application Number Title Priority Date Filing Date
BR112018068694A BR112018068694A2 (pt) 2016-03-16 2017-02-03 método para processar uma chapa de impressão litográfica
BR112018068709A BR112018068709A2 (pt) 2016-03-16 2017-02-03 método para processar uma chapa de impressão litográfica
BR112018068728A BR112018068728A2 (pt) 2016-03-16 2017-02-03 método e aparelho para o processamento de uma chapa de impressão litográfica
BR112018068745A BR112018068745A2 (pt) 2016-03-16 2017-02-03 processo e aparelho para processar uma chapa de impressão litográfica
BR112018068758A BR112018068758A2 (pt) 2016-03-16 2017-02-03 método e aparelho para processar uma chapa de impressão litográfica
BR112018068753A BR112018068753A2 (pt) 2016-03-16 2017-02-03 método para processar uma chapa de impressão litográfica

Country Status (9)

Country Link
US (9) US20190079405A1 (pt)
EP (10) EP3429848B1 (pt)
JP (4) JP2019510271A (pt)
CN (10) CN108780282A (pt)
AU (4) AU2017235147A1 (pt)
BR (7) BR112018068761A2 (pt)
CA (4) CA3017806A1 (pt)
ES (1) ES2812324T3 (pt)
WO (10) WO2017157572A1 (pt)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107357140B (zh) * 2017-09-14 2021-05-04 江阴江化微电子材料股份有限公司 一种正性光刻胶用显影液及其应用
EP3495891B1 (en) 2017-12-08 2021-06-16 Agfa Nv A method for making a lithographic printing plate
JP7019031B2 (ja) 2018-03-29 2022-02-14 富士フイルム株式会社 平版印刷版作製用現像処理装置、及び、平版印刷版の作製方法
CN108749274B (zh) * 2018-04-30 2022-10-04 浙江聚众柔印科技有限公司 柔性制版机中药水分散装置
EP3637188A1 (en) * 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor
US11136531B2 (en) * 2018-10-22 2021-10-05 Allied Pressroom Products Cleaning system for a printing press recirculation system
EP3778253A1 (en) * 2019-08-13 2021-02-17 Agfa Nv Method for processing a lithographic printing plate
EP4382306A1 (en) 2022-12-08 2024-06-12 Eco3 Bv Lithographic printing press make-ready method

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B06W Patent application suspended after preliminary examination (for patents with searches from other patent authorities) chapter 6.23 patent gazette]
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

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B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2656 DE 30-11-2021 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.