TWI864645B - 流量控制裝置的排氣構造、排氣方法以及具備該排氣構造的氣體供給系統、及氣體供給方法 - Google Patents

流量控制裝置的排氣構造、排氣方法以及具備該排氣構造的氣體供給系統、及氣體供給方法 Download PDF

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TWI864645B
TWI864645B TW112110637A TW112110637A TWI864645B TW I864645 B TWI864645 B TW I864645B TW 112110637 A TW112110637 A TW 112110637A TW 112110637 A TW112110637 A TW 112110637A TW I864645 B TWI864645 B TW I864645B
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Taiwan
Prior art keywords
valve
aforementioned
flow
control device
exhaust
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TW112110637A
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English (en)
Chinese (zh)
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TW202409772A (zh
Inventor
西野功二
平田薰
杉田勝幸
小川慎也
井手口圭佑
池田信一
澤地淳
Original Assignee
日商富士金股份有限公司
日商東京威力科創股份有限公司
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)
TW112110637A 2022-03-22 2023-03-22 流量控制裝置的排氣構造、排氣方法以及具備該排氣構造的氣體供給系統、及氣體供給方法 TWI864645B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022045363 2022-03-22
JP2022-045363 2022-03-22

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TW202409772A TW202409772A (zh) 2024-03-01
TWI864645B true TWI864645B (zh) 2024-12-01

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TW112110637A TWI864645B (zh) 2022-03-22 2023-03-22 流量控制裝置的排氣構造、排氣方法以及具備該排氣構造的氣體供給系統、及氣體供給方法

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US (1) US20250251745A1 (https=)
JP (1) JP7823843B2 (https=)
KR (1) KR20240137654A (https=)
CN (1) CN118786400A (https=)
TW (1) TWI864645B (https=)
WO (1) WO2023182105A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015064035A1 (ja) * 2013-10-31 2015-05-07 株式会社フジキン 圧力式流量制御装置
CN110444460A (zh) * 2014-08-20 2019-11-12 东京毅力科创株式会社 等离子体处理装置的应用方法
US20210043425A1 (en) * 2018-07-02 2021-02-11 Tokyo Electron Limited Gas supply system, plasma processing device, and control method for gas supply system
TWI719992B (zh) * 2015-06-19 2021-03-01 日商東京威力科創股份有限公司 氣體供給系統、氣體供給控制方法及氣體置換方法
TW202125626A (zh) * 2019-11-21 2021-07-01 日商東京威力科創股份有限公司 氣體供給系統、電漿處理裝置及氣體供給系統之控制方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4648098B2 (ja) * 2005-06-06 2011-03-09 シーケーディ株式会社 流量制御機器絶対流量検定システム
JP6012247B2 (ja) * 2012-04-27 2016-10-25 株式会社フジキン 流体制御装置
JP6321972B2 (ja) * 2014-01-21 2018-05-09 株式会社フジキン 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法
JP6047540B2 (ja) * 2014-11-05 2016-12-21 Ckd株式会社 流量検定ユニット

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015064035A1 (ja) * 2013-10-31 2015-05-07 株式会社フジキン 圧力式流量制御装置
CN110444460A (zh) * 2014-08-20 2019-11-12 东京毅力科创株式会社 等离子体处理装置的应用方法
TWI719992B (zh) * 2015-06-19 2021-03-01 日商東京威力科創股份有限公司 氣體供給系統、氣體供給控制方法及氣體置換方法
US20210043425A1 (en) * 2018-07-02 2021-02-11 Tokyo Electron Limited Gas supply system, plasma processing device, and control method for gas supply system
TW202125626A (zh) * 2019-11-21 2021-07-01 日商東京威力科創股份有限公司 氣體供給系統、電漿處理裝置及氣體供給系統之控制方法

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WO2023182105A1 (ja) 2023-09-28
US20250251745A1 (en) 2025-08-07
TW202409772A (zh) 2024-03-01
JP7823843B2 (ja) 2026-03-04
JPWO2023182105A1 (https=) 2023-09-28
CN118786400A (zh) 2024-10-15
KR20240137654A (ko) 2024-09-20

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