JP7823843B2 - 流量制御装置の排気構造、排気方法及びそれを備えたガス供給システム及びガス供給方法 - Google Patents

流量制御装置の排気構造、排気方法及びそれを備えたガス供給システム及びガス供給方法

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Publication number
JP7823843B2
JP7823843B2 JP2024510068A JP2024510068A JP7823843B2 JP 7823843 B2 JP7823843 B2 JP 7823843B2 JP 2024510068 A JP2024510068 A JP 2024510068A JP 2024510068 A JP2024510068 A JP 2024510068A JP 7823843 B2 JP7823843 B2 JP 7823843B2
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JP
Japan
Prior art keywords
valve
flow rate
flow
gas
exhaust
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2024510068A
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English (en)
Japanese (ja)
Other versions
JPWO2023182105A1 (https=
Inventor
功二 西野
薫 平田
勝幸 杉田
慎也 小川
圭佑 井手口
信一 池田
淳 澤地
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Fujikin Inc
Original Assignee
Tokyo Electron Ltd
Fujikin Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd, Fujikin Inc filed Critical Tokyo Electron Ltd
Publication of JPWO2023182105A1 publication Critical patent/JPWO2023182105A1/ja
Application granted granted Critical
Publication of JP7823843B2 publication Critical patent/JP7823843B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)
JP2024510068A 2022-03-22 2023-03-15 流量制御装置の排気構造、排気方法及びそれを備えたガス供給システム及びガス供給方法 Active JP7823843B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022045363 2022-03-22
JP2022045363 2022-03-22
PCT/JP2023/010113 WO2023182105A1 (ja) 2022-03-22 2023-03-15 流量制御装置の排気構造、排気方法及びそれを備えたガス供給システム及びガス供給方法

Publications (2)

Publication Number Publication Date
JPWO2023182105A1 JPWO2023182105A1 (https=) 2023-09-28
JP7823843B2 true JP7823843B2 (ja) 2026-03-04

Family

ID=88101498

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024510068A Active JP7823843B2 (ja) 2022-03-22 2023-03-15 流量制御装置の排気構造、排気方法及びそれを備えたガス供給システム及びガス供給方法

Country Status (6)

Country Link
US (1) US20250251745A1 (https=)
JP (1) JP7823843B2 (https=)
KR (1) KR20240137654A (https=)
CN (1) CN118786400A (https=)
TW (1) TWI864645B (https=)
WO (1) WO2023182105A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006337346A (ja) 2005-06-06 2006-12-14 Ckd Corp 流量制御機器絶対流量検定システム
JP2013231460A (ja) 2012-04-27 2013-11-14 Fujikin Inc 流体制御装置
WO2015064035A1 (ja) 2013-10-31 2015-05-07 株式会社フジキン 圧力式流量制御装置
WO2015111391A1 (ja) 2014-01-21 2015-07-30 株式会社フジキン 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法
JP2016090387A (ja) 2014-11-05 2016-05-23 Ckd株式会社 流量検定ユニット
JP2017011055A (ja) 2015-06-19 2017-01-12 東京エレクトロン株式会社 ガス供給系、ガス供給制御方法、及びガス置換方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6346849B2 (ja) * 2014-08-20 2018-06-20 東京エレクトロン株式会社 ガス供給系、プラズマ処理装置、及びプラズマ処理装置の運用方法
JP7296699B2 (ja) * 2018-07-02 2023-06-23 東京エレクトロン株式会社 ガス供給システム、プラズマ処理装置およびガス供給システムの制御方法
JP2021082127A (ja) * 2019-11-21 2021-05-27 東京エレクトロン株式会社 ガス供給システム、プラズマ処理装置及びガス供給システムの制御方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006337346A (ja) 2005-06-06 2006-12-14 Ckd Corp 流量制御機器絶対流量検定システム
JP2013231460A (ja) 2012-04-27 2013-11-14 Fujikin Inc 流体制御装置
WO2015064035A1 (ja) 2013-10-31 2015-05-07 株式会社フジキン 圧力式流量制御装置
WO2015111391A1 (ja) 2014-01-21 2015-07-30 株式会社フジキン 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法
JP2016090387A (ja) 2014-11-05 2016-05-23 Ckd株式会社 流量検定ユニット
JP2017011055A (ja) 2015-06-19 2017-01-12 東京エレクトロン株式会社 ガス供給系、ガス供給制御方法、及びガス置換方法

Also Published As

Publication number Publication date
WO2023182105A1 (ja) 2023-09-28
US20250251745A1 (en) 2025-08-07
TW202409772A (zh) 2024-03-01
TWI864645B (zh) 2024-12-01
JPWO2023182105A1 (https=) 2023-09-28
CN118786400A (zh) 2024-10-15
KR20240137654A (ko) 2024-09-20

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