WO2023182105A1 - 流量制御装置の排気構造、排気方法及びそれを備えたガス供給システム及びガス供給方法 - Google Patents

流量制御装置の排気構造、排気方法及びそれを備えたガス供給システム及びガス供給方法 Download PDF

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Publication number
WO2023182105A1
WO2023182105A1 PCT/JP2023/010113 JP2023010113W WO2023182105A1 WO 2023182105 A1 WO2023182105 A1 WO 2023182105A1 JP 2023010113 W JP2023010113 W JP 2023010113W WO 2023182105 A1 WO2023182105 A1 WO 2023182105A1
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WIPO (PCT)
Prior art keywords
flow rate
valve
exhaust
control valve
control device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2023/010113
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English (en)
French (fr)
Japanese (ja)
Inventor
功二 西野
薫 平田
勝幸 杉田
慎也 小川
圭佑 井手口
信一 池田
淳 澤地
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Fujikin Inc
Original Assignee
Tokyo Electron Ltd
Fujikin Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Tokyo Electron Ltd, Fujikin Inc filed Critical Tokyo Electron Ltd
Priority to JP2024510068A priority Critical patent/JP7823843B2/ja
Priority to CN202380024208.4A priority patent/CN118786400A/zh
Priority to KR1020247028019A priority patent/KR20240137654A/ko
Priority to US18/846,977 priority patent/US20250251745A1/en
Publication of WO2023182105A1 publication Critical patent/WO2023182105A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means

Definitions

  • the present invention relates to an exhaust structure and exhaust method for a flow rate control device used in semiconductor manufacturing equipment, chemical plants, etc., and a gas supply system and gas supply method using the same.
  • Various flow meters and flow control devices are used in semiconductor manufacturing equipment and chemical plants to control the flow rates of material gases, etching gases, and the like.
  • pressure-type flow control devices are widely used because they can control the mass flow rate of various fluids with high precision using a relatively simple mechanism that combines a control valve and a restrictor (for example, an orifice plate or critical nozzle). has been done.
  • a control valve for example, an orifice plate or critical nozzle
  • pressure-type flow control devices have excellent flow control characteristics that allow stable flow control even when the primary supply pressure, that is, the pressure upstream of the control valve, fluctuates greatly. There is.
  • Some pressure-type flow rate control devices adjust the flow rate by controlling the fluid pressure on the upstream side of the constriction portion (hereinafter sometimes referred to as upstream pressure P1).
  • upstream pressure P1 the fluid pressure on the upstream side of the constriction portion
  • upstream pressure P1 the critical expansion condition
  • pressure-type flow control device is configured to flow gas through the fine holes in the throttle section, even after the opening of the control valve is reduced to reduce the flow rate, there may be residual gas between the control valve and the throttle section.
  • the pressure of the gas may not drop suddenly and may flow out over a relatively long period of time, for example about 1 second.
  • pressure-type flow control devices have the problem of having to discharge residual gas as quickly as possible in order to improve responsiveness when reducing the flow rate, that is, changing the controlled flow rate from a large flow rate to a small flow rate. there were.
  • Patent Document 1 discloses that when performing so-called step-down control of the flow rate, in which the gas supply amount is decreased in steps, the gas pressure between the control valve and the throttle section is lowered more quickly. technology has been disclosed.
  • an exhaust passage as a branch passage is connected to a position between the control valve and the throttle part, and when the flow rate is stepped down, the exhaust passage provided in the exhaust passage is By opening the exhaust valve for a short period of time, the upstream pressure P1 is reduced more rapidly.
  • the present invention has been made in view of the above-mentioned problems, and provides an exhaust structure and an exhaust method for a flow rate control device that can improve the responsiveness of flow rate step-down while utilizing the configuration of an existing flow rate control device, as well as an exhaust method therefor.
  • the main objective is to provide a gas supply system and a gas supply method using the gas supply system and gas supply method.
  • An exhaust structure of a flow rate control device includes a main body forming a main body flow path communicating a fluid inlet and a fluid outlet, a control valve provided on the main body flow path, and a control valve provided downstream of the control valve.
  • a flow rate control device comprising a constriction section and a pressure sensor that measures the pressure of the main body flow path between the control valve and the constriction section; a gas source that supplies gas to the flow rate control device; an exhaust path that branches at a branch point on the gas supply path between the gas source and the flow rate control device; a first valve is disposed in the gas supply path upstream of the branch point; A second valve is disposed, and the controller includes a control section that controls operations of the first valve, the second valve, and the control valve, and the control section changes from a state in which the first flow rate is controlled to a state in which the first flow rate is controlled.
  • the first valve when changing the flow rate from the first flow rate to the second flow rate, the first valve is closed and the second valve is closed before exhausting gas between the control valve and the throttle section.
  • the gas between the first valve and the control valve is previously exhausted by opening the control valve and once closing the control valve.
  • the exhaust structure of the flow control device described above further includes a supply pressure sensor that measures the pressure in the flow path between the control valve and the first valve, and the exhaust structure is configured to change the flow rate from the first flow rate to the second flow rate.
  • the opening/closing operation of the control valve is controlled based on the output of the supply pressure sensor.
  • the exhaust structure of the flow rate control device further includes a relaxation part disposed between the control valve and the branch point.
  • a plurality of gas supply paths and a plurality of corresponding flow rate control devices are provided, and each of the plurality of gas supply paths is provided with the first valve, while the second valve is provided.
  • the exhaust passage is commonly connected to the plurality of gas supply passages.
  • a plurality of the gas supply passages and a plurality of the corresponding flow rate control devices are provided, the plurality of gas supply passages and the exhaust passage are formed in one flow passage block, and the one flow The first valve and the second valve are fixed to the road block.
  • a gas supply system includes the exhaust structure of the flow rate control device according to any one of the above, and pumps the gas between the control valve and the throttle part until a pressure corresponding to a second flow rate is reached. After exhausting the air, the second valve is closed, the first valve and the control valve are opened, and the second flow rate is controlled.
  • An exhaust method for a flow rate control device includes: a main body forming a main body flow path communicating a fluid inlet and a fluid outlet; a control valve provided on the main body flow path; and a control valve provided downstream of the control valve.
  • a flow rate control device comprising a constriction section and a pressure sensor that measures the pressure of the main body flow path between the control valve and the constriction section; a gas source that supplies gas to the flow rate control device; an exhaust path that branches at a branch point on the gas flow path between the flow control device, a first valve disposed in the gas supply path upstream of the branch point, and a second valve in the exhaust path.
  • a method of exhausting a flow rate control device using an exhaust structure of a flow rate control device configured by arranging a flow rate control device, wherein a signal is output to change from a state in which a first flow rate is controlled to a second flow rate control state. a step of closing the first valve and opening the second valve while the control valve is open; and directing the fluid accumulated between the throttle portion from the control valve to the exhaust device. and a step of evacuation.
  • the exhaust method for a flow rate control device described above includes, after the step of outputting a signal for changing the state in which the first flow rate is controlled to the second flow rate control, the control valve and the throttle portion Before exhausting the gas between the first valve and the control valve, the gas between the first valve and the control valve is previously exhausted by closing the first valve, opening the second valve, and once closing the control valve. and then opening the control valve.
  • a gas supply method includes the above-described method for exhausting a flow rate control device, wherein after the step of exhausting the fluid accumulated between the control valve and the throttle portion to the exhaust device, The method includes the step of closing two valves, opening the first valve and the control valve, and controlling the flow rate at a second flow rate.
  • FIG. 1 is a schematic diagram showing a gas supply system using an exhaust structure of a flow rate control device according to an embodiment of the present invention. It is a figure showing an example of composition of a flow rate control device with which a gas supply system is provided.
  • FIG. 7 is a schematic diagram showing a gas supply system using an exhaust structure of a flow rate control device according to another embodiment of the present invention.
  • FIG. 3 is a diagram showing a valve opening/closing operation when performing a flow rate step-down operation according to the present embodiment, with (a) to (d) showing sequential steps. It is a graph showing the time change of upstream pressure P1 and control valve opening CV when performing a flow rate step-down operation according to the present embodiment.
  • FIG. 3 is a flowchart showing a gas supply operation including an exhaust operation of the flow rate control device according to an embodiment of the present invention.
  • FIG. 3 is a diagram showing an embodiment in which a common exhaust path is provided for a plurality of gas supply lines. It is a figure which shows the embodiment which forms the gas supply path and exhaust path of several gas supply lines in one metal block, (a) is a sectional view, (b) is a top view.
  • FIG. 1 shows a gas supply system 100 according to this embodiment.
  • the gas supply system 100 can supply the gas G from the gas source 1 to the process chamber 24 via the pressure-type flow control device 10 provided in the gas supply path 3 .
  • a cutoff valve 22 is provided downstream of the pressure-type flow rate control device 10, and can stop the gas supply to the process chamber 24.
  • a vacuum pump 26 is connected to the process chamber 24, and can evacuate the inside of the process chamber 24 and the flow path during gas supply.
  • the cutoff valve 22 for example, an AOV (air-operated valve) or a solenoid valve may be used, and it may be built into the pressure-type flow rate control device 10.
  • the pressure type flow rate control device 10 of this embodiment includes a constriction section 14 provided in a flow path, a control valve 12 provided on the upstream side of the constriction section 14, and an upstream section between the constriction section 14 and the control valve 12. It includes a pressure sensor 16 that detects the pressure P1 and a temperature sensor 18 that detects the temperature between the constriction part 14 and the control valve 12.
  • the pressure-type flow rate control device 10 may further include a pressure sensor (not shown) that measures the downstream pressure P2 on the downstream side of the throttle section 14.
  • the pressure sensor that measures the downstream pressure P2 may be provided integrally with the pressure-type flow rate control device 10, or may be provided separately from the pressure-type flow rate control device 10.
  • the pressure sensor 16 for example, a semiconductor piezoresistive diffusion pressure sensor or a capacitance manometer is used, and as the temperature sensor 18, for example, a temperature measuring resistor or a thermistor is used.
  • the control valve 12 for example, a piezo element-driven valve (hereinafter sometimes referred to as a piezo valve) that opens and closes a metal diaphragm valve body using a piezo actuator is used.
  • a piezo valve is a valve (for example, a proportional valve) that can be opened to an arbitrary opening degree by adjusting a driving voltage applied to a piezo element.
  • constriction section 14 for example, an orifice plate or a sonic nozzle is used, and the opening diameter of the constriction section 14 is set to, for example, 10 to 2000 ⁇ m.
  • an arbitrary flow resistor that is, one that restricts fluid flow, pressure, etc., can be used.
  • FIG. 2 shows an exemplary configuration of the pressure-type flow control device 10.
  • the pressure type flow rate control device 10 is configured using a main body 11 in which a main body channel 13 is formed that communicates a fluid inlet 13i and a fluid outlet 13o.
  • the main body 11 is formed from a metal block made of stainless steel, for example, and the main body channel 13 is formed by combining elongated holes drilled in the metal block.
  • a control valve 12 and a throttle section 14 are provided on the main body flow path 11 .
  • a pressure sensor 16 is attached to the main body 11 to measure the pressure in the main body flow path 13 located between the control valve 12 and the throttle section 14.
  • the temperature sensor 18 and the like shown in FIG. 1 are omitted in FIG. 2, the temperature sensor 18 is arranged, for example, in a bottomed pore bored close to the main body channel 13.
  • the pressure-based flow control device 10 also includes a control circuit 20 connected to the pressure sensor 16, the temperature sensor 18, and the control valve 12.
  • the control circuit 20 includes a built-in CPU, memory, A/D converter, etc. provided on a circuit board, and includes a computer program for executing the operations described below, and is realized by a combination of hardware and software. .
  • the flow rate Q K2P2 m (P1 - P2) n (K2 is the difference between the type of fluid and the fluid temperature.
  • the flow rate control can be performed according to the relationship between the proportional coefficient (the proportionality coefficient depending on the equation and the indexes m and n, which are values derived from the actual flow rate).
  • the flow rate determined by the calculation may be displayed as a flow rate output value on the display section of the external control device.
  • a first valve (gas supply valve) V1 is provided between the gas source 1 and the pressure-type flow rate control device 10 on the upstream side of the pressure-type flow rate control device 10.
  • a supply path 3 is provided.
  • an exhaust path 4 having a second valve (exhaust valve) V2 is connected to a branch point A between the first valve V1 provided in the gas supply path 3 and the pressure type flow rate control device 10.
  • the exhaust path 4 is connected to the exhaust device 2, and gas can be exhausted E from the gas supply path 3 by opening the second valve V2.
  • on-off valves with good response such as AOV (air-driven valve), solenoid valve, or electric valve
  • valves with adjustable opening such as piezo valves are preferably used. You can also use
  • a supply pressure sensor 28 is provided in the gas supply path 3 to measure the supply pressure P0.
  • the supply pressure sensor 28 is used to check whether the supply pressure P0 is maintained at a sufficiently high value during normal gas supply, and is also used to monitor the supply pressure P0 during flow rate step-down, which will be described later. It will be done.
  • a semiconductor piezoresistive diffusion pressure sensor or a capacitance manometer for example, is used similarly to the pressure sensor 16, and unlike the embodiment shown in FIG. good.
  • FIG. 3 shows a gas supply system 100a according to another embodiment. If the gas between the gas supply path 3 or the control valve 12 and the throttle section 14 is rapidly exhausted through the exhaust path 4, the pressure P1 downstream of the control valve 12 will undergo sudden pressure fluctuations, resulting in an unstable state. As a result, flow control may become unstable. In order to prevent such a situation, as shown in FIG. 3, a device is installed between the pressure type flow control device 10 or control valve 12 and the branch point A to moderate (restrict) the flow of gas during exhaust to some extent. A relaxation part 29 may be provided. As a result, rapid pressure fluctuations in the upstream pressure P1 can be suppressed, and smooth flow control can be performed. As the relaxation part 29, one having a larger opening area than the orifice, sonic nozzle, etc. used in the throttle part 14 may be used.
  • FIG. 4 shows the opening and closing operations of the first valve V1, the second valve V2, and the control valve 12 when stepping down the flow rate from the first flow rate QH to the lower second flow rate QL (a) to (a). It is a figure sequentially shown to d).
  • a white valve indicates that the valve is in an open state
  • a black valve indicates that the valve is in a closed state. Note that, in FIG. 4, for the sake of simplicity, the supply pressure sensor 28, temperature sensor 18, and control circuit 20 shown in FIG. 1 are omitted.
  • control circuit 20 may be provided outside the pressure-type flow rate control device 10.
  • the control circuit 20 that controls the control valve 12 may be provided inside the pressure type flow rate control device 10, and the first valve V1 and the second valve V2 may be controlled by a separate external control circuit. , everything including the control of the control valve 12 of the pressure type flow rate control device 10 may be controlled from the outside.
  • a communication function and a cooperation function are provided so that the control circuit 20 built in the pressure type flow rate control device 10 and a control circuit that performs other control can cooperate, and the control circuit 20 and other control circuits are provided with a communication function and a function of cooperation.
  • the controller may control the entire system including the controller.
  • FIG. 5 shows temporal changes in the upstream pressure P1 and temporal changes in the opening degree CV of the control valve 12 in association with each state shown in FIGS. 4(a) to (d).
  • the upstream pressure P1 is proportional to the flow rate in the pressure type flow rate control device 10 as described above, it can be considered to indicate the flow rate Q.
  • the flow rate can be expressed as a ratio with the rated flow rate as 100%.
  • the upstream pressure P1 also shows a high value corresponding to the first flow rate QH.
  • the opening degree CV of the control valve 12 is also opened to a correspondingly large opening degree.
  • the supply pressure P0 on the upstream side of the control valve 12 is maintained at a value sufficiently larger than the upstream pressure P1.
  • the downstream pressure P2 on the downstream side of the throttle section 14 is typically maintained at a vacuum pressure (for example, 100 Torr or less), and gas is supplied to the process chamber 24 at a first flow rate.
  • the control valve 12 is also closed at the start of this flow rate step-down. That is, before exhausting the gas between the control valve 12 and the throttle section 14, the control valve 12 is once closed to exhaust the gas between the first valve V1 and the control valve 12 in advance. In this way, the flow path between the first valve V1, the second valve V2, and the control valve 12 is exhausted from the exhaust path 4, and as a result, the supply pressure P0 rapidly decreases. On the other hand, even when the control valve 12 is closed, the residual gas between the control valve 12 and the throttle section 14 flows out to the downstream side via the throttle section 14, and as a result, the upstream pressure increases. P1 also decreases.
  • the opening degree CV of the control valve 12 during pre-exhaust may be decreased linearly. Also, before opening the second valve V2 for pre-evacuation, all valves, that is, the first valve V1, the second valve V2, and the control valve 12, are closed, and then the second valve V2 is opened. You may also do so.
  • the control valve 12 is opened at time t2 shown in FIG.
  • the residual gas between the control valve 12 and the throttle section 14 not only flows out downstream via the throttle section 14, but also as shown in the section (c) of FIG. , and is also exhausted from the exhaust path 4 via the control valve 12. Therefore, the upstream pressure P1 decreases more rapidly, and at the same time, the flow rate of the gas flowing downstream can also decrease more quickly.
  • the opening degree of the control valve 12 during the exhaust operation may be arbitrarily set depending on the magnitude of the first flow rate and the second flow rate. For example, in the section (c) of FIG. As shown, ramp function control that gradually opens in a linear function may be adopted.
  • control valve 12 shifts to feedback control based on the output of the pressure sensor 16, and the opening degree is adjusted so that the upstream pressure P1 is maintained at the pressure corresponding to the second flow rate QL.
  • the control valve 12 shifts to feedback control based on the output of the pressure sensor 16, and the opening degree is adjusted so that the upstream pressure P1 is maintained at the pressure corresponding to the second flow rate QL.
  • FIG. 6 is a graph showing an example of a flow rate control operation sequence including a flow rate step-down from a first flow rate (here, 100% flow rate) to a second flow rate (here, 30% flow rate).
  • V1 and V2 indicate the opening and closing operations of the first valve V1 and the second valve V2
  • P0 indicates the supply pressure P0 on the upstream side of the control valve.
  • IN and OUT indicate an input signal (set flow rate signal) and an output signal (calculated flow rate signal based on the measured upstream pressure P1) to the pressure type flow rate control device 10.
  • CVV indicates a piezo drive voltage applied to a normally closed piezo valve that constitutes the control valve 12, and P1 indicates an upstream pressure P1 between the control valve 12 and the throttle portion 14.
  • the first valve V1 is kept open and the second valve V2 is kept closed, and the supply pressure P0 is kept at a sufficiently high pressure (here, 250 kPa gauge pressure or more).
  • an initial voltage is applied to the piezo drive voltage CVV, and here, the piezo drive voltage CVV also gradually increases according to the ramp function control or first-order lag control of the target upstream pressure P1.
  • the piezo drive voltage CVV also gradually increases according to the ramp function control or first-order lag control of the target upstream pressure P1.
  • the upstream pressure P1 is maintained at a constant pressure (here, 300 kPa absolute pressure) and gas is flowing at 100% flow rate, and at time t1, an input is made to reduce the flow rate to 30% flow rate.
  • a signal IN is provided to the pressure flow control device 10.
  • the first valve V1 is closed and the second valve V2 is opened, and the supply pressure P0 is reduced to a reduced pressure state.
  • the piezo drive voltage CVV is momentarily set to 0, the control valve 12 is closed, the gas remaining in the gas supply path 3 is exhausted for a moment, and then the voltage is returned to the original voltage and the control valve 12 is opened. , the opening degree is gradually reduced.
  • the control valve 12 since the control valve 12 is open, the residual gas between the control valve 12 and the throttle section 14 is more rapidly exhausted via the exhaust path 4 via the control valve 12 and the second valve V2. Ru.
  • the control valve 12 performs feedback control to maintain the pressure corresponding to the second flow rate.
  • the first valve V1 is opened and the second valve V2 is closed, and the supply pressure P0 is restored to a sufficiently high pressure, and the gas can continue to flow at the second flow rate thereafter.
  • FIG. 7 is a flowchart showing an example of flow rate step-down control.
  • step S1 when the first valve V1, which is a gas supply valve, is opened and the second valve V2, which is an exhaust valve, is closed, the control valve opening degree CV is determined to be an opening corresponding to the first flow rate.
  • the gas flows downstream of the throttle section 14 at a first flow rate.
  • step S2 when a command to change the flow rate to a second flow rate that is smaller than the first flow rate and is not zero is received as a set flow rate signal, as shown in step S2, the first valve V1 is closed and the second valve V1 is closed. Open valve V2 to perform exhaust operation.
  • the control valve opening CV is also closed, and the upstream flow path between the first valve V1 and the control valve 12 is pre-evacuated.
  • the first valve V1 may be closed during the final short period when the gas is allowed to flow at the first flow rate.
  • the upstream pressure P1 between the control valve 12 and the throttle part 14 can be maintained at the desired value, the first valve V1 is closed to reduce the supply pressure P0, and the second flow rate is immediately before stepping down to the second flow rate. It is also possible to supply the gas at one flow rate.
  • step S3 it is determined whether the supply pressure P0 has decreased sufficiently by comparing it with the upstream pressure P1. If the supply pressure P0 is lower than the upstream pressure P1, it can be confirmed that the situation is sufficient to exhaust the residual gas to the upstream side by opening the control valve 12. In this manner, by controlling the opening/closing operation of the control valve 12 during flow rate step-down based on the output of the supply pressure sensor 28, exhaust to the upstream side can be performed more reliably and effectively.
  • this step S3 is not necessarily necessary, and it has been confirmed that the supply pressure P0 decreases rapidly in a short period of time due to pre-evacuation, such as when the flow path volume between the first valve V1 and the control valve 12 is relatively small.
  • the control valve 12 may be controlled to be closed for a predetermined short period of time without particularly comparing the pressures.
  • the supply pressure P0 does not necessarily have to be lower than the upstream pressure P1, and it may be determined whether or not to complete pre-evacuation based on whether the supply pressure P0 has decreased to a predetermined pressure.
  • step S4 by opening the control valve 12, the residual gas between the control valve 12 and the throttle section 14 is exhausted via the upstream exhaust path 4. Thereby, the upstream pressure P1 and the flow rate of the gas flowing downstream can be rapidly reduced.
  • the control valve 12 may be opened all at once to a predetermined opening degree, or may be gradually opened to a predetermined opening degree over time. Further, feedback control based on the upstream pressure P1 may be continuously performed on the control valve 12. Even if residual gas is being exhausted to the upstream side, the control valve 12 remains open until the measured upstream pressure P1 decreases to a pressure value corresponding to the second flow rate. This is because it is thought to be preserved.
  • step S5 it is determined whether the upstream pressure P1 has decreased to the upstream pressure threshold Pth corresponding to the second flow rate.
  • This threshold value Pth may be the value of the upstream pressure P1 corresponding to the second flow rate, or may be a threshold value set to a value different from this. If the threshold value Pth is made smaller, the exhaust time to the upstream side becomes longer, so the upstream pressure P1 can be lowered more quickly.However, when the gas is then flowed at the second flow rate, undershoot may occur due to insufficient supply pressure P0. may occur. Therefore, the threshold value Pth may be set to a value higher than the upstream pressure P1 corresponding to the second flow rate to some extent.
  • step S6 when it is confirmed that the upstream pressure P1 has decreased sufficiently, as shown in step S6, the first valve V1 is opened and the second valve V2 is closed to restore the supply pressure P0, and the upstream side
  • the control valve opening degree CV is controlled to the opening degree corresponding to the second flow rate. Specifically, by feedback-controlling the control valve 12 based on the output of the pressure sensor 16 that measures the upstream pressure P1, gas can be caused to flow downstream of the throttle section 14 at the second flow rate.
  • FIG. 8 shows an embodiment in which one common exhaust path 4 is provided for a plurality of gas supply lines L1 to L3.
  • each pressure-type flow rate control device 10 is provided in the gas supply path 3 of each gas supply line, and different types of gases can be supplied to the process chamber at desired flow rates. can.
  • the first valve V1 and the control valve 12 are normally closed in the other gas supply lines.
  • the exhaust path 4 is commonly connected to a branch point between the first valve V1 and the control valve 12 in each gas supply path 3.
  • the exhaust path 4 can be used to perform upstream exhaust for any of the gas supply lines L1 to L3 when the flow rate is stepped down, and responsiveness can be improved.
  • one exhaust device 2 By providing the common exhaust path 4 in this way, one exhaust device 2, one exhaust path 4, and one second valve V2 are sufficient, so the system configuration can be simplified and costs can be reduced. Further, even when a supply pressure sensor (not shown) is provided, it may be sufficient to provide one in the exhaust path 4 or any one of the gas supply paths 3.
  • each gas supply line L1 to L3 is connected to the same process chamber 24, and the above-mentioned common gas supply line L1 to L3 is connected to the same process chamber 24, and the exhaust system including the vacuum pump 26 connected to this process chamber 24 is connected to the above-mentioned common gas supply line L1 to L3 for exhausting from the upstream side.
  • An exhaust path 4 is connected thereto.
  • the chamber-connected vacuum pump 26 can be used as the exhaust device 2 not only in the case where a plurality of gas supply lines L1 to L3 are provided as in this embodiment, but also in the single-system gas supply system shown in FIG. Of course.
  • FIGS. 9(a) and 9(b) show an embodiment in which the gas supply passages 3 and exhaust passages 4 of the plurality of gas supply lines L1 to L3 are provided in one flow passage block 5.
  • the flow path block itself corresponding to a plurality of gas supply lines is disclosed in Patent Document 2, for example, and is used to form an integrated gas supply system.
  • each flow path is formed in a block made of metal (for example, stainless steel) as the flow path block 5 by drilling using a drill.
  • FIG. 9(a) shows a U-shaped flow path, it is not easy to form such a flow path by drilling, so in reality, a narrow hole is formed from the end face of the block.
  • Each channel can be easily formed by sealing the opening of the hole with a sealing plug or by drilling a V-shaped pore extending diagonally downward from the top surface.
  • a first valve V1 and a second valve V2 are fixed to the flow path block 5, and a gas supply path 3 and an exhaust path connected at a branch point A. 4 can be compactly formed for multiple lines.
  • the first flow rate QH is set to 100%, it is not limited thereto.
  • the second flow rate QL is not limited to 30%.
  • the first flow rate QH and the second flow rate QL may be any set flow rate as long as residual pressure is generated when the flow rate setting is changed from the first flow rate QH to the second flow rate QL.
  • FIGS. 9(a) and 9(b) a mode in which a plurality of exhaust passages 4 and a second valve V2 corresponding to a plurality of gas supply lines L1 to L3 are provided in one flow passage block 5 has been described. , by forming an exhaust passage 4 extending in the width direction that is commonly connected to each gas supply passage 3, one common exhaust passage 4 and one second valve V2 as shown in FIG. It is also possible to have a configuration in which the flow path block 5 is provided.
  • the exhaust structure and exhaust method of the flow rate control device according to the embodiments of the present invention, as well as the gas supply system and gas supply method using the same, are used for gas supply in, for example, semiconductor manufacturing equipment.

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PCT/JP2023/010113 2022-03-22 2023-03-15 流量制御装置の排気構造、排気方法及びそれを備えたガス供給システム及びガス供給方法 Ceased WO2023182105A1 (ja)

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JP2024510068A JP7823843B2 (ja) 2022-03-22 2023-03-15 流量制御装置の排気構造、排気方法及びそれを備えたガス供給システム及びガス供給方法
CN202380024208.4A CN118786400A (zh) 2022-03-22 2023-03-15 流量控制装置的排气结构、排气方法以及具备其的气体供给系统和气体供给方法
KR1020247028019A KR20240137654A (ko) 2022-03-22 2023-03-15 유량 제어 장치의 배기 구조, 배기 방법 및 그것을 구비한 가스 공급 시스템 및 가스 공급 방법
US18/846,977 US20250251745A1 (en) 2022-03-22 2023-03-15 Exhaust structure and exhaust method for flow rate control device, and gas supply system and gas supply method comprising same

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JP2013231460A (ja) * 2012-04-27 2013-11-14 Fujikin Inc 流体制御装置
WO2015064035A1 (ja) * 2013-10-31 2015-05-07 株式会社フジキン 圧力式流量制御装置
WO2015111391A1 (ja) * 2014-01-21 2015-07-30 株式会社フジキン 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法
JP2017011055A (ja) * 2015-06-19 2017-01-12 東京エレクトロン株式会社 ガス供給系、ガス供給制御方法、及びガス置換方法

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JP6346849B2 (ja) * 2014-08-20 2018-06-20 東京エレクトロン株式会社 ガス供給系、プラズマ処理装置、及びプラズマ処理装置の運用方法
JP6047540B2 (ja) * 2014-11-05 2016-12-21 Ckd株式会社 流量検定ユニット
JP7296699B2 (ja) * 2018-07-02 2023-06-23 東京エレクトロン株式会社 ガス供給システム、プラズマ処理装置およびガス供給システムの制御方法
JP2021082127A (ja) * 2019-11-21 2021-05-27 東京エレクトロン株式会社 ガス供給システム、プラズマ処理装置及びガス供給システムの制御方法

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Publication number Priority date Publication date Assignee Title
JP2013231460A (ja) * 2012-04-27 2013-11-14 Fujikin Inc 流体制御装置
WO2015064035A1 (ja) * 2013-10-31 2015-05-07 株式会社フジキン 圧力式流量制御装置
WO2015111391A1 (ja) * 2014-01-21 2015-07-30 株式会社フジキン 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法
JP2017011055A (ja) * 2015-06-19 2017-01-12 東京エレクトロン株式会社 ガス供給系、ガス供給制御方法、及びガス置換方法

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KR20240137654A (ko) 2024-09-20

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