AU736457B2 - Spherical semiconductor device and the manufacture method for the same and spherical semiconductor device material - Google Patents
Spherical semiconductor device and the manufacture method for the same and spherical semiconductor device material Download PDFInfo
- Publication number
- AU736457B2 AU736457B2 AU40313/97A AU4031397A AU736457B2 AU 736457 B2 AU736457 B2 AU 736457B2 AU 40313/97 A AU40313/97 A AU 40313/97A AU 4031397 A AU4031397 A AU 4031397A AU 736457 B2 AU736457 B2 AU 736457B2
- Authority
- AU
- Australia
- Prior art keywords
- spherical
- core
- semiconductor device
- semiconductor
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000004065 semiconductor Substances 0.000 title claims description 226
- 239000000463 material Substances 0.000 title claims description 62
- 238000000034 method Methods 0.000 title claims description 46
- 238000004519 manufacturing process Methods 0.000 title claims description 36
- 239000010408 film Substances 0.000 claims description 150
- 239000011162 core material Substances 0.000 claims description 144
- 239000010409 thin film Substances 0.000 claims description 93
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 86
- 229910052710 silicon Inorganic materials 0.000 claims description 82
- 239000010703 silicon Substances 0.000 claims description 81
- 239000013078 crystal Substances 0.000 claims description 39
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 31
- 230000001699 photocatalysis Effects 0.000 claims description 31
- 238000000576 coating method Methods 0.000 claims description 30
- 239000011248 coating agent Substances 0.000 claims description 27
- 238000006243 chemical reaction Methods 0.000 claims description 26
- 230000015572 biosynthetic process Effects 0.000 claims description 25
- 238000010438 heat treatment Methods 0.000 claims description 23
- 230000005611 electricity Effects 0.000 claims description 22
- 239000011810 insulating material Substances 0.000 claims description 20
- 238000005339 levitation Methods 0.000 claims description 19
- 230000001681 protective effect Effects 0.000 claims description 19
- 239000004408 titanium dioxide Substances 0.000 claims description 15
- 239000007769 metal material Substances 0.000 claims description 12
- 238000002161 passivation Methods 0.000 claims description 12
- 239000000155 melt Substances 0.000 claims description 9
- 230000003068 static effect Effects 0.000 claims description 8
- 239000000969 carrier Substances 0.000 claims description 7
- 238000003303 reheating Methods 0.000 claims description 6
- 230000003667 anti-reflective effect Effects 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 105
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 48
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 25
- 238000010276 construction Methods 0.000 description 24
- 239000012768 molten material Substances 0.000 description 23
- 235000012239 silicon dioxide Nutrition 0.000 description 23
- 239000000377 silicon dioxide Substances 0.000 description 22
- 230000006870 function Effects 0.000 description 16
- 238000001953 recrystallisation Methods 0.000 description 15
- 238000009792 diffusion process Methods 0.000 description 13
- 239000012535 impurity Substances 0.000 description 13
- 229910021417 amorphous silicon Inorganic materials 0.000 description 12
- 239000008151 electrolyte solution Substances 0.000 description 12
- 229940021013 electrolyte solution Drugs 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 230000002829 reductive effect Effects 0.000 description 11
- 239000007789 gas Substances 0.000 description 10
- 230000009471 action Effects 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- 238000009826 distribution Methods 0.000 description 8
- 229910052581 Si3N4 Inorganic materials 0.000 description 7
- 239000004411 aluminium Substances 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 238000005868 electrolysis reaction Methods 0.000 description 7
- 229910052594 sapphire Inorganic materials 0.000 description 7
- 239000010980 sapphire Substances 0.000 description 7
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 7
- 238000007711 solidification Methods 0.000 description 7
- 230000008023 solidification Effects 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 229910002601 GaN Inorganic materials 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 6
- 229910010413 TiO 2 Inorganic materials 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 5
- 239000011941 photocatalyst Substances 0.000 description 5
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 4
- 238000005452 bending Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000003487 electrochemical reaction Methods 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000005486 microgravity Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 230000037361 pathway Effects 0.000 description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000011343 solid material Substances 0.000 description 2
- 229910052596 spinel Inorganic materials 0.000 description 2
- 239000011029 spinel Substances 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000003411 electrode reaction Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical group [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000011799 hole material Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229940071870 hydroiodic acid Drugs 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000009545 invasion Effects 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000002674 ointment Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/035281—Shape of the body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/03529—Shape of the potential jump barrier or surface barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
- H01L31/056—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means the light-reflecting means being of the back surface reflector [BSR] type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/062—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the metal-insulator-semiconductor type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/1017—Shape being a sphere
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP1997/002993 WO1999010935A1 (en) | 1997-08-27 | 1997-08-27 | Spheric semiconductor device, method for manufacturing the same, and spheric semiconductor device material |
Publications (2)
Publication Number | Publication Date |
---|---|
AU4031397A AU4031397A (en) | 1999-03-16 |
AU736457B2 true AU736457B2 (en) | 2001-07-26 |
Family
ID=14181037
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU40313/97A Ceased AU736457B2 (en) | 1997-08-27 | 1997-08-27 | Spherical semiconductor device and the manufacture method for the same and spherical semiconductor device material |
Country Status (8)
Country | Link |
---|---|
US (1) | US6294822B1 (ko) |
EP (1) | EP0940860B1 (ko) |
JP (1) | JP3326462B2 (ko) |
KR (1) | KR100386833B1 (ko) |
AU (1) | AU736457B2 (ko) |
CA (1) | CA2269632C (ko) |
DE (1) | DE69725601T2 (ko) |
WO (1) | WO1999010935A1 (ko) |
Families Citing this family (57)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6771239B1 (en) * | 1999-05-17 | 2004-08-03 | Seiko Epson Corporation | Method for manufacturing an active matrix substrate |
JP3992126B2 (ja) * | 1999-12-16 | 2007-10-17 | 株式会社三井ハイテック | 太陽電池の製造方法 |
JP4239352B2 (ja) * | 2000-03-28 | 2009-03-18 | 株式会社日立製作所 | 電子装置の製造方法 |
JP2002060943A (ja) * | 2000-08-22 | 2002-02-28 | Tohoku Electric Power Co Inc | 高純度シリコンの被覆方法及び装置 |
US7205626B1 (en) | 2000-10-20 | 2007-04-17 | Josuke Nakata | Light-emitting or light-receiving with plurality of particle-shaped semiconductor devices having light-emitting or light-receiving properties |
KR100549249B1 (ko) | 2000-10-20 | 2006-02-03 | 죠스케 나카다 | 발광 또는 수광용 반도체 장치 및 그 제조 방법 |
JP2002261301A (ja) * | 2001-02-28 | 2002-09-13 | Kyocera Corp | 光電変換装置 |
US6512301B1 (en) * | 2001-07-12 | 2003-01-28 | Intel Corporation | Making interconnections to a non-flat surface |
AU2001277779B2 (en) | 2001-08-13 | 2005-04-07 | Sphelar Power Corporation | Semiconductor device and method of its manufacture |
AU2001277778B2 (en) * | 2001-08-13 | 2005-04-07 | Sphelar Power Corporation | Light-emitting or light-receiving semiconductor module and method of its manufacture |
KR100619614B1 (ko) | 2001-10-19 | 2006-09-01 | 죠스케 나카다 | 발광 또는 수광용 반도체 모듈 및 그 제조 방법 |
WO2003056633A1 (fr) * | 2001-12-25 | 2003-07-10 | Josuke Nakata | Appareil semi-conducteur d'emission et de reception de lumiere |
NL1020059C2 (nl) * | 2002-02-21 | 2003-08-25 | Corus Technology B V | Werkwijze en inrichting voor het bekleden van een substraat. |
WO2003094248A1 (en) * | 2002-05-02 | 2003-11-13 | Josuke Nakata | Light-receiving panel or light-emitting panel, and manufacturing method thereof |
ES2294131T3 (es) * | 2002-05-13 | 2008-04-01 | Josuke Nakata | Dispositivo para producir cristales granulares del tipo tubo de caida libre. |
AU2002313256B8 (en) | 2002-06-21 | 2006-11-02 | Sphelar Power Corporation | Light-receiving or light-emitting device and its production method |
US7079453B2 (en) * | 2002-07-09 | 2006-07-18 | Casio Computer Co., Ltd. | Timepiece and electronic apparatus with bulb-shaped semiconductor element |
US6897085B2 (en) | 2003-01-21 | 2005-05-24 | Spheral Solar Power, Inc. | Method of fabricating an optical concentrator for a photovoltaic solar cell |
US7402747B2 (en) * | 2003-02-18 | 2008-07-22 | Kyocera Corporation | Photoelectric conversion device and method of manufacturing the device |
US7387400B2 (en) * | 2003-04-21 | 2008-06-17 | Kyosemi Corporation | Light-emitting device with spherical photoelectric converting element |
JP2004335823A (ja) * | 2003-05-09 | 2004-11-25 | Canon Inc | 光起電力素子及び光起電力素子の形成方法 |
WO2004109890A1 (ja) * | 2003-06-09 | 2004-12-16 | Kyosemi Corporation | 発電システム |
US20060185715A1 (en) * | 2003-07-25 | 2006-08-24 | Hammerbacher Milfred D | Photovoltaic apparatus including spherical semiconducting particles |
EP1521308A1 (de) * | 2003-10-02 | 2005-04-06 | Scheuten Glasgroep | Kugel- oder kornförmiges Halbleiterbauelement zur Verwendung in Solarzellen und Verfahren zur Herstellung; Verfahren zur Herstellung einer Solarzelle mit Halbleiterbauelement und Solarzelle |
EP1521309A1 (de) * | 2003-10-02 | 2005-04-06 | Scheuten Glasgroep | Serienverschaltung von Solarzellen mit integrierten Halbleiterkörpern, Verfahren zur Herstellung und Photovoltaikmodul mit Serienverschaltung |
JP4437657B2 (ja) * | 2003-10-03 | 2010-03-24 | 富士機械製造株式会社 | 光発電パネルの製造方法 |
CN1771608A (zh) * | 2003-10-24 | 2006-05-10 | 京半导体股份有限公司 | 受光或发光模块板及其制造方法 |
WO2005043632A1 (en) * | 2003-11-03 | 2005-05-12 | Sustainable Technologies International Pty Ltd | Multilayered photovoltaic device on envelope surface |
US20050236030A1 (en) * | 2003-11-27 | 2005-10-27 | Kyocera Corporation | Photoelectric conversion device and method for manufacturing the same |
DE112004002816B4 (de) * | 2004-03-31 | 2012-09-13 | Air Trick Inc. | Elektrostatischer Schwebeofen des Fall-Typs |
US7682544B2 (en) | 2004-06-29 | 2010-03-23 | Fuji Machine Mfg. Co., Ltd. | Method of fabricating photovoltaic panel |
CA2640083A1 (en) * | 2006-02-06 | 2007-08-16 | Kyosemi Corporation | Light receiving or emitting semiconductor module |
US20110033962A1 (en) * | 2006-04-21 | 2011-02-10 | Wavenics Inc. | High efficiency led with multi-layer reflector structure and method for fabricating the same |
KR100732191B1 (ko) * | 2006-04-21 | 2007-06-27 | 한국과학기술원 | 다층 반사기 구조의 고효율 발광다이오드 및 그의 제조방법 |
KR101004901B1 (ko) * | 2006-06-02 | 2010-12-28 | 가부시키가이샤 히타치세이사쿠쇼 | Ic 태그용 인렛의 제조 방법 |
US7736928B2 (en) * | 2006-12-01 | 2010-06-15 | Applied Materials, Inc. | Precision printing electroplating through plating mask on a solar cell substrate |
US7799182B2 (en) * | 2006-12-01 | 2010-09-21 | Applied Materials, Inc. | Electroplating on roll-to-roll flexible solar cell substrates |
US7704352B2 (en) * | 2006-12-01 | 2010-04-27 | Applied Materials, Inc. | High-aspect ratio anode and apparatus for high-speed electroplating on a solar cell substrate |
US20080128019A1 (en) * | 2006-12-01 | 2008-06-05 | Applied Materials, Inc. | Method of metallizing a solar cell substrate |
US20100101627A1 (en) * | 2008-10-26 | 2010-04-29 | Patel Pradyumna V | Flexible solar panel module |
US20100126849A1 (en) * | 2008-11-24 | 2010-05-27 | Applied Materials, Inc. | Apparatus and method for forming 3d nanostructure electrode for electrochemical battery and capacitor |
US20110005565A1 (en) * | 2009-07-10 | 2011-01-13 | Eduardo Flores | Solar sphere |
DE102009027752A1 (de) | 2009-07-15 | 2011-01-27 | Jack Green Power Gmbh | Solarmodul und Verfahren zu dessen Herstellung |
DE102009027753A1 (de) | 2009-07-15 | 2011-01-27 | Jack Green Power Gmbh | Photovoltaikmodul und Verfahren zu dessen Befestigung |
CN101969078B (zh) * | 2010-08-06 | 2012-11-14 | 白金 | 一种选择性汇聚的光学器件 |
KR20130013989A (ko) * | 2011-07-29 | 2013-02-06 | 지에스칼텍스 주식회사 | 구형 반도체 소자를 이용한 광전 변환 장치 및 이의 제조 방법 |
US9593053B1 (en) | 2011-11-14 | 2017-03-14 | Hypersolar, Inc. | Photoelectrosynthetically active heterostructures |
KR101426224B1 (ko) * | 2012-02-10 | 2014-08-07 | 최대규 | 태양전지, 태양전지 거치 장치 및 태양전지 시공 방법 |
DE102012008440A1 (de) | 2012-05-01 | 2014-07-10 | Martin Bogar | Solarmodul und Verfahren zu dessen Herstellung |
JP6449766B2 (ja) * | 2012-07-02 | 2019-01-09 | ヘリアテク ゲゼルシャフト ミット ベシュレンクテル ハフツングHeliatek Gmbh | 光電子デバイス用透明電極 |
EP2717313A2 (en) * | 2012-10-08 | 2014-04-09 | Scheuten S.à.r.l. | Large area LED-lighting device |
KR101251870B1 (ko) | 2012-11-22 | 2013-04-10 | 엘지이노텍 주식회사 | 태양전지 및 이의 제조방법 |
US9525097B2 (en) | 2013-03-15 | 2016-12-20 | Nthdegree Technologies Worldwide Inc. | Photovoltaic module having printed PV cells connected in series by printed conductors |
US10100415B2 (en) | 2014-03-21 | 2018-10-16 | Hypersolar, Inc. | Multi-junction artificial photosynthetic cell with enhanced photovoltages |
TWI651542B (zh) * | 2017-06-20 | 2019-02-21 | 張樂燕 | 長波長紅外線抗反射疊層 |
KR102165004B1 (ko) * | 2018-11-06 | 2020-10-13 | (주)소프트피브이 | 광 발전용 파티클 유닛 및 이를 포함하는 투명 태양 전지 |
CN113707787B (zh) * | 2020-05-22 | 2023-07-18 | 重庆康佳光电技术研究院有限公司 | 球形倒装微型led及其制造方法、显示面板 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05218468A (ja) * | 1992-01-31 | 1993-08-27 | Isuzu Motors Ltd | 太陽電池 |
US5498576A (en) * | 1994-07-22 | 1996-03-12 | Texas Instruments Incorporated | Method and apparatus for affixing spheres to a foil matrix |
US5506053A (en) * | 1994-12-06 | 1996-04-09 | General Atomics | Radio frequency transparent infrared reflective coating materials and methods of making the same |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59121886A (ja) * | 1982-12-21 | 1984-07-14 | ウエスターン エレクトリック カムパニー,インコーポレーテッド | 光デバイス作成方法 |
US4617192A (en) * | 1982-12-21 | 1986-10-14 | At&T Bell Laboratories | Process for making optical INP devices |
JPS61220482A (ja) | 1985-03-27 | 1986-09-30 | Mita Ind Co Ltd | 無指向性フオトダイオ−ド |
KR970000416B1 (ko) * | 1985-05-31 | 1997-01-09 | 사이언티픽 이매징 테크놀로지시 이코포레이티드 | 규소웨이퍼 보강재 및 보강방법 |
JP2659184B2 (ja) * | 1987-02-17 | 1997-09-30 | 日本電気株式会社 | シヨツトキ障壁型赤外線センサ |
JPH038455A (ja) * | 1989-06-02 | 1991-01-16 | Babcock Hitachi Kk | 粉砕分級装置 |
JPH038455U (ko) * | 1989-06-12 | 1991-01-28 | ||
US5084091A (en) * | 1989-11-09 | 1992-01-28 | Crucible Materials Corporation | Method for producing titanium particles |
JPH03227577A (ja) * | 1990-02-01 | 1991-10-08 | Mitsubishi Electric Corp | 太陽電池 |
JPH04207087A (ja) * | 1990-11-30 | 1992-07-29 | Hitachi Ltd | 発光素子 |
JPH08125210A (ja) | 1994-10-24 | 1996-05-17 | Jiyousuke Nakada | 受光素子及び受光素子アレイ並びにそれらを用いた電解装置 |
US6204545B1 (en) * | 1996-10-09 | 2001-03-20 | Josuke Nakata | Semiconductor device |
-
1997
- 1997-08-27 CA CA002269632A patent/CA2269632C/en not_active Expired - Fee Related
- 1997-08-27 DE DE69725601T patent/DE69725601T2/de not_active Expired - Lifetime
- 1997-08-27 US US09/297,207 patent/US6294822B1/en not_active Expired - Lifetime
- 1997-08-27 AU AU40313/97A patent/AU736457B2/en not_active Ceased
- 1997-08-27 WO PCT/JP1997/002993 patent/WO1999010935A1/ja active IP Right Grant
- 1997-08-27 KR KR10-1999-7003597A patent/KR100386833B1/ko active IP Right Grant
- 1997-08-27 JP JP51076699A patent/JP3326462B2/ja not_active Expired - Fee Related
- 1997-08-27 EP EP97937817A patent/EP0940860B1/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05218468A (ja) * | 1992-01-31 | 1993-08-27 | Isuzu Motors Ltd | 太陽電池 |
US5498576A (en) * | 1994-07-22 | 1996-03-12 | Texas Instruments Incorporated | Method and apparatus for affixing spheres to a foil matrix |
US5506053A (en) * | 1994-12-06 | 1996-04-09 | General Atomics | Radio frequency transparent infrared reflective coating materials and methods of making the same |
Also Published As
Publication number | Publication date |
---|---|
CA2269632A1 (en) | 1999-03-04 |
KR20000068831A (ko) | 2000-11-25 |
AU4031397A (en) | 1999-03-16 |
EP0940860A1 (en) | 1999-09-08 |
KR100386833B1 (ko) | 2003-06-09 |
DE69725601D1 (de) | 2003-11-20 |
WO1999010935A1 (en) | 1999-03-04 |
US6294822B1 (en) | 2001-09-25 |
EP0940860A4 (en) | 2000-05-17 |
JP3326462B2 (ja) | 2002-09-24 |
EP0940860B1 (en) | 2003-10-15 |
CA2269632C (en) | 2003-09-02 |
DE69725601T2 (de) | 2004-04-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AU736457B2 (en) | Spherical semiconductor device and the manufacture method for the same and spherical semiconductor device material | |
US6204545B1 (en) | Semiconductor device | |
EP0866506B1 (en) | Semiconductor device | |
JP3056467B2 (ja) | 半導体装置製造用基板、その製造方法、及び、光電変換装置、その製造方法 | |
US5258077A (en) | High efficiency silicon solar cells and method of fabrication | |
US7170001B2 (en) | Fabrication of back-contacted silicon solar cells using thermomigration to create conductive vias | |
US20040003837A1 (en) | Photovoltaic-photoelectrochemical device and processes | |
US6294726B1 (en) | Silicon with structured oxygen doping, its production and use | |
US20080236665A1 (en) | Method for Rapid Liquid Phase Deposition of Crystalline Si Thin Films on Large Glass Substrates for Solar Cell Applications | |
CN1155109C (zh) | 球状半导体器件及其制造方法 | |
US8148629B2 (en) | Method and structure for hydrogenation of porous monocrystalline silicon substrates | |
US8163330B2 (en) | Molten metal spraying for metallization application in solar cells | |
JP2007208049A (ja) | 光電変換装置、その製造方法および光発電装置 | |
JP2007022859A (ja) | シリコン結晶粒子の製造方法及び光電変換装置並びに光発電装置 | |
JP2006036582A (ja) | 粒状結晶の製造装置および光電変換装置ならびに光発電装置 | |
JP2006137622A (ja) | 粒状結晶の製造装置および製造方法ならびに光電変換装置および光発電装置 | |
JP5661446B2 (ja) | 結晶半導体粒子の製造方法 | |
JP2006066732A (ja) | 粒状結晶の製造方法および光電変換装置ならびに光発電装置 | |
JP2007281445A (ja) | 粒状結晶の製造方法および光電変換装置ならびに光発電装置 | |
JP2008300511A (ja) | 光電変換装置 | |
JP2006114788A (ja) | 粒状結晶の製造装置および光電変換装置ならびに光発電装置 | |
JP2006114789A (ja) | 粒状結晶の製造方法および光電変換装置ならびに光発電装置 | |
JP2007145616A (ja) | 結晶質半導体粒子の製造方法、光電変換装置の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
SREP | Specification republished | ||
FGA | Letters patent sealed or granted (standard patent) |