US20060196424A1 - Plasma generating electrode assembly - Google Patents

Plasma generating electrode assembly Download PDF

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Publication number
US20060196424A1
US20060196424A1 US10/543,715 US54371505A US2006196424A1 US 20060196424 A1 US20060196424 A1 US 20060196424A1 US 54371505 A US54371505 A US 54371505A US 2006196424 A1 US2006196424 A1 US 2006196424A1
Authority
US
United States
Prior art keywords
plasma
electrodes
assembly
electrode
accordance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US10/543,715
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English (en)
Inventor
Frank Swallow
Peter Dobbyn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Corning Ireland Ltd
Original Assignee
Dow Corning Ireland Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB0302265A external-priority patent/GB0302265D0/en
Priority claimed from GB0304094A external-priority patent/GB0304094D0/en
Application filed by Dow Corning Ireland Ltd filed Critical Dow Corning Ireland Ltd
Assigned to DOW CORNING IRELAND LIMITED reassignment DOW CORNING IRELAND LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: DOBBYN, PETER, SWALLOW, FRANK
Publication of US20060196424A1 publication Critical patent/US20060196424A1/en
Priority to US12/274,984 priority Critical patent/US7892611B2/en
Abandoned legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • H05H1/246—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated using external electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/4697—Generating plasma using glow discharges

Definitions

  • the dielectric materials used in accordance with the present invention may be made from any suitable dielectric, examples include but are not restricted to polycarbonate, polyethylene, glass, glass laminates, epoxy filled glass laminates and the like.
  • the dielectric has sufficient strength in order to prevent any bowing or disfigurement of the dielectric by the conductive material in the electrode.
  • the dielectric used is machinable and is provided at a thickness of up to 50 mm in thickness, more preferably up to 40 mm thickness and most preferably 15 to 30 mm thickness. In instances where the selected dielectric is not sufficiently transparent, a glass or the like window may be utilized to enable diagnostic viewing of the generated plasma.
  • a major advantage of the present invention is conformity, by using a liquid/paste to ensure a constant and intimate contact/adherence thereof to the interfaces with the inner and outer walls of the electrode. Whilst contact/adherence may be obtained by the use of a flowable medium such as a liquid or paste, it may also be obtained by physical adhesion to both the surfaces of the inner and outer walls of the electrode by a conductive medium that can absorb mechanical and thermal stresses at those surfaces that would lead to de-lamination. As such, an adhesive elastomer with both thermal and electrically conductive properties could be used as the medium between the surfaces of the inner and outer walls of the electrode.
  • the path length of the plasma zone caused by the introduction the support ribs may be readily altered and optimised.
  • a single plasma assembly may be utilised with a means for varying the materials passing through the plasma zone formed between the electrodes.
  • the only substance passing through the plasma zone might be the process gas such as helium which is excited by the application of the potential between the electrodes to form a plasma zone.
  • the resulting helium plasma may be utilised to clean and/or activate the substrate which is passed through or relative to the plasma zone.
  • one or more coating forming precursor material(s) may be introduced and are excited by passing through the plasma zone and treating the substrate.
  • the substrate to be coated may comprise any material, sufficiently flexible to be transported through the assembly as hereinbefore described, for example plastics for example thermoplastics such as polyolefins e.g. polyethylene, and polypropylene, polycarbonates, polyurethanes, polyvinyl chloride, polyesters (for example polyalkylene terephthalates, particularly polyethylene terephthalate), polymethacrylates (for example polymethylmethacrylate and polymers of hydroxyethylmethacrylate), polyepoxides, polysulphones, polyphenylenes, polyetherketones, polyimides, polyamides, polystyrenes, polydimethylsiloxanes, phenolic, epoxy and melamine-formaldehyde resins, and blends and copolymers thereof.
  • plastics for example thermoplastics such as polyolefins e.g. polyethylene, and polypropylene, polycarbonates, polyurethanes, polyvinyl chloride, polyesters
  • Substrates which may be treated by an assembly in accordance with the present invention may be in the form of synthetic and/or natural fibres, woven or non-woven fibres, powder, siloxane, fabrics, woven or non-woven fibres, natural fibres, synthetic fibres cellulosic material and powder or a blend of an organic polymeric material and a organosilicon-containing additive which is miscible or substantially non-miscible with the organic polymeric material as described in the applicants co-pending patent application WO 01/40359.
  • the dimensions of the substrate are limited by the dimensions of the volume within which the atmospheric pressure plasma discharge is generated, i.e. the distance between the inner walls of the electrodes in accordance with the present invention. For typical plasma generating apparatus, the plasma is generated within a gap of from 3 to 50 mm, for example 5 to 25 mm.
  • the present invention has particular utility for coating films, fibres and powders.
  • FIG. 11 is a view of an assembly of the present invention for treating a substrate passing between pairs of electrodes.
  • FIG. 12 is a graph showing that the plasma produced is of a glow discharge type.
  • Electrode 2 is a composite electrode with a metallic plate 6 a , and conductive liquid 11 forming a composite electrode.
  • plate 6 a forms a constraining surface for the conductive liquid in chamber 11 and is designed so as to provide structural integrity to the electrode assembly 2 .
  • FIG. 5 a shows an electrode assembly where the electrically conductive liquid previously used is replaced by an electrically and thermally conductive paste 40 in chamber 11 which affects both a homogeneous electric field and the efficient transport of heat from the inner wall 5 to the cooled plate 6 a having cooling fins or the like 30 .
  • FIG. 5 b shows an electrode assembly using a one piece dielectric 67 , having a chamber 11 b , which has been engineered out of the body of the dielectric 67 .
  • the dielectric is adapted to receive plate 6 a having cooling fins 30 and encase the electrically conductive liquid.
  • the dielectric material is hollowed out, with or without support ribs 15 which when present are formed by leaving un-hollowed sections.
  • the need for the hollowed out chamber 11 b can be avoided by replacing the conductive liquid with a suitable cured or uncured layer of electrically conductive paste 62 which is position between inner wall 5 and plate 6 a .
  • the paste can remain uncured, but preferably is cured to improve adhesion to both plate 6 a and dielectric 61 .
  • plate 6 a is either cooled by air or chilled liquid.
  • the electrical potential is applied to metallic plate 6 a and dispersed evenly to the rear face of the inner wall 5 through the conductive liquid and paste respectively in chamber 11 .
  • the conductive liquid is encased within the internal and external regions of a double concentric pipe arrangement as seen in FIGS. 6 and 7 , wherein the gap between outer pipe 32 and the inner pipe 34 forms a plasma zone 36 which in use is generated between the pipes.
  • This embodiment may be utilised to treat materials such as, gases, liquid aerosols, powders, fibres, flake, foams etc. that can be transported through such concentric pipe arrangements for plasma treatment.
  • the pipe may for example be utilized in a substantially vertical position as seen in FIG. 7 .
  • a cooling liquid may be passed into, through and out of inner pipe 34 by way of inlet 3 a and outlet 4 a and an outer cooling coil 25 a may be utilized to at least substantially surround outer pipe 32 to remove heat generated by effecting the plasma.
  • plasma zone 160 generates a coating for the substrate by means of the introduction of a reactive precursor.
  • the reactive precursor may comprise gaseous, liquid and/or solid coating making material, but are preferably liquid and solid coating making materials introduced in a liquid or solid form through nebuliser 174 .
  • An important aspect of the fact that the reactive agent being coated is a liquid or solid is that said atomised liquid or solid travels under gravity through plasma zone 160 and is kept separate from plasma zone 125 and as such no coating occurs in plasma zone 125 .
  • the substrate to be coated then passes through plasma zone 160 and is coated and transported over roller 172 and is subsequently collected or further treated with, for example, additional plasma treatments.
  • Dielectric barrier discharges exist as either filamentary or glow discharges. Filamentary discharges occur when local non-uniformities in either electric field potential or charge densities cause the ionisation of the gas to become localized and lead to a highly concentrated current discharge over a very short time span (in the region of approximately 2-5 nanoseconds duration). These types of discharges can produce non-uniform coatings or damage the substrates due to the locally intense nature of the filamentary discharges.
  • the choice of electrodes in accordance with the present invention in combination with suitable electrode geometries, gas compositions and power/frequency conditions ensure that atmospheric pressure dielectric barrier discharges can occur in glow discharge modes where the plasma is formed uniformly across the width of the electrodes. This leads to a current discharge which is much longer than the filamentary discharge with a duration of 2-10 microseconds which results in the formation of significantly more uniform coatings.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Fluid Mechanics (AREA)
  • Electromagnetism (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Secondary Cells (AREA)
  • Ceramic Capacitors (AREA)
  • Chemical Vapour Deposition (AREA)
US10/543,715 2003-01-31 2004-01-28 Plasma generating electrode assembly Abandoned US20060196424A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/274,984 US7892611B2 (en) 2003-01-31 2008-11-20 Plasma generating electrode assembly

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
GB0302265A GB0302265D0 (en) 2003-01-31 2003-01-31 Plasma generating electrode assembly
GBGB0302265.4 2003-01-31
GBGB0304094.6 2003-02-24
GB0304094A GB0304094D0 (en) 2003-02-24 2003-02-24 Plasma generating electrode assembly
PCT/EP2004/001756 WO2004068916A1 (en) 2003-01-31 2004-01-28 Plasma generating electrode assembly

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/274,984 Division US7892611B2 (en) 2003-01-31 2008-11-20 Plasma generating electrode assembly

Publications (1)

Publication Number Publication Date
US20060196424A1 true US20060196424A1 (en) 2006-09-07

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Family Applications (2)

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US10/543,715 Abandoned US20060196424A1 (en) 2003-01-31 2004-01-28 Plasma generating electrode assembly
US12/274,984 Expired - Fee Related US7892611B2 (en) 2003-01-31 2008-11-20 Plasma generating electrode assembly

Family Applications After (1)

Application Number Title Priority Date Filing Date
US12/274,984 Expired - Fee Related US7892611B2 (en) 2003-01-31 2008-11-20 Plasma generating electrode assembly

Country Status (13)

Country Link
US (2) US20060196424A1 (de)
EP (1) EP1588592B1 (de)
JP (1) JP2006515708A (de)
KR (1) KR101072792B1 (de)
AT (1) ATE451823T1 (de)
BR (1) BRPI0407155A (de)
CA (1) CA2513327A1 (de)
DE (1) DE602004024500D1 (de)
EA (1) EA010388B1 (de)
ES (1) ES2336329T3 (de)
MX (1) MXPA05008024A (de)
TW (1) TW200423824A (de)
WO (1) WO2004068916A1 (de)

Cited By (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060082319A1 (en) * 2004-10-04 2006-04-20 Eden J Gary Metal/dielectric multilayer microdischarge devices and arrays
US20070163503A1 (en) * 2006-01-17 2007-07-19 Mitsubishi Heavy Industries, Ltd. Thin film preparation apparatus
WO2008054246A1 (fr) * 2006-10-18 2008-05-08 Egor Mihailovich Mandrik Tête de générateur de plasma gazeux analytique
US7477017B2 (en) 2005-01-25 2009-01-13 The Board Of Trustees Of The University Of Illinois AC-excited microcavity discharge device and method
US20090200032A1 (en) * 2007-10-16 2009-08-13 Foret Plasma Labs, Llc System, method and apparatus for creating an electrical glow discharge
US20100175987A1 (en) * 2006-12-28 2010-07-15 Nederlandse Organisatie Voor Toegepast- Natuurwetenschappelijk Onderzoek Tno A surface dielectric barrier discharge plasma unit and a method of generating a surface plasma
US20100193129A1 (en) * 2007-08-31 2010-08-05 Yoichiro Tabata Apparatus for generating dielectric barrier discharge gas
US20110108195A1 (en) * 2008-07-04 2011-05-12 Tokyo Electron Limited Temperature adjusting mechanism and semiconductor manufacturing Appratus using temperature adjusting mechanism
WO2011134978A1 (fr) 2010-04-30 2011-11-03 Agc Glass Europe Electrode pour procede plasma dbd
US8278810B2 (en) 2007-10-16 2012-10-02 Foret Plasma Labs, Llc Solid oxide high temperature electrolysis glow discharge cell
CN102914567A (zh) * 2011-08-05 2013-02-06 中国科学院寒区旱区环境与工程研究所 多路沙地水分动态监测仪
US20140110059A1 (en) * 2012-10-19 2014-04-24 Hefei Boe Optoelectronics Technology Co., Ltd. Atmospheric-pressure plasma processing apparatus for substrates
US20140174540A1 (en) * 2012-12-21 2014-06-26 Intermolecular, Inc. ALD Process Window Combinatorial Screening Tool
US8785808B2 (en) 2001-07-16 2014-07-22 Foret Plasma Labs, Llc Plasma whirl reactor apparatus and methods of use
US8810122B2 (en) 2007-10-16 2014-08-19 Foret Plasma Labs, Llc Plasma arc torch having multiple operating modes
US8833054B2 (en) 2008-02-12 2014-09-16 Foret Plasma Labs, Llc System, method and apparatus for lean combustion with plasma from an electrical arc
US8904749B2 (en) 2008-02-12 2014-12-09 Foret Plasma Labs, Llc Inductively coupled plasma arc device
US20150022075A1 (en) * 2013-07-22 2015-01-22 Anderson Remplex, Inc. Dielectric Barrier Discharge Apparatus
US9114373B2 (en) 2011-11-11 2015-08-25 Saga University Plasma generation device
US9185787B2 (en) 2007-10-16 2015-11-10 Foret Plasma Labs, Llc High temperature electrolysis glow discharge device
US9230777B2 (en) 2007-10-16 2016-01-05 Foret Plasma Labs, Llc Water/wastewater recycle and reuse with plasma, activated carbon and energy system
US9445488B2 (en) 2007-10-16 2016-09-13 Foret Plasma Labs, Llc Plasma whirl reactor apparatus and methods of use
US9499443B2 (en) 2012-12-11 2016-11-22 Foret Plasma Labs, Llc Apparatus and method for sintering proppants
EP3096699A1 (de) * 2014-01-23 2016-11-30 Linde Aktiengesellschaft Nichtthermisches plasma
US9516736B2 (en) 2007-10-16 2016-12-06 Foret Plasma Labs, Llc System, method and apparatus for recovering mining fluids from mining byproducts
US9560731B2 (en) 2007-10-16 2017-01-31 Foret Plasma Labs, Llc System, method and apparatus for an inductively coupled plasma Arc Whirl filter press
JP2017509099A (ja) * 2013-12-19 2017-03-30 マサリコバ ウニベルシタＭａｓａｒｙｋｏｖａ Ｕｎｉｖｅｒｚｉｔａ 中空非導電体の内面及び／または外面のプラズマ処理の方法及び装置
US9699879B2 (en) 2013-03-12 2017-07-04 Foret Plasma Labs, Llc Apparatus and method for sintering proppants
US9761413B2 (en) 2007-10-16 2017-09-12 Foret Plasma Labs, Llc High temperature electrolysis glow discharge device
US10244614B2 (en) 2008-02-12 2019-03-26 Foret Plasma Labs, Llc System, method and apparatus for plasma arc welding ceramics and sapphire
US10267106B2 (en) 2007-10-16 2019-04-23 Foret Plasma Labs, Llc System, method and apparatus for treating mining byproducts
US10265116B2 (en) 2009-08-25 2019-04-23 Leibniz-Institut Fuer Plasmaforschung Und Technologie E.V Device for the planar treatment of areas of human or animal skin or mucous membrane surfaces by means of a cold atmospheric pressure plasma
US10368557B2 (en) 2001-07-16 2019-08-06 Foret Plasma Labs, Llc Apparatus for treating a substance with wave energy from an electrical arc and a second source
CN111199890A (zh) * 2018-11-20 2020-05-26 细美事有限公司 接合装置及接合方法
US10669653B2 (en) * 2015-06-18 2020-06-02 Kevin Kremeyer Directed energy deposition to facilitate high speed applications
US10818571B2 (en) * 2018-11-19 2020-10-27 Delta Electronics (Shanghai) Co., Ltd. Packaging structure for power module
CN111876751A (zh) * 2015-02-18 2020-11-03 株式会社尼康 电子器件制造装置及方法、半导体装置和显示器
US10827598B2 (en) * 2017-08-16 2020-11-03 DBD Plasma GmbH Plasma generator module
CN113560150A (zh) * 2021-07-15 2021-10-29 南京工业大学 一种用于农膜材料防尘涂层沉积的等离子体改性装置
US20220316132A1 (en) * 2021-04-01 2022-10-06 Saudi Arabian Oil Company Systems and methods for the functionalization of polyolefin fibers
CN115475498A (zh) * 2022-08-25 2022-12-16 大连海事大学 一种船舶废气等离子体脱除装置的余热回收系统
US11806686B2 (en) 2007-10-16 2023-11-07 Foret Plasma Labs, Llc System, method and apparatus for creating an electrical glow discharge

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7893182B2 (en) 2003-10-15 2011-02-22 Dow Corning Corporation Manufacture of resins
GB0423685D0 (en) 2004-10-26 2004-11-24 Dow Corning Ireland Ltd Improved method for coating a substrate
EP1808056B1 (de) * 2004-11-05 2015-08-26 Dow Corning Ireland Limited Plasmaprozess
DE102005001158B4 (de) * 2005-01-10 2016-11-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Barrierenentladungselektroden mit Kühlung und Vorrichtung mit einer solchen Barrierenentladungselektrode
WO2006093136A1 (ja) * 2005-03-01 2006-09-08 Hitachi Kokusai Electric Inc. 基板処理装置および半導体デバイスの製造方法
JP5017906B2 (ja) * 2005-04-19 2012-09-05 東洋製罐株式会社 プラズマｃｖｄ用マイクロ波供給装置及び該マイクロ波供給装置を備えた蒸着膜形成装置
JP2007199091A (ja) * 2006-01-20 2007-08-09 Toppan Printing Co Ltd カラーフィルタの製造方法及びカラーフィルタ
JP4942360B2 (ja) * 2006-02-20 2012-05-30 積水化学工業株式会社 プラズマ処理装置の電極構造
JP2007257962A (ja) * 2006-03-22 2007-10-04 Sekisui Chem Co Ltd 放電処理装置および放電処理方法
WO2007128947A1 (en) 2006-05-02 2007-11-15 Dow Corning Ireland Limited Fluid replacement system
KR101244674B1 (ko) 2006-05-02 2013-03-25 다우 코닝 아일랜드 리미티드 웹 밀봉 장치
KR100675752B1 (ko) * 2006-09-14 2007-01-30 (주) 씨엠테크 플라즈마 반응기
EP2074644A1 (de) * 2006-10-03 2009-07-01 Dow Global Technologies Inc. Verbesserte plasmaelektrode
DE102006060932A1 (de) 2006-12-20 2008-07-03 Carl Freudenberg Kg Temperaturstabile plasmabehandelte Gebilde und Verfahren zu deren Herstellung
ITMI20070350A1 (it) * 2007-02-23 2008-08-24 Univ Milano Bicocca Metodo di lavorazine a plasma atmosferico per il trattamento dei materiali
US20120003397A1 (en) * 2007-08-14 2012-01-05 Universite Libre De Bruxelles Method for depositing nanoparticles on a support
GB0717430D0 (en) * 2007-09-10 2007-10-24 Dow Corning Ireland Ltd Atmospheric pressure plasma
NL1036272A1 (nl) * 2007-12-19 2009-06-22 Asml Netherlands Bv Radiation source, lithographic apparatus and device manufacturing method.
DE102010001606A1 (de) * 2010-02-04 2011-08-04 Laser-Laboratorium Göttingen eV, 37077 Hohltrichterförmiger Plasmagenerator
WO2011139128A2 (ko) * 2010-05-07 2011-11-10 나노세미콘(주) 웨이퍼 처리를 위한 다중 플라즈마 발생 장치
KR101101364B1 (ko) * 2010-05-07 2012-01-02 유정호 웨이퍼 처리를 위한 다중 플라즈마 발생 장치
KR101022538B1 (ko) * 2010-07-02 2011-03-16 광주과학기술원 플라즈마 발생장치 및 이를 구비하는 플라즈마 분광분석장치
US9090492B2 (en) 2011-02-18 2015-07-28 Sealite Engineering, Inc. Microchlorine generation for anti-biofouling
RU2465747C1 (ru) * 2011-05-26 2012-10-27 Государственное учебно-научное учреждение Физический факультет Московского государственного университета имени М.В. Ломоносова Полимерный гаситель самостоятельного дугового разряда с металлическими электродами при электровзрыве проволочки
JP5795065B2 (ja) * 2011-06-16 2015-10-14 京セラ株式会社 プラズマ発生体及びプラズマ発生装置
TWI607809B (zh) 2011-10-12 2017-12-11 1366科技公司 用於將抗蝕劑薄層沉積於基材上之裝置及方法
CN102361531B (zh) * 2011-10-26 2013-07-03 西安电子科技大学 大面积均匀非磁化等离子体产生装置及方法
KR101337047B1 (ko) 2012-01-11 2013-12-06 강원대학교산학협력단 상압 플라즈마 장치
GB2501933A (en) * 2012-05-09 2013-11-13 Linde Ag device for providing a flow of non-thermal plasma
DE112013002561T5 (de) * 2012-05-18 2015-02-19 Rave N.P., Inc. Vorrichtung und Verfahren zur Entfernung von Verunreinigungen
US9408287B2 (en) 2012-11-27 2016-08-02 General Electric Company System and method for controlling plasma induced flow
KR101462765B1 (ko) * 2013-03-08 2014-11-21 성균관대학교산학협력단 패턴화된 세포 배양용 기판의 제조방법, 패턴화된 세포 배양용 기판 및 세포칩
TWI486996B (zh) 2013-12-04 2015-06-01 Ind Tech Res Inst 電漿裝置及電漿裝置的操作方法
US20170072628A1 (en) * 2014-05-28 2017-03-16 Drexel University Nozzle for selectively generating either plasma or ultraviolet radiation
JP6584787B2 (ja) * 2015-02-13 2019-10-02 株式会社日立ハイテクノロジーズ プラズマイオン源および荷電粒子ビーム装置
RU2601335C1 (ru) * 2015-07-06 2016-11-10 Федеральное государственное бюджетное учреждение науки Институт физики твердого тела Российской академии наук (ИФТТ РАН) Способ нанесения массивов углеродных нанотрубок на металлические подложки
SG11201906540WA (en) 2017-01-19 2019-08-27 Open Monoclonal Tech Inc Human antibodies from transgenic rodents with multiple heavy chain immunoglobulin loci
CN111052873B (zh) * 2017-09-06 2022-10-28 东芝三菱电机产业系统株式会社 活性气体生成装置
CN108347868A (zh) * 2018-04-26 2018-07-31 苏州工业职业技术学院 一种电力电子管路结构
EP3565386A1 (de) * 2018-04-30 2019-11-06 Universiteit Gent Verfahren zur plasmapulverbehandlung und -beschichtung
KR102123734B1 (ko) * 2018-08-20 2020-06-17 광운대학교 산학협력단 플라즈마 소스
EP3900495A4 (de) * 2018-12-20 2022-09-21 Mécanique Analytique Inc. Elektrodenanordnungen für plasmaentladungsvorrichtungen
DE102020104533B4 (de) 2020-02-20 2022-03-24 Bernd Deutsch Fluidbehandlungsvorrichtung, Elektrodengitter dafür und Baueinheit aus einer Mehrzahl solcher Elektrodengitter
JP7516700B2 (ja) 2020-06-10 2024-07-17 サカタインクス株式会社 プラズマ含有ガス製造装置
TWI780758B (zh) * 2021-06-09 2022-10-11 國立中山大學 電漿處理裝置及其方法

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3899685A (en) * 1972-03-23 1975-08-12 Electricity Council Ozonisers
US4130490A (en) * 1977-05-23 1978-12-19 Lovelace Alan M Administrator Electric discharge for treatment of trace contaminants
US4813488A (en) * 1986-04-02 1989-03-21 Franz Plasser Bahnbaumaschinen-Industriegesellschaft M.B.H. Ballast cleaning machine
US4834948A (en) * 1986-07-10 1989-05-30 E. M. Heinkel K.G. Device for enriching a fluid with ozone
US4976098A (en) * 1988-01-30 1990-12-11 Rieter Machine Works, Ltd. Method and apparatus for dissipating heat from a textile machine
US4999136A (en) * 1988-08-23 1991-03-12 Westinghouse Electric Corp. Ultraviolet curable conductive resin
US5185132A (en) * 1989-12-07 1993-02-09 Research Development Corporation Of Japan Atomspheric plasma reaction method and apparatus therefor
US5387775A (en) * 1993-03-31 1995-02-07 The United States Of America As Represented By The United States Department Of Energy Apparatus for the plasma destruction of hazardous gases
US5820541A (en) * 1994-11-15 1998-10-13 Biozon, S.L. Process, formula and installation for the treatment and sterilization of biological, solid, liquid, ferrous metallic, non-ferrous metallic, toxic and dangerous hospital waste material
US6232723B1 (en) * 2000-02-09 2001-05-15 Igor Alexeff Direct current energy discharge system
US20010005032A1 (en) * 1998-07-08 2001-06-28 Robert Aigner Method for producing a filled recess in a material layer, and an integrated circuit configuration produced by the method
US20010024486A1 (en) * 1999-12-08 2001-09-27 Herbert Brian Kenneth X-ray apparatus with filter comprising filter elements with adjustable X-ray absorption and X-ray absorption sensor
US6489585B1 (en) * 1999-07-27 2002-12-03 Matsushita Electric Works, Ltd. Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus
US20030095898A1 (en) * 2001-11-22 2003-05-22 Mitsubishi Denki Kabushiki Kaisha Ozonizer

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3707024A (en) * 1971-03-31 1972-12-26 Us Agriculture Method for electrostatically bulking and impregnating staple yarns
JPS6398958A (ja) * 1986-10-15 1988-04-30 Sanyo Electric Co Ltd 二次電池
JPH03188285A (ja) 1989-12-15 1991-08-16 Oki Electric Ind Co Ltd ドライエッチング装置
CN1026186C (zh) 1990-09-27 1994-10-12 机械电子工业部第四十九研究所 一种制作介质薄膜的方法
US5478429A (en) * 1993-01-20 1995-12-26 Tokyo Electron Limited Plasma process apparatus
US5414324A (en) 1993-05-28 1995-05-09 The University Of Tennessee Research Corporation One atmosphere, uniform glow discharge plasma
JP3341179B2 (ja) 1994-01-31 2002-11-05 イーシー化学株式会社 大気圧グロ−放電用電極及び該電極を使用したプラズマ処理方法
JP3806847B2 (ja) 1995-11-24 2006-08-09 イーシー化学株式会社 大気圧グロー放電プラズマによる粉体の処理方法及び装置
JPH1131608A (ja) 1997-07-10 1999-02-02 Hitachi Cable Ltd 保護抵抗
RU2159520C1 (ru) * 1999-04-30 2000-11-20 Камский политехнический институт Плазмотрон с жидкими электродами (варианты)
JP2001035835A (ja) 1999-07-16 2001-02-09 Sachiko Okazaki プラズマ処理方法及びプラズマ処理装置
GB9928781D0 (en) 1999-12-02 2000-02-02 Dow Corning Surface treatment
WO2001052302A1 (en) * 2000-01-10 2001-07-19 Tokyo Electron Limited Segmented electrode assembly and method for plasma processing
WO2001091896A1 (fr) * 2000-05-29 2001-12-06 Three Tec Co., Ltd. Appareil de traitement d'objets et dispositif a plasma dote de cet appareil
KR100823858B1 (ko) * 2000-10-04 2008-04-21 다우 코닝 아일랜드 리미티드 피복물 형성 방법 및 피복물 형성 장치
CN1466771A (zh) 2000-10-26 2004-01-07 陶氏康宁爱尔兰有限公司 大气压等离子体组件
CN1180151C (zh) 2001-04-10 2004-12-15 中国科学院化学研究所 羊毛纤维制品的防缩处理方法
GB0208261D0 (en) 2002-04-10 2002-05-22 Dow Corning An atmospheric pressure plasma assembly

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3899685A (en) * 1972-03-23 1975-08-12 Electricity Council Ozonisers
US4130490A (en) * 1977-05-23 1978-12-19 Lovelace Alan M Administrator Electric discharge for treatment of trace contaminants
US4813488A (en) * 1986-04-02 1989-03-21 Franz Plasser Bahnbaumaschinen-Industriegesellschaft M.B.H. Ballast cleaning machine
US4834948A (en) * 1986-07-10 1989-05-30 E. M. Heinkel K.G. Device for enriching a fluid with ozone
US4976098A (en) * 1988-01-30 1990-12-11 Rieter Machine Works, Ltd. Method and apparatus for dissipating heat from a textile machine
US4999136A (en) * 1988-08-23 1991-03-12 Westinghouse Electric Corp. Ultraviolet curable conductive resin
US5185132A (en) * 1989-12-07 1993-02-09 Research Development Corporation Of Japan Atomspheric plasma reaction method and apparatus therefor
US5387775A (en) * 1993-03-31 1995-02-07 The United States Of America As Represented By The United States Department Of Energy Apparatus for the plasma destruction of hazardous gases
US5820541A (en) * 1994-11-15 1998-10-13 Biozon, S.L. Process, formula and installation for the treatment and sterilization of biological, solid, liquid, ferrous metallic, non-ferrous metallic, toxic and dangerous hospital waste material
US20010005032A1 (en) * 1998-07-08 2001-06-28 Robert Aigner Method for producing a filled recess in a material layer, and an integrated circuit configuration produced by the method
US6489585B1 (en) * 1999-07-27 2002-12-03 Matsushita Electric Works, Ltd. Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus
US20010024486A1 (en) * 1999-12-08 2001-09-27 Herbert Brian Kenneth X-ray apparatus with filter comprising filter elements with adjustable X-ray absorption and X-ray absorption sensor
US6232723B1 (en) * 2000-02-09 2001-05-15 Igor Alexeff Direct current energy discharge system
US20030095898A1 (en) * 2001-11-22 2003-05-22 Mitsubishi Denki Kabushiki Kaisha Ozonizer

Cited By (75)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8796581B2 (en) 2001-07-16 2014-08-05 Foret Plasma Labs, Llc Plasma whirl reactor apparatus and methods of use
US8785808B2 (en) 2001-07-16 2014-07-22 Foret Plasma Labs, Llc Plasma whirl reactor apparatus and methods of use
US10368557B2 (en) 2001-07-16 2019-08-06 Foret Plasma Labs, Llc Apparatus for treating a substance with wave energy from an electrical arc and a second source
US7573202B2 (en) * 2004-10-04 2009-08-11 The Board Of Trustees Of The University Of Illinois Metal/dielectric multilayer microdischarge devices and arrays
US20060082319A1 (en) * 2004-10-04 2006-04-20 Eden J Gary Metal/dielectric multilayer microdischarge devices and arrays
US7477017B2 (en) 2005-01-25 2009-01-13 The Board Of Trustees Of The University Of Illinois AC-excited microcavity discharge device and method
US20070163503A1 (en) * 2006-01-17 2007-07-19 Mitsubishi Heavy Industries, Ltd. Thin film preparation apparatus
EA011792B1 (ru) * 2006-10-18 2009-06-30 Егор Михайлович МАНДРИК Головка для аналитического газового плазматрона
WO2008054246A1 (fr) * 2006-10-18 2008-05-08 Egor Mihailovich Mandrik Tête de générateur de plasma gazeux analytique
US20100175987A1 (en) * 2006-12-28 2010-07-15 Nederlandse Organisatie Voor Toegepast- Natuurwetenschappelijk Onderzoek Tno A surface dielectric barrier discharge plasma unit and a method of generating a surface plasma
US9131595B2 (en) 2006-12-28 2015-09-08 Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno Surface dielectric barrier discharge plasma unit and a method of generating a surface plasma
US20100193129A1 (en) * 2007-08-31 2010-08-05 Yoichiro Tabata Apparatus for generating dielectric barrier discharge gas
US8857371B2 (en) * 2007-08-31 2014-10-14 Toshiba Mitsubishi-Electric Industrial Systems Corporation Apparatus for generating dielectric barrier discharge gas
US9241396B2 (en) 2007-10-16 2016-01-19 Foret Plasma Labs, Llc Method for operating a plasma arc torch having multiple operating modes
US10117318B2 (en) 2007-10-16 2018-10-30 Foret Plasma Labs, Llc High temperature electrolysis glow discharge device
US11806686B2 (en) 2007-10-16 2023-11-07 Foret Plasma Labs, Llc System, method and apparatus for creating an electrical glow discharge
US10638592B2 (en) 2007-10-16 2020-04-28 Foret Plasma Labs, Llc System, method and apparatus for an inductively coupled plasma arc whirl filter press
US10412820B2 (en) 2007-10-16 2019-09-10 Foret Plasma Labs, Llc System, method and apparatus for recovering mining fluids from mining byproducts
US8278810B2 (en) 2007-10-16 2012-10-02 Foret Plasma Labs, Llc Solid oxide high temperature electrolysis glow discharge cell
US8810122B2 (en) 2007-10-16 2014-08-19 Foret Plasma Labs, Llc Plasma arc torch having multiple operating modes
US9781817B2 (en) 2007-10-16 2017-10-03 Foret Plasma Labs, Llc High temperature electrolysis glow discharge device
US10395892B2 (en) 2007-10-16 2019-08-27 Foret Plasma Labs, Llc High temperature electrolysis glow discharge method
US9761413B2 (en) 2007-10-16 2017-09-12 Foret Plasma Labs, Llc High temperature electrolysis glow discharge device
US20090200032A1 (en) * 2007-10-16 2009-08-13 Foret Plasma Labs, Llc System, method and apparatus for creating an electrical glow discharge
US10267106B2 (en) 2007-10-16 2019-04-23 Foret Plasma Labs, Llc System, method and apparatus for treating mining byproducts
US9644465B2 (en) 2007-10-16 2017-05-09 Foret Plasma Labs, Llc System, method and apparatus for creating an electrical glow discharge
US9051820B2 (en) 2007-10-16 2015-06-09 Foret Plasma Labs, Llc System, method and apparatus for creating an electrical glow discharge
US9105433B2 (en) 2007-10-16 2015-08-11 Foret Plasma Labs, Llc Plasma torch
US9111712B2 (en) 2007-10-16 2015-08-18 Foret Plasma Labs, Llc Solid oxide high temperature electrolysis glow discharge cell
US9951942B2 (en) 2007-10-16 2018-04-24 Foret Plasma Labs, Llc Solid oxide high temperature electrolysis glow discharge cell
US8568663B2 (en) 2007-10-16 2013-10-29 Foret Plasma Labs, Llc Solid oxide high temperature electrolysis glow discharge cell and plasma system
US9560731B2 (en) 2007-10-16 2017-01-31 Foret Plasma Labs, Llc System, method and apparatus for an inductively coupled plasma Arc Whirl filter press
US10184322B2 (en) 2007-10-16 2019-01-22 Foret Plasma Labs, Llc System, method and apparatus for creating an electrical glow discharge
US9185787B2 (en) 2007-10-16 2015-11-10 Foret Plasma Labs, Llc High temperature electrolysis glow discharge device
US20150323174A1 (en) * 2007-10-16 2015-11-12 Foret Plasma Labs, Llc Solid Oxide High Temperature Electrolysis Glow Discharge Cell
US9230777B2 (en) 2007-10-16 2016-01-05 Foret Plasma Labs, Llc Water/wastewater recycle and reuse with plasma, activated carbon and energy system
US9516736B2 (en) 2007-10-16 2016-12-06 Foret Plasma Labs, Llc System, method and apparatus for recovering mining fluids from mining byproducts
US9445488B2 (en) 2007-10-16 2016-09-13 Foret Plasma Labs, Llc Plasma whirl reactor apparatus and methods of use
US9790108B2 (en) 2007-10-16 2017-10-17 Foret Plasma Labs, Llc Water/wastewater recycle and reuse with plasma, activated carbon and energy system
US10018351B2 (en) * 2007-10-16 2018-07-10 Foret Plasma Labs, Llc Solid oxide high temperature electrolysis glow discharge cell
US10098191B2 (en) * 2008-02-12 2018-10-09 Forest Plasma Labs, LLC Inductively coupled plasma arc device
US9163584B2 (en) 2008-02-12 2015-10-20 Foret Plasma Labs, Llc System, method and apparatus for lean combustion with plasma from an electrical arc
US10244614B2 (en) 2008-02-12 2019-03-26 Foret Plasma Labs, Llc System, method and apparatus for plasma arc welding ceramics and sapphire
US20150103860A1 (en) * 2008-02-12 2015-04-16 Foret Plasma Labs, Llc Inductively coupled plasma arc device
US9869277B2 (en) 2008-02-12 2018-01-16 Foret Plasma Labs, Llc System, method and apparatus for lean combustion with plasma from an electrical arc
US8904749B2 (en) 2008-02-12 2014-12-09 Foret Plasma Labs, Llc Inductively coupled plasma arc device
US8833054B2 (en) 2008-02-12 2014-09-16 Foret Plasma Labs, Llc System, method and apparatus for lean combustion with plasma from an electrical arc
WO2009128868A1 (en) * 2008-02-13 2009-10-22 Foret Plasma Labs, Llc System, method and apparatus for coupling a solid oxide high temperature electrolysis glow discharge cell to a plasma arc torch
US20110108195A1 (en) * 2008-07-04 2011-05-12 Tokyo Electron Limited Temperature adjusting mechanism and semiconductor manufacturing Appratus using temperature adjusting mechanism
US8968512B2 (en) * 2008-07-04 2015-03-03 Tokyo Electron Limited Temperature adjusting mechanism and semiconductor manufacturing apparatus using temperature adjusting mechanism
US10265116B2 (en) 2009-08-25 2019-04-23 Leibniz-Institut Fuer Plasmaforschung Und Technologie E.V Device for the planar treatment of areas of human or animal skin or mucous membrane surfaces by means of a cold atmospheric pressure plasma
EA024404B1 (ru) * 2010-04-30 2016-09-30 Агк Гласс Юроп Электрод для плазменной обработки диэлектрическим барьерным разрядом
WO2011134978A1 (fr) 2010-04-30 2011-11-03 Agc Glass Europe Electrode pour procede plasma dbd
CN102914567A (zh) * 2011-08-05 2013-02-06 中国科学院寒区旱区环境与工程研究所 多路沙地水分动态监测仪
US9114373B2 (en) 2011-11-11 2015-08-25 Saga University Plasma generation device
US20140110059A1 (en) * 2012-10-19 2014-04-24 Hefei Boe Optoelectronics Technology Co., Ltd. Atmospheric-pressure plasma processing apparatus for substrates
US9892907B2 (en) * 2012-10-19 2018-02-13 Boe Technology Group Co., Ltd. Atmospheric-pressure plasma processing apparatus for substrates
US9499443B2 (en) 2012-12-11 2016-11-22 Foret Plasma Labs, Llc Apparatus and method for sintering proppants
US10030195B2 (en) 2012-12-11 2018-07-24 Foret Plasma Labs, Llc Apparatus and method for sintering proppants
US9175389B2 (en) * 2012-12-21 2015-11-03 Intermolecular, Inc. ALD process window combinatorial screening tool
US20140174540A1 (en) * 2012-12-21 2014-06-26 Intermolecular, Inc. ALD Process Window Combinatorial Screening Tool
US9801266B2 (en) 2013-03-12 2017-10-24 Foret Plasma Labs, Llc Apparatus and method for sintering proppants
US9699879B2 (en) 2013-03-12 2017-07-04 Foret Plasma Labs, Llc Apparatus and method for sintering proppants
US20150022075A1 (en) * 2013-07-22 2015-01-22 Anderson Remplex, Inc. Dielectric Barrier Discharge Apparatus
JP2017509099A (ja) * 2013-12-19 2017-03-30 マサリコバ ウニベルシタＭａｓａｒｙｋｏｖａ Ｕｎｉｖｅｒｚｉｔａ 中空非導電体の内面及び／または外面のプラズマ処理の方法及び装置
EP3096699A1 (de) * 2014-01-23 2016-11-30 Linde Aktiengesellschaft Nichtthermisches plasma
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US10669653B2 (en) * 2015-06-18 2020-06-02 Kevin Kremeyer Directed energy deposition to facilitate high speed applications
US10827598B2 (en) * 2017-08-16 2020-11-03 DBD Plasma GmbH Plasma generator module
US10818571B2 (en) * 2018-11-19 2020-10-27 Delta Electronics (Shanghai) Co., Ltd. Packaging structure for power module
CN111199890A (zh) * 2018-11-20 2020-05-26 细美事有限公司 接合装置及接合方法
US20220316132A1 (en) * 2021-04-01 2022-10-06 Saudi Arabian Oil Company Systems and methods for the functionalization of polyolefin fibers
US12060677B2 (en) * 2021-04-01 2024-08-13 Saudi Arabian Oil Company Systems and methods for the functionalization of polyolefin fibers
CN113560150A (zh) * 2021-07-15 2021-10-29 南京工业大学 一种用于农膜材料防尘涂层沉积的等离子体改性装置
CN115475498A (zh) * 2022-08-25 2022-12-16 大连海事大学 一种船舶废气等离子体脱除装置的余热回收系统

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