WO2015111391A1 - 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法 - Google Patents

圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法 Download PDF

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Publication number
WO2015111391A1
WO2015111391A1 PCT/JP2015/000154 JP2015000154W WO2015111391A1 WO 2015111391 A1 WO2015111391 A1 WO 2015111391A1 JP 2015000154 W JP2015000154 W JP 2015000154W WO 2015111391 A1 WO2015111391 A1 WO 2015111391A1
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Prior art keywords
valve
pressure
control device
fluid
exhaust
Prior art date
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Ceased
Application number
PCT/JP2015/000154
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English (en)
French (fr)
Japanese (ja)
Inventor
薫 平田
池田　信一
西野　功二
土肥　亮介
勝幸 杉田
正明 永瀬
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Fujikin Inc
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Fujikin Inc
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Publication date
Application filed by Fujikin Inc filed Critical Fujikin Inc
Priority to KR1020167005843A priority Critical patent/KR101887364B1/ko
Priority to US15/110,208 priority patent/US9841770B2/en
Priority to CN201580002126.5A priority patent/CN105940357B/zh
Publication of WO2015111391A1 publication Critical patent/WO2015111391A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/004—Actuating devices; Operating means; Releasing devices actuated by piezoelectric means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
    • F16K31/06—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K7/00—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves
    • F16K7/12—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm
    • F16K7/14—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm arranged to be deformed against a flat seat
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K7/00—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves
    • F16K7/12—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm
    • F16K7/14—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm arranged to be deformed against a flat seat
    • F16K7/16—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm arranged to be deformed against a flat seat the diaphragm being mechanically actuated, e.g. by screw-spindle or cam
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0604—Process monitoring, e.g. flow or thickness monitoring

Definitions

  • the present invention relates to an improvement of a pressure-type flow rate control device, and improves the followability of flow rate control and improves the response at the time of flow rate rise and flow rate fall, thereby improving the raw material gas supply device for semiconductor manufacturing equipment and the like.
  • the present invention relates to a pressure-type flow rate control device capable of significantly improving the operation performance and a method for preventing overshoot at the start of the flow rate control.
  • the latter pressure type flow control device FCS is composed of a control valve CV, a temperature detector T, a pressure detector P, an orifice OL, an arithmetic control unit CD and the like as shown in FIG. It has excellent flow characteristics such that stable flow control can be performed even when the pressure fluctuates greatly.
  • the calculation control unit CD is composed of a temperature correction / flow rate calculation circuit CDa, a comparison circuit CDb, an input / output circuit CDc, an output circuit CDd, and the like.
  • the detected values from the pressure detector P and the temperature detector T are input to the temperature correction / flow rate calculation circuit CDa, where the temperature correction of the detected pressure and the flow rate calculation are performed, and the flow rate calculation value Qt is supplied to the comparison circuit CDb. Entered.
  • An input signal Q S corresponding to the set flow rate is input from the terminal In and input to the comparison circuit CDb via the input / output circuit CDc, where it is compared with the flow rate calculation value Qt from the temperature correction / flow rate calculation circuit CDa. Is done.
  • the control signal Pd is output to the drive portion of the control valve CV, thereby driving the control valve CV and the set flow rate input signal. Automatic adjustment is performed so that the difference (Qs ⁇ Qt) between Qs and the calculated flow rate value Qt becomes zero.
  • FCS-WR type A pressure type flow rate control device that calculates as m (P 1 -P 2 ) n (where K, m, and n are constants) is called an FCS-WR type.
  • the FCS-N type orifice is an orifice having a structure in which a plurality of orifices OL connected in parallel are arbitrarily selected by a switching valve, and the flow rate control is performed.
  • FCS-SN type FCS-SN type
  • FCS-SWR type FCS-WR type orifice
  • FIG. 6 shows the FCS-N type (JP-A-8-338546, etc.), FCS-SN type (JP-A-2006-330851, etc.), FCS-WR type (JP-A-2003-195948, etc.) and FCS-SWR.
  • FIG. 5 is a system configuration diagram of a mold (Japanese Patent Application No. 2010-512916, etc.), and since its configuration and operating principle are already known, detailed description thereof is omitted here.
  • P 1 and P 2 are pressure sensors
  • CV is a control valve
  • OL is an orifice
  • OL 1 is a small orifice
  • OL 2 is a large orifice
  • ORV is an orifice switching valve.
  • FCS pressure type flow rate control device
  • FIG. 7 is a configuration system diagram of the pressure-type flow rate control device capable of performing the pulse control described above, and good rising and falling characteristics can be obtained by minimizing the internal volume between the orifice OL and the on-off valve Vp. Therefore, highly accurate pulse control can be performed.
  • the main object of the present invention is to provide a pressure type flow rate control device capable of pulse flow rate control and an overshoot prevention method at the start of the flow rate control.
  • an on-off valve is provided on the downstream side of the orifice of the conventional pressure type flow control device, and it is possible to perform pulse flow control by controlling the opening and closing of this, but in the state where the flow control is not performed, the control valve
  • the fluid passage internal pressure becomes high due to the minute leak of the raw material gas, so that the fluid passage internal pressure at the start of the flow rate control becomes larger than the set value and overshoot occurs.
  • the present invention is intended to solve the above-described problem of overshoot at the start of flow control, and provides a pressure-type flow control device capable of pulse flow control and a method for preventing overshoot at the start of the flow control. This is a major issue.
  • the present invention provides an on-off valve on the downstream side of an orifice of a conventional pressure type flow rate control device, and in the pressure type flow rate control device capable of controlling the pulse flow rate by opening and closing the on-off valve, an overshoot occurs at the start of the flow rate control.
  • a vent line is provided on the upstream side of the orifice, and before starting the flow control, the exhaust passage is exhausted in advance to reduce the pressure on the downstream side of the orifice, thereby overloading at the start of the flow control. Prevent shoots.
  • the pressure type flow rate control device is provided with a fluid passage communicating between the fluid inlet and the fluid outlet, and an exhaust passage branched from the fluid passage and communicating between the fluid passage and the exhaust outlet.
  • a main body a pressure control valve that is fixed to the fluid inlet side of the main body and opens and closes the upstream side of the fluid passage, and a first pressure that detects the internal pressure of the fluid passage downstream of the pressure control valve.
  • the basic configuration includes a valve. Before starting the fluid flow control by the pressure flow control device, the pressure control valve and the exhaust valve are actuated to forcibly exhaust the fluid passage space between the pressure control control valve and the open / close valve. It is possible to prevent overshoot at the start of control.
  • Pulse control of the flow rate can be performed by opening and closing the on-off valve during flow rate control.
  • the on-off valve may be provided on the downstream side of the orifice.
  • the exhaust valve may be a control valve.
  • the main body may be provided with a second pressure sensor for detecting the fluid passage internal pressure downstream of the orifice.
  • the second pressure sensor may be a sensor that detects an internal pressure of the fluid passage between the orifice and the on-off valve.
  • the orifice and the on-off valve may be a valve with a built-in orifice having a configuration in which the orifice and the on-off valve are integrally assembled and fixed.
  • a plurality of the orifices may be connected in parallel, and a fluid may be circulated through at least one of the orifices by a switching valve.
  • a plurality of the orifices may be connected in parallel, and a fluid may be provided to the at least one orifice by a switching valve, and a pressure sensor may be provided to detect the pressure in the fluid passage on the downstream side of the orifice.
  • the pressure control valve and the exhaust valve may be piezo element driven metal diaphragm type control valves.
  • the on-off valve may be a pneumatically driven valve or an electromagnetically driven valve.
  • the exhaust passage is forcibly exhausted by a vacuum pump connected to the exhaust outlet.
  • the method of the present invention also includes a main body provided with a fluid passage communicating between the fluid inlet and the fluid outlet, an exhaust passage branched from the fluid passage and communicating between the fluid passage and the exhaust outlet, A pressure control valve that is fixed to the fluid inlet side and opens and closes the upstream side of the fluid passage; a first pressure sensor that detects a fluid passage internal pressure downstream of the pressure control control valve; A pressure-type flow rate control device comprising: an orifice provided in the fluid passage downstream from a branch location; an on-off valve that opens and closes the fluid passage downstream of the orifice; and an exhaust valve that opens and closes the exhaust passage.
  • An overshoot prevention method wherein the fluid passage between the pressure control control valve and the orifice is operated by operating the exhaust valve before starting the flow control by the pressure type flow control device. By forcing evacuating the while, which is the method of preventing overshoot at the flow control started.
  • the pressure type flow rate control device includes a main body provided with a fluid passage communicating between the fluid inlet and the fluid outlet, an exhaust passage communicating between the fluid passage and the exhaust outlet, and a fluid inlet side of the main body.
  • a pressure control valve that is fixed to the fluid passage and opens and closes the upstream side of the fluid passage, a first pressure sensor that detects a fluid passage internal pressure downstream of the pressure control control valve, and a downstream portion from the branch point of the exhaust passage
  • An orifice provided in the fluid passage, an on-off valve for opening and closing the fluid passage on the downstream side of the first pressure sensor, and an exhaust valve for opening and closing the exhaust passage.
  • the pressure control control valve and the exhaust valve are operated to forcibly exhaust the fluid passage space between the pressure control control valve and the on-off valve. As a result, overshoot at the start of flow control can be prevented.
  • the control responsiveness at the time of fluctuation of the control flow rate is enhanced, and not only can the start time and the fall time of the flow rate control be greatly reduced, but also the time adjustment is easy Therefore, it is possible to improve the so-called gas replacement property of the pressure type flow rate control device, improve the equipment operation rate, improve the quality of semiconductor products, and the like.
  • the on-off valve provided in the fluid supply passage is an on-off valve with a built-in orifice, so that the pressure type flow control device can be further reduced in size, and the exhaust valve is closed, so that a normal pressure type flow control device is provided. It can also be applied.
  • FIG. 6 is a basic configuration diagram of a conventional pressure type flow rate control device (FCS-N type).
  • FCS-N type FCS-N type
  • FCS-WR type pressure type flow control device
  • FCS-SN type FCS-SN type
  • D shows the FCS-SWR type
  • FIG. 1 is a system diagram showing the basic configuration of the pressure type flow control device of the present invention
  • FIG. 2 is a longitudinal sectional view showing the basic configuration of the pressure type flow control device according to the present invention
  • FIG. 3 shows the pressure according to the present invention. It is the top view (a) and front view (b) of a type flow control device, and the partial expanded sectional view (c) of an on-off valve with a built-in orifice.
  • FIG. 4 is a system diagram showing a configuration of a gas supply box using the pressure type flow rate control device according to the present invention.
  • a pressure type flow control device 1 includes a main body 2, a pressure control control valve 6, an exhaust valve 7, a pneumatically driven on-off valve 8, a first pressure sensor P. 1 and a second pressure sensor P 2 , an orifice OL, and the like. Further, in the embodiment of FIG. 2, and one orifice OL and FCS-WR pressure type flow rate control apparatus using a first pressure sensor P 1 and the second pressure sensor P 2 off valve 8 of the pneumatic type Thus, regardless of whether the fluid flowing through the orifice OL is in a critical state or a non-critical state, the flow rate can be controlled by adjusting the pressure using the pressure control control valve 6.
  • valve seat 3 is an inlet side block
  • 4 is a main body block
  • 5 is an outlet side block
  • 8 is a pneumatically driven on-off valve
  • 8a is a pneumatic valve driving unit
  • 9 is a fluid.
  • An inlet, 10a is a fluid passage
  • 10b is an exhaust passage
  • 11 is a fluid outlet
  • 12 is an exhaust outlet
  • 13 is a gasket
  • 14 is a control panel control board
  • 15 is a casing
  • 16 is a connector for connection.
  • the main body 2 is formed by assembling and integrating an inlet side block 3, a main body block 4 and an outlet side block 5 with fixing bolts (not shown), a pressure control control valve 6, an exhaust valve 7,
  • the first pressure sensor P 1 and the second pressure sensor P 2 are screwed and fixed to the main body 2 respectively.
  • the second pressure sensor P 2 is placed in the lower part of the inner surface of the outlet side block 5, it is communicated with the fluid passage 10a so as to avoid the intersection of the exhaust passage 10b.
  • the pressure control control valve 6 is an on-off valve using a piezo drive element 6a having a known metal diaphragm as a valve body 20.
  • the piezo drive element 6a is expanded by energizing the piezo drive element 6a, and the cylindrical body 17 is elastic.
  • the valve body presser 19 is moved upward by pushing it upward against the elastic force of 18, and the valve body 20 is separated from the valve seat 2a by the self-elastic force of the diaphragm valve body 20 to open the valve.
  • the valve opening is adjusted by changing the voltage applied to the piezo drive element 6a.
  • the structure and operation of the exhaust valve 7 can be the same as those of the pressure control control valve 6, and the valve opening degree can be controlled by adjusting the extension amount of the piezo drive element 7a.
  • the exhaust valve 7 may be a known pneumatically driven or electromagnetically driven opening / closing control valve instead of the piezo-driven metal diaphragm type opening / closing valve. It is also possible to use a valve. Further, it is possible to control all the operations of the pressure control control valve 6, the exhaust valve 7, the on-off valve 8, etc. automatically via the panel control board 14. It is the same as the case of.
  • the orifice OL and the on-off valve 8 are integrally assembled in order to reduce the size of the device and reduce the fluid passage volume.
  • a type on-off valve is used. Since the structure of the orifice built-in on-off valve 8 itself is known (Patent Document 6, Japanese Patent Laid-Open No. 2000-213667, etc.), detailed description thereof is omitted here, but as shown in FIG.
  • a hole 34 for accommodating the valve mechanism is provided on the upper surface of the outlet side block 5, and an orifice OL, a valve seat ring 30, a valve body (metal diaphragm) 20, a presser cylinder 33, a valve body presser 19, a stem 31,
  • the constituent members of the valve mechanism such as the spring 32 are arranged, and the on-off valve 8 is fixed on the outlet side block 5 constituting the main body 2.
  • the orifice built-in type on-off valve By using the orifice built-in type on-off valve, the internal volume between the orifice and the valve element can be minimized, and the rising and falling characteristics of the flow rate when the valve is opened and closed are improved.
  • the orifice built-in type on-off valve has an orifice on the upstream side and a valve body on the downstream side. In this case, the fall characteristics are affected only by the operation of the on-off valve, and the internal volume is minimal. Therefore, the influence of the internal volume on the rise characteristic is small.
  • the valve body By reversing the mounting direction of the opening / closing valve with built-in orifice, the valve body is provided on the upstream side and the orifice is provided on the downstream side. In this case, the rise characteristic is affected only by the operation of the open / close valve, and the fall characteristic The effect of the internal volume is small.
  • FIG. 4 is a system diagram showing the configuration of the gas supply box using the pressure type flow rate control device according to the present invention, and the three kinds of real gases G 1 to G 3 and G 2 are used individually or appropriately. These gas species are mixed at a predetermined ratio and supplied to the process chamber 29.
  • the FCS-N internal space gas is forcibly exhausted (vacuum exhausted) by the vacuum pump 28 through the outlet side opening / closing valve 24 of the exhaust line 27 via the exhaust valve 7 (not shown). It is.
  • 21 is a gas supply port
  • 22 is a supply side switching valve
  • 23 is an outlet side switching valve
  • 26 is a mixed gas supply line.
  • FCS-WR type pressure type flow control device using the orifice built-in on-off valve 8 shown in FIG.
  • FCS-N type, FCS-SN type, and FCS-SWR type may be used as the flow rate control device, and any of the previous types of pressure flow control devices shown in FIG. Can also be applied to the practice of the present invention.
  • the highly accurate pulse flow rate control can be performed with a pulse interval of several tens to several hundreds msec. Since the operating principle and configuration of the pressure type flow rate control device are already known, detailed description thereof is omitted here.
  • the present invention can be applied not only to gas supply facilities and gas supply devices for semiconductor manufacturing apparatuses, but also to flow control devices for various gas supply facilities such as the chemical industry and the food industry.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)
  • Control Of Fluid Pressure (AREA)
PCT/JP2015/000154 2014-01-21 2015-01-15 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法 Ceased WO2015111391A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020167005843A KR101887364B1 (ko) 2014-01-21 2015-01-15 압력식 유량 제어 장치 및 그 유량 제어 개시 시의 오버슈트 방지 방법
US15/110,208 US9841770B2 (en) 2014-01-21 2015-01-15 Pressure-type flow control device and method for preventing overshooting at start of flow control performed by said device
CN201580002126.5A CN105940357B (zh) 2014-01-21 2015-01-15 压力式流量控制装置及其流量控制开始时的超量防止方法

Applications Claiming Priority (2)

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JP2014008831A JP6321972B2 (ja) 2014-01-21 2014-01-21 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法
JP2014-008831 2014-01-21

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KR20180006856A (ko) * 2016-07-11 2018-01-19 도쿄엘렉트론가부시키가이샤 가스 공급 시스템, 기판 처리 시스템 및 가스 공급 방법
JP2018098208A (ja) * 2016-12-15 2018-06-21 サーモ フィッシャー サイエンティフィック （ブレーメン） ゲーエムベーハー 改善されたガス流量制御
WO2023182105A1 (ja) * 2022-03-22 2023-09-28 株式会社フジキン 流量制御装置の排気構造、排気方法及びそれを備えたガス供給システム及びガス供給方法

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US11137779B2 (en) 2016-04-28 2021-10-05 Fujikin Incorporated Fluid control device, method for controlling fluid control device, and fluid control system
US11144075B2 (en) 2016-06-30 2021-10-12 Ichor Systems, Inc. Flow control system, method, and apparatus
US10679880B2 (en) 2016-09-27 2020-06-09 Ichor Systems, Inc. Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same
US10665430B2 (en) * 2016-07-11 2020-05-26 Tokyo Electron Limited Gas supply system, substrate processing system and gas supply method
JP6786096B2 (ja) * 2016-07-28 2020-11-18 株式会社フジキン 圧力式流量制御装置
JP7245600B2 (ja) * 2016-12-15 2023-03-24 株式会社堀場エステック 流量制御装置、及び、流量制御装置用プログラム
JP7107648B2 (ja) * 2017-07-11 2022-07-27 株式会社堀場エステック 流体制御装置、流体制御システム、流体制御方法、及び、流体制御装置用プログラム
JP7157476B2 (ja) * 2018-04-27 2022-10-20 株式会社フジキン 流量制御方法および流量制御装置
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