WO2019184224A1 - 显示面板及制作显示面板用掩模板 - Google Patents

显示面板及制作显示面板用掩模板 Download PDF

Info

Publication number
WO2019184224A1
WO2019184224A1 PCT/CN2018/102547 CN2018102547W WO2019184224A1 WO 2019184224 A1 WO2019184224 A1 WO 2019184224A1 CN 2018102547 W CN2018102547 W CN 2018102547W WO 2019184224 A1 WO2019184224 A1 WO 2019184224A1
Authority
WO
WIPO (PCT)
Prior art keywords
hole
holes
row
aperture
apertures
Prior art date
Application number
PCT/CN2018/102547
Other languages
English (en)
French (fr)
Inventor
王徐亮
刘明星
甘帅燕
高峰
Original Assignee
昆山国显光电有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 昆山国显光电有限公司 filed Critical 昆山国显光电有限公司
Priority to KR1020207000950A priority Critical patent/KR20200011047A/ko
Priority to EP18912132.0A priority patent/EP3623866A4/en
Priority to US16/333,229 priority patent/US20210363626A1/en
Priority to JP2019570531A priority patent/JP2020524218A/ja
Publication of WO2019184224A1 publication Critical patent/WO2019184224A1/zh

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C21/00—Accessories or implements for use in connection with applying liquids or other fluent materials to surfaces, not provided for in groups B05C1/00 - B05C19/00
    • B05C21/005—Masking devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • the present application relates to the field of display technologies, and in particular, to a display panel and a mask for fabricating the same.
  • the pixel array is generally prepared by an evaporation process, for example, by precisely depositing a light-emitting layer onto a substrate by a precision metal mask to form a high-density pixel array.
  • the number of openings of the reticle is increasing, and the density of the openings is increasing, resulting in a smaller and smaller distance between the openings, and the strength of the reticle is reduced.
  • the conventional scheme usually changes the shape or arrangement of the pixels to achieve the purpose of increasing the connection bridge area, thereby improving the strength of the mask.
  • the results obtained are usually limited.
  • the present application provides a display panel and a mask for manufacturing the display panel, which can improve the strength of the edge of the mask, thereby improving the precision of pixel evaporation, and avoiding the problem of uneven color development at the edge of the display panel.
  • the application provides a mask for manufacturing a display panel, including:
  • a display area a plurality of first through holes arranged at intervals;
  • a transition display area is disposed at a periphery of the display area, and a plurality of second through holes are provided at intervals;
  • the density of the second through hole is smaller than the density of the first through hole.
  • the mask plate changes the density of the second via hole of the edge transition display region, reduces the density of the second via hole in the transition display region, and helps to increase the second portion without affecting the display effect.
  • the distance between the through holes increases the area of the connecting bridge between the second through holes, increasing the strength of the edge region of the mask.
  • the geometric center of the first through hole is a first hole, and the geometric center of the second through hole is a second hole;
  • the aperture of the second through hole is smaller than the aperture of the first through hole.
  • first hole core and the second hole core are arranged in a row in a horizontal direction, and the first hole core and the second hole core are arranged in a row in a vertical direction;
  • a distance between two adjacent first holes in the horizontal direction is equal, and a distance between two adjacent first holes in the vertical direction is equal;
  • the distance between the two second holes adjacent in the horizontal direction is equal, and the distance between the two first holes adjacent in the vertical direction is equal.
  • a distance between two of the first apertures adjacent in the horizontal direction is equal to a distance between two of the second apertures adjacent in the horizontal direction
  • the distance between the two first holes adjacent in the vertical direction is equal to the distance between the two second holes adjacent in the vertical direction.
  • the second through hole closest to the display area is the first row of through holes of the transition display area, and the transition display area is sequentially in a direction away from the display area. a second through hole to a Nth through hole, wherein the N is a positive integer;
  • a row of the second through holes closest to the display area is a first column of through holes of the transition display area, and in a direction away from the display area, a second column of through holes of the transition display area is sequentially a M-th through hole, wherein the M is a positive integer;
  • the apertures of the Nth row via and the Mth column via are at least 0.3 times the aperture of the first via.
  • the apertures of the first row of vias to the Nth row of vias are reduced by a first predetermined rule, and the first column of vias are to the of the Mth column of vias The aperture is reduced by a second predetermined rule.
  • the number of rows and the number of columns of the second via hole are the same.
  • the second through hole is two rows and two columns
  • the apertures of the first row of via holes and the first column of via holes are 0.6-0.9 times the aperture of the first via hole;
  • the apertures of the second row of vias and the second column of vias are 0.3-0.6 times the aperture of the first via.
  • the second through hole is three rows and three columns
  • the apertures of the first row of via holes and the first column of via holes are 0.7-0.9 times the aperture of the first via hole;
  • the apertures of the second row of through holes and the second row of through holes are 0.5-0.7 times of the aperture of the first through hole;
  • the apertures of the third row of vias and the third row of vias are 0.3-0.5 times the aperture of the first via.
  • the second through holes are four rows and four columns
  • the apertures of the first row of via holes and the first column of via holes are 0.8-0.9 times the aperture of the first via hole;
  • the apertures of the second row of through holes and the second row of through holes are 0.6-0.8 times the aperture of the first through hole;
  • the apertures of the third row of through holes and the third row of through holes are 0.4 to 0.6 times the aperture of the first through hole;
  • the apertures of the fourth row of vias and the fourth row of vias are 0.3-0.4 times the aperture of the first via.
  • the second through hole is five rows and five columns
  • the apertures of the first row of via holes and the first column of via holes are 0.8-0.9 times the aperture of the first via hole;
  • the apertures of the second row of vias and the second row of vias are 0.7-0.8 times the aperture of the first via
  • the apertures of the third row of through holes and the third row of through holes are 0.6-0.7 times of the aperture of the first through hole;
  • the apertures of the fourth row of through holes and the fourth row of through holes are 0.4-0.6 times the aperture of the first through hole;
  • the apertures of the fifth row of via holes and the fifth row of via holes are 0.3 to 0.4 times the aperture of the first via hole.
  • the number of rows and the number of columns of the second via are different.
  • the second through holes are three rows and four columns
  • the aperture of the first row of through holes is 0.7-0.9 times of the aperture of the first through hole; the aperture of the second row of through holes is 0.5-0.7 times of the aperture of the first through hole;
  • the pore diameter of the pore is 0.3-0.5 times the pore diameter of the first through hole;
  • the aperture of the first column through hole is 0.8-0.9 times the aperture of the first through hole; the aperture of the second column through hole is 0.6-0.8 times the aperture of the first through hole; the third The aperture of the column through hole is 0.4-0.6 times the aperture of the first through hole; and the aperture of the fourth column through hole is 0.3-0.4 times the aperture of the first through hole.
  • the application also provides a display panel comprising:
  • Pixels arranged in an array on the display substrate are arranged in an array on the display substrate
  • the pixel is produced by a mask as described above.
  • FIG. 1 is a schematic structural view of a fine metal mask in a conventional scheme
  • FIG. 2 is a partial enlarged view of a display area opening and a transition display area opening of a fine metal mask in a conventional scheme
  • FIG 3 is a schematic structural view of a mask plate of one embodiment of the present application.
  • FIG. 1 is a schematic structural view of a fine metal mask in a conventional scheme.
  • the fine metal mask 100 is divided into a display area 300 and a transition display area 200.
  • the display area 300 is a pixel evaporation area of the main display area of the display panel
  • the transition display area 200 is a transition area of the display area 300 and the edge of the fine metal mask.
  • the fine metal mask 100 is provided with openings arranged in an array for vapor-depositing the evaporation material onto the array substrate.
  • 2 is a partial enlarged view of a display area opening and a transition display area opening of a fine metal mask in a conventional scheme.
  • the openings of the display area 300 and the transition display area 200 are identical, that is, the shape of the opening, the size of the opening, and the density of the opening are uniform.
  • the conventional solution usually fixes the fine metal mask to a metal frame, and then fixes the fine metal mask with the metal frame on the array substrate, and then performs Evaporation.
  • the fine metal mask is fixed in the metal frame, it is necessary to firstly use a suitable force to stretch the fine metal mask, and then apply a suitable opposing force on the metal frame to deform the metal frame, and finally the fineness of the stretching.
  • the metal mask is fixed on the metal frame to which the opposing force is applied, and the fine metal mask is tightened by the restoring force generated by the deformation of the metal frame, so that the fine metal mask does not sag during the evaporation process.
  • This process of pre-tensioning a fine metal mask is commonly referred to as a web process.
  • the conventional scheme In general, in order to improve the precision of evaporation, the conventional scheme also needs to perform PMA (pixel position accuracy) debugging to realize the positioning of the fine mask and the array substrate. Therefore, in the process of drawing nets, it is necessary to find a suitable tensile force and a resistance force for deforming the metal frame, and to adjust the strength by the test of the physical object to meet the needs of the vapor deposition precision.
  • the openings of the fine metal mask are more and more dense, the distance between the openings, that is, the size of the connecting bridge between the openings, becomes smaller and smaller, resulting in the fine metal mask being easily damaged in the web process, especially It is the fixed part of the edge. Due to the concentrated force, the evaporation edge area is prone to breakage, which causes problems such as vapor deposition offset and edge color mixing, which increases the difficulty and cost of the evaporation process and affects the evaporation process. Preparation efficiency.
  • the present application provides a reticle having a special structure.
  • the mask provided by the present application has high strength, thereby improving the precision of pixel evaporation and avoiding the problem of uneven color development at the edge of the display panel.
  • 3 is a schematic structural view of a mask plate of one embodiment of the present application.
  • the mask 500 is used to fabricate a display panel.
  • the mask 500 includes a display area 520 and a transition display area 510.
  • the display area 520 is configured to evaporate pixels to the main display area of the display panel, and the display area 520 is provided with a plurality of first through holes 521 disposed at intervals.
  • the transition display area 510 is disposed at a periphery of the display area 520, and the transition display area 510 is provided with a plurality of second through holes 511 spaced apart.
  • the transition display area 510 is used for transition between the display area 520 and the edge of the reticle 500.
  • the density of the second through hole 511 is smaller than the density of the first through hole 521. That is, the percentage of the area occupied by the second through hole 511 in the transition display area 510 of the mask 500 is smaller than the area occupied by the first through hole 521 in the display area 520 of the mask 500.
  • the shape of the opening of the display area 300 and the transition display area 200, the size of the opening, and the density of the opening are identical. Therefore, the edge of the mask 100 is easily broken, resulting in a problem of uneven color development in the edge region of the display panel produced by the mask. Therefore, in the present application, changing the density of the second through hole 511 of the transition display area 510 reduces the density of the second through hole 511 in the transition display area 510 without affecting the display effect. It is helpful to increase the distance between the second through holes 511, thereby increasing the area of the connecting bridge between the second through holes 511, and improving the strength of the edge region of the mask 500.
  • the geometric center of the first through hole 521 of the display area 520 is a first hole center.
  • the geometric center of the second through hole 511 of the transition display area 510 is a second hole center.
  • the arrangement of the first hole in the display area is the same as the arrangement of the second hole in the filter display area, and the aperture of the second through hole 511 is smaller than the first through hole.
  • the present application reduces the second through hole 511 in the transition display area 510 by reducing the aperture of the second through hole 511 and increasing the distance between the outer edges of the adjacent second through holes 511.
  • the density inside is increased to increase the area of the connecting bridge between the second through holes 511, and the edge strength of the mask 500 is increased.
  • the first and second holes are arranged in a row in a horizontal direction.
  • the first hole core and the second hole core are arranged in a row in a vertical direction.
  • the distance between the two first holes adjacent in the horizontal direction is equal, and the distance between the two first holes adjacent in the vertical direction is equal;
  • the distance between the two adjacent second holes in the horizontal direction is equal, and the distance between the two first holes adjacent in the vertical direction is equal.
  • a distance between two of the first apertures adjacent in the horizontal direction is equal to a distance between two of the second apertures adjacent in the horizontal direction; in the vertical direction
  • a distance between two adjacent ones of the first holes is equal to a distance between two of the second holes adjacent in the vertical direction.
  • the first hole core and the second hole core are arranged in the same array manner, except that the aperture of the second through hole 511 in the transition display region 510 is reduced, adjacent The distance between the second through holes 511 increases, so that the density of the second through holes 511 in the transition display region 510 decreases.
  • the present application simply and conveniently changes the structure of the mask 500, and further reduces the manufacturing process difficulty of the mask 500, improves the strength of the mask 500, and helps to improve the stability of the web process.
  • a direction extending away from the display area 520 in a horizontal direction is a first direction (X)
  • a direction extending away from the display area 520 in a vertical direction is The second direction (Y).
  • the second through holes 511 are sequentially arranged in the first direction with a first column through hole, a second column through hole, a Mth column through hole, wherein M is a positive integer.
  • the first row of through holes is a row of second through holes closest to the display area 520 in the first direction
  • the Mth column of the through holes is the second line of the second row farthest from the display area 520 in the first direction. hole.
  • the second through holes 511 are sequentially arranged with the first row of through holes, the second row of through holes, and the Nth row of through holes in the second direction, wherein N is a positive integer.
  • the first row of via holes is a row of second via holes closest to the display region 520 in the second direction
  • the Nth row of via holes is a row of second pass farthest from the display region 520 in the second direction. hole.
  • the apertures of the Nth row via and the Mth column via are at least 0.3 times the aperture of the first via 521 of the display region 520 to avoid the edge of the mask 500.
  • the aperture of the second through hole 511 is too small, which has a great influence on the actual effect of the edge region.
  • an aperture of the first row of through holes to the Nth row of through holes is reduced according to a first predetermined rule, and an aperture of the first column of through holes to the Mth column of through holes Reduced by the second preset rule.
  • the first preset rule and the second preset rule may be the same or different.
  • the first preset rule may be adjusted according to the number of rows of the second through holes.
  • the second preset rule may be adjusted according to the number of columns of the second through holes.
  • the first predetermined rule is that the aperture decreases from the first row of through holes toward the Nth row of through holes
  • the second predetermined rule is that the aperture is from the first column of through holes toward the first M The column through holes are reduced.
  • the number of rows and the number of columns of the second vias of the transition display region 510 may be the same.
  • the apertures of the first row of through holes and the first column of through holes are 0.6- of the aperture of the first through hole 521. 0.9 times.
  • the apertures of the second row of vias and the second row of vias are 0.3-0.6 times the aperture of the first vias 521.
  • the apertures of the first row of through holes and the first column of through holes are 0.7- of the aperture of the first through hole 521. 0.9 times.
  • the apertures of the second row of vias and the second row of vias are 0.5-0.7 times the aperture of the first vias 521.
  • the apertures of the third row of vias and the third row of vias are 0.3-0.5 times the aperture of the first vias 521.
  • the apertures of the first row of through holes and the first column of through holes are 0.8- of the aperture of the first through hole 521. 0.9 times.
  • the apertures of the second row of vias and the second row of vias are 0.6-0.8 times the aperture of the first vias 521.
  • the apertures of the third row of vias and the third row of vias are 0.4-0.6 times the aperture of the first vias 521.
  • the apertures of the fourth row of vias and the fourth row of vias are 0.3-0.4 times the aperture of the first vias 521.
  • the apertures of the first row of through holes and the first column of through holes are 0.8-0.9 of the aperture of the first through hole 521. Times.
  • the apertures of the second row of vias and the second row of vias are 0.7-0.8 times the aperture of the first vias 521.
  • the apertures of the third row of vias and the third row of vias are 0.6-0.7 times the aperture of the first vias 521.
  • the apertures of the fourth row of vias and the fourth row of vias are 0.4-0.6 times the aperture of the first vias 521.
  • the apertures of the fifth row through hole and the fifth column through hole are 0.3-0.4 times the aperture of the first through hole 521.
  • the number of rows and the number of columns of the second through holes of the transition display area 510 may be different.
  • the law of variation of the aperture of the second through hole 511 is also different, by providing an optimum gradient of the aperture of the second through hole 511 for different number of rows and columns. Rules, an optimal transition to the display effect of the transition display area 510 can be achieved.
  • the number of rows of the second through holes 511 may not be equal to the number of columns of the second through holes 511. That is to say, the number of rows and the number of columns of the second through holes 511 in the transition display area 510 may be different.
  • the aperture variation rule of the second through hole 511 can refer to the above scheme.
  • the transition display area 510 may be arranged in three rows and four columns.
  • the second through holes 511 of the three rows may be disposed such that the aperture of the first row of through holes is 0.7-0.9 times the aperture of the first through hole 521; and the aperture of the second row of through holes is the
  • the through hole 521 has a hole diameter of 0.5-0.7 times; the third row through hole has a hole diameter of 0.3-0.5 times the hole diameter of the first through hole 521.
  • the second row of the second through holes 511 may be disposed such that the aperture of the first column through hole is 0.8-0.9 times the aperture of the first through hole 521; and the aperture of the second column through hole is the a through hole 521 is 0.6-0.8 times the aperture; the aperture of the third column through hole is 0.4-0.6 times the aperture of the first through hole 521; and the aperture of the fourth column through hole is the first pass
  • the pores 521 have a pore size of 0.3-0.4 times.
  • the present application also provides a display panel including a display substrate and pixels arranged in an array on the display substrate.
  • the pixels are fabricated from a mask as previously described.
  • the display panel has high resolution and high pixel evaporation precision, which can avoid the problem of uneven display of edges on the display panel.
  • the reticle 500 of the present application can increase the design margin in the horizontal direction and the vertical direction.
  • the result of PPA (pixel position accuracy) debugging of the mask of the present application is superior to that of the conventional scheme.
  • the strength of the mask 100 is improved, and the problem of uneven color development at the edge of the display panel is also significantly reduced.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

一种显示面板及制作显示面板用掩模板（500）。掩模板（500）用于制作显示面板，包括显示区（520），开设有多个间隔设置的第一通孔（521）；以及过渡显示区（510），设置于所述显示区（520）的周边，开设有多个间隔设置的第二通孔（511）。第二通孔（511）的密度小于第一通孔（521）的密度。显示面板包括显示基板和在所述显示基板上阵列排布的像素。像素由前述的掩模板（500）制作而成。该掩模板（500）能够提高掩模板的强度，从而提高像素蒸镀的精准度，避免出现显示面板的边缘显色不均的问题。

Description

显示面板及制作显示面板用掩模板 技术领域
本申请涉及显示技术领域，特别是涉及显示面板和制作该显示面板的掩模板。
背景技术
随着显示技术的发展，显示面板的分辨率越来越高，屏幕解析度大幅提高，使得像素阵列的密度越来越高，对显示面板的制程提出了较大的挑战。像素阵列一般采用蒸镀工艺制备，例如通过精密金属掩模板(Fine Metal Mask)将发光层精准地蒸镀到基板上，形成高密度的像素阵列。掩模板的开口数量越来越多，开口密度越来越大，导致开口之间的距离越来越小，掩模板强度降低。
为了增加掩模板的强度，传统方案通常会改变像素的形状或排列方式，以达到增加连接桥面积的目的，从而提高掩模板的强度。但是，通过改变像素排布方式来提高掩模板的强度，得到的结果通常是有限的。并且，在很多情况下，对于采用传统像素排布方式的显示面板的制备，以及无法调整像素排布的情况下，难以简单有效的提高掩模板的强度。
发明内容
基于此，本申请提供一种显示面板和制作该显示面板用的掩模板，能够提高掩模板边缘的强度，从而提高像素蒸镀的精准度，避免出现显示面板边缘显色不均的问题。
本申请提供一种掩模板，用于制作显示面板，包括：
显示区，开设有多个间隔设置的第一通孔；以及
过渡显示区，设置于所述显示区的周边，开设有多个间隔设置的第二通孔；
其中，所述第二通孔的密度小于所述第一通孔的密度。
上述掩模板改变所述边缘过渡显示区的第二通孔密度，降低所述第二通孔在所述过渡显示区的密度，在不影响显示效果的情况下，有助于增加所述第二 通孔之间的距离，增加所述第二通孔之间的连接桥的面积，提高所述掩模板的边缘区域的强度。
在其中一个实施例中，所述第一通孔的几何中心为第一孔心，所述第二通孔的几何中心为第二孔心；
所述第一孔心在所述显示区的排布方式与所述第二孔心在所述过滤显示区的排布方式相同；
所述第二通孔的孔径小于所述第一通孔的孔径。
在其中一个实施例中，所述第一孔心和所述第二孔心沿水平方向成行排布，所述第一孔心和所述第二孔心沿竖直方向成列排布；
在所述水平方向上相邻的两个所述第一孔心之间的距离相等，在所述竖直方向上相邻的两个所述第一孔心之间的距离相等；
在所述水平方向上相邻的两个所述第二孔心之间的距离相等，在所述竖直方向上相邻的两个所述第一孔心之间的距离相等。
在其中一个实施例中，在所述水平方向上相邻的两个所述第一孔心之间的距离等于在所述水平方向上相邻的两个所述第二孔心之间的距离；在所述竖直方向上相邻的两个所述第一孔心之间的距离等于在所述竖直方向上相邻的两个所述第二孔心之间的距离。
在其中一个实施例中，最靠近所述显示区的一行所述第二通孔为所述过渡显示区的第一行通孔，沿远离所述显示区的方向，依次为所述过渡显示区的第二行通孔至第N行通孔，其中所述N为正整数；
最靠近所述显示区的一列所述第二通孔为所述过渡显示区的第一列通孔，沿远离所述显示区的方向，依次为所述过渡显示区的第二列通孔至第M列通孔，其中所述M为正整数；
所述第N行通孔和所述第M列通孔的孔径至少为所述第一通孔孔径的0.3倍。
在其中一个实施例中，所述第一行通孔至所述第N行通孔的孔径按第一预设规则减小，且所述第一列通孔至所述第M列通孔的孔径按第二预设规则减小。
在其中一个实施例中，所述第二通孔的行数和列数相同。
在其中一个实施例中，当所述第二通孔为两行两列时，
所述第一行通孔和所述第一列通孔的孔径为所述第一通孔孔径的0.6-0.9倍；
所述第二行通孔和所述第二列通孔的孔径为所述第一通孔孔径的0.3-0.6倍。
在其中一个实施例中，当所述第二通孔为三行三列时，
所述第一行通孔和所述第一列通孔的孔径为所述第一通孔孔径的0.7-0.9倍；
所述第二行通孔和所述第二列通孔的孔径为所述第一通孔孔径的0.5-0.7倍；
第三行通孔和第三列通孔的孔径为所述第一通孔孔径的0.3-0.5倍。
在其中一个实施例中，当所述第二通孔为四行四列时，
所述第一行通孔和所述第一列通孔的孔径为所述第一通孔孔径的0.8-0.9倍；
所述第二行通孔和所述第二列通孔的孔径为所述第一通孔孔径的0.6-0.8倍；
第三行通孔和第三列通孔的孔径为所述第一通孔孔径的0.4-0.6倍；
第四行通孔和第四列通孔的孔径为所述第一通孔孔径的0.3-0.4倍。
在其中一个实施例中，当所述第二通孔为五行五列时，
所述第一行通孔和所述第一列通孔的孔径为所述第一通孔孔径的0.8-0.9倍；
所述第二行通孔和所述第二列通孔的孔径为所述第一通孔孔径的0.7-0.8倍；
第三行通孔和第三列通孔的孔径为所述第一通孔孔径的0.6-0.7倍；
第四行通孔和第四列通孔的孔径为所述第一通孔孔径的0.4-0.6倍；
第五行通孔和第五列通孔的孔径为所述第一通孔孔径的0.3-0.4倍。
在其中一个实施例中，所述第二通孔的行数和列数不同。
在其中一个实施例中，当所述第二通孔为三行四列时，
所述第一行通孔的孔径为所述第一通孔孔径的0.7-0.9倍；所述第二行通孔的孔径为所述第一通孔孔径的0.5-0.7倍；第三行通孔的孔径为所述第一通孔孔径的0.3-0.5倍；
所述第一列通孔的孔径为所述第一通孔孔径的0.8-0.9倍；所述第二列通孔的孔径为所述第一通孔孔径的0.6-0.8倍；所述第三列通孔的孔径为所述第一通孔孔径的0.4-0.6倍；所述第四列通孔的孔径为所述第一通孔孔径的0.3-0.4倍。
本申请还提供一种显示面板，包括：
显示基板；和
在所述显示基板上阵列排布的像素；
其中，所述像素由如前所述的掩模板制作得到。
附图说明
为了更清楚地说明本申请实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他实施例的附图。
图1是传统方案中的一种精细金属掩模板的结构示意图；
图2是传统方案中的精细金属掩模板的显示区开口和过渡显示区开口的局部放大图；
图3是本申请的一个实施例的掩模板的结构示意图。
具体实施方式
为使本申请的上述目的、特征和优点能够更加明显易懂，下面结合附图对本申请的具体实施方式做详细的说明。在下面的描述中阐述了很多具体细节以便于充分理解本申请。但是本申请能够以很多不同于在此描述的其它方式来实施，本领域技术人员可以在不违背本申请内涵的情况下做类似改进，因此本申请不受下面公开的具体实施例的限制。
在制作显示面板上的像素时，需要将像素的各层材料通过蒸镀工艺蒸镀到 阵列基板上。在蒸镀的过程中，需要使用相应的精细金属掩模板(Fine Metal Mask)。由于在蒸镀的过程中会产生高温，此时精细金属掩模板会发生热膨胀，导致精细金属掩模板在重力的作用下产生下垂现象，从而使得精细金属掩模板的几何形状发生变化，进而导致蒸镀材料不能被蒸镀到指定位置，影响蒸镀精度，导致显示面板出现显示不均和混色的问题。
图1是传统方案中的一种精细金属掩模板的结构示意图。如图1所示，所述精细金属掩模板100分为显示区300和过渡显示区200。显示区300为显示面板的主显示区的像素蒸镀区，过渡显示区200是显示区300与精细金属掩模板边缘的过渡区。所述精细金属掩模板100上设置有呈阵列分布的开口，用于将蒸镀材料蒸镀到阵列基板上。图2是传统方案中的精细金属掩模板的显示区开口和过渡显示区开口的局部放大图。如图2所示，传统方案中，所述显示区300和所述过渡显示区200的开口是一致的，即开口的形状、开口的尺寸和开口的密度是一致的。
为了避免蒸镀工艺中精细金属掩模板容易变形的问题，传统方案通常是将精细金属掩模板与一个金属框架进行固定，然后将带有金属框架的精细金属掩模板固定在阵列基板上，再进行蒸镀。具体地，在将精细金属掩模板固定在金属框架中时，需要先选用适当的力拉伸精细金属掩模板，然后在金属框架上施加合适的对抗力使金属框架变形，最后将拉伸的精细金属掩模板固定在被施加了对抗力的金属框架上，利用金属框架因变形而产生的回复力绷紧精细金属掩模板，从而使得精细金属掩模板在蒸镀过程中不会下垂。这种使精细金属掩模板预张紧的工艺通常被称作张网工艺。
一般来说，为了提高蒸镀的精度，传统方案还需要进行精细金属掩模板PPA(pixel position accuracy，像素点位精度)调试，以实现精细掩模板和阵列基板的定位。所以在张网工艺中，需要寻找合适的拉伸力和使金属框架产生形变的对抗力，并通过对实物的测试，调整力度，以满足蒸镀精度的需要。然而，由于精细金属掩模板的开口越来越密集，开口之间的距离、即开口之间的连接桥的尺寸越来越小，导致在张网工艺中精细金属掩模板极易被损坏，尤其是边缘的固定处，由于受力较为集中，导致在蒸镀边缘区容易出现破损，从而出现蒸 镀偏移、边缘混色等问题，增加了蒸镀工艺的难度及成本，影响了蒸镀工艺的制备效率。
为了提高掩模板的强度，本申请提供一种具有特殊结构的掩模板。本申请提供的掩模板具有较高的强度，从而提高像素蒸镀的精准度，避免出现显示面板的边缘显色不均的问题。图3是本申请的一个实施例的掩模板的结构示意图。如图3所示，掩模板500用于制作显示面板。掩模板500包括显示区520和过渡显示区510。所述显示区520用于向所述显示面板的主显示区蒸镀像素，所述显示区520开设有多个间隔设置的第一通孔521。所述过渡显示区510设置于所述显示区520的周边，所述过渡显示区510开设有多个间隔设置的第二通孔511。所述过渡显示区510用于所述显示区520和所述掩模板500的边缘之间的过渡。所述第二通孔511的密度小于所述第一通孔521的密度。也就是说，所述第二通孔511在掩模板500的过渡显示区510所占有的面积百分比小于所述第一通孔521在所述掩模板500的显示区520所占有的面积百分比。
需要理解的是，传统方案中，如图2所示，所述显示区300和所述过渡显示区200的开口的形状、开口的尺寸和开口的密度是一致的。因此所述掩模板100的边缘容易破损，导致所述掩模板制得的显示面板的边缘地区出现显色不均的问题。因此，本申请中，改变所述过渡显示区510的所述第二通孔511的密度，降低所述第二通孔511在所述过渡显示区510的密度，在不影响显示效果的情况下，有助于增加所述第二通孔511之间的距离，从而增加所述第二通孔511之间的连接桥的面积，提高所述掩模板500的边缘区域的强度。
在一个实施例中，所述显示区520的所述第一通孔521的几何中心为第一孔心。所述过渡显示区510的所述第二通孔511的几何中心为第二孔心。所述第一孔心在所述显示区的排布方式与所述第二孔心在所述过滤显示区的排布方式相同，所述第二通孔511的孔径小于所述第一通孔521的孔径。因此，相邻的所述第二通孔511的外缘之间的距离大于相邻的所述第一通孔521的外缘之间的距离。
本申请通过减小所述第二通孔511的孔径，增加相邻的所述第二通孔511的外缘之间的距离来减小所述第二通孔511在所述过渡显示区510内的密度， 从而增加所述第二通孔511之间的连接桥的面积，提高所述掩模板500的边缘强度。
在一个实施例中，所述第一孔心和所述第二孔心沿水平方向成行排布。所述第一孔心和所述第二孔心沿竖直方向成列排布。在所述水平方向上相邻的两个所述第一孔心之间的距离相等，在所述竖直方向上相邻的两个所述第一孔心之间的距离相等；在所述水平方向上相邻的两个所述第二孔心之间的距离相等，在所述竖直方向上相邻的两个所述第一孔心之间的距离相等。在所述水平方向上相邻的两个所述第一孔心之间的距离等于在所述水平方向上相邻的两个所述第二孔心之间的距离；在所述竖直方向上相邻的两个所述第一孔心之间的距离等于在所述竖直方向上相邻的两个所述第二孔心之间的距离。也就是说，所述第一孔心和所述第二孔心都是按照一样的阵列方式排布，只是所述过渡显示区510内的所述第二通孔511的孔径减小，相邻的所述第二通孔511之间的距离便随着增大，从而所述过渡显示区510内的所述第二通孔511的密度减小。本申请简单方便地改变了所述掩模板500的结构，并且进一步降低了所述掩模板500的制作工艺难度，提高了所述掩模板500的强度，有助于提高张网工艺的稳定性。
如图3所示，在一个实施例中，在水平方向上沿远离所述显示区520延伸的方向为第一方向(X)，在竖直方向上沿远离所述显示区520延伸的方向为第二方向(Y)。所述第二通孔511在所述第一方向上依次排布有第一列通孔、第二列通孔……第M列通孔，其中M为正整数。其中，第一列通孔为在第一方向上最靠近所述显示区520的一列第二通孔，第M列通孔为在第一方向上最远离所述显示区520的一列第二通孔。所述第二通孔511在所述第二方向上依次排布有第一行通孔、第二行通孔……第N行通孔，其中N为正整数。其中，第一行通孔为在第二方向上最靠近所述显示区520的一行第二通孔，第N行通孔为在第二方向上最远离所述显示区520的一行第二通孔。所述第N行通孔和所述第M列通孔的孔径至少为所述显示区520的所述第一通孔521的孔径的0.3倍，以避免所述掩模板500的边缘处的所述第二通孔511的孔径过小，对边缘区域的现实效果影响太大。
在一个实施例中，所述第一行通孔至所述第N行通孔的孔径按第一预设规则减小，且所述第一列通孔至所述第M列通孔的孔径按第二预设规则减小。其中，第一预设规则和第二预设规则可以相同或者不同。第一预设规则可以根据第二通孔的行数进行调整。第二预设规则可以根据第二通孔的列数进行调整。例如，第一预设规则为孔径从所述第一行通孔朝向所述第N行通孔减小，所述第二预设规则为孔径从所述第一列通孔朝向所述第M列通孔减小。
在一个实施例中，过渡显示区510的第二通孔的行数和列数可以是相同的。
在一个实施例中，当所述第二通孔511为两行两列时，所述第一行通孔和所述第一列通孔的孔径为所述第一通孔521孔径的0.6-0.9倍。所述第二行通孔和所述第二列通孔的孔径为所述第一通孔521孔径的0.3-0.6倍。
在一个实施例中，当所述第二通孔511为三行三列时，所述第一行通孔和所述第一列通孔的孔径为所述第一通孔521孔径的0.7-0.9倍。所述第二行通孔和所述第二列通孔的孔径为所述第一通孔521孔径的0.5-0.7倍。第三行通孔和第三列通孔的孔径为所述第一通孔521孔径的0.3-0.5倍。
在一个实施例中，当所述第二通孔511为四行四列时，所述第一行通孔和所述第一列通孔的孔径为所述第一通孔521孔径的0.8-0.9倍。所述第二行通孔和所述第二列通孔的孔径为所述第一通孔521孔径的0.6-0.8倍。第三行通孔和第三列通孔的孔径为所述第一通孔521孔径的0.4-0.6倍。第四行通孔和第四列通孔的孔径为所述第一通孔521孔径的0.3-0.4倍。
在一个实施例中，当所述第二通孔511为五行五列时，所述第一行通孔和所述第一列通孔的孔径为所述第一通孔521孔径的0.8-0.9倍。所述第二行通孔和所述第二列通孔的孔径为所述第一通孔521孔径的0.7-0.8倍。第三行通孔和第三列通孔的孔径为所述第一通孔521孔径的0.6-0.7倍。第四行通孔和第四列通孔的孔径为所述第一通孔521孔径的0.4-0.6倍。第五行通孔和第五列通孔的孔径为所述第一通孔521孔径的0.3-0.4倍。
本申请中，所述过渡显示区510的第二通孔的行数和列数可以是不同的。在行数和列数设置不同的情况下，所述第二通孔511的孔径变化规律也不同，通过提供具有针对不同行数和列数的所述第二通孔511的孔径的最佳渐变规则， 可以实现对所述过渡显示区510的显示效果的最佳过渡。
在一个实施例中，所述第二通孔511的行数可以不等于所述第二通孔511孔径的列数。也就说，所述过渡显示区510内的所述第二通孔511的行数和列数可以是不同的。采用不同的行数或列数时，所述第二通孔511的孔径变化规则可以参考上述的方案。例如所述过渡显示区510可以是三行四列的排布方式。三行所述第二通孔511可以设置为：所述第一行通孔的孔径为所述第一通孔521孔径的0.7-0.9倍；所述第二行通孔的孔径为所述第一通孔521孔径的0.5-0.7倍；第三行通孔的孔径为所述第一通孔521孔径的0.3-0.5倍。四列所述第二通孔511可以设置为：所述第一列通孔的孔径为所述第一通孔521孔径的0.8-0.9倍；所述第二列通孔的孔径为所述第一通孔521孔径的0.6-0.8倍；所述第三列通孔的孔径为所述第一通孔521孔径的0.4-0.6倍；所述第四列通孔的孔径为所述第一通孔521孔径的0.3-0.4倍。
本申请还提供一种显示面板，包括显示基板和在所述显示基板上阵列排布的像素。所述像素由如前所述的掩模板制作得到。所述显示面板分辨率高，并且像素蒸镀精度高，可避免显示面板出现边缘显示不均的问题。
本申请的所述掩模板500可增加水平方向和竖直方向上的设计余量。本申请的掩模板的PPA(pixel position accuracy，像素点位精度)调试的结果优于传统方案的掩模板。所述掩模板100的强度得到提高，所述显示面板边缘的显色不均问题也显著得到降低。
以上所述实施例的各技术特征可以进行任意的组合，为使描述简洁，未对上述实施例中的各个技术特征所有可能的组合都进行描述，然而，只要这些技术特征的组合不存在矛盾，都应当认为是本说明书记载的范围。
以上所述实施例仅表达了本申请的几种实施方式，其描述较为具体和详细，但并不能因此而理解为对发明专利范围的限制。应当指出的是，对于本领域的普通技术人员来说，在不脱离本申请构思的前提下，还可以做出若干变形和改进，这些都属于本申请的保护范围。因此，本专利的保护范围应以所附权利要求为准。

Claims (14)

  1. 一种掩模板，用于制作显示面板，其中，包括：
    显示区，开设有多个间隔设置的第一通孔；以及
    过渡显示区，设置于所述显示区的周边，开设有多个间隔设置的第二通孔；
    其中所述第二通孔的密度小于所述第一通孔的密度。
  2. 根据权利要求1所述的掩模板，其中，
    所述第一通孔的几何中心为第一孔心，所述第二通孔的几何中心为第二孔心；
    所述第一孔心在所述显示区的排布方式与所述第二孔心在所述过滤显示区的排布方式相同；
    所述第二通孔的孔径小于所述第一通孔的孔径。
  3. 根据权利要求2所述的掩模板，其中，
    所述第一孔心和所述第二孔心沿水平方向成行排布，所述第一孔心和所述第二孔心沿竖直方向成列排布；
    在所述水平方向上相邻的两个所述第一孔心之间的距离相等，在所述竖直方向上相邻的两个所述第一孔心之间的距离相等；
    在所述水平方向上相邻的两个所述第二孔心之间的距离相等，在所述竖直方向上相邻的两个所述第一孔心之间的距离相等。
  4. 根据权利要求3所述的掩模板，其中，在所述水平方向上相邻的两个所述第一孔心之间的距离等于在所述水平方向上相邻的两个所述第二孔心之间的距离；在所述竖直方向上相邻的两个所述第一孔心之间的距离等于在所述竖直方向上相邻的两个所述第二孔心之间的距离。
  5. 根据权利要求4所述的掩模板，其中，
    最靠近所述显示区的一行所述第二通孔为所述过渡显示区的第一行通孔，沿远离所述显示区的方向，依次为所述过渡显示区的第二行通孔至第N行通孔，其中所述N为正整数；
    最靠近所述显示区的一列所述第二通孔为所述过渡显示区的第一列通孔， 沿远离所述显示区的方向，依次为所述过渡显示区的第二列通孔至第M列通孔，其中所述M为正整数；
    所述第N行通孔和所述第M列通孔的孔径至少为所述第一通孔孔径的0.3倍。
  6. 根据权利要求5所述的掩模板，其中，所述第一行通孔至所述第N行通孔的孔径按第一预设规则减小，且所述第一列通孔至所述第M列通孔的孔径按第二预设规则减小。
  7. 根据权利要求6所述的掩模板，其中，所述第二通孔的行数和列数相同。
  8. 根据权利要求7所述的掩模板，其中，
    当所述第二通孔为两行两列时，
    所述第一行通孔和所述第一列通孔的孔径为所述第一通孔孔径的0.6-0.9倍；
    所述第二行通孔和所述第二列通孔的孔径为所述第一通孔孔径的0.3-0.6倍。
  9. 根据权利要求7所述的掩模板，其中，
    当所述第二通孔为三行三列时，
    所述第一行通孔和所述第一列通孔的孔径为所述第一通孔孔径的0.7-0.9倍；
    所述第二行通孔和所述第二列通孔的孔径为所述第一通孔孔径的0.5-0.7倍；
    第三行通孔和第三列通孔的孔径为所述第一通孔孔径的0.3-0.5倍。
  10. 根据权利要求7所述的掩模板，其中，
    当所述第二通孔为四行四列时，
    所述第一行通孔和所述第一列通孔的孔径为所述第一通孔孔径的0.8-0.9倍；
    所述第二行通孔和所述第二列通孔的孔径为所述第一通孔孔径的0.6-0.8倍；
    第三行通孔和第三列通孔的孔径为所述第一通孔孔径的0.4-0.6倍；
    第四行通孔和第四列通孔的孔径为所述第一通孔孔径的0.3-0.4倍。
  11. 根据权利要求7所述的掩模板，其中，
    当所述第二通孔为五行五列时，
    所述第一行通孔和所述第一列通孔的孔径为所述第一通孔孔径的0.8-0.9倍；
    所述第二行通孔和所述第二列通孔的孔径为所述第一通孔孔径的0.7-0.8倍；
    第三行通孔和第三列通孔的孔径为所述第一通孔孔径的0.6-0.7倍；
    第四行通孔和第四列通孔的孔径为所述第一通孔孔径的0.4-0.6倍；
    第五行通孔和第五列通孔的孔径为所述第一通孔孔径的0.3-0.4倍。
  12. 根据权利要求6所述的掩模板，其中，所述第二通孔的行数和列数不同。
  13. 根据权利要求12所述的掩模板，其中，
    当所述第二通孔为三行四列时，
    所述第一行通孔的孔径为所述第一通孔孔径的0.7-0.9倍；所述第二行通孔的孔径为所述第一通孔孔径的0.5-0.7倍；第三行通孔的孔径为所述第一通孔孔径的0.3-0.5倍；
    所述第一列通孔的孔径为所述第一通孔孔径的0.8-0.9倍；所述第二列通孔的孔径为所述第一通孔孔径的0.6-0.8倍；所述第三列通孔的孔径为所述第一通孔孔径的0.4-0.6倍；所述第四列通孔的孔径为所述第一通孔孔径的0.3-0.4倍。
  14. 一种显示面板，其中，包括：
    显示基板；和
    在所述显示基板上阵列排布的像素；
    其中，所述像素由权利要求1-13中任一项所述的掩模板制作而成。
PCT/CN2018/102547 2018-03-30 2018-08-27 显示面板及制作显示面板用掩模板 WO2019184224A1 (zh)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020207000950A KR20200011047A (ko) 2018-03-30 2018-08-27 디스플레이 패널 및 이를 제조하기 위한 마스크
EP18912132.0A EP3623866A4 (en) 2018-03-30 2018-08-27 DISPLAY PANEL AND MASK PLATE USED TO MAKE A DISPLAY PANEL
US16/333,229 US20210363626A1 (en) 2018-03-30 2018-08-27 Display panel and mask plate for fabricating the same
JP2019570531A JP2020524218A (ja) 2018-03-30 2018-08-27 表示パネル及び表示パネル製造用マスク

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201820471716.3U CN208013662U (zh) 2018-03-30 2018-03-30 显示面板及制作显示面板用掩模板
CN201820471716.3 2018-03-30

Publications (1)

Publication Number Publication Date
WO2019184224A1 true WO2019184224A1 (zh) 2019-10-03

Family

ID=63892167

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2018/102547 WO2019184224A1 (zh) 2018-03-30 2018-08-27 显示面板及制作显示面板用掩模板

Country Status (7)

Country Link
US (1) US20210363626A1 (zh)
EP (1) EP3623866A4 (zh)
JP (1) JP2020524218A (zh)
KR (1) KR20200011047A (zh)
CN (1) CN208013662U (zh)
TW (1) TWM570537U (zh)
WO (1) WO2019184224A1 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109207920B (zh) * 2018-11-12 2021-02-09 京东方科技集团股份有限公司 掩模版
CN109487206B (zh) * 2018-12-11 2020-08-11 武汉华星光电半导体显示技术有限公司 掩膜版及采用该掩膜版的掩膜装置
CN109722630B (zh) * 2019-01-09 2020-01-14 昆山工研院新型平板显示技术中心有限公司 掩模单元及具有该掩模单元的掩模板组件
CN109504938B (zh) * 2019-01-09 2020-04-17 昆山国显光电有限公司 一种掩膜单元及其制作方法、掩膜版
CN110760790A (zh) * 2019-02-28 2020-02-07 云谷（固安）科技有限公司 掩膜板及掩膜组件
CN110335888A (zh) * 2019-04-24 2019-10-15 深圳市华星光电半导体显示技术有限公司 显示面板以及显示装置
CN111834395A (zh) 2019-09-30 2020-10-27 昆山国显光电有限公司 透明显示面板、显示装置及其显示面板
CN110718578B (zh) * 2019-10-31 2022-10-21 武汉天马微电子有限公司 一种显示面板及其制备方法、显示装置、掩膜板
WO2022087906A1 (zh) * 2020-10-28 2022-05-05 京东方科技集团股份有限公司 掩膜板及其制备方法、显示面板及其制备方法、显示装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103589995A (zh) * 2013-10-09 2014-02-19 昆山允升吉光电科技有限公司 一种掩模板的制作方法
CN103695842A (zh) * 2013-12-31 2014-04-02 信利半导体有限公司 一种掩膜板及其制作方法
CN105589274A (zh) * 2016-03-11 2016-05-18 厦门天马微电子有限公司 掩膜板、阵列基板、液晶显示装置及形成通孔的方法
US20160186317A1 (en) * 2014-12-26 2016-06-30 Samsung Display Co., Ltd. Apparatus for deposition and substrate alignment method in the same
CN107435131A (zh) * 2017-09-29 2017-12-05 上海天马微电子有限公司 掩膜装置、蒸镀设备以及掩膜装置制备方法
CN107460436A (zh) * 2017-07-25 2017-12-12 武汉华星光电半导体显示技术有限公司 金属网板及蒸镀掩膜装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101897481B1 (ko) * 2010-11-04 2018-09-12 루미리즈 홀딩 비.브이. 결정학적으로 이완된 구조에 기초한 고체 상태 발광 디바이스
KR102024853B1 (ko) * 2012-09-03 2019-11-05 삼성디스플레이 주식회사 단위 마스크 및 마스크 조립체
JP2015103427A (ja) * 2013-11-26 2015-06-04 株式会社ジャパンディスプレイ 表示装置の製造方法
JP2017222064A (ja) * 2016-06-14 2017-12-21 株式会社リコー 電力供給制御装置、液滴吐出装置、電力供給制御方法、電力供給制御プログラム
JP7121918B2 (ja) * 2016-12-14 2022-08-19 大日本印刷株式会社 蒸着マスク装置及び蒸着マスク装置の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103589995A (zh) * 2013-10-09 2014-02-19 昆山允升吉光电科技有限公司 一种掩模板的制作方法
CN103695842A (zh) * 2013-12-31 2014-04-02 信利半导体有限公司 一种掩膜板及其制作方法
US20160186317A1 (en) * 2014-12-26 2016-06-30 Samsung Display Co., Ltd. Apparatus for deposition and substrate alignment method in the same
CN105589274A (zh) * 2016-03-11 2016-05-18 厦门天马微电子有限公司 掩膜板、阵列基板、液晶显示装置及形成通孔的方法
CN107460436A (zh) * 2017-07-25 2017-12-12 武汉华星光电半导体显示技术有限公司 金属网板及蒸镀掩膜装置
CN107435131A (zh) * 2017-09-29 2017-12-05 上海天马微电子有限公司 掩膜装置、蒸镀设备以及掩膜装置制备方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP3623866A4 *

Also Published As

Publication number Publication date
EP3623866A1 (en) 2020-03-18
TWM570537U (zh) 2018-11-21
KR20200011047A (ko) 2020-01-31
EP3623866A4 (en) 2020-07-29
CN208013662U (zh) 2018-10-26
US20210363626A1 (en) 2021-11-25
JP2020524218A (ja) 2020-08-13

Similar Documents

Publication Publication Date Title
WO2019184224A1 (zh) 显示面板及制作显示面板用掩模板
WO2018024040A1 (zh) 掩模板、包含该掩模板的掩模板组件及其制造方法
US10439170B2 (en) Multi-layer mask
US9975134B2 (en) Deposition mask and method of manufacturing the same
CN108796435B (zh) 掩模版及其制作方法
KR20170112673A (ko) 증착용마스크 및 이를 이용한 oled 패널
TWI564408B (zh) 蒸鍍遮罩、蒸鍍方法及蒸鍍遮罩之製造方法
WO2021036067A1 (zh) 掩模板及制备方法、精细金属掩模板、掩模装置及使用方法
TWI706189B (zh) 掩模板及顯示面板的製造方法
WO2021073191A1 (zh) 一种掩膜版
JP7327969B2 (ja) 蒸着用マスク
CN105154822A (zh) 一种小开口蒸镀用掩模板
US20210336147A1 (en) Mask
CN108281575B (zh) 掩膜板及其制作方法
WO2021027794A1 (zh) 掩膜板组件
CN107815641B (zh) 掩膜板
WO2016145763A1 (zh) 一种金属掩膜板及其制作出的有机电致发光显示器件
WO2020181849A1 (zh) 微型精密掩膜板及其制作方法和amoled显示器件
CN113690396B (zh) 掩膜组件及其制造方法、目标结构的制造方法、显示装置
CN113215529B (zh) 精密掩膜板和掩膜板组件
KR102138800B1 (ko) 마스크 및 프레임 일체형 마스크
KR102313965B1 (ko) 마스크의 제조 방법과 마스크 및 이를 포함하는 프레임 일체형 마스크
JP7127281B2 (ja) 蒸着マスク、フレーム付き蒸着マスク、蒸着マスク準備体、パターンの形成方法、蒸着マスクの製造方法、有機半導体素子の製造方法、及び有機ｅｌディスプレイの製造方法
KR20220151402A (ko) 프레임 및 프레임 일체형 마스크
KR20210154492A (ko) 프레임 일체형 마스크 제조용 마스크 셀 시트부 및 프레임 일체형 마스크

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 18912132

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2019570531

Country of ref document: JP

Kind code of ref document: A

ENP Entry into the national phase

Ref document number: 2018912132

Country of ref document: EP

Effective date: 20191212

ENP Entry into the national phase

Ref document number: 20207000950

Country of ref document: KR

Kind code of ref document: A