JPWO2023182105A1 - - Google Patents

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Publication number
JPWO2023182105A1
JPWO2023182105A1 JP2024510068A JP2024510068A JPWO2023182105A1 JP WO2023182105 A1 JPWO2023182105 A1 JP WO2023182105A1 JP 2024510068 A JP2024510068 A JP 2024510068A JP 2024510068 A JP2024510068 A JP 2024510068A JP WO2023182105 A1 JPWO2023182105 A1 JP WO2023182105A1
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2024510068A
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Japanese (ja)
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JP7823843B2 (ja
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Publication of JPWO2023182105A1 publication Critical patent/JPWO2023182105A1/ja
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Publication of JP7823843B2 publication Critical patent/JP7823843B2/ja
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Anticipated expiration legal-status Critical

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Classifications

    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00Control of flow
    • G05D7/06Control of flow characterised by the use of electric means
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00Control of flow
    • G05D7/06Control of flow characterised by the use of electric means
    • G05D7/0617Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0402Apparatus for fluid treatment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)
JP2024510068A 2022-03-22 2023-03-15 流量制御装置の排気構造、排気方法及びそれを備えたガス供給システム及びガス供給方法 Active JP7823843B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022045363 2022-03-22
JP2022045363 2022-03-22
PCT/JP2023/010113 WO2023182105A1 (ja) 2022-03-22 2023-03-15 流量制御装置の排気構造、排気方法及びそれを備えたガス供給システム及びガス供給方法

Publications (2)

Publication Number Publication Date
JPWO2023182105A1 true JPWO2023182105A1 (https=) 2023-09-28
JP7823843B2 JP7823843B2 (ja) 2026-03-04

Family

ID=88101498

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024510068A Active JP7823843B2 (ja) 2022-03-22 2023-03-15 流量制御装置の排気構造、排気方法及びそれを備えたガス供給システム及びガス供給方法

Country Status (6)

Country Link
US (1) US20250251745A1 (https=)
JP (1) JP7823843B2 (https=)
KR (1) KR20240137654A (https=)
CN (1) CN118786400A (https=)
TW (1) TWI864645B (https=)
WO (1) WO2023182105A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006337346A (ja) * 2005-06-06 2006-12-14 Ckd Corp 流量制御機器絶対流量検定システム
JP2013231460A (ja) * 2012-04-27 2013-11-14 Fujikin Inc 流体制御装置
WO2015064035A1 (ja) * 2013-10-31 2015-05-07 株式会社フジキン 圧力式流量制御装置
WO2015111391A1 (ja) * 2014-01-21 2015-07-30 株式会社フジキン 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法
JP2016090387A (ja) * 2014-11-05 2016-05-23 Ckd株式会社 流量検定ユニット
JP2017011055A (ja) * 2015-06-19 2017-01-12 東京エレクトロン株式会社 ガス供給系、ガス供給制御方法、及びガス置換方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6346849B2 (ja) * 2014-08-20 2018-06-20 東京エレクトロン株式会社 ガス供給系、プラズマ処理装置、及びプラズマ処理装置の運用方法
JP7296699B2 (ja) * 2018-07-02 2023-06-23 東京エレクトロン株式会社 ガス供給システム、プラズマ処理装置およびガス供給システムの制御方法
JP2021082127A (ja) * 2019-11-21 2021-05-27 東京エレクトロン株式会社 ガス供給システム、プラズマ処理装置及びガス供給システムの制御方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006337346A (ja) * 2005-06-06 2006-12-14 Ckd Corp 流量制御機器絶対流量検定システム
JP2013231460A (ja) * 2012-04-27 2013-11-14 Fujikin Inc 流体制御装置
WO2015064035A1 (ja) * 2013-10-31 2015-05-07 株式会社フジキン 圧力式流量制御装置
WO2015111391A1 (ja) * 2014-01-21 2015-07-30 株式会社フジキン 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法
JP2016090387A (ja) * 2014-11-05 2016-05-23 Ckd株式会社 流量検定ユニット
JP2017011055A (ja) * 2015-06-19 2017-01-12 東京エレクトロン株式会社 ガス供給系、ガス供給制御方法、及びガス置換方法

Also Published As

Publication number Publication date
WO2023182105A1 (ja) 2023-09-28
US20250251745A1 (en) 2025-08-07
TW202409772A (zh) 2024-03-01
TWI864645B (zh) 2024-12-01
JP7823843B2 (ja) 2026-03-04
CN118786400A (zh) 2024-10-15
KR20240137654A (ko) 2024-09-20

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