MY150368A - Alignment system and method for a substrate in a nano-imprint process - Google Patents

Alignment system and method for a substrate in a nano-imprint process

Info

Publication number
MY150368A
MY150368A MYPI2010000239A MYPI20100239A MY150368A MY 150368 A MY150368 A MY 150368A MY PI2010000239 A MYPI2010000239 A MY PI2010000239A MY PI20100239 A MYPI20100239 A MY PI20100239A MY 150368 A MY150368 A MY 150368A
Authority
MY
Malaysia
Prior art keywords
substrate
gratings
template mold
respect
tool coordinates
Prior art date
Application number
MYPI2010000239A
Other languages
English (en)
Inventor
Pawan K Nimmakayala
Choi Byung-Jin
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Publication of MY150368A publication Critical patent/MY150368A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0277—Electrolithographic processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Multimedia (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
MYPI2010000239A 2007-07-20 2008-07-18 Alignment system and method for a substrate in a nano-imprint process MY150368A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US95100207P 2007-07-20 2007-07-20
US12/175,258 US7837907B2 (en) 2007-07-20 2008-07-17 Alignment system and method for a substrate in a nano-imprint process

Publications (1)

Publication Number Publication Date
MY150368A true MY150368A (en) 2013-12-31

Family

ID=40281655

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2010000239A MY150368A (en) 2007-07-20 2008-07-18 Alignment system and method for a substrate in a nano-imprint process

Country Status (8)

Country Link
US (2) US7837907B2 (cg-RX-API-DMAC7.html)
EP (1) EP2171537B1 (cg-RX-API-DMAC7.html)
JP (1) JP4791597B2 (cg-RX-API-DMAC7.html)
KR (1) KR101487301B1 (cg-RX-API-DMAC7.html)
CN (1) CN101772733B (cg-RX-API-DMAC7.html)
AT (1) ATE556357T1 (cg-RX-API-DMAC7.html)
MY (1) MY150368A (cg-RX-API-DMAC7.html)
WO (1) WO2009014655A1 (cg-RX-API-DMAC7.html)

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Also Published As

Publication number Publication date
US20110026039A1 (en) 2011-02-03
ATE556357T1 (de) 2012-05-15
US8147731B2 (en) 2012-04-03
KR20100050462A (ko) 2010-05-13
JP2010534406A (ja) 2010-11-04
KR101487301B1 (ko) 2015-01-28
US7837907B2 (en) 2010-11-23
EP2171537B1 (en) 2012-05-02
US20090026657A1 (en) 2009-01-29
CN101772733B (zh) 2013-09-18
WO2009014655A1 (en) 2009-01-29
EP2171537A4 (en) 2010-08-04
EP2171537A1 (en) 2010-04-07
JP4791597B2 (ja) 2011-10-12
CN101772733A (zh) 2010-07-07

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