BR112018068745A2 - processo e aparelho para processar uma chapa de impressão litográfica - Google Patents

processo e aparelho para processar uma chapa de impressão litográfica

Info

Publication number
BR112018068745A2
BR112018068745A2 BR112018068745A BR112018068745A BR112018068745A2 BR 112018068745 A2 BR112018068745 A2 BR 112018068745A2 BR 112018068745 A BR112018068745 A BR 112018068745A BR 112018068745 A BR112018068745 A BR 112018068745A BR 112018068745 A2 BR112018068745 A2 BR 112018068745A2
Authority
BR
Brazil
Prior art keywords
cavity
processing
lithographic printing
printing plate
allows
Prior art date
Application number
BR112018068745A
Other languages
English (en)
Inventor
Bogunovic Iris
Moriame Philippe
Original Assignee
Agfa Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Nv filed Critical Agfa Nv
Publication of BR112018068745A2 publication Critical patent/BR112018068745A2/pt

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00Preparing for use and conserving printing surfaces
    • B41N3/08Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/3042Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3057Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/3042Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071Process control means, e.g. for replenishing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/3092Recovery of material; Waste processing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/322Aqueous alkaline compositions
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking

Abstract

expõe-se um aparelho para processar um material de chapa de impressão litográfica que compreende uma unidade de revelação (5) que inclui uma cavidade de revelação (6), sendo que a dita cavidade compreende uma placa de fundo (10), uma placa de cobertura (7) e paredes laterais (21,22) que em conjunto definem um volume que é fechado com a exceção de uma abertura de entrada (8) que permite que o material em chapa entre na cavidade e uma abertura de saída (9) que permite que o material em chapa saia da cavidade; caracterizado pelo fato de que a placa de cobertura (7) é provida de pelo menos um elemento protuberante no lado que fica voltado para a unidade de revelação.
BR112018068745A 2016-03-16 2017-02-03 processo e aparelho para processar uma chapa de impressão litográfica BR112018068745A2 (pt)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
EP16160576 2016-03-16
EP16160627 2016-03-16
EP16160591 2016-03-16
EP16160616 2016-03-16
EP16168969 2016-05-10
PCT/EP2017/052412 WO2017157573A1 (en) 2016-03-16 2017-02-03 Method and apparatus for processing a lithographic printing plate

Publications (1)

Publication Number Publication Date
BR112018068745A2 true BR112018068745A2 (pt) 2019-01-22

Family

ID=57909645

Family Applications (7)

Application Number Title Priority Date Filing Date
BR112018068753A BR112018068753A2 (pt) 2016-03-16 2017-02-03 método para processar uma chapa de impressão litográfica
BR112018068709A BR112018068709A2 (pt) 2016-03-16 2017-02-03 método para processar uma chapa de impressão litográfica
BR112018068758A BR112018068758A2 (pt) 2016-03-16 2017-02-03 método e aparelho para processar uma chapa de impressão litográfica
BR112018068694A BR112018068694A2 (pt) 2016-03-16 2017-02-03 método para processar uma chapa de impressão litográfica
BR112018068761A BR112018068761A2 (pt) 2016-03-16 2017-02-03 método para processamento de uma placa para impressão litográfica
BR112018068728A BR112018068728A2 (pt) 2016-03-16 2017-02-03 método e aparelho para o processamento de uma chapa de impressão litográfica
BR112018068745A BR112018068745A2 (pt) 2016-03-16 2017-02-03 processo e aparelho para processar uma chapa de impressão litográfica

Family Applications Before (6)

Application Number Title Priority Date Filing Date
BR112018068753A BR112018068753A2 (pt) 2016-03-16 2017-02-03 método para processar uma chapa de impressão litográfica
BR112018068709A BR112018068709A2 (pt) 2016-03-16 2017-02-03 método para processar uma chapa de impressão litográfica
BR112018068758A BR112018068758A2 (pt) 2016-03-16 2017-02-03 método e aparelho para processar uma chapa de impressão litográfica
BR112018068694A BR112018068694A2 (pt) 2016-03-16 2017-02-03 método para processar uma chapa de impressão litográfica
BR112018068761A BR112018068761A2 (pt) 2016-03-16 2017-02-03 método para processamento de uma placa para impressão litográfica
BR112018068728A BR112018068728A2 (pt) 2016-03-16 2017-02-03 método e aparelho para o processamento de uma chapa de impressão litográfica

Country Status (9)

Country Link
US (9) US20190079406A1 (pt)
EP (10) EP3429852B8 (pt)
JP (4) JP2019510271A (pt)
CN (10) CN108778745A (pt)
AU (4) AU2017235147A1 (pt)
BR (7) BR112018068753A2 (pt)
CA (4) CA3017801A1 (pt)
ES (1) ES2812324T3 (pt)
WO (10) WO2017157573A1 (pt)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107357140B (zh) * 2017-09-14 2021-05-04 江阴江化微电子材料股份有限公司 一种正性光刻胶用显影液及其应用
EP3495891B1 (en) 2017-12-08 2021-06-16 Agfa Nv A method for making a lithographic printing plate
JP7019031B2 (ja) 2018-03-29 2022-02-14 富士フイルム株式会社 平版印刷版作製用現像処理装置、及び、平版印刷版の作製方法
CN108749274B (zh) * 2018-04-30 2022-10-04 浙江聚众柔印科技有限公司 柔性制版机中药水分散装置
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor
US11136531B2 (en) * 2018-10-22 2021-10-05 Allied Pressroom Products Cleaning system for a printing press recirculation system
EP3778253A1 (en) * 2019-08-13 2021-02-17 Agfa Nv Method for processing a lithographic printing plate

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