CN118786400A - 流量控制装置的排气结构、排气方法以及具备其的气体供给系统和气体供给方法 - Google Patents
流量控制装置的排气结构、排气方法以及具备其的气体供给系统和气体供给方法 Download PDFInfo
- Publication number
- CN118786400A CN118786400A CN202380024208.4A CN202380024208A CN118786400A CN 118786400 A CN118786400 A CN 118786400A CN 202380024208 A CN202380024208 A CN 202380024208A CN 118786400 A CN118786400 A CN 118786400A
- Authority
- CN
- China
- Prior art keywords
- valve
- flow rate
- control device
- exhaust
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
- G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Flow Control (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022045363 | 2022-03-22 | ||
| JP2022-045363 | 2022-03-22 | ||
| PCT/JP2023/010113 WO2023182105A1 (ja) | 2022-03-22 | 2023-03-15 | 流量制御装置の排気構造、排気方法及びそれを備えたガス供給システム及びガス供給方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN118786400A true CN118786400A (zh) | 2024-10-15 |
Family
ID=88101498
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202380024208.4A Pending CN118786400A (zh) | 2022-03-22 | 2023-03-15 | 流量控制装置的排气结构、排气方法以及具备其的气体供给系统和气体供给方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20250251745A1 (https=) |
| JP (1) | JP7823843B2 (https=) |
| KR (1) | KR20240137654A (https=) |
| CN (1) | CN118786400A (https=) |
| TW (1) | TWI864645B (https=) |
| WO (1) | WO2023182105A1 (https=) |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4648098B2 (ja) * | 2005-06-06 | 2011-03-09 | シーケーディ株式会社 | 流量制御機器絶対流量検定システム |
| JP6012247B2 (ja) * | 2012-04-27 | 2016-10-25 | 株式会社フジキン | 流体制御装置 |
| CN105659177B (zh) * | 2013-10-31 | 2018-07-10 | 株式会社富士金 | 压力式流量控制装置 |
| JP6321972B2 (ja) * | 2014-01-21 | 2018-05-09 | 株式会社フジキン | 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法 |
| JP6346849B2 (ja) * | 2014-08-20 | 2018-06-20 | 東京エレクトロン株式会社 | ガス供給系、プラズマ処理装置、及びプラズマ処理装置の運用方法 |
| JP6047540B2 (ja) * | 2014-11-05 | 2016-12-21 | Ckd株式会社 | 流量検定ユニット |
| JP6512959B2 (ja) * | 2015-06-19 | 2019-05-15 | 東京エレクトロン株式会社 | ガス供給系、ガス供給制御方法、及びガス置換方法 |
| JP7296699B2 (ja) * | 2018-07-02 | 2023-06-23 | 東京エレクトロン株式会社 | ガス供給システム、プラズマ処理装置およびガス供給システムの制御方法 |
| JP2021082127A (ja) * | 2019-11-21 | 2021-05-27 | 東京エレクトロン株式会社 | ガス供給システム、プラズマ処理装置及びガス供給システムの制御方法 |
-
2023
- 2023-03-15 CN CN202380024208.4A patent/CN118786400A/zh active Pending
- 2023-03-15 KR KR1020247028019A patent/KR20240137654A/ko active Pending
- 2023-03-15 JP JP2024510068A patent/JP7823843B2/ja active Active
- 2023-03-15 US US18/846,977 patent/US20250251745A1/en active Pending
- 2023-03-15 WO PCT/JP2023/010113 patent/WO2023182105A1/ja not_active Ceased
- 2023-03-22 TW TW112110637A patent/TWI864645B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2023182105A1 (ja) | 2023-09-28 |
| US20250251745A1 (en) | 2025-08-07 |
| TW202409772A (zh) | 2024-03-01 |
| TWI864645B (zh) | 2024-12-01 |
| JP7823843B2 (ja) | 2026-03-04 |
| JPWO2023182105A1 (https=) | 2023-09-28 |
| KR20240137654A (ko) | 2024-09-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |