ATE451823T1 - Plasmaerzeugungselektrodenbaugruppe - Google Patents
PlasmaerzeugungselektrodenbaugruppeInfo
- Publication number
- ATE451823T1 ATE451823T1 AT04705817T AT04705817T ATE451823T1 AT E451823 T1 ATE451823 T1 AT E451823T1 AT 04705817 T AT04705817 T AT 04705817T AT 04705817 T AT04705817 T AT 04705817T AT E451823 T1 ATE451823 T1 AT E451823T1
- Authority
- AT
- Austria
- Prior art keywords
- electrodes
- electrode assembly
- plasma generation
- generation electrode
- housing
- Prior art date
Links
- 230000004888 barrier function Effects 0.000 abstract 1
- 239000004020 conductor Substances 0.000 abstract 1
- 239000003989 dielectric material Substances 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 239000002243 precursor Substances 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
- H05H1/246—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated using external electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/4697—Generating plasma using glow discharges
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Fluid Mechanics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
- Ceramic Capacitors (AREA)
- Secondary Cells (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB0302265A GB0302265D0 (en) | 2003-01-31 | 2003-01-31 | Plasma generating electrode assembly |
| GB0304094A GB0304094D0 (en) | 2003-02-24 | 2003-02-24 | Plasma generating electrode assembly |
| PCT/EP2004/001756 WO2004068916A1 (en) | 2003-01-31 | 2004-01-28 | Plasma generating electrode assembly |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE451823T1 true ATE451823T1 (de) | 2009-12-15 |
Family
ID=32827039
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT04705817T ATE451823T1 (de) | 2003-01-31 | 2004-01-28 | Plasmaerzeugungselektrodenbaugruppe |
Country Status (13)
| Country | Link |
|---|---|
| US (2) | US20060196424A1 (de) |
| EP (1) | EP1588592B1 (de) |
| JP (1) | JP2006515708A (de) |
| KR (1) | KR101072792B1 (de) |
| AT (1) | ATE451823T1 (de) |
| BR (1) | BRPI0407155A (de) |
| CA (1) | CA2513327A1 (de) |
| DE (1) | DE602004024500D1 (de) |
| EA (1) | EA010388B1 (de) |
| ES (1) | ES2336329T3 (de) |
| MX (1) | MXPA05008024A (de) |
| TW (1) | TW200423824A (de) |
| WO (1) | WO2004068916A1 (de) |
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| US8764978B2 (en) | 2001-07-16 | 2014-07-01 | Foret Plasma Labs, Llc | System for treating a substance with wave energy from an electrical arc and a second source |
| US7893182B2 (en) | 2003-10-15 | 2011-02-22 | Dow Corning Corporation | Manufacture of resins |
| US7573202B2 (en) * | 2004-10-04 | 2009-08-11 | The Board Of Trustees Of The University Of Illinois | Metal/dielectric multilayer microdischarge devices and arrays |
| GB0423685D0 (en) | 2004-10-26 | 2004-11-24 | Dow Corning Ireland Ltd | Improved method for coating a substrate |
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| DE102005001158B4 (de) * | 2005-01-10 | 2016-11-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Barrierenentladungselektroden mit Kühlung und Vorrichtung mit einer solchen Barrierenentladungselektrode |
| US7477017B2 (en) | 2005-01-25 | 2009-01-13 | The Board Of Trustees Of The University Of Illinois | AC-excited microcavity discharge device and method |
| KR100909750B1 (ko) * | 2005-03-01 | 2009-07-29 | 가부시키가이샤 히다치 고쿠사이 덴키 | 기판 처리 장치 및 반도체 디바이스의 제조 방법 |
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| US9516736B2 (en) | 2007-10-16 | 2016-12-06 | Foret Plasma Labs, Llc | System, method and apparatus for recovering mining fluids from mining byproducts |
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| US9761413B2 (en) | 2007-10-16 | 2017-09-12 | Foret Plasma Labs, Llc | High temperature electrolysis glow discharge device |
| US9445488B2 (en) | 2007-10-16 | 2016-09-13 | Foret Plasma Labs, Llc | Plasma whirl reactor apparatus and methods of use |
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| EP1101389B1 (de) * | 1998-07-08 | 2008-09-24 | Infineon Technologies AG | Verfahren zur herstellung einer integrierten schaltungsanordnung umfassend einen hohlraum in einer materialschicht, sowie eine durch das verfahren erzeugte integrierte schaltungsanordnung |
| RU2159520C1 (ru) * | 1999-04-30 | 2000-11-20 | Камский политехнический институт | Плазмотрон с жидкими электродами (варианты) |
| JP2001035835A (ja) | 1999-07-16 | 2001-02-09 | Sachiko Okazaki | プラズマ処理方法及びプラズマ処理装置 |
| EP1073091A3 (de) * | 1999-07-27 | 2004-10-06 | Matsushita Electric Works, Ltd. | Elektrode für Plasmaerzeugung, Anwendung dieser Elektrode in einem Plasmabehandlungsgerät, und Plasmabehandlung mittels dieses Gerätes |
| GB9928781D0 (en) | 1999-12-02 | 2000-02-02 | Dow Corning | Surface treatment |
| EP1153399A1 (de) * | 1999-12-08 | 2001-11-14 | Koninklijke Philips Electronics N.V. | Röntgenstrahlungsvorrichtung mit filter, welcher filtereinheiten mit regelbarer röntgenstrahlungsabsorption enthält, sowie röntgenstrahlungsabsorptionssensor |
| JP5165825B2 (ja) * | 2000-01-10 | 2013-03-21 | 東京エレクトロン株式会社 | 分割された電極集合体並びにプラズマ処理方法。 |
| US6232723B1 (en) * | 2000-02-09 | 2001-05-15 | Igor Alexeff | Direct current energy discharge system |
| DE60132089T2 (de) * | 2000-05-29 | 2008-12-11 | ADTEC Plasma Technology Co., Ltd., Fukuyama City | Vorrichtung zur behandlung von gasen miitels plasma |
| ATE257412T1 (de) * | 2000-10-04 | 2004-01-15 | Dow Corning Ireland Ltd | Verfahren und vorrichtung zur herstellung einer beschichtung |
| MXPA03003661A (es) | 2000-10-26 | 2005-01-25 | Dow Corning Ireland Ltd | Montaje de plasma a presion atmosferica. |
| CN1180151C (zh) | 2001-04-10 | 2004-12-15 | 中国科学院化学研究所 | 羊毛纤维制品的防缩处理方法 |
| JP3641608B2 (ja) * | 2001-11-22 | 2005-04-27 | 東芝三菱電機産業システム株式会社 | オゾン発生器 |
| GB0208261D0 (en) | 2002-04-10 | 2002-05-22 | Dow Corning | An atmospheric pressure plasma assembly |
-
2004
- 2004-01-28 AT AT04705817T patent/ATE451823T1/de not_active IP Right Cessation
- 2004-01-28 JP JP2005518665A patent/JP2006515708A/ja active Pending
- 2004-01-28 US US10/543,715 patent/US20060196424A1/en not_active Abandoned
- 2004-01-28 BR BR0407155-7A patent/BRPI0407155A/pt not_active Application Discontinuation
- 2004-01-28 WO PCT/EP2004/001756 patent/WO2004068916A1/en not_active Ceased
- 2004-01-28 CA CA002513327A patent/CA2513327A1/en not_active Abandoned
- 2004-01-28 KR KR1020057013543A patent/KR101072792B1/ko not_active Expired - Fee Related
- 2004-01-28 EP EP04705817A patent/EP1588592B1/de not_active Expired - Lifetime
- 2004-01-28 DE DE602004024500T patent/DE602004024500D1/de not_active Expired - Lifetime
- 2004-01-28 ES ES04705817T patent/ES2336329T3/es not_active Expired - Lifetime
- 2004-01-28 EA EA200501210A patent/EA010388B1/ru not_active IP Right Cessation
- 2004-01-28 MX MXPA05008024A patent/MXPA05008024A/es not_active Application Discontinuation
- 2004-01-30 TW TW093102189A patent/TW200423824A/zh unknown
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2008
- 2008-11-20 US US12/274,984 patent/US7892611B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| BRPI0407155A (pt) | 2006-02-07 |
| CA2513327A1 (en) | 2004-08-12 |
| MXPA05008024A (es) | 2006-01-27 |
| US7892611B2 (en) | 2011-02-22 |
| WO2004068916A1 (en) | 2004-08-12 |
| TW200423824A (en) | 2004-11-01 |
| EP1588592B1 (de) | 2009-12-09 |
| KR20050103201A (ko) | 2005-10-27 |
| KR101072792B1 (ko) | 2011-10-14 |
| ES2336329T3 (es) | 2010-04-12 |
| EP1588592A1 (de) | 2005-10-26 |
| JP2006515708A (ja) | 2006-06-01 |
| US20060196424A1 (en) | 2006-09-07 |
| US20110006039A1 (en) | 2011-01-13 |
| EA200501210A1 (ru) | 2005-12-29 |
| DE602004024500D1 (de) | 2010-01-21 |
| EA010388B1 (ru) | 2008-08-29 |
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