ATE556357T1 - Ausrichtungssystem und -verfahren für ein substrat in einem nanodruckverfahren - Google Patents

Ausrichtungssystem und -verfahren für ein substrat in einem nanodruckverfahren

Info

Publication number
ATE556357T1
ATE556357T1 AT08794586T AT08794586T ATE556357T1 AT E556357 T1 ATE556357 T1 AT E556357T1 AT 08794586 T AT08794586 T AT 08794586T AT 08794586 T AT08794586 T AT 08794586T AT E556357 T1 ATE556357 T1 AT E556357T1
Authority
AT
Austria
Prior art keywords
substrate
alignment system
optical energy
sensor system
chuck
Prior art date
Application number
AT08794586T
Other languages
German (de)
English (en)
Inventor
Pawan Nimmakayala
Byung-Jin Choi
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Application granted granted Critical
Publication of ATE556357T1 publication Critical patent/ATE556357T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0277—Electrolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Multimedia (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AT08794586T 2007-07-20 2008-07-18 Ausrichtungssystem und -verfahren für ein substrat in einem nanodruckverfahren ATE556357T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US95100207P 2007-07-20 2007-07-20
US12/175,258 US7837907B2 (en) 2007-07-20 2008-07-17 Alignment system and method for a substrate in a nano-imprint process
PCT/US2008/008817 WO2009014655A1 (en) 2007-07-20 2008-07-18 Alignment system and method for a substrate in a nano-imprint process

Publications (1)

Publication Number Publication Date
ATE556357T1 true ATE556357T1 (de) 2012-05-15

Family

ID=40281655

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08794586T ATE556357T1 (de) 2007-07-20 2008-07-18 Ausrichtungssystem und -verfahren für ein substrat in einem nanodruckverfahren

Country Status (8)

Country Link
US (2) US7837907B2 (cg-RX-API-DMAC7.html)
EP (1) EP2171537B1 (cg-RX-API-DMAC7.html)
JP (1) JP4791597B2 (cg-RX-API-DMAC7.html)
KR (1) KR101487301B1 (cg-RX-API-DMAC7.html)
CN (1) CN101772733B (cg-RX-API-DMAC7.html)
AT (1) ATE556357T1 (cg-RX-API-DMAC7.html)
MY (1) MY150368A (cg-RX-API-DMAC7.html)
WO (1) WO2009014655A1 (cg-RX-API-DMAC7.html)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7630067B2 (en) * 2004-11-30 2009-12-08 Molecular Imprints, Inc. Interferometric analysis method for the manufacture of nano-scale devices
US20070231421A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. Enhanced Multi Channel Alignment
US7943080B2 (en) * 2005-12-23 2011-05-17 Asml Netherlands B.V. Alignment for imprint lithography
US8012395B2 (en) * 2006-04-18 2011-09-06 Molecular Imprints, Inc. Template having alignment marks formed of contrast material
US9573319B2 (en) * 2007-02-06 2017-02-21 Canon Kabushiki Kaisha Imprinting method and process for producing a member in which a mold contacts a pattern forming layer
US8945444B2 (en) * 2007-12-04 2015-02-03 Canon Nanotechnologies, Inc. High throughput imprint based on contact line motion tracking control
US20090147237A1 (en) * 2007-12-05 2009-06-11 Molecular Imprints, Inc. Spatial Phase Feature Location
US8610726B2 (en) * 2008-09-26 2013-12-17 Apple Inc. Computer systems and methods with projected display
US20100079653A1 (en) * 2008-09-26 2010-04-01 Apple Inc. Portable computing system with a secondary image output
US7881603B2 (en) 2008-09-26 2011-02-01 Apple Inc. Dichroic aperture for electronic imaging device
US20100092599A1 (en) * 2008-10-10 2010-04-15 Molecular Imprints, Inc. Complementary Alignment Marks for Imprint Lithography
US8345242B2 (en) 2008-10-28 2013-01-01 Molecular Imprints, Inc. Optical system for use in stage control
US8231821B2 (en) * 2008-11-04 2012-07-31 Molecular Imprints, Inc. Substrate alignment
US8432548B2 (en) * 2008-11-04 2013-04-30 Molecular Imprints, Inc. Alignment for edge field nano-imprinting
KR20120001768A (ko) * 2009-03-23 2012-01-04 인테벡, 인코포레이티드 패턴드 미디어에서의 아일랜드 대 트랜치 비의 최적화를 위한 공정
JP2010267357A (ja) * 2009-05-18 2010-11-25 Hitachi High-Technologies Corp パターンドメディアの製造方法及び製造装置
US9164375B2 (en) * 2009-06-19 2015-10-20 Canon Nanotechnologies, Inc. Dual zone template chuck
TWI431668B (zh) * 2009-06-24 2014-03-21 Ulvac Inc 真空成膜裝置及真空成膜裝置之擋板位置檢測方法
US8380878B2 (en) 2009-08-13 2013-02-19 Cox Communications, Inc. Side loading
KR101116321B1 (ko) * 2009-08-21 2012-03-09 에이피시스템 주식회사 기판 정렬 방법
NL2005259A (en) * 2009-09-29 2011-03-30 Asml Netherlands Bv Imprint lithography.
JP5563319B2 (ja) * 2010-01-19 2014-07-30 キヤノン株式会社 インプリント装置、および物品の製造方法
WO2011097514A2 (en) 2010-02-05 2011-08-11 Molecular Imprints, Inc. Templates having high contrast alignment marks
US8620064B2 (en) * 2010-02-17 2013-12-31 Applied Materials, Inc. Method for imaging workpiece surfaces at high robot transfer speeds with reduction or prevention of motion-induced distortion
US8452077B2 (en) * 2010-02-17 2013-05-28 Applied Materials, Inc. Method for imaging workpiece surfaces at high robot transfer speeds with correction of motion-induced distortion
US8698889B2 (en) * 2010-02-17 2014-04-15 Applied Materials, Inc. Metrology system for imaging workpiece surfaces at high robot transfer speeds
NL2005975A (en) * 2010-03-03 2011-09-06 Asml Netherlands Bv Imprint lithography.
JP5539011B2 (ja) * 2010-05-14 2014-07-02 キヤノン株式会社 インプリント装置、検出装置、位置合わせ装置、及び物品の製造方法
US8538132B2 (en) * 2010-09-24 2013-09-17 Apple Inc. Component concentricity
WO2012040699A2 (en) 2010-09-24 2012-03-29 Molecular Imprints, Inc. High contrast alignment marks through multiple stage imprinting
JP5635870B2 (ja) 2010-10-22 2014-12-03 新日本無線株式会社 反射型フォトセンサを用いた位置検出装置
WO2012149029A2 (en) 2011-04-25 2012-11-01 Molecular Imprints, Inc. Optically absorptive material for alignment marks
US8834146B2 (en) 2012-10-24 2014-09-16 Massachusetts Institute Of Technology System for passive alignment of surfaces
US9377683B2 (en) 2013-03-22 2016-06-28 HGST Netherlands B.V. Imprint template with optically-detectable alignment marks and method for making using block copolymers
JP5909210B2 (ja) 2013-07-11 2016-04-26 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6395352B2 (ja) * 2013-07-12 2018-09-26 キヤノン株式会社 インプリント装置およびインプリント方法、それを用いた物品の製造方法
US9356061B2 (en) 2013-08-05 2016-05-31 Apple Inc. Image sensor with buried light shield and vertical gate
JP6499898B2 (ja) 2014-05-14 2019-04-10 株式会社ニューフレアテクノロジー 検査方法、テンプレート基板およびフォーカスオフセット方法
US9797846B2 (en) 2015-04-17 2017-10-24 Nuflare Technology, Inc. Inspection method and template
TWI619145B (zh) 2015-04-30 2018-03-21 佳能股份有限公司 壓印裝置，基板運送裝置，壓印方法以及製造物件的方法
US11191164B2 (en) * 2015-09-29 2021-11-30 Dai Nippon Printing Co., Ltd. Wiring structure and method of manufacturing the same, semiconductor device, multilayer wiring structure and method of manufacturing the same, semiconductor element mounting substrate, method of forming pattern structure, imprint mold and method of manufacturing the same, imprint mold set, and method of manufacturing multilayer wiring board
WO2017167637A1 (en) 2016-03-30 2017-10-05 Asml Netherlands B.V. Substrate edge detection
US10241260B2 (en) 2016-08-26 2019-03-26 Molecular Imprints, Inc. Edge sealant confinement and halo reduction for optical devices
CN111247623B (zh) * 2017-10-17 2024-03-08 佳能株式会社 压印装置和物品制造方法
US11513372B2 (en) 2018-06-12 2022-11-29 Magic Leap, Inc. Edge sealant application for optical devices
WO2020023373A1 (en) 2018-07-23 2020-01-30 Wendong Xing Optical device venting gaps for edge sealant and lamination dam
JP2020035924A (ja) * 2018-08-30 2020-03-05 キオクシア株式会社 原版
WO2020081672A1 (en) 2018-10-16 2020-04-23 Magic Leap, Inc. Methods and apparatuses for casting polymer products
KR102165655B1 (ko) 2019-07-25 2020-10-14 서원대학교산학협력단 패턴필름의 제조방법 및 상기 제조방법으로 제조된 패턴필름
JP7337682B2 (ja) * 2019-12-18 2023-09-04 キヤノン株式会社 インプリント装置、インプリント方法、及び物品の製造方法
CN113119642B (zh) * 2021-04-13 2022-07-01 北京黎马敦太平洋包装有限公司 一种压印工作站
CN114326340B (zh) * 2022-01-14 2024-04-02 苏州新维度微纳科技有限公司 纳米压印对准方法及系统

Family Cites Families (68)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4024944A (en) * 1975-12-24 1977-05-24 Texas Instruments Incorporated Semiconductor slice prealignment system
NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.
NL8600639A (nl) * 1986-03-12 1987-10-01 Asm Lithography Bv Werkwijze voor het ten opzichte van elkaar uitrichten van een masker en een substraat en inrichting voor het uitvoeren van de werkwijze.
JPH08167559A (ja) * 1994-12-15 1996-06-25 Nikon Corp アライメント方法及び装置
US6034378A (en) * 1995-02-01 2000-03-07 Nikon Corporation Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus
JPH09297408A (ja) * 1996-05-08 1997-11-18 Nikon Corp プリアライメント装置
JPH1186346A (ja) * 1997-09-09 1999-03-30 Sony Corp 光ディスク、光ディスクの製造方法及び光ディスク原盤の製造方法
US6417922B1 (en) * 1997-12-29 2002-07-09 Asml Netherlands B.V. Alignment device and lithographic apparatus comprising such a device
JP2000323461A (ja) * 1999-05-11 2000-11-24 Nec Corp 微細パターン形成装置、その製造方法、および形成方法
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US7432634B2 (en) 2000-10-27 2008-10-07 Board Of Regents, University Of Texas System Remote center compliant flexure device
TWI231405B (en) * 1999-12-22 2005-04-21 Asml Netherlands Bv Lithographic projection apparatus, position detection device, and method of manufacturing a device using a lithographic projection apparatus
TWI282909B (en) * 1999-12-23 2007-06-21 Asml Netherlands Bv Lithographic apparatus and a method for manufacturing a device
US6462818B1 (en) * 2000-06-22 2002-10-08 Kla-Tencor Corporation Overlay alignment mark design
KR100862301B1 (ko) 2000-07-16 2008-10-13 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 임프린트 리소그래피를 위한 고분해능 오버레이 정렬 방법 및 시스템
CN1696826A (zh) 2000-08-01 2005-11-16 得克萨斯州大学系统董事会 用对激活光透明的模板在衬底上形成图案的方法及半导体器件
AU2001286573A1 (en) 2000-08-21 2002-03-04 Board Of Regents, The University Of Texas System Flexure based macro motion translation stage
US6486954B1 (en) * 2000-09-01 2002-11-26 Kla-Tencor Technologies Corporation Overlay alignment measurement mark
US20050274219A1 (en) 2004-06-01 2005-12-15 Molecular Imprints, Inc. Method and system to control movement of a body for nano-scale manufacturing
US20060005657A1 (en) 2004-06-01 2006-01-12 Molecular Imprints, Inc. Method and system to control movement of a body for nano-scale manufacturing
US7387508B2 (en) 2004-06-01 2008-06-17 Molecular Imprints Inc. Compliant device for nano-scale manufacturing
JP2004523906A (ja) 2000-10-12 2004-08-05 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 室温かつ低圧マイクロおよびナノ転写リソグラフィのためのテンプレート
TW556296B (en) * 2000-12-27 2003-10-01 Koninkl Philips Electronics Nv Method of measuring alignment of a substrate with respect to a reference alignment mark
US20050064344A1 (en) 2003-09-18 2005-03-24 University Of Texas System Board Of Regents Imprint lithography templates having alignment marks
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7027156B2 (en) 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7070405B2 (en) 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US6916584B2 (en) * 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
TWI266970B (en) * 2002-08-01 2006-11-21 Molecular Imprints Inc Scatterometry alignment for imprint lithography
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US20040065252A1 (en) 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US6929762B2 (en) * 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US7323130B2 (en) 2002-12-13 2008-01-29 Molecular Imprints, Inc. Magnification correction employing out-of-plane distortion of a substrate
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US6951173B1 (en) 2003-05-14 2005-10-04 Molecular Imprints, Inc. Assembly and method for transferring imprint lithography templates
US7150622B2 (en) 2003-07-09 2006-12-19 Molecular Imprints, Inc. Systems for magnification and distortion correction for imprint lithography processes
US7136150B2 (en) 2003-09-25 2006-11-14 Molecular Imprints, Inc. Imprint lithography template having opaque alignment marks
JP2005116978A (ja) * 2003-10-10 2005-04-28 Sumitomo Heavy Ind Ltd ナノインプリント装置及び方法
JP2005153091A (ja) * 2003-11-27 2005-06-16 Hitachi Ltd 転写方法及び転写装置
US20050275311A1 (en) 2004-06-01 2005-12-15 Molecular Imprints, Inc. Compliant device for nano-scale manufacturing
US7535549B2 (en) 2004-06-03 2009-05-19 Board Of Regents, University Of Texas System System and method for improvement of alignment and overlay for microlithography
US7768624B2 (en) 2004-06-03 2010-08-03 Board Of Regents, The University Of Texas System Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
US20050270516A1 (en) 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
JP2006013400A (ja) * 2004-06-29 2006-01-12 Canon Inc ２つの対象物間の相対的位置ずれ検出方法及び装置
JP4550504B2 (ja) * 2004-07-22 2010-09-22 株式会社日立製作所 記録媒体の製造方法
US7650481B2 (en) * 2004-11-24 2010-01-19 Qualcomm Incorporated Dynamic control of memory access speed
US7630067B2 (en) * 2004-11-30 2009-12-08 Molecular Imprints, Inc. Interferometric analysis method for the manufacture of nano-scale devices
US7292326B2 (en) 2004-11-30 2007-11-06 Molecular Imprints, Inc. Interferometric analysis for the manufacture of nano-scale devices
US20070231421A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. Enhanced Multi Channel Alignment
KR20070086766A (ko) 2004-12-01 2007-08-27 몰레큘러 임프린츠 인코퍼레이티드 임프린트 리소그래피 공정용 열관리를 위한 노출 방법
KR100647314B1 (ko) * 2005-01-31 2006-11-23 삼성전자주식회사 나노 임프린트 리소그래피용 정렬시스템 및 이를 채용한임프린트 리소그래피 방법
JP4290177B2 (ja) * 2005-06-08 2009-07-01 キヤノン株式会社 モールド、アライメント方法、パターン形成装置、パターン転写装置、及びチップの製造方法
US7342642B2 (en) * 2005-06-20 2008-03-11 Asml Netherlands B.V. Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method
US7408618B2 (en) * 2005-06-30 2008-08-05 Asml Netherlands B.V. Lithographic apparatus substrate alignment
US7670530B2 (en) 2006-01-20 2010-03-02 Molecular Imprints, Inc. Patterning substrates employing multiple chucks
CN104317161A (zh) 2005-12-08 2015-01-28 分子制模股份有限公司 用于衬底双面图案形成的方法和系统
JP4735280B2 (ja) * 2006-01-18 2011-07-27 株式会社日立製作所 パターン形成方法
JP4736821B2 (ja) * 2006-01-24 2011-07-27 株式会社日立製作所 パターン形成方法およびパターン形成装置
JP5306989B2 (ja) 2006-04-03 2013-10-02 モレキュラー・インプリンツ・インコーポレーテッド 複数のフィールド及びアライメント・マークを有する基板を同時にパターニングする方法
US7802978B2 (en) 2006-04-03 2010-09-28 Molecular Imprints, Inc. Imprinting of partial fields at the edge of the wafer
JP4185941B2 (ja) * 2006-04-04 2008-11-26 キヤノン株式会社 ナノインプリント方法及びナノインプリント装置
US7547398B2 (en) 2006-04-18 2009-06-16 Molecular Imprints, Inc. Self-aligned process for fabricating imprint templates containing variously etched features
JP4795300B2 (ja) * 2006-04-18 2011-10-19 キヤノン株式会社 位置合わせ方法、インプリント方法、位置合わせ装置、インプリント装置、及び位置計測方法
JP4848832B2 (ja) * 2006-05-09 2011-12-28 凸版印刷株式会社 ナノインプリント装置及びナノインプリント方法
JP2008276919A (ja) * 2007-03-30 2008-11-13 Pioneer Electronic Corp インプリント装置およびインプリント方法

Also Published As

Publication number Publication date
US20110026039A1 (en) 2011-02-03
US8147731B2 (en) 2012-04-03
KR20100050462A (ko) 2010-05-13
JP2010534406A (ja) 2010-11-04
KR101487301B1 (ko) 2015-01-28
US7837907B2 (en) 2010-11-23
EP2171537B1 (en) 2012-05-02
US20090026657A1 (en) 2009-01-29
CN101772733B (zh) 2013-09-18
WO2009014655A1 (en) 2009-01-29
EP2171537A4 (en) 2010-08-04
MY150368A (en) 2013-12-31
EP2171537A1 (en) 2010-04-07
JP4791597B2 (ja) 2011-10-12
CN101772733A (zh) 2010-07-07

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