WO2019188087A1 - 銅張積層板 - Google Patents
銅張積層板 Download PDFInfo
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- WO2019188087A1 WO2019188087A1 PCT/JP2019/009093 JP2019009093W WO2019188087A1 WO 2019188087 A1 WO2019188087 A1 WO 2019188087A1 JP 2019009093 W JP2019009093 W JP 2019009093W WO 2019188087 A1 WO2019188087 A1 WO 2019188087A1
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- resin
- copper
- adhesive layer
- clad laminate
- copper foil
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/14—Layered products comprising a layer of metal next to a fibrous or filamentary layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/02—Layered products essentially comprising sheet glass, or glass, slag, or like fibres in the form of fibres or filaments
- B32B17/04—Layered products essentially comprising sheet glass, or glass, slag, or like fibres in the form of fibres or filaments bonded with or embedded in a plastic substance
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/061—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of metal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/02—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by structural features of a fibrous or filamentary layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J171/00—Adhesives based on polyethers obtained by reactions forming an ether link in the main chain; Adhesives based on derivatives of such polymers
- C09J171/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
- C09J171/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
- C09J171/12—Polyphenylene oxides
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J179/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
- C09J179/02—Polyamines
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0366—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/06—Coating on the layer surface on metal layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/10—Coating on the layer surface on synthetic resin layer or on natural or synthetic rubber layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/20—Inorganic coating
- B32B2255/205—Metallic coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/26—Polymeric coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
- B32B2260/02—Composition of the impregnated, bonded or embedded layer
- B32B2260/021—Fibrous or filamentary layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
- B32B2260/04—Impregnation, embedding, or binder material
- B32B2260/046—Synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2262/00—Composition or structural features of fibres which form a fibrous or filamentary layer or are present as additives
- B32B2262/10—Inorganic fibres
- B32B2262/101—Glass fibres
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
- B32B2307/204—Di-electric
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
- B32B2307/206—Insulating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/538—Roughness
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/732—Dimensional properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/748—Releasability
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2311/00—Metals, their alloys or their compounds
- B32B2311/12—Copper
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0237—High frequency adaptations
- H05K1/024—Dielectric details, e.g. changing the dielectric material around a transmission line
Definitions
- the present invention relates to a copper clad laminate.
- Printed wiring boards are widely used in electronic devices such as portable electronic devices. In particular, with higher functions of portable electronic devices and the like in recent years, the frequency of signals has been increased, and printed wiring boards suitable for such high-frequency applications have been demanded.
- the printed wiring board for high frequency is desired to have a low transmission loss in order to enable transmission without deteriorating the quality of the high frequency signal.
- a printed wiring board is provided with a copper foil processed into a wiring pattern and an insulating resin base material, but transmission loss is mainly due to conductor loss due to the copper foil and dielectric loss due to the insulating resin base material. It consists of. Therefore, in a copper foil with a resin layer applied to high frequency applications, it is desirable to suppress dielectric loss due to the resin layer. For this purpose, the resin layer is required to have excellent dielectric properties, particularly low dielectric loss tangent.
- Patent Document 1 Japanese Patent No. 5118469 discloses a copper foil with a resin layer having a filler particle-containing resin layer on the surface of a copper foil, and the filler particle-containing resin layer is an aromatic polyamide resin. It is described that it is a semi-cured resin layer containing filler particles containing a polymer, an epoxy resin, and a curing accelerator, and treated with phenylaminosilane, which is an amino silane coupling agent.
- Patent Document 2 Japanese Translation of PCT International Publication No. 2009-518208 discloses a method of manufacturing a laminated board for high-frequency printed circuit boards. This manufacturing method includes preparing a low profile copper foil sheet, Applying a low dielectric loss resin layer, partially curing a low dielectric loss resin to form a low profile copper sheet coated with resin, and forming a low profile copper sheet coated with resin into a prepreg It is said to include the lamination to form a copper clad laminate.
- Patent Document 3 Japanese Patent Laid-Open No.
- 2016-028885 discloses a metal-clad laminate that can produce a printed wiring board with reduced loss during signal transmission, and includes an insulating layer containing a polyphenylene ether compound, A metal layer bonded to the insulating layer, and an intermediate layer containing a silane compound interposed between the insulating layer and the metal layer, and the ten-point average roughness Rz of the bonding surface of the metal layer is 0.5 ⁇ m or more and 4 ⁇ m or less.
- a metal-clad laminate is described.
- the present inventors have recently selected a specific resin as an adhesive layer in a copper clad laminate comprising a copper foil, an adhesive layer and a resin layer in this order, and the surface roughness of the copper foil on the adhesive layer side.
- a specific resin as an adhesive layer in a copper clad laminate comprising a copper foil, an adhesive layer and a resin layer in this order, and the surface roughness of the copper foil on the adhesive layer side.
- an object of the present invention is to provide a copper-clad laminate capable of further improving the transmission characteristics exhibited by the resin layer while ensuring sufficient peel strength between the copper foil and the resin layer.
- Copper foil Provided on the surface of the copper foil, polyphenylene ether resin, polyimide resin, olefin resin, liquid crystal polymer, polyester resin, polystyrene resin, hydrocarbon elastomer, benzoxazine resin, active ester resin, cyanate ester resin, bismaleimide resin, butadiene
- An adhesive layer comprising at least one selected from the group consisting of a resin, a hydrogenated or non-hydrogenated styrene butadiene resin, an epoxy resin, a fluororesin, a resin having a vinyl group, and a copolymer thereof;
- a resin layer provided on the surface of the adhesive layer;
- a maximum height Sz measured on the surface of the copper foil on the adhesive layer side in accordance with ISO25178 is 6.8 ⁇ m or less, and the adhesive layer
- a copper clad laminate is provided in which a dielectric loss tangent value ⁇ a at a frequency of 1 GHz is equal to or less than a dielectric
- a method for producing the copper clad laminate Preparing a copper foil having a surface having a maximum height Sz measured in accordance with ISO25178 of 6.8 ⁇ m or less; On the surface of the copper foil, polyphenylene ether resin, polyimide resin, olefin resin, liquid crystal polymer, polyester resin, polystyrene resin, hydrocarbon elastomer, benzoxazine resin, active ester resin, cyanate ester resin, bismaleimide resin, butadiene resin, Dielectric loss tangent value at a frequency of 1 GHz after curing, including at least one selected from the group consisting of hydrogenated or non-hydrogenated styrene butadiene resins, epoxy resins, fluororesins, resins having vinyl groups, and copolymers thereof Applying and drying a resin varnish containing an adhesive having a ⁇ a to obtain a copper foil with an adhesive; Bonding the copper foil with adhesive to a resin
- FIG. 3 is a diagram showing a procedure for producing copper-clad laminate samples in Examples 1 to 10.
- the “maximum height Sz” is a parameter representing the distance from the highest point to the lowest point on the surface, measured in accordance with ISO25178.
- the maximum height Sz can be calculated by measuring a surface profile of a predetermined measurement area (for example, a region of 10,000 ⁇ m 2 ) on the copper foil surface with a commercially available laser microscope.
- “Cultosis Sku” is a parameter representing the sharpness of the height distribution measured in accordance with ISO25178, and is also referred to as kurtosis.
- Sku 3 means that the height distribution is a normal distribution.
- the kurtosis Sku can be calculated by measuring a surface profile of a predetermined measurement area (for example, a region of 10,000 ⁇ m 2 ) on the copper foil surface with a commercially available laser microscope.
- the “dielectric loss tangent value at a frequency of 1 GHz” is a dielectric loss tangent value measured in accordance with ASTM D2520 (JIS C2565: 1992) by the SPDR dielectric resonator method. This dielectric loss tangent value can be measured using a commercially available network analyzer.
- the copper-clad laminate of the present invention includes a copper foil, an adhesive layer and a resin layer.
- Adhesive layer consists of polyphenylene ether resin, polyimide resin, olefin resin, liquid crystal polymer, polyester resin, polystyrene resin, hydrocarbon elastomer, benzoxazine resin, active ester resin, cyanate ester resin, bismaleimide resin, butadiene resin, hydrogenated Or it contains 1 or more types selected from the group which consists of a non-hydrogenated styrene butadiene resin, an epoxy resin, a fluororesin, a resin which has a vinyl group, and these copolymers, and is provided in the surface of copper foil.
- the resin layer is provided on the surface of the adhesive layer.
- the copper-clad laminate has a maximum height Sz of 6.8 ⁇ m or less on the surface of the copper foil on the adhesive layer side. Further, the dielectric loss tangent value ⁇ a of the adhesive layer at a frequency of 1 GHz is equal to or less than the dielectric loss tangent value ⁇ r of the resin layer at a frequency of 1 GHz.
- a specific resin is selected as the adhesive layer, and the surface roughness of the copper foil on the adhesive layer side is specified.
- the copper clad laminate of the present invention is used in a high frequency band of, for example, a signal frequency of 10 GHz or more, a high frequency substrate or network used for an automobile antenna, a mobile phone base station antenna, a high performance server, a collision prevention radar, or the like.
- the present invention is preferably applicable to printed wiring board applications for high-frequency digital communication in equipment. Examples of such network devices include (i) base station servers, routers, (ii) corporate networks, (iii) high-speed mobile communication backbone systems, and the like.
- the copper-clad laminate of the present invention by selectively using the above-mentioned adhesive layer, compared to a laminate (adhesive layer-free laminate) consisting only of a copper foil and a resin layer. Improved transmission characteristics (more reduced transmission loss) can be realized. In addition, high adhesiveness (peel strength) between the copper foil and the resin layer can also be realized as the adhesive layer.
- the peel strength of the copper foil with respect to the adhesive layer measured in accordance with JIS C 6481-1996 is 0.3 kN / m or more when the adhesive layer is cured. More preferably, it is 0.4 kN / m or more, More preferably, it is 0.5 kN / m or more, Most preferably, it is 0.6 kN / m or more. In general, the higher the peel strength is, the better. However, the product typically has a value of 1.4 kN / m or less, more typically 1.2 kN / m or less.
- the copper foil may be an electrolytic foil or a rolled metal foil (so-called raw foil) as long as the surface on the adhesive layer side satisfies the above-described maximum height Sz, and at least any It may be in the form of a surface-treated foil having a surface treated on either side.
- the surface treatment is various surface treatments performed to improve or impart some property (for example, rust prevention, moisture resistance, chemical resistance, acid resistance, heat resistance, and adhesion to the substrate) on the surface of the metal foil. It can be.
- the surface treatment may be performed on at least one side of the metal foil, or may be performed on both sides of the metal foil. Examples of the surface treatment performed on the copper foil include rust prevention treatment, silane treatment, roughening treatment, barrier formation treatment and the like.
- the maximum height Sz on the surface of the copper foil on the adhesive layer side is 6.8 ⁇ m or less, preferably 0.15 ⁇ m or more and 6.8 ⁇ m or less, more preferably 0.25 ⁇ m or more and 5.0 ⁇ m or less, and further preferably 0. It is 30 ⁇ m or more and 3.0 ⁇ m or less.
- transmission loss can be desirably reduced while ensuring sufficient adhesion with the resin layer via the adhesive layer. That is, it is possible to reduce the conductor loss caused by the copper foil, which can be increased by the skin effect of the copper foil, and to further reduce the transmission loss.
- the kurtosis (kurtosis) Sku on the surface of the copper foil on the adhesive layer side is preferably 2.0 or more and 4.0 or less, more preferably 2.2 or more and 3.8 or less, and further preferably 2.4 or more and 3 or less. .5 or less.
- transmission loss can be desirably reduced. That is, it is possible to reduce the conductor loss caused by the copper foil, which can be increased by the skin effect of the copper foil, and to further reduce the transmission loss.
- the thickness of the copper foil is not particularly limited, but is preferably 0.1 ⁇ m or more and 100 ⁇ m or less, more preferably 0.15 ⁇ m or more and 50 ⁇ m or less, and further preferably 0.2 ⁇ m or more and 40 ⁇ m or less. If the thickness is within these ranges, methods such as MSAP (modified semi-additive), SAP (semi-additive), and subtractive methods, which are general pattern formation methods for wiring formation of printed wiring boards, can be used. It can be adopted. Moreover, you may use copper foil with a carrier for copper foil.
- the adhesive layer is a layer that functions as a primer layer for improving the adhesion between the copper foil and the adhesive layer, for example, a resin layer (for example, an insulating base material).
- a resin layer for example, an insulating base material.
- the dielectric loss tangent value ⁇ a of the adhesive layer at a frequency of 1 GHz is equal to or less than the dielectric loss tangent value ⁇ r of the resin layer at a frequency of 1 GHz, and preferably less than ⁇ r.
- the dielectric loss tangent value ⁇ a of the adhesive layer at a frequency of 1 GHz is preferably 0.0001 or more and 0.003 or less, more preferably 0.0005 or more and 0.003 or less, still more preferably 0.0008 or more and 0.0025 or less. Preferably they are 0.001 or more and 0.002 or less.
- the dielectric loss tangent value ⁇ a is within these ranges, when the dielectric tangent value ⁇ r of the resin layer is 0.003 or more, the dielectric loss tangent value ⁇ a of the adhesive layer is equal to or lower than the dielectric loss tangent value ⁇ r of the resin layer. It will be. In any case, by adopting an adhesive layer having a low dielectric loss tangent value ⁇ a as described above, the transmission characteristics exhibited by the resin layer can be improved more than expected.
- the adhesive layer has at least one selected from the group consisting of an olefin resin, a polystyrene resin, a liquid crystal polymer, and a fluororesin, and is 10 weights with respect to the total weight of the adhesive layer. % Or more, more preferably 15% by weight or more, and still more preferably 20% by weight or more.
- the adhesive layer comprises a polyphenylene ether resin, preferably 20% by weight or more, more preferably 25% by weight or more, and further preferably 30% by weight with respect to the total weight of the adhesive layer. % Or more.
- a polyphenylene ether resin preferably 20% by weight or more, more preferably 25% by weight or more, and further preferably 30% by weight with respect to the total weight of the adhesive layer. % Or more.
- the adhesive layer is made of polyimide resin, preferably 10% by weight or more, more preferably 20% by weight or more, further preferably 30% by weight based on the total weight of the adhesive layer. % Or more.
- polyimide resin preferably 10% by weight or more, more preferably 20% by weight or more, further preferably 30% by weight based on the total weight of the adhesive layer. % Or more.
- the adhesive layer comprises at least one selected from the group consisting of a butadiene resin, a hydrogenated or non-hydrogenated styrene butadiene resin, an epoxy resin, and a resin having a vinyl group.
- the total weight of the adhesive layer is preferably 1% by weight or more, more preferably 5% by weight or more, and still more preferably 10% by weight or more.
- the adhesive layer may further contain a filler.
- the filler By adding the filler, the dielectric loss tangent of the resin layer can be desirably reduced.
- Any known filler that can be used in the resin composition can be used as appropriate, and an inorganic filler is preferable.
- preferable inorganic fillers include particles of silica, alumina, talc, etc., and silica particles are particularly preferable from the viewpoint of reducing dielectric loss tangent.
- the particle diameter of the filler is not particularly limited, but the average particle diameter D50 measured by the average particle diameter laser diffraction / scattering particle size distribution measurement is 0.00 from the viewpoint of maintaining the surface smoothness of the resin layer and suppressing aggregation when the varnish is mixed.
- the thickness is preferably from 01 ⁇ m to 2.0 ⁇ m, more preferably from 0.01 ⁇ m to 1.5 ⁇ m, and still more preferably from 0.01 ⁇ m to 1.0 ⁇ m.
- the filler content in the adhesive layer is 85% by weight or less, preferably 0% by weight or more and 75% by weight or less, more preferably 0% by weight or more and 60% by weight or less, based on the total weight of the adhesive layer. More preferably, it is 0 to 50% by weight. With such a content, it is possible to avoid a decrease in peel strength while being excellent in dielectric loss tangent.
- an inorganic filler is contained, it is preferable to use filler particles that have been subjected to a specific surface treatment.
- the filler particles are preferably surface-treated with a silane coupling agent.
- the adhesive layer may contain imidazole as a curing accelerator. Since the imidazole curing accelerator is incorporated into the molecular structure as part of the resin without being released as ions after the curing reaction with the resin component, the dielectric properties and insulation reliability of the resin layer can be improved. .
- the content of the imidazole-based curing accelerator is not particularly limited, and may be appropriately determined in an amount that brings about desirable curing while taking into account various conditions such as the composition of the resin layer.
- the thickness of the adhesive layer is preferably from 0.1 ⁇ m to 20 ⁇ m, more preferably from 0.3 ⁇ m to 18 ⁇ m, still more preferably from 0.5 ⁇ m to 15 ⁇ m, and most preferably from 1 ⁇ m to 10 ⁇ m.
- the thickness of the adhesive layer is preferably from 0.1 ⁇ m to 20 ⁇ m, more preferably from 0.3 ⁇ m to 18 ⁇ m, still more preferably from 0.5 ⁇ m to 15 ⁇ m, and most preferably from 1 ⁇ m to 10 ⁇ m.
- the resin layer can be one generally used as a resin base material in a copper clad laminate, and is not particularly limited.
- a preferable resin layer includes a glass cloth and an insulating resin impregnated in the glass cloth from the viewpoint of ensuring rigidity and insulation, and is typically a prepreg.
- Preferred examples of the insulating resin used as the prepreg include an epoxy resin, a cyanate ester resin, a polyimide resin, a bismaleimide triazine resin (BT resin), a polyphenylene ether resin, a phenol resin, a liquid crystal polymer resin, a polytetrafluoroethylene resin (PTFE), and the like. Is mentioned.
- the resin layer is not limited to those having the above-described rigidity, and may have flexibility. In that case, it is preferable that the resin layer does not include glass cloth.
- the dielectric loss tangent value ⁇ r at a frequency of 1 GHz of the resin layer is desired to be low from the viewpoint of transmission loss reduction, typically 0.0001 or more and 0.03 or less, more typically 0.0001 or more and 0.02 or less. More typically, it is from 0.0002 to 0.01, and most typically from 0.0003 to 0.005.
- the thickness of the resin layer is not particularly limited as long as it is appropriately determined depending on the application, but is preferably 5 ⁇ m or more and 5 mm or less, more preferably 10 ⁇ m or more and 3 mm or less, and further preferably 15 ⁇ m or more and 1 mm or less.
- the production of the copper clad laminate may be performed according to a known method, and is not particularly limited.
- a resin varnish containing an adhesive component is applied to a copper foil, dried, and the obtained copper foil with adhesive is laminated to a resin layer (prepreg, etc.) to produce a copper clad laminate.
- a copper-clad laminate is obtained by first applying an adhesive to a resin layer (such as a prepreg) to form a resin layer with an adhesive, and bonding a copper foil to the surface of the adhesive layer and curing the resin layer and the adhesive layer.
- a plate may be manufactured.
- the raw material for resin varnish used for preparation of an adhesive bond layer in the following examples is as follows.
- -Cyclic olefin resin L3PS (cycloolefin, manufactured by Nippon Zeon Co., Ltd., dielectric constant (1 GHz): 2.2 (nominal value), dielectric loss tangent (1 GHz): 0.0018 (nominal value))
- -Cyclic olefin resin TOPAS6017 (Cyclic olefin copolymer, manufactured by Polyplastics Co., Ltd.) -Hydrogenated styrene butad
- the composition of this copper sulfate solution was as follows: copper concentration 80 g / L, free sulfuric acid concentration 140 g / L, bis (3-sulfopropyl) disulfide concentration 30 mg / L, diallyldimethylammonium chloride polymer concentration 50 mg / L, chlorine concentration 40 mg / L It was.
- the surface treated surface of the electrolytic copper foil A thus obtained had a ten-point average roughness Rzjis of 0.5 ⁇ m (measured in accordance with JIS B0601-2001), a maximum height Sz of 0.35 ⁇ m, and a particulate protrusion There was nothing. Moreover, the thickness of the electrolytic copper foil A was 18 ⁇ m.
- the first stage electrolytic treatment was performed in a copper sulfate solution (copper concentration: 10.5 g / L, free sulfuric acid concentration: 220 g / L) under the conditions of a solution temperature of 30 ° C. and a current density of 28 A / dm 2 .
- the second-stage electrolytic treatment was performed in a copper sulfate solution (copper concentration: 10.5 g / L, free sulfuric acid concentration: 220 g / L) under the conditions of a solution temperature of 30 ° C. and a current density of 16 A / dm 2 .
- the third stage electrolytic treatment was performed in a copper sulfate solution (copper concentration: 70 g / L, free sulfuric acid concentration: 220 g / L) under the conditions of a solution temperature of 52 ° C. and a current density of 21 A / dm 2 .
- the surface treatment surface of the electrolytic copper foil B thus obtained had a 10-point average roughness Rzjis of 1.8 ⁇ m (based on JIS B0601-2001) and a maximum height Sz of 3.30 ⁇ m. Moreover, the thickness of the electrolytic copper foil B was 18 ⁇ m.
- This covering plating was performed under smooth plating conditions with a copper concentration of 70 g / L, a free sulfuric acid concentration of 120 g / L, a liquid temperature of 45 ° C., and a current density of 25 A / dm 2 .
- rust prevention treatment was performed on both surfaces of the electrolytic copper foil. Specifically, it is immersed in a solution having a potassium pyrophosphate concentration of 80 g / L, a zinc concentration of 0.2 g / L, a nickel concentration of 2 g / L, and a liquid temperature of 40 ° C.
- Stainless steel (SUS) plates were placed on both sides of the electrolytic copper foil and electrolyzed at a current density of 0.5 A / dm 2 to form a zinc-nickel alloy layer on both sides of the electrolytic copper foil. Further, a chromate layer was formed by an electrolytic method.
- the electrolytic copper foil on which the rust prevention treatment layer was formed was washed with water and immediately subjected to a silane coupling agent treatment on the surface of the rust prevention treatment layer on the roughening treatment surface.
- a silane coupling agent treatment ⁇ -glycidoxypropyltrimethoxysilane is dissolved in ion-exchanged water to prepare an aqueous solution having a concentration of 3 g / L.
- the film was showered and then brought into contact with a roll to make the liquid film thickness uniform.
- the electrolytic copper foil after the silane coupling agent treatment was held in a drying furnace set to an atmosphere where the copper foil temperature was 150 ° C. for 4 seconds to disperse moisture, and the electrolytic copper foil C was used as a surface-treated copper foil. Obtained.
- the thus obtained electrolytic copper foil C had a ten-point average roughness Rzjis of the roughened surface of 3.0 ⁇ m (based on JIS B0601-2001) and a maximum height Sz of 6.63 ⁇ m. Moreover, the thickness of the electrolytic copper foil C was 18 ⁇ m.
- the maximum height Sz and kurtosis (kurtosis) Sku which are the surface shapes on the side (roughened surface) where the adhesive layers of the electrolytic copper foils A to C are to be provided, were as follows.
- ⁇ Maximum height Sz> The maximum height Sz on the copper foil surface was measured in accordance with ISO25178 by surface texture analysis using a laser microscope (manufactured by Keyence Corporation, VK-X100). Specifically, the surface profile of a two-dimensional region having a measurement visual field of 100 ⁇ m ⁇ 100 ⁇ m on the copper foil surface was measured by a laser method. The average value when measuring three places on the same sample was adopted as the value of the maximum height Sz. The results were as shown in Table 1.
- kurtosis kurtosis Sku>
- kurtosis kurtosis Sku on the surface of the copper foil was measured according to ISO25178. Specifically, the surface profile of a two-dimensional region having a measurement visual field of 100 ⁇ m ⁇ 100 ⁇ m on the copper foil surface was measured by a laser method. An average value obtained by measuring 10 points on the same sample was adopted as kurtosis (kurtosis) Sku. The results were as shown in Table 1.
- ⁇ Dielectric property evaluation-Dielectric loss tangent> With respect to the obtained resin film consisting of the adhesive layer 14 alone, a dielectric loss tangent value ⁇ a at 1 GHz was measured by a SPDR dielectric resonator method using a network analyzer (manufactured by Keysight, PNA-L N5234A). This measurement was performed according to ASTM D2520 (JIS C2565: 1992). The results were as shown in Table 2. Table 2 also shows the magnitude relationship with the dielectric tangent value ⁇ r at 1 GHz of the prepreg used as the resin layer in (4) and (5) described later.
- copper foil 22 that is, copper foil A (Example 1), copper foil B ( The adhesive layer 24 is formed on the surface having the above Sz and Sku of Example 2) or the copper foil C (Example 3) so that the coating thickness after drying is 4 ⁇ m, and the copper foil with adhesive 20 is formed.
- the two prepregs that are the resin layer 26 (MEGTRON-6 manufactured by Panasonic Corporation, actual thickness 200 ⁇ m, dielectric constant Dk: 3.9 at 1 GHz by SPDR method, dielectric Laminating with tangent Df: 0.003) to obtain a resin substrate having a thickness of 0.25 mm.
- vacuum pressing was performed under the conditions of a press temperature of 190 ° C., a temperature holding time of 120 minutes, and a press pressure of 300 N to obtain a copper clad laminate 28 with the adhesive layer 24 in a cured state.
- a circuit for a peel strength measurement test was formed on the obtained copper-clad laminate 28. Specifically, a dry film was laminated on both surfaces of the copper clad laminate 28 to form an etching resist layer. Then, a 10 mm width peel strength measurement test circuit was exposed and developed on the etching resist layers on both sides to form an etching pattern. Thereafter, circuit etching was performed with a copper etchant, and the etching resist was removed to obtain a circuit 22a.
- the circuit 22a thus formed was peeled from the adhesive layer 24, and the peel strength R (kN / m) between the circuit 22a and the adhesive layer 24 was measured.
- the peel strength R was measured according to JIS C 6481-1996. The results were as shown in Table 2.
- copper foil 22 that is, copper foil A (Example 1), copper foil B (Example)
- the adhesive layer 24 is formed on the surface having Sz and Sku of 2) or copper foil C (Example 3) so that the coating thickness after drying is 4 ⁇ m, and the copper foil 20 with adhesive is produced. did.
- Example 4 The raw material components for the resin varnish and the organic solvent (cyclopentanone) were weighed so that the blending ratio (mass ratio) shown in Table 2 was 30 parts by weight. The weighed raw material components for resin varnish and the solvent were put into a flask and stirred at room temperature for 30 minutes with a propeller-type stirrer to dissolve the resin component in the solvent, and the resin varnish was recovered. The adhesive layer and the copper clad laminate were prepared and evaluated in the same manner as in Example 1 except that the resin varnish thus obtained was used. The results were as shown in Table 2.
- Examples 5-7 The raw material components for the resin varnish and the organic solvent (toluene) were weighed so that the mixing ratio (mass ratio) shown in Table 2 was 10 parts by weight.
- the weighed raw material components for the resin varnish and the solvent were put into a flask, and stirred at 60 ° C. for 30 minutes with a propeller-type stirrer to dissolve the resin component in the solvent, and the resin varnish was recovered.
- the adhesive layer and the copper clad laminate were prepared and evaluated in the same manner as in Example 1 except that the resin varnish thus obtained was used. The results were as shown in Table 2.
- Example 8 (Comparison) The raw material components for resin varnish and the organic solvent (mixed solvent of 50% toluene and 50% methyl ethyl ketone) were weighed so that the blending ratio (mass ratio) shown in Table 3 was 10 parts by weight. The weighed raw material components for the resin varnish and the solvent were put into a flask, and stirred at 60 ° C. for 30 minutes with a propeller-type stirrer to dissolve the resin component in the solvent, and the resin varnish was recovered. The adhesive layer and the copper clad laminate were prepared and evaluated in the same manner as in Example 1 except that the resin varnish thus obtained was used. The results were as shown in Table 3.
- Examples 9 and 10 (Comparison) The raw material components for the resin varnish and the organic solvent (mixed solution of 25% dimethylacetamide and 75% cyclopentanone) were added so that the blending ratio (mass ratio) shown in Table 3 and the solid content ratio would be 10 parts by weight. Weighed. The weighed raw material components for the resin varnish and the solvent were put into a flask, and stirred at 60 ° C. for 30 minutes with a propeller-type stirrer to dissolve the resin component in the solvent, and the resin varnish was recovered. The adhesive layer and the copper clad laminate were prepared and evaluated in the same manner as in Example 1 except that the resin varnish thus obtained was used. The results were as shown in Table 3.
- Example 11 (Comparison) A copper foil laminate was prepared and the transmission loss was measured in the same manner as in Example 1 except that the adhesive layer was not formed. The results were as shown in Table 3.
- Example 12 (Comparison) A copper foil laminate was prepared and transmission loss was measured in the same manner as in Example 2 except that the adhesive layer was not formed. The results were as shown in Table 3.
- Example 13 (Comparison) A copper foil laminate was prepared and the transmission loss was measured in the same manner as in Example 3 except that the adhesive layer was not formed. The results were as shown in Table 3.
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Abstract
Description
銅箔と、
前記銅箔の表面に設けられ、ポリフェニレンエーテル樹脂、ポリイミド樹脂、オレフィン系樹脂、液晶ポリマー、ポリエステル樹脂、ポリスチレン樹脂、炭化水素エラストマー、ベンゾオキサジン樹脂、活性エステル樹脂、シアネートエステル樹脂、ビスマレイミド樹脂、ブタジエン樹脂、水添又は非水添スチレンブタジエン樹脂、エポキシ樹脂、フッ素樹脂、ビニル基を有する樹脂、及びこれらの共重合体からなる群から選択される1種以上を含む、接着剤層と、
前記接着剤層の表面に設けられる樹脂層と、
を含む銅張積層板であって、前記銅箔の前記接着剤層側の表面における、ISO25178に準拠して測定される最大高さSzが6.8μm以下であり、かつ、前記接着剤層の周波数1GHzにおける誘電正接値δaが、前記樹脂層の周波数1GHzにおける誘電正接値δrと同等又はそれ以下である、銅張積層板が提供される。
ISO25178に準拠して測定される最大高さSzが6.8μm以下である表面を有する銅箔を用意する工程と、
前記銅箔の表面に、ポリフェニレンエーテル樹脂、ポリイミド樹脂、オレフィン系樹脂、液晶ポリマー、ポリエステル樹脂、ポリスチレン樹脂、炭化水素エラストマー、ベンゾオキサジン樹脂、活性エステル樹脂、シアネートエステル樹脂、ビスマレイミド樹脂、ブタジエン樹脂、水添又は非水添スチレンブタジエン樹脂、エポキシ樹脂、フッ素樹脂、ビニル基を有する樹脂、及びこれらの共重合体からなる群から選択される1種以上を含み、硬化後の周波数1GHzにおける誘電正接値がδaである接着剤を含む樹脂ワニスを塗布して乾燥させ、接着剤付銅箔を得る工程と、
前記接着剤付銅箔を、周波数1GHzにおける誘電正接値がδrである樹脂層に張り合わせて銅張積層板とする工程と、
を含み、前記δaが前記δrと同等又はそれ以下である、銅張積層板の製造方法が提供される。
本発明を特定するために用いられるパラメータの定義を以下に示す。
本発明の銅張積層板は、銅箔、接着剤層及び樹脂層を含む。接着剤層は、ポリフェニレンエーテル樹脂、ポリイミド樹脂、オレフィン系樹脂、液晶ポリマー、ポリエステル樹脂、ポリスチレン樹脂、炭化水素エラストマー、ベンゾオキサジン樹脂、活性エステル樹脂、シアネートエステル樹脂、ビスマレイミド樹脂、ブタジエン樹脂、水添又は非水添スチレンブタジエン樹脂、エポキシ樹脂、フッ素樹脂、ビニル基を有する樹脂、及びこれらの共重合体からなる群から選択される1種以上を含み、銅箔の表面に設けられる。樹脂層は、接着剤層の表面に設けられる。銅張積層板は、銅箔の接着剤層側の表面における、最大高さSzが6.8μm以下である。また、接着剤層の周波数1GHzにおける誘電正接値δaが、樹脂層の周波数1GHzにおける誘電正接値δrと同等又はそれ以下である。このように、銅箔、接着剤層及び樹脂層を順に備えた銅張積層板において、接着剤層として特定の樹脂を選択し、かつ、銅箔の接着剤層側の表面粗さを特定することにより、銅箔及び樹脂層間の十分な剥離強度を確保しながら、樹脂層の呈する伝送特性を更に改善可能な、銅張積層板を提供できる。したがって、本発明の銅張積層板は、例えば信号周波数10GHz以上の高周波帯域で用いられる、自動車用アンテナ、携帯電話基地局アンテナ、高性能サーバー、衝突防止用レーダー等に用いられる高周波基板、あるいはネットワーク機器における高周波デジタル通信用のプリント配線板用途等に好ましく適用可能である。そのようなネットワーク機器の例としては、(i)基地局内サーバー、ルーター等、(ii)企業内ネットワーク、(iii)高速携帯通信の基幹システム等が挙げられる。
<樹脂ワニス用原料成分>
‐ ポリフェニレンエーテル樹脂(PPE):OPE-2St-2200(二官能ポリフェニレンエーテルオリゴマーのスチレン誘導体、三菱ガス化学株式会社製、数平均分子量約2200、120℃での粘度:8000Pa・s未満)
‐ 環状オレフィン樹脂:L3PS(シクロオレフィン、日本ゼオン株式会社製、誘電率
(1GHz):2.2(公称値)、誘電正接(1GHz):0.0018(公称値))
‐ 環状オレフィン樹脂:TOPAS6017(環状オレフィンコポリマー、ポリプラスチックス株式会社製)
‐ 水添スチレンブタジエン樹脂:MP-10(水添スチレン系熱可塑性エラストマー、旭化成株式会社製、誘電率(1GHz):2.4、誘電正接(1GHz):0.0012)
‐ スチレンブタジエン樹脂:TR2003(JSR製)
‐ 低誘電ポリイミド樹脂:PIAD-301(末端官能基:カルボキシル基、溶媒:シクロヘキサノン、メチルシクロヘキサン及びエチレングルコールジメチルエーテルの混合液、荒川化学工業株式会社製、誘電率(1GHz):2.70、誘電正接(1GHz):0.003、軟化点:140℃)
‐ エポキシ樹脂:NC-3000H(ビフェニルアラルキル型、日本化薬株式会社製、エポキシ当量288g/Eq)
‐ エポキシ化ポリブタジエン樹脂:JP100(日本曹達株式会社製)
‐ マレイミド樹脂:MIR-3000(ビフェニルアラルキル型、日本化薬株式会社製、官能基当量275g/Eq)
‐ ポリカルボジイミド樹脂:カルボジライトV-09GB(日清紡ケミカル株式会社製)
‐ イミダゾール系硬化促進剤:2P4MHZ(四国化成工業株式会社製)
‐ ポリアミド樹脂:BPAM-155(フェノール性水酸基含有ポリブタジエン変性芳香族ポリアミド樹脂、日本化薬株式会社製)
‐ 無機フィラー:SC-2050MTX(アドマテックス株式会社製、平均粒径D50=0.5μm、表面フェニルアミノシラン処理品)
(1)電解銅箔の作製
3種類の電解銅箔A~Cを以下の方法により作製した。
硫酸銅溶液中で、陰極にチタン製の回転電極(表面粗さRa=0.20μm)を陽極にDSAを用い、溶液温度45℃、電流密度55A/dm2で電解し、原箔を作製した。この硫酸銅溶液の組成は、銅濃度80g/L、フリー硫酸濃度140g/L、ビス(3-スルホプロピル)ジスルフィド濃度30mg/L、ジアリルジメチルアンモニウムクロライド重合体濃度50mg/L、塩素濃度40mg/Lとした。その後、原箔の電解液面に対して下記(a)~(c)の表面処理を順次行った。
(a)亜鉛-ニッケル被膜形成
‐ ピロリン酸カリウム濃度:80g/L
‐ 亜鉛濃度:0.2g/L
‐ ニッケル濃度:2g/L
‐ 溶液温度:40℃
‐ 電流密度:0.5A/dm2
(b)クロメート層形成
‐ クロム酸濃度:1g/L、pH11
‐ 溶液温度:25℃
‐ 電流密度:1A/dm2
(c)シラン層形成
‐ シランカップリング剤:3-アミノプロピルトリメトキシシラン(3g/L水溶液)
‐ 液処理方法:シャワー処理
電解銅箔Aの原箔の電解液面側の表面に、粒子状突起を形成させた後、電解銅箔Aと同様の表面処理を行った。粒子突起の形成は、以下の3段階の電解処理により行った。1段目の電解処理は、硫酸銅溶液(銅濃度:10.5g/L、フリー硫酸濃度:220g/L)中にて、溶液温度30℃、電流密度28A/dm2の条件で行った。2段目の電解処理は、硫酸銅溶液(銅濃度:10.5g/L、フリー硫酸濃度:220g/L)中にて、溶液温度30℃、電流密度16A/dm2の条件で行った。3段目の電解処理は、硫酸銅溶液(銅濃度:70g/L、フリー硫酸濃度:220g/L)中にて、溶液温度52℃、電流密度21A/dm2の条件で行った。
電極面側の表面粗さがRzjis=1.4μmの電解銅箔を用いて、電極面側に微細銅粒子を付着形成する粗化処理を行った。具体的には、上記電解銅箔を、銅濃度が8g/L、フリー硫酸濃度が150g/L、添加剤(ニカワ)を含有する液温が25℃の銅電解液に浸漬し、200C/dm2の電気量を用いて、10秒間通電し、電極面側の表面に微細銅粒子を析出付着させた。その後、「被せめっき」を行い、微細銅粒子を当該電極面に定着させた。この被せめっきは、銅濃度が70g/L、フリー硫酸濃度が120g/L、液温が45℃、電流密度が25A/dm2の平滑めっき条件で行った。
レーザー顕微鏡(株式会社キーエンス製、VK-X100)を用いた表面性状解析により、銅箔表面における最大高さSzの測定をISO25178に準拠して行った。具体的には、銅箔表面における測定視野100μm×100μmの二次元領域の表面プロファイルをレーザー法により測定した。同一サンプルに対して3か所測定したときの平均値を最大高さSzの値として採用した。結果は、表1に示されるとおりであった。
レーザー顕微鏡(株式会社キーエンス製、VK-X100)を用いた表面性状解析により、銅箔表面におけるクルトシス(尖り度)Skuの測定をISO25178に準拠して行った。具体的には、銅箔表面における測定視野100μm×100μmの二次元領域の表面プロファイルを、レーザー法により測定した。同一サンプルに対して10か所測定したときの平均値をクルトシス(尖り度)Skuとして採用した。結果は、表1に示されるとおりであった。
表2に示される配合比(質量比)でかつ固形分割合が10重量部となるように、上記樹脂ワニス用原料成分と有機溶剤(トルエン50%とメチルエチルケトン50%の混合溶媒)を秤量した。秤量した樹脂ワニス用原料成分及び溶剤をフラスコに投入し、60℃で30分間プロペラ式攪拌装置にて撹拌させて樹脂成分を溶剤に溶解させ、樹脂ワニスを回収した。
上記(1)で得られた樹脂ワニスを、銅箔A(例1)、銅箔B(例2)又は銅箔C(例3)の上記Sz及びSkuを有する面に、乾燥後の塗工厚みが50μmの厚さとなるよう塗工した。塗工した樹脂ワニスをオーブンで乾燥させ、半硬化(Bステージ)状態とした。こうして図1に示されるように銅箔12の片面に接着剤層14を備えた接着剤付銅箔10を2枚作製した。図1に示されるように、2枚の接着剤付銅箔10を接着剤層14同士が重なるように積層して、プレス温度190℃、温度保持時間90分、プレス圧力400Nの条件で真空プレスを行い、接着剤層14を硬化状態とした。こうして硬化された接着剤層14の厚さは100μmであった。プレス後の積層体から銅箔をエッチングして除去し、接着剤層14単独からなる樹脂フィルムを得た。
上記得られた接着剤層14単独からなる樹脂フィルムについて、ネットワークアナライザー(キーサイト社製、PNA-L N5234A)を用いてSPDR誘電体共振器法により、1GHzにおける誘電正接値δaを測定した。この測定はASTMD2520(JIS C2565:1992)に準拠して行った。結果は表2に示されるとおりであった。また、表2には、後述の(4)及び(5)で樹脂層として用いられるプリプレグの1GHzにおける誘電正接値δrとの大小関係も併記している。表2から分かるように、接着剤層の周波数1GHzにおける誘電正接値δaは、樹脂層(プリプレグ)の周波数1GHzにおける誘電正接値δr(=0.003)と同等又はそれ以下であることが分かる。
上記(3)と同様の手順に従って、図2に示されるように、銅箔22、すなわち銅箔A(例1)、銅箔B(例2)又は銅箔C(例3)の上記Sz及びSkuを有する面に対して乾燥後の塗工厚みが4μmの厚さとなるよう接着剤層24を形成し、接着剤付銅箔20を作製した。次いで、接着剤付銅箔20を最外層として、樹脂層26である2枚のプリプレグ(パナソニック株式会社製MEGTRON-6、実厚さ200μm、SPDR法による1GHzにおける誘電率Dk:3.9、誘電正接Df:0.003)と共に積層して厚さ0.25mmの樹脂基材を得た。図2に示されるように、プレス温度190℃、温度保持時間120分、プレス圧力300Nの条件で真空プレスを行い、接着剤層24を硬化状態として銅張積層板28を得た。得られた銅張積層板28に剥離強度測定試験用の回路形成を行った。具体的には、銅張積層板28の両面にドライフィルムを張り合わせて、エッチングレジスト層を形成した。そして、その両面のエッチングレジスト層に、10mm幅の剥離強度測定試験用の回路を露光現像し、エッチングパターンを形成した。その後、銅エッチング液で回路エッチングを行い、エッチングレジストを剥離して回路22aを得た。こうして形成された回路22aを接着剤層24から剥離して、回路22a及び接着剤層24間の剥離強度R(kN/m)を測定した。この剥離強度Rの測定はJIS C 6481-1996に準拠して行った。結果は表2に示されるとおりであった。
上記(3)と同様の手順に従って、図2に示されるように、銅箔22、すなわち銅箔A(例1)、銅箔B(例2)又は銅箔C(例3)の上記Sz及びSkuを有する面に対して乾燥後の塗工厚みが4μmの厚さとなるよう接着剤層24を形成し、接着剤付銅箔20を作製した。次いで、接着剤付銅箔20を最外層として、樹脂層26である2枚のプリプレグ(パナソニック株式会社製MEGTRON-6、実厚さ68μm、SPDR法による1GHzにおける誘電率Dk:3.9、誘電正接Df:0.003)と共に積層して厚さ0.14mmの両面銅張積層板28を得た。その後、銅箔をパターンエッチングすることにより、マイクロストリップ回路を作成した。回路の特性インピーダンスが50Ωとなるパターンを選定し、50GHzにおける伝送損失S21(db/cm)を測定した。結果は表2に示されるとおりであった。なお、表2には、接着剤層を用いないで銅箔A、B又はCを直接プリグレグに積層したこと以外は上記同様にして作製された参照サンプルの50GHzにおける伝送損失S21(db/cm)(後述する例11~13を参照)に対する相対割合(%)も併せて示してある。この相対割合が低いほど、接着剤層による伝送損失の低減効果が大きいことを意味する。
表2に示される配合比(質量比)でかつ固形分割合が30重量部となるように、上記樹脂ワニス用原料成分と有機溶剤(シクロペンタノン)を秤量した。秤量した樹脂ワニス用原料成分及び溶剤をフラスコに投入し、常温で30分間プロペラ式攪拌装置にて撹拌させて樹脂成分を溶剤に溶解させ、樹脂ワニスを回収した。こうして得られた樹脂ワニスを使用したこと以外は例1と同様にして、接着剤層及び銅張積層板の作製及び評価を行った。結果は表2に示されるとおりであった。
表2に示される配合比(質量比)でかつ固形分割合が10重量部となるように、上記樹脂ワニス用原料成分と有機溶剤(トルエン)を秤量した。秤量した樹脂ワニス用原料成分及び溶剤をフラスコに投入し、60℃で30分間プロペラ式攪拌装置にて撹拌させて樹脂成分を溶剤に溶解させ、樹脂ワニスを回収した。こうして得られた樹脂ワニスを用いたこと以外は例1と同様にして、接着剤層及び銅張積層板の作製及び評価を行った。結果は表2に示されるとおりであった。
表3に示される配合比(質量比)でかつ固形分割合が10重量部となるように、上記樹脂ワニス用原料成分と有機溶剤(トルエン50%とメチルエチルケトン50%の混合溶媒)を秤量した。秤量した樹脂ワニス用原料成分及び溶剤をフラスコに投入し、60℃で30分間プロペラ式攪拌装置にて撹拌させて樹脂成分を溶剤に溶解させ、樹脂ワニスを回収した。こうして得られた樹脂ワニスを用いたこと以外は例1と同様にして、接着剤層及び銅張積層板の作製及び評価を行った。結果は表3に示されるとおりであった。
表3に示される配合比(質量比)でかつ固形分割合が10重量部となるように、上記樹脂ワニス用原料成分と有機溶剤(ジメチルアセトアミド25%とシクロペンタノン75%の混合溶液)を秤量した。秤量した樹脂ワニス用原料成分及び溶剤をフラスコに投入し、60℃で30分間プロペラ式攪拌装置にて撹拌させて樹脂成分を溶剤に溶解させ、樹脂ワニスを回収した。こうして得られた樹脂ワニスを用いたこと以外は例1と同様にして、接着剤層及び銅張積層板の作製及び評価を行った。結果は表3に示されるとおりであった。
接着剤層を形成しなかったこと以外は例1と同様にして、銅箔積層板の作製及び伝送損失の測定を行った。結果は表3に示されるとおりであった。
接着剤層を形成しなかったこと以外は例2と同様にして、銅箔積層板の作製及び伝送損失の測定を行った。結果は表3に示されるとおりであった。
接着剤層を形成しなかったこと以外は例3と同様にして、銅箔積層板の作製及び伝送損失の測定を行った。結果は表3に示されるとおりであった。
Claims (14)
- 銅箔と、
前記銅箔の表面に設けられ、ポリフェニレンエーテル樹脂、ポリイミド樹脂、オレフィン系樹脂、液晶ポリマー、ポリエステル樹脂、ポリスチレン樹脂、炭化水素エラストマー、ベンゾオキサジン樹脂、活性エステル樹脂、シアネートエステル樹脂、ビスマレイミド樹脂、ブタジエン樹脂、水添又は非水添スチレンブタジエン樹脂、エポキシ樹脂、フッ素樹脂、ビニル基を有する樹脂、及びこれらの共重合体からなる群から選択される1種以上を含む、接着剤層と、
前記接着剤層の表面に設けられる樹脂層と、
を含む銅張積層板であって、前記銅箔の前記接着剤層側の表面における、ISO25178に準拠して測定される最大高さSzが6.8μm以下であり、かつ、前記接着剤層の周波数1GHzにおける誘電正接値δaが、前記樹脂層の周波数1GHzにおける誘電正接値δrと同等又はそれ以下である、銅張積層板。 - 前記銅箔の前記接着剤層側の表面における最大高さSzが0.15μm以上6.8μm以下である、請求項1に記載の銅張積層板。
- 前記接着剤層の周波数1GHzにおける誘電正接値δaが0.0001以上0.003以下である、請求項1又は2に記載の銅張積層板。
- 前記樹脂層の周波数1GHzにおける誘電正接値δrが0.0001以上0.03以下である、請求項1~3のいずれか一項に記載の銅張積層板。
- 前記銅箔の接着剤層側の表面における、ISO25178に準拠して測定されるクルトシスSkuが2.0以上4.0以下である、請求項1~4のいずれか一項に記載の銅張積層板。
- 前記接着剤層が、オレフィン系樹脂、ポリスチレン樹脂、液晶ポリマー、及びフッ素樹脂からなる群から選択される少なくとも1種を、前記接着剤層の合計重量に対して10重量%以上含む、請求項1~5のいずれか一項に記載の銅張積層板。
- 前記接着剤層が、ポリフェニレンエーテル樹脂を、前記接着剤層の合計重量に対して20重量%以上含む、請求項1~6のいずれか一項に記載の銅張積層板。
- 前記接着剤層が、ポリイミド樹脂を、前記接着剤層の合計重量に対して10重量%以上含む、請求項1~7のいずれか一項に記載の銅張積層板。
- 前記接着剤層が、ブタジエン樹脂、水添又は非水添スチレンブタジエン樹脂、エポキシ樹脂、及びビニル基を有する樹脂からなる群から選択される少なくとも1種を、前記接着剤層の合計重量に対して1重量%以上含む、請求項1~8のいずれか一項に記載の銅張積層板。
- 前記樹脂層が、ガラスクロスと、前記ガラスクロスに含浸される絶縁樹脂とを含む、請求項1~9のいずれか一項に記載の銅張積層板。
- 前記接着剤層の厚さが0.1μm以上20μm以下である、請求項1~10のいずれか一項に記載の銅張積層板。
- 前記樹脂層の厚さが5μm以上5mm以下である、請求項1~11のいずれか一項に記載の銅張積層板。
- JIS C 6481-1996に準拠して測定される、前記接着剤層に対する前記銅箔の剥離強度が0.3kN/m以上である、請求項1~12のいずれか一項に記載の銅張積層板。
- 請求項1~13のいずれか一項に記載の銅張積層板の製造方法であって、
ISO25178に準拠して測定される最大高さSzが6.8μm以下である表面を有する銅箔を用意する工程と、
前記銅箔の表面に、ポリフェニレンエーテル樹脂、ポリイミド樹脂、オレフィン系樹脂、液晶ポリマー、ポリエステル樹脂、ポリスチレン樹脂、炭化水素エラストマー、ベンゾオキサジン樹脂、活性エステル樹脂、シアネートエステル樹脂、ビスマレイミド樹脂、ブタジエン樹脂、水添又は非水添スチレンブタジエン樹脂、エポキシ樹脂、フッ素樹脂、ビニル基を有する樹脂、及びこれらの共重合体からなる群から選択される1種以上を含み、硬化後の周波数1GHzにおける誘電正接値がδaである接着剤を含む樹脂ワニスを塗布して乾燥させ、接着剤付銅箔を得る工程と、
前記接着剤付銅箔を、周波数1GHzにおける誘電正接値がδrである樹脂層に張り合わせて銅張積層板とする工程と、
を含み、前記δaが前記δrと同等又はそれ以下である、銅張積層板の製造方法。
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CN111836716A (zh) | 2020-10-27 |
CN111836716B (zh) | 2023-02-24 |
KR20200118144A (ko) | 2020-10-14 |
SG11202009376SA (en) | 2020-10-29 |
TW201941933A (zh) | 2019-11-01 |
JP7166334B2 (ja) | 2022-11-07 |
JPWO2019188087A1 (ja) | 2021-04-15 |
US11950376B2 (en) | 2024-04-02 |
US20210029823A1 (en) | 2021-01-28 |
TWI787480B (zh) | 2022-12-21 |
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