AU9648198A - Aligner and exposure method - Google Patents

Aligner and exposure method

Info

Publication number
AU9648198A
AU9648198A AU96481/98A AU9648198A AU9648198A AU 9648198 A AU9648198 A AU 9648198A AU 96481/98 A AU96481/98 A AU 96481/98A AU 9648198 A AU9648198 A AU 9648198A AU 9648198 A AU9648198 A AU 9648198A
Authority
AU
Australia
Prior art keywords
aligner
exposure method
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU96481/98A
Other languages
English (en)
Inventor
Tetsuo Taniguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU9648198A publication Critical patent/AU9648198A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU96481/98A 1997-10-31 1998-10-26 Aligner and exposure method Abandoned AU9648198A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-299775 1997-10-31
JP29977597A JP4210871B2 (ja) 1997-10-31 1997-10-31 露光装置
PCT/JP1998/004843 WO1999023692A1 (en) 1997-10-31 1998-10-26 Aligner and exposure method

Publications (1)

Publication Number Publication Date
AU9648198A true AU9648198A (en) 1999-05-24

Family

ID=17876815

Family Applications (1)

Application Number Title Priority Date Filing Date
AU96481/98A Abandoned AU9648198A (en) 1997-10-31 1998-10-26 Aligner and exposure method

Country Status (3)

Country Link
JP (1) JP4210871B2 (https=)
AU (1) AU9648198A (https=)
WO (1) WO1999023692A1 (https=)

Families Citing this family (156)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6351041B1 (en) 1999-07-29 2002-02-26 Nikon Corporation Stage apparatus and inspection apparatus having stage apparatus
JP4230676B2 (ja) * 2001-04-27 2009-02-25 株式会社東芝 露光装置の照度むらの測定方法、照度むらの補正方法、半導体デバイスの製造方法及び露光装置
KR20170018113A (ko) 2003-04-09 2017-02-15 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
WO2004090634A2 (en) 2003-04-10 2004-10-21 Nikon Corporation Environmental system including vaccum scavange for an immersion lithography apparatus
KR101177330B1 (ko) 2003-04-10 2012-08-30 가부시키가이샤 니콘 액침 리소그래피 장치
KR101159564B1 (ko) 2003-04-11 2012-06-25 가부시키가이샤 니콘 액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침액체를 유지하는 장치 및 방법
KR20170016014A (ko) 2003-04-11 2017-02-10 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
TWI424470B (zh) 2003-05-23 2014-01-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
KR101520591B1 (ko) 2003-06-13 2015-05-14 가부시키가이샤 니콘 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
TWI515770B (zh) 2003-06-19 2016-01-01 尼康股份有限公司 An exposure apparatus, an exposure method, and an element manufacturing method
CN102043350B (zh) 2003-07-28 2014-01-29 株式会社尼康 曝光装置、器件制造方法、及曝光装置的控制方法
KR101381563B1 (ko) 2003-08-21 2014-04-04 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR101162527B1 (ko) 2003-09-03 2012-07-09 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR101664642B1 (ko) 2003-09-29 2016-10-11 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
WO2005031824A1 (ja) 2003-09-29 2005-04-07 Nikon Corporation 投影露光装置、投影露光方法およびデバイス製造方法
TWI598934B (zh) 2003-10-09 2017-09-11 尼康股份有限公司 Exposure apparatus, exposure method, and device manufacturing method
EP1679738A4 (en) 2003-10-28 2008-08-06 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
TW201834020A (zh) 2003-10-28 2018-09-16 日商尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
CN100461336C (zh) 2003-10-31 2009-02-11 株式会社尼康 曝光装置以及器件制造方法
TW201809801A (zh) 2003-11-20 2018-03-16 日商尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
EP2717295B1 (en) 2003-12-03 2018-07-18 Nikon Corporation Exposure apparatus, exposure method, and method for producing a device
EP3376523A1 (en) 2004-01-05 2018-09-19 Nikon Corporation Exposure apparatus, exposure method, and device producing method
CN1938646B (zh) 2004-01-20 2010-12-15 卡尔蔡司Smt股份公司 曝光装置和用于投影透镜的测量装置
US7697110B2 (en) 2004-01-26 2010-04-13 Nikon Corporation Exposure apparatus and device manufacturing method
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
EP1713114B1 (en) 2004-02-03 2018-09-19 Nikon Corporation Exposure apparatus and device manufacturing method
EP1713115B1 (en) 2004-02-04 2016-05-04 Nikon Corporation Exposure apparatus, exposure method, and device producing method
TWI389174B (zh) 2004-02-06 2013-03-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
KR101166007B1 (ko) 2004-02-10 2012-07-17 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법, 메인터넌스 방법 및노광 방법
KR101106497B1 (ko) 2004-02-20 2012-01-20 가부시키가이샤 니콘 노광 장치, 공급 방법 및 회수 방법, 노광 방법, 및디바이스 제조 방법
DE102004013886A1 (de) 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
KR101851511B1 (ko) 2004-03-25 2018-04-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
EP1737024A4 (en) * 2004-03-25 2008-10-15 Nikon Corp Exposure equipment, exposure method and device manufacturing method
EP1753016B1 (en) 2004-04-19 2012-06-20 Nikon Corporation Exposure apparatus and device producing method
US7486381B2 (en) 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1774405B1 (en) 2004-06-04 2014-08-06 Carl Zeiss SMT GmbH System for measuring the image quality of an optical imaging system
WO2005122218A1 (ja) 2004-06-09 2005-12-22 Nikon Corporation 露光装置及びデバイス製造方法
US8373843B2 (en) 2004-06-10 2013-02-12 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8717533B2 (en) 2004-06-10 2014-05-06 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8508713B2 (en) 2004-06-10 2013-08-13 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR20180072867A (ko) 2004-06-10 2018-06-29 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
EP3098835B1 (en) 2004-06-21 2017-07-26 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US8698998B2 (en) 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101433491B1 (ko) 2004-07-12 2014-08-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
WO2006009169A1 (ja) 2004-07-21 2006-01-26 Nikon Corporation 露光方法及びデバイス製造方法
CN102998910A (zh) 2004-08-03 2013-03-27 株式会社尼康 曝光装置的控制方法、曝光方法及组件制造方法
KR101700547B1 (ko) 2004-09-17 2017-01-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US8102512B2 (en) 2004-09-17 2012-01-24 Nikon Corporation Substrate holding device, exposure apparatus, and device manufacturing method
EP1806771A4 (en) * 2004-10-08 2008-06-18 Nikon Corp EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD
US7852456B2 (en) 2004-10-13 2010-12-14 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
TWI436403B (zh) 2004-10-26 2014-05-01 尼康股份有限公司 A cleaning method, a substrate processing method, an exposure apparatus, and an element manufacturing method
EP1816671A4 (en) 2004-11-11 2010-01-13 Nikon Corp EXPOSURE METHOD, COMPONENT MANUFACTURING METHOD AND SUBSTRATE
TWI654661B (zh) * 2004-11-18 2019-03-21 Nikon Corporation 位置測量方法、位置控制方法、測量方法、裝載方法、曝光方法及曝光裝置、及元件製造方法
TWI405041B (zh) * 2004-12-01 2013-08-11 尼康股份有限公司 Stage device and exposure device
JP4752473B2 (ja) 2004-12-09 2011-08-17 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
WO2006064851A1 (ja) 2004-12-15 2006-06-22 Nikon Corporation 基板保持装置、露光装置、及びデバイス製造方法
US7528931B2 (en) * 2004-12-20 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7450217B2 (en) 2005-01-12 2008-11-11 Asml Netherlands B.V. Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
WO2006080516A1 (ja) 2005-01-31 2006-08-03 Nikon Corporation 露光装置及びデバイス製造方法
US8547522B2 (en) * 2005-03-03 2013-10-01 Asml Netherlands B.V. Dedicated metrology stage for lithography applications
JP2006295146A (ja) * 2005-03-18 2006-10-26 Canon Inc 位置決め装置、露光装置及びデバイス製造方法
TWI424260B (zh) 2005-03-18 2014-01-21 尼康股份有限公司 A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method
WO2006101024A1 (ja) 2005-03-18 2006-09-28 Nikon Corporation 露光方法及び露光装置、デバイス製造方法、並びに露光装置の評価方法
EP3159738B1 (en) 2005-03-25 2018-12-12 Nikon Corporation Method of determining distortion of a projection optical system
US9239524B2 (en) 2005-03-30 2016-01-19 Nikon Corporation Exposure condition determination method, exposure method, exposure apparatus, and device manufacturing method involving detection of the situation of a liquid immersion region
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
EP1873816A4 (en) 2005-04-18 2010-11-24 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENTS MANUFACTURING METHOD
US8236467B2 (en) 2005-04-28 2012-08-07 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
EP2660854B1 (en) 2005-05-12 2017-06-21 Nikon Corporation Projection optical system, exposure apparatus and exposure method
KR20080018158A (ko) 2005-06-21 2008-02-27 가부시키가이샤 니콘 노광 장치 및 노광 방법, 메인터넌스 방법과 디바이스 제조방법
US7924416B2 (en) 2005-06-22 2011-04-12 Nikon Corporation Measurement apparatus, exposure apparatus, and device manufacturing method
US8693006B2 (en) 2005-06-28 2014-04-08 Nikon Corporation Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
US8179517B2 (en) 2005-06-30 2012-05-15 Nikon Corporation Exposure apparatus and method, maintenance method for exposure apparatus, and device manufacturing method
KR101449055B1 (ko) 2005-08-23 2014-10-08 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
TWI450044B (zh) 2005-08-31 2014-08-21 尼康股份有限公司 An optical element, an exposure apparatus using the same, an exposure method, and a manufacturing method of the micro-element
US8111374B2 (en) 2005-09-09 2012-02-07 Nikon Corporation Analysis method, exposure method, and device manufacturing method
CN101258581B (zh) 2005-09-09 2011-05-11 株式会社尼康 曝光装置及曝光方法以及设备制造方法
EP1936665A4 (en) 2005-09-21 2010-03-31 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
JP3997245B2 (ja) * 2005-10-04 2007-10-24 キヤノン株式会社 露光装置及びデバイス製造方法
US8681314B2 (en) 2005-10-24 2014-03-25 Nikon Corporation Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method
JP2007123334A (ja) * 2005-10-25 2007-05-17 Nikon Corp ステージ装置、露光装置、デバイスの製造方法
EP1950795A4 (en) 2005-11-01 2010-06-02 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
JPWO2007055199A1 (ja) 2005-11-09 2009-04-30 株式会社ニコン 露光装置及び方法、並びにデバイス製造方法
EP1962328B1 (en) 2005-11-14 2013-01-16 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
WO2007058188A1 (ja) 2005-11-15 2007-05-24 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
KR20080068820A (ko) 2005-11-16 2008-07-24 가부시키가이샤 니콘 기판 처리 방법, 포토마스크의 제조 방법 및 포토마스크,그리고 디바이스 제조 방법
JP2007165869A (ja) 2005-11-21 2007-06-28 Nikon Corp 露光方法及びそれを用いたデバイス製造方法、露光装置、並びに基板処理方法及び装置
US7803516B2 (en) 2005-11-21 2010-09-28 Nikon Corporation Exposure method, device manufacturing method using the same, exposure apparatus, and substrate processing method and apparatus
US8125610B2 (en) 2005-12-02 2012-02-28 ASML Metherlands B.V. Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
US7782442B2 (en) 2005-12-06 2010-08-24 Nikon Corporation Exposure apparatus, exposure method, projection optical system and device producing method
KR20080071552A (ko) 2005-12-06 2008-08-04 가부시키가이샤 니콘 노광 방법, 노광 장치 및 디바이스 제조 방법
KR20080071555A (ko) 2005-12-06 2008-08-04 가부시키가이샤 니콘 노광 장치, 노광 방법, 투영 광학계 및 디바이스 제조방법
EP2768016B1 (en) 2005-12-08 2017-10-25 Nikon Corporation Exposure apparatus and method
TWI409598B (zh) 2005-12-28 2013-09-21 尼康股份有限公司 Pattern forming method and pattern forming apparatus, exposure method and exposure apparatus, and component manufacturing method
TWI457977B (zh) 2005-12-28 2014-10-21 尼康股份有限公司 A pattern forming method and a pattern forming apparatus, and an element manufacturing method
WO2007077875A1 (ja) 2005-12-28 2007-07-12 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
US8411271B2 (en) 2005-12-28 2013-04-02 Nikon Corporation Pattern forming method, pattern forming apparatus, and device manufacturing method
US8953148B2 (en) 2005-12-28 2015-02-10 Nikon Corporation Exposure apparatus and making method thereof
KR101323565B1 (ko) 2006-01-19 2013-10-29 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법및 패턴 형성 장치, 노광 방법 및 노광 장치, 그리고디바이스 제조 방법
KR20080103564A (ko) 2006-02-16 2008-11-27 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR20080102192A (ko) 2006-02-16 2008-11-24 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
TW200801833A (en) 2006-02-16 2008-01-01 Nikon Corp Exposure apparatus, exposure method and device manufacturing method
KR20080101865A (ko) 2006-02-16 2008-11-21 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
CN101385120B (zh) * 2006-02-21 2012-09-05 株式会社尼康 测定装置及方法、处理装置及方法、图案形成装置及方法、曝光装置及方法、以及元件制造方法
CN101980084B (zh) 2006-02-21 2013-01-23 株式会社尼康 曝光装置、曝光方法及组件制造方法
EP3267258A1 (en) 2006-02-21 2018-01-10 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
KR20080108226A (ko) 2006-03-03 2008-12-12 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
JP4973652B2 (ja) 2006-03-03 2012-07-11 株式会社ニコン 露光装置及びデバイス製造方法
WO2007102484A1 (ja) 2006-03-07 2007-09-13 Nikon Corporation デバイス製造方法、デバイス製造システム及び測定検査装置
EP1995768A4 (en) 2006-03-13 2013-02-06 Nikon Corp EXPOSURE DEVICE, MAINTENANCE METHOD, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
US8982322B2 (en) 2006-03-17 2015-03-17 Nikon Corporation Exposure apparatus and device manufacturing method
US20070242254A1 (en) 2006-03-17 2007-10-18 Nikon Corporation Exposure apparatus and device manufacturing method
US20080013062A1 (en) 2006-03-23 2008-01-17 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
WO2007116752A1 (ja) 2006-04-05 2007-10-18 Nikon Corporation ステージ装置、露光装置、ステージ制御方法、露光方法、およびデバイス製造方法
TW200746259A (en) 2006-04-27 2007-12-16 Nikon Corp Measuring and/or inspecting method, measuring and/or inspecting apparatus, exposure method, device manufacturing method, and device manufacturing apparatus
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
US8477283B2 (en) 2006-05-10 2013-07-02 Nikon Corporation Exposure apparatus and device manufacturing method
US7728462B2 (en) 2006-05-18 2010-06-01 Nikon Corporation Monolithic stage devices providing motion in six degrees of freedom
EP2037486A4 (en) 2006-05-18 2012-01-11 Nikon Corp EXPOSURE METHOD AND DEVICE, MAINTENANCE METHOD AND COMPONENT MANUFACTURING METHOD
TW200818256A (en) 2006-05-22 2008-04-16 Nikon Corp Exposure method and apparatus, maintenance method, and device manufacturing method
EP2034515A4 (en) 2006-05-23 2012-01-18 Nikon Corp MAINTENANCE METHOD, EXPOSURE METHOD AND DEVICE AND COMPONENT MANUFACTURING METHOD
TWI439814B (zh) * 2006-06-12 2014-06-01 尼康股份有限公司 A mounting apparatus, an exposure apparatus, and an element manufacturing method
WO2008001871A1 (en) 2006-06-30 2008-01-03 Nikon Corporation Maintenance method, exposure method and apparatus and device manufacturing method
US20080073563A1 (en) 2006-07-01 2008-03-27 Nikon Corporation Exposure apparatus that includes a phase change circulation system for movers
WO2008007660A1 (en) 2006-07-14 2008-01-17 Nikon Corporation Stage apparatus and exposure apparatus
WO2008026593A1 (en) 2006-08-30 2008-03-06 Nikon Corporation Exposure apparatus, device production method, cleaning method, and cleaning member
TWI596444B (zh) * 2006-08-31 2017-08-21 尼康股份有限公司 Exposure method and device, and device manufacturing method
SG10201407218XA (en) * 2006-09-01 2015-01-29 Nippon Kogaku Kk Movable Body Drive Method And Movable Body Drive System, Pattern Formation Method And Apparatus, Exposure Method And Apparatus, And Device Manufacturing Method
WO2008029884A1 (en) 2006-09-08 2008-03-13 Nikon Corporation Cleaning member, cleaning method and device manufacturing method
KR101419195B1 (ko) 2006-09-08 2014-07-15 가부시키가이샤 니콘 마스크, 노광 장치 및 디바이스 제조 방법
KR101419196B1 (ko) 2006-09-29 2014-07-15 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
JP5055971B2 (ja) 2006-11-16 2012-10-24 株式会社ニコン 表面処理方法及び表面処理装置、露光方法及び露光装置、並びにデバイス製造方法
US20080156356A1 (en) 2006-12-05 2008-07-03 Nikon Corporation Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method
EP2998983B1 (en) 2006-12-27 2018-03-21 Nikon Corporation Stage apparatus, exposure apparatus and device fabricating method
JP5505584B2 (ja) * 2006-12-28 2014-05-28 株式会社ニコン 露光装置
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
KR101531426B1 (ko) 2007-03-01 2015-06-24 가부시키가이샤 니콘 펠리클 프레임 장치, 마스크, 노광 방법, 노광 장치, 및 디바이스의 제조 방법
US7830046B2 (en) 2007-03-16 2010-11-09 Nikon Corporation Damper for a stage assembly
US8497980B2 (en) 2007-03-19 2013-07-30 Nikon Corporation Holding apparatus, exposure apparatus, exposure method, and device manufacturing method
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8300207B2 (en) 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
US8164736B2 (en) 2007-05-29 2012-04-24 Nikon Corporation Exposure method, exposure apparatus, and method for producing device
JP4968335B2 (ja) 2007-06-11 2012-07-04 株式会社ニコン 計測部材、センサ、計測方法、露光装置、露光方法、及びデバイス製造方法
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
SG185313A1 (en) 2007-10-16 2012-11-29 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
CN101681123B (zh) 2007-10-16 2013-06-12 株式会社尼康 照明光学系统、曝光装置以及元件制造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9176393B2 (en) 2008-05-28 2015-11-03 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
EP2282188B1 (en) 2008-05-28 2015-03-11 Nikon Corporation Illumination optical system and exposure apparatus
NL2003363A (en) 2008-09-10 2010-03-15 Asml Netherlands Bv Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method.
US8435723B2 (en) 2008-09-11 2013-05-07 Nikon Corporation Pattern forming method and device production method
US8384875B2 (en) 2008-09-29 2013-02-26 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR101733257B1 (ko) 2009-11-05 2017-05-24 가부시키가이샤 니콘 포커스 테스트 마스크, 포커스 계측 방법, 노광 장치, 및 노광 방법

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3203719B2 (ja) * 1991-12-26 2001-08-27 株式会社ニコン 露光装置、その露光装置により製造されるデバイス、露光方法、およびその露光方法を用いたデバイス製造方法
US5715064A (en) * 1994-06-17 1998-02-03 International Business Machines Corporation Step and repeat apparatus having enhanced accuracy and increased throughput
JPH09199413A (ja) * 1996-01-23 1997-07-31 Nikon Corp 露光方法及び露光装置

Also Published As

Publication number Publication date
WO1999023692A1 (en) 1999-05-14
JP4210871B2 (ja) 2009-01-21
JPH11135400A (ja) 1999-05-21

Similar Documents

Publication Publication Date Title
AU9648198A (en) Aligner and exposure method
AU1505699A (en) Projection exposure method and projection aligner
AU1175799A (en) Projection aligner and projection exposure method
AU6853598A (en) Aligner, exposure method using the aligner, and method of manufacture of circuitdevice
AU1176199A (en) Aligner, exposure method and device manufacturing method
AU1179200A (en) Exposure method and device
AU2747999A (en) Projection exposure method and system
AU2076099A (en) Exposure method and device
AU1078700A (en) Exposure method and exposure apparatus
AU4653999A (en) Exposure method and system
AU1053199A (en) Exposure apparatus and method of manufacturing the same, and exposure method
AU1435599A (en) Polymer-nanocrystal photo device and method for making the same
AU7161598A (en) Goniometer-based body-tracking device and method
AU6893698A (en) Device and method for preventing restenosis
AU1555001A (en) Exposure method and apparatus
AU8357398A (en) Exposure method and aligner
AU1689899A (en) Exposure method and exposure apparatus
AU3534299A (en) Exposure method and exposure system
AU4143000A (en) Exposure method and apparatus
AU2327800A (en) Exposure method and apparatus
AU4949900A (en) Exposure method and apparatus
AU1504799A (en) Aligner, exposure method and method of manufacturing device
AU1554901A (en) Exposure method and exposure apparatus
AU4291099A (en) Photomask and exposure method
AU9762398A (en) Exposure apparatus

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase