WO2015018154A1 - 改性纳米二氧化硅及其制备方法、颜料分散体、感光树脂组合物 - Google Patents

改性纳米二氧化硅及其制备方法、颜料分散体、感光树脂组合物 Download PDF

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Publication number
WO2015018154A1
WO2015018154A1 PCT/CN2013/089087 CN2013089087W WO2015018154A1 WO 2015018154 A1 WO2015018154 A1 WO 2015018154A1 CN 2013089087 W CN2013089087 W CN 2013089087W WO 2015018154 A1 WO2015018154 A1 WO 2015018154A1
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Prior art keywords
pigment dispersion
modified nano
acrylate
nano silica
pigment
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English (en)
French (fr)
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赵明
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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Priority to US14/389,105 priority Critical patent/US10138390B2/en
Publication of WO2015018154A1 publication Critical patent/WO2015018154A1/zh
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/10—Homopolymers or copolymers of methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0001—Post-treatment of organic pigments or dyes
    • C09B67/0022—Wet grinding of pigments
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
    • C09B67/0084—Dispersions of dyes
    • C09B67/0085—Non common dispersing agents
    • C09B67/009—Non common dispersing agents polymeric dispersing agent
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3081—Treatment with organo-silicon compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/10—Homopolymers or copolymers of methacrylic acid esters
    • C09D133/12—Homopolymers or copolymers of methyl methacrylate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/24—Homopolymers or copolymers of amides or imides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/206—Filters comprising particles embedded in a solid matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G03F7/0022—Devices or apparatus
    • G03F7/0027—Devices or apparatus characterised by pressure means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/0325—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polysaccharides, e.g. cellulose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer

Definitions

  • the present invention relates to the field of material technology, and in particular to a modified nano-silica and a preparation method thereof, a pigment dispersion comprising the modified nano-silica, and a photosensitive resin composition comprising the pigment dispersion.
  • the more common method for preparing color filters is the pigment dispersion method, which has the advantages of process cartridge, light resistance, heat resistance, chemical resistance and stable performance.
  • the pigment dispersion method is to disperse a pigment in a resin, add an alkali-soluble resin, a photopolymerization monomer, an initiator, and other additives, and then apply it on a transparent glass substrate on which a black matrix has been prepared, and undergo a photolithography process such as exposure and development.
  • the color layer of the color filter that is, the red, green, and blue color resists can be formed.
  • a stable combination of a pigment, a dispersant, and a binder resin is required to maintain the excellent performance of the obtained pigment paste, wherein the binder resin plays a role in the system.
  • the viscosity is increased to form a steric effect between the pigment particles, effectively preventing the occurrence of agglomeration.
  • the primary particle size of the pigment itself becomes smaller and smaller, from less than 100 nm to less than 50 nm, the dispersion becomes more and more difficult.
  • the increase of the surface energy of the pigment particles itself causes the pigment in the paste to easily occur. Reunion affects the coating effect that is ultimately configured as a photoresist.
  • the photosensitive resin composition including the above pigment dispersion is likely to undergo shrinkage of the resin layer after the coating and exposure development, and the shrinkage of the surface of the film and the shrinkage of the side wall can be observed. This shrinkage affects the next step, such as coating of other organic film layers, sputtering of ITO, and the like. Summary of the invention
  • the technical solution adopted to solve the technical problem of the present invention is a modified nano silica, wherein the surface of the modified nano silica particle is grafted with an unsaturated double bond, and the modified nano silica particle The average particle size is 5-50 nm.
  • the modified nano silica particles have an average particle diameter of 10 to 20 nm.
  • the addition of ordinary inorganic particles to the organic pigment composition does not prevent the agglomeration of the pigment; at the same time, it cannot be crosslinked with the polymer in the pigment composition to form a network structure type composite structure.
  • the modified nano silica particles of the present invention can crosslink with other high molecular substances due to the unsaturated double bonds on the surface thereof, and the modified nano silica having the above particle diameter is much smaller than the particles capable of dispersing organic pigments.
  • the modified nano silica particles are dispersed in the pigment paste to be separated by the steric hindrance effect of the binder resin covered by the pigment surface, and the modified nano silica itself is not
  • the saturated functional group is suitable for forming a node of the crosslinked network, and the polymer segments are joined to form a network structure, thereby effectively preventing agglomeration of the nano silica particles themselves and effectively preventing agglomeration of the pigment.
  • Another object of the present invention is to provide a process for preparing a modified nano silica, which comprises: 1) adding tetraethyl orthosilicate to a solution of a vinyl group-containing silane coupling agent, for example
  • the tetraethyl orthosilicate may be added by dropping or other relatively slow feeding method, and the step of continuing the reaction to form the initial product after the completion of the addition may be carried out;
  • the tetraethyl orthosilicate has a mass fraction of 15 to 25 parts
  • the vinyl group-containing silane coupling agent has a mass fraction of 3 to 10 parts.
  • the tetraethyl orthosilicate is added dropwise to the solution of the vinyl group-containing silane coupling agent at a reaction temperature of 50 to 80 ° C, and the addition is continued.
  • the reaction is carried out at the reaction temperature for 6-12 h.
  • the aging temperature is 110-160 ° C, and the aging time is 8-30 h.
  • the solution of the vinyl group-containing silane coupling agent contains the silane coupling agent and a solvent, and the concentration (mass concentration) of the silane coupling agent may be 2 to 10%. It is preferably 5-8%.
  • the solvent may be any solvent capable of dissolving the vinyl group-containing silane coupling agent, such as ethanol, water, or a combination thereof, but is not limited thereto.
  • the solution may also contain aqueous ammonia to adjust the pH of the solution between 7-9.
  • the vinyl group-containing silane coupling agent is vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriisoxyloxysilane, vinyl three One or more of acetoxysilane, Y-(mercaptoacryloxy)propyltrimethoxysilane, and the like.
  • a vinyl group-containing silane coupling agent can increase the dispersion state of the silica particles themselves in an organic solvent even if the surface of the nano silica particles is provided with an unsaturated double bond group.
  • the steric effect between the particles prevents their mutual agglomeration, and on the other hand, the organic groups on the surface are lipophilic, which facilitates their dispersion in organic solvents.
  • the ratio of the vinyl group-containing silane coupling agent to tetraethyl orthosilicate to control the number of double bonds on the surface of the nano silica particles, the surface of the nano silica particles is not polymerized when crosslinked.
  • Multi-segment causes a local viscosity surge, thereby maintaining a low cross-linking state, so that when the nano-silica particles are put into the pigment dispersion, a cross-linked network with nano-silica particles as a node can be constructed, and The viscosity property of the pigment dispersion itself is not affected, so that it remains in a low-viscosity, stable state, which may cause clogging of the photosensitive resin composition containing the pigment dispersion in the coating process.
  • Another object of the present invention is to provide a pigment dispersion which is effective in preventing agglomeration and film-forming property, and which solves the problem that the prior pigment dispersion is easily agglomerated and the film-forming property is poor.
  • the technical solution adopted to solve the technical problem of the present invention is a pigment dispersion prepared by dispersing a solute in a solvent and causing a crosslinking reaction, wherein the average particle diameter of the solid particles in the pigment dispersion is 40-1 00 nm;
  • the solute comprises: 1-5% of the modified nano-silica of the invention, 3-6% of the dispersing agent, 2-6% of the binder resin, and 10-20% of the pigment, based on 100% by mass of the pigment dispersion.
  • the photoinitiator is 0.1-0.5%.
  • the solvent used may be any organic solvent capable of providing effective dispersion, such as, but not limited to, propylene glycol monoterpene ether acetate, B. Ethyl acetate, ethylene glycol monoterpene ether, n-butanol, ethyl ethoxypropionate, and the like.
  • modified nano silica particles as a crosslinking point
  • crosslinking resin containing an unsaturated double bond in the dispersion is crosslinked and polymerized, and a network polymer resin is formed in the dispersion.
  • the system provides stronger encapsulation and stabilization of the pigment particles, thereby effectively reducing the occurrence of agglomeration and precipitation between the particles.
  • the solute further comprises 0.2 to 1% of quantum dots, based on 100% by mass of the pigment dispersion.
  • the quantum dots have a particle diameter of from 1 to 10 nm.
  • a quantum dot is introduced in the synthesis stage of the modified nano silica, specifically, a quantum dot is introduced into a solution of a vinyl group-containing silane coupling agent, and then tetrasilicate is added to the resulting solution.
  • Ethyl ester after reaction and aging, can form a composite structure of modified nano-silica-coated quantum dots.
  • Quantum Dot is a semiconductor nanostructure that binds excitons in three spatial directions. It is usually composed of semiconductor materials such as CdS, CdSe, CdTe, ZnSe, InP, InAs, etc., or two or two.
  • semiconductor materials such as CdS, CdSe, CdTe, ZnSe, InP, InAs, etc., or two or two.
  • the above semiconductor material composition such as CdSe-doped ZnS, CdSe-doped ZnSe, or the like.
  • the emission spectrum of a quantum dot can be controlled by changing the size of the quantum dot.
  • quantum dots having different emission spectra absorb the light emitted by the backlight and emit fluorescence similar to the color of the sub-pixel region in which it is located, thereby enhancing the observer's
  • the light that can be received can also increase the color gamut.
  • the dispersant is a block copolymer composed of a solvent-soluble block and a block having a nitrogen atom-containing functional group.
  • the above dispersant has an amine value of from 80 to 150 mg KOH/g.
  • the block copolymer is one or more of an acrylic, a polyurethane, a polyaminoamide, a polyether ester, and an aliphatic polycarboxylic acid block copolymer.
  • the pigment is one or more of azo, phthalocyanine, quinacridone, benzimidazolone, indanthrene, and dioxazine.
  • color it can be various pigments applied to color filters, for example, blue pigment, green pigment, red pigment, yellow pigment, purple pigment, orange pigment, brown pigment, Pigments of various colors such as black pigments.
  • the binder resin has an unsaturated double bond.
  • the binder resin can participate in the polymerization reaction due to the unsaturated double bond in the molecular chain, thereby encapsulating the pigment particles, isolating the agglomeration between the particles, and preventing sedimentation.
  • the binder resin is polyvinyl alcohol, hydroxypropyl cellulose, carboxymethyl cellulose, hydroxyethyl cellulose, mercapto cellulose, styrene-acrylic resin each having an unsaturated double bond. , styrene-acrylic acid-acrylate resin, styrene-maleic acid half ester resin, mercaptoacrylic acid-mercapto acrylate resin, isobutylene-maleic acid resin, rosin modified maleic acid resin, polyvinylpyrrolidone, poly One or more of allylamine, polyvinyl chloride, chlorinated polypropylene, and polyethyleneimine.
  • the photoinitiator is benzoin and its derivatives, benzil, alkyl phenone, acyl phosphorus oxide, benzophenone, thioxanthone, diaryl One of iodine salt, triaryl iodine salt, alkyl iodine salt, and cumene iron hexafluorophosphate.
  • the above photoinitiator can absorb a certain wavelength of energy in the ultraviolet region (250 to 400 nm) or the visible region (400 to 800 nm) to generate radicals, cations, etc., thereby causing polymerization and crosslinking curing.
  • the preparation method of the pigment dispersion of the invention comprises the following steps:
  • a modified nano-silica (which optionally encapsulates quantum dots) and a photoinitiator are added to the resulting dispersion, and a cross-linking reaction is carried out by irradiation with light (usually ultraviolet light) to obtain a pigment dispersion.
  • Another object of the present invention is to provide a photosensitive resin composition
  • a photosensitive resin composition comprising: pigment dispersion 30-40%, alkali soluble resin 1.5-6%, polymerization, based on 100% by mass of the total mass of the photosensitive resin composition Monomer 2-5%, photoinitiator 0.2-0.8%.
  • the alkali-soluble resin is an acrylic copolymer, and the acrylic copolymer has an acid value of 50 to 150.
  • the acrylic copolymer having the acid value can achieve a good developing effect without affecting the undeveloped portion.
  • the acrylic copolymer is selected from (indenyl) acrylic acid / (fluorenyl) acrylate copolymer, (fluorenyl) acrylic acid / (fluorenyl) benzoate copolymer, (mercapto) acrylic / (mercapto) acrylic acid (2-hydroxyethyl) I (mercapto) Benzoyl acrylate copolymer, (mercapto) acrylic acid / (fluorenyl) decyl acrylate / styrene copolymer, (mercapto) acrylic / (mercapto) acrylic acid (2-hydroxyethyl) / (mercapto) acrylic Phenyl oxime ester / (fluorenyl) decyl acrylate copolymer, (mercapto) acrylic acid / (fluorenyl) phenyl decyl acrylate / N-phenyl maleimide copolymer, the acid value of the acrylic copolymer
  • the acrylic copolymer having the acid value can achieve a good developing effect without affecting the undeveloped portion.
  • (indenyl)acrylic acid means acrylic acid and/or mercaptoacrylic acid.
  • (indenyl) acrylate means acrylate and/or methacrylate.
  • the polymerized monomer is usually a photopolymerizable monomer.
  • the polymerizable monomer is hexyl phenyl carbitol acrylate, N-vinyl pyrrolidone, (2-ethylhexyl carbitol) acrylate, ethyl (meth) acrylate, bisphenol A
  • the photoinitiator in the photosensitive resin composition may be selected from those described above for the pigment dispersion, and may be the same as or different from the photoinitiator used in the pigment dispersion.
  • the photosensitive resin composition may further contain an added solvent to meet the viscosity requirements of the coating operation.
  • the added solvent may be selected from those described above for the pigment dispersion, and may be the same as or different from the solvent used in the pigment dispersion.
  • the photosensitive resin composition may further contain additives commonly used in the art, such as a leveling agent, a photosensitizer, and the like.
  • the mixing and dispersing operations may be selected from commonly used dispersing machines and mixers, such as ball mills, horizontal sand mills, vertical sand mills, ring sanders, ultrafine mills, high pressure nano-hooks.
  • Mass machine high speed mixer, high speed agitating mill, roller crusher, ultrasonic disperser, homomixer, etc.
  • the present invention prepares modified nano-silica having an unsaturated double bond, which can be cross-linked with other high-molecular substances; by introducing the modified nano-silica particles into the pigment dispersion, so that in the dispersion Produce cross-linking, can be on pigment particles Helps to suspend and reduce sedimentation.
  • the alkali-soluble resin, the polymerizable monomer, the photoinitiator, and other additives are added to the pigment dispersion to form the photosensitive resin composition, in the exposure stage, the polymerized monomers are polymerized and crosslinked to form a network structure, and thus the dispersion
  • the network cross-linked structure containing nano-silica particles forms an interpenetrating network type composite structure, which penetrates and interacts with each other to support each other in the post-baking stage, reducing thermal expansion of the film and reducing shrinkage of the film surface. And collapse phenomenon, effectively enhance the heat resistance, chemical resistance, mechanical properties and friction resistance of the film; while maintaining transparency and gloss, it does not adversely affect the optical properties of the photosensitive resin itself.
  • the average particle size described herein was determined using a laser nanoparticle size analyzer (ZS90, Malvern Instruments (China)).
  • the acid and amine values described herein were determined by titration using a pH meter, respectively.
  • the brightness described in this paper is measured by a color difference meter (Color i5, X-rite, USA).
  • the light source is a pulsed xenon lamp, D65, with an illumination range of 750 to 3200 lux (Luxes) and a detection power of 20 watts.
  • the raw materials used in the comparative examples and examples are as follows:
  • Mercaptoacrylic acid/mercapto acrylate resin resin, molecular weight 9700, acid value 37.9, solid content 40wt% acrylic acid-isobutylene-maleic anhydride resin self-made resin, molecular weight 17500, acid value 39.5, solid content 11.7wt% thiol acrylic acid / mercaptoacrylic acid (2-hydroxyethyl) custom resin, molecular weight 8400, acid
  • the present comparative example provides a pigment dispersion, and a photosensitive resin composition comprising the pigment dispersion.
  • the pigment dispersion provided in the present comparative example is prepared by mixing and reacting a solute and a solvent, wherein the average particle diameter of the solid particles in the pigment dispersion is 200 nm, and the dissolution shield is 100% by mass of the pigment dispersion.
  • a solute a solvent
  • the dissolution shield is 100% by mass of the pigment dispersion.
  • the method for preparing the above pigment dispersion comprises the following steps:
  • the benzoquinone copolymer was mixed, mixed in a disperser at a speed of 500 rpm for 1 h, and then ground by adding an appropriate amount of zirconia beads having an average particle diameter of 0.3-1.0 mm, dispersed by a high-speed stirring grinder. 5h, after the completion of the grinding, the zirconia beads were removed to obtain a pigment dispersion.
  • the commercially available modified nano silica was added under stirring to 2-hydroxy-2-mercapto-1-phenylacetone as an initiator, after stirring for 0.5 h.
  • the exposure cross-linking reaction was carried out for 30 s to obtain a pigment dispersion.
  • the photosensitive resin composition provided in the present comparative example includes, by mass percentage, 32% of the pigment dispersion prepared above, 1.5% of an alkali-soluble resin, 0.2% of a photoinitiator, 2% of a polymerizable monomer, and the balance being a solvent.
  • the above photosensitive resin composition is prepared as follows:
  • the pigment dispersion prepared in the above ratio was obtained according to the above mass ratio.
  • the acrylic copolymer as the alkali-soluble resin was a mercaptoacrylic acid/decyl methacrylate copolymer having an acid value of 150 and a hexyl acrylate as a polymerization monomer.
  • Nica carbitol ester propylene glycol monoterpene ether acetate as a solvent, mixed in a ball mill at a speed of 500 rpm for 3 h, and then ground by adding an appropriate amount of zirconia beads having an average particle diameter of 0.3-1.0 mm, dispersed by a high-speed stirring mill for 5 hours, after the completion of the polishing, the zirconia beads were removed, and 2-thiobenzothiazole as a photoinitiator was added.
  • the photosensitive resin composition prepared above is coated on a transparent glass substrate prepared with a black matrix, and after being subjected to a photolithography process such as exposure and development for 20 seconds, a color layer (ie, a photoresist layer) of the color filter can be formed.
  • a photolithography process such as exposure and development for 20 seconds
  • a color layer ie, a photoresist layer
  • the above-mentioned appearance of the photoresist was examined, and the results are shown in Table 1.
  • the color filter prepared above was prepared as a display panel, further packaged as a display, and the brightness of the display was detected at a detection power of 20 watts. The results are shown in Table 1.
  • Example 1 The color filter prepared above was prepared as a display panel, further packaged as a display, and the brightness of the display was detected at a detection power of 20 watts. The results are shown in Table 1.
  • the present embodiment provides a modified nano silica particle, a preparation method thereof, a pigment dispersion containing the modified nano silica, and a photosensitive resin composition.
  • the surface of the modified nano silica particles provided in this embodiment is grafted with an unsaturated double bond, and the modified nano silica particles have an average particle diameter of 5 nm.
  • the preparation method of the above modified nano silica particles comprises the following steps:
  • the nanosilica primary product produced in step 1 was transferred to a constant temperature reaction kettle and aged at 160 ° C for 8 h.
  • the obtained precipitate was filtered, and the obtained cake was washed three times with ethanol, and dried under vacuum to obtain modified nano silica particles.
  • the pigment dispersion provided in this embodiment is prepared by mixing a solute in a solvent and performing a crosslinking reaction, wherein the pigment dispersion has an average particle diameter of 50 nm, and the solute has a pigment dispersion mass of
  • the 100% meter includes: 1% modified nano-silica, 3% dispersant, 6% binder resin, 20% pigment, 0.1% photoinitiator; the rest is 69.9% solvent.
  • the method for preparing the above pigment dispersion comprises the steps of: taking the blush pigment PR177 as a pigment, Disperbyk-137 as a dispersing agent, propylene glycol monoterpene ether acetate as a solvent, as a binder resin, according to the above mass fraction
  • the fluorenyl enoyl acid/mercapto phenyl phthalate copolymer is mixed, mixed in a disperser at a speed of 500 rpm for 1 h, and then ground by adding an appropriate amount of zirconia beads having an average particle diameter of 0.3-1.0 mm was dispersed by a high-speed stirring grinder for 5 hours, and after the completion of the grinding, the zirconia beads were removed to obtain a pigment dispersion liquid.
  • the pigment dispersion obtained above was prepared, and the modified nano silica prepared in the present example was added under stirring to give 2-hydroxy-2-mercapto-1-phenylacetone as an initiator, after stirring for 0.5 h.
  • the exposure cross-linking reaction was carried out for 30 s under a UV lamp (GE-B8565) to obtain a pigment dispersion.
  • the photosensitive resin composition provided in the present embodiment comprises, by mass percentage, a pigment dispersion of 32%, an alkali-soluble resin of 1.5%, a photoinitiator of 0.2%, a polymerized monomer of 2%, and the balance being a solvent.
  • the above photosensitive resin composition is prepared as follows:
  • the pigment dispersion is obtained in the above mass ratio, and the alkenoic acid copolymer as the alkali-soluble resin is a mercaptoacrylic acid/decyl methacrylate copolymer having an acid value of 150 and a hexyl phenyl acrylate as a polymerization monomer.
  • Alcohol ester, propylene glycol monoterpene ether acetate as solvent mixed in a ball mill at a speed of 500 rpm for 3 h, and then ground by adding an appropriate amount of zirconia beads having an average particle diameter of 0.3-1.0 mm.
  • the high-speed stirring mill was dispersed for 5 hours, and after the completion of the grinding, the zirconia beads were removed, and 2-thiobenzothiazole as a photoinitiator was added.
  • the photosensitive resin composition prepared above is applied onto a transparent glass substrate on which a black matrix is prepared, and after being subjected to a photolithography process such as exposure and development for 20 seconds, a color layer of the color filter can be formed, and the above-mentioned photoresist appearance is performed. Check, the results are shown in Table 1.
  • Example 2 The color filter prepared above was prepared as a display panel, further packaged as a display, and the brightness of the display was detected at the same power. The results are shown in Table 1.
  • Example 2 The color filter prepared above was prepared as a display panel, further packaged as a display, and the brightness of the display was detected at the same power. The results are shown in Table 1.
  • Example 2 The color filter prepared above was prepared as a display panel, further packaged as a display, and the brightness of the display was detected at the same power. The results are shown in Table 1. Example 2
  • the embodiment provides a modified nano silica particle and a preparation method thereof, and There is a pigment dispersion of the modified nano silica and a photosensitive resin composition.
  • the surface of the modified nano silica particles provided in this embodiment is grafted with an unsaturated double bond, and the modified nano silica particles have an average particle diameter of 10 nm.
  • the preparation method of the above modified nano silica particles comprises the following steps:
  • the quantum dots (CdTe, size 10 nm) were dissolved in absolute ethanol to form a quantum dot solution.
  • the nanosilica primary product produced in step 1 was transferred to a constant temperature reaction kettle and aged at 120 ° C for 12 h.
  • the obtained precipitate was filtered, and the obtained cake was washed three times with ethanol, and dried under vacuum to obtain modified nano silica particles.
  • the pigment dispersion provided in this embodiment is prepared by mixing a solute in a solvent and performing a crosslinking reaction, wherein the pigment dispersion has an average particle diameter of 100 nm, and the solute has a pigment dispersion mass of 100% including: modified nano-silica 2%, dispersant 6%, binder resin 2%, pigment 10%, photoinitiator 0.3%, quantum dots (CdTe, size 10nm) 0.1%; the rest are solvents 79.6%.
  • the method for preparing the above pigment dispersion comprises the following steps:
  • Indanthrene blue RS as a pigment, TR-7010 (polyurethane) as a dispersing agent, propylene glycol monoterpene ether acetate as a solvent, and carboxymethyl cellulose as a binder resin were obtained according to the above mass fraction.
  • the zirconia beads are removed to obtain a pigment dispersion.
  • the pigment dispersion obtained above is taken and added to the embodiment under stirring.
  • the prepared modified nano silica, benzoic acid as an initiator was subjected to an exposure crosslinking reaction under an ultraviolet lamp (GE-B8565) for 40 s after stirring for 1 hour to obtain a pigment dispersion.
  • GE-B8565 ultraviolet lamp
  • the photosensitive resin composition provided in the present embodiment comprises, by mass percentage, a pigment dispersion of 30%, an alkali-soluble resin of 2%, a photoinitiator of 0.3%, a polymerized monomer of 5%, and the balance being a solvent.
  • the above photosensitive resin composition is prepared as follows:
  • the pigment dispersion is obtained according to the above mass ratio, and the alkenoic acid copolymer as the alkali-soluble resin is a methacrylic acid/mercapto phenyl phthalate copolymer having an acid value of 50 and ethyl methacrylate as a polymerization monomer.
  • propylene glycol monoterpene ether acetate as a solvent, mixed in a ball mill at a speed of 500 rpm for 3 hours, and then ground by adding an appropriate amount of zirconia beads having an average particle diameter of 0.3-1.0 mm, by high-speed stirring.
  • the grinder was dispersed for 5 hours, and after the completion of the grinding, the zirconia beads were removed, and the benzil as a photoinitiator was added.
  • the photosensitive resin composition prepared above is applied onto a transparent glass substrate on which a black matrix is prepared, and after being subjected to a photolithography process such as exposure and development for 20 seconds, a color layer of the color filter can be formed, and the above-mentioned photoresist appearance is performed. Check, the results are shown in Table 1.
  • Example 3 The color filter prepared above was prepared as a display panel, further packaged as a display, and the brightness of the display was detected at the same power. The results are shown in Table 1.
  • Example 3 The color filter prepared above was prepared as a display panel, further packaged as a display, and the brightness of the display was detected at the same power. The results are shown in Table 1.
  • the present embodiment provides a modified nano silica particle, a preparation method thereof, a pigment dispersion containing the modified nano silica, and a photosensitive resin composition.
  • the surface of the modified nano silica particles provided in this embodiment is grafted with an unsaturated double bond, and the modified nano silica particles have an average particle diameter of 20 nm.
  • the preparation method of the above modified nano silica particles comprises the following steps:
  • Quantum dots (CdTe, size lnm) were dissolved in absolute ethanol to form a quantum dot solution.
  • the nanosilica primary product produced in step 1 was transferred to a constant temperature reaction kettle and aged at 120 ° C for 12 h.
  • the obtained precipitate was filtered, and the obtained cake was washed three times with ethanol, and dried under vacuum to obtain modified nano silica particles.
  • the pigment dispersion provided in this embodiment is prepared by mixing a solute in a solvent and performing a crosslinking reaction, wherein the pigment dispersion has an average particle diameter of 80 nm, and the solute has a pigment dispersion mass of 100% includes: 3% modified nano-silica, 4% dispersant, 3% binder resin, 14% pigment, 0.4% photoinitiator; quantum dot (CdTe, size lnm) 0.7%; 74.9%.
  • the method for preparing the above pigment dispersion comprises the following steps:
  • Benzimidazolone yellow H4G PY151 as a pigment according to the above mass fraction, BYK-130 (polyaminoamide, Disperbyk-130) as a dispersing agent, propylene glycol monoterpene ether acetate as a solvent, as a binder resin
  • BYK-130 polyaminoamide, Disperbyk-130
  • propylene glycol monoterpene ether acetate as a solvent
  • the methacrylic acid-mercapto methacrylate resin is mixed, mixed in a disperser at a speed of 500 rpm for 1 h, and then ground by adding an appropriate amount of zirconia beads having an average particle diameter of 0.3-1.0 mm.
  • the high-speed stirring mill was dispersed for 5 hours, and after the completion of the grinding, the zirconia beads were removed to obtain a pigment dispersion.
  • the pigment dispersion obtained above was prepared, and the modified nano silica prepared in the present example was added under stirring to obtain bisbenzoylphenylphosphine oxide as an initiator, and after stirring for 2 hours, in an ultraviolet lamp (GE- B8565) The exposure cross-linking reaction was carried out for 60 s to obtain a pigment dispersion.
  • the photosensitive resin composition provided in the present embodiment comprises, by mass percentage, 35% of a pigment dispersion, 3% of an alkali-soluble resin, 0.4% of a photoinitiator, 3% of a polymerizable monomer, and the balance being a solvent.
  • the above photosensitive resin composition is prepared as follows:
  • the pigment dispersion is obtained in the above mass ratio, and the alkenoic acid copolymer as the alkali-soluble resin is a mercaptoacrylic acid/mercapto acrylate/styrene copolymer having an acid value.
  • the photosensitive resin composition prepared above is applied onto a transparent glass substrate on which a black matrix is prepared, and after being subjected to a photolithography process such as exposure and development for 20 seconds, a color layer of the color filter can be formed, and the above-mentioned photoresist appearance is performed. Check, the results are shown in Table 1.
  • the color filter prepared above was prepared as a display panel, further packaged as a display, and the brightness of the display was detected at the same power. The results are shown in Table 1.
  • Example 4 The color filter prepared above was prepared as a display panel, further packaged as a display, and the brightness of the display was detected at the same power. The results are shown in Table 1.
  • the present embodiment provides a modified nano silica particle, a preparation method thereof, a pigment dispersion containing the modified nano silica, and a photosensitive resin composition.
  • the surface of the modified nano silica particles provided in this embodiment is grafted with an unsaturated double bond, and the modified nano silica particles have an average particle diameter of 20 nm.
  • the preparation method of the above modified nano silica particles comprises the following steps:
  • Quantum dots (CdTe, size 2 nm) were dissolved in absolute ethanol to form a quantum dot solution.
  • step 2 2) aging step of nano silica initial product
  • the nanosilica primary product produced in step 1 was transferred to a constant temperature reaction kettle and aged at 140 ° C for 20 h.
  • the obtained precipitate was filtered, and the obtained cake was washed three times with ethanol, and dried under vacuum to obtain modified nano silica particles.
  • the pigment dispersion provided in the present embodiment is obtained by mixing a solute in a solvent and undergoing a crosslinking reaction, wherein the pigment particles have an average particle diameter of 40 nm.
  • the solute comprises 100% of the pigment dispersion mass: 4% modified nano-silica, 5% dispersant, 4% binder resin, 16% pigment, 0.1% photoinitiator; quantum dots (CdTe, The size is 2 nm) 1%; the rest is 69.8% solvent.
  • the method for preparing the above pigment dispersion comprises the following steps:
  • Indanthrene blue RS as a pigment, BYK-131 as a dispersing agent, propylene glycol monoterpene ether acetate as a solvent, and isobutylene-maleic acid resin as a binder resin are mixed according to the above mass fraction.
  • the disperser was mixed at a speed of 500 rpm for 1 h, and then ground with an appropriate amount of zirconia beads.
  • the zirconia beads had an average particle diameter of 0.3-1.0 mm, dispersed by a high-speed stirring grinder for 5 h, and the zirconia was removed after the end of the grinding.
  • the ball that is, a pigment dispersion liquid is obtained.
  • the above pigment preparation liquid was prepared, and the modified nano silica prepared in the present example was added under stirring, and the benzoin bismuth ether as an initiator was exposed to ultraviolet light (GE-B8565) after stirring for 3 hours.
  • the crosslinking reaction was carried out for 50 s to obtain a pigment dispersion.
  • the photosensitive resin composition provided in the present embodiment comprises, by mass percentage, a pigment dispersion of 38%, an alkali-soluble resin of 6%, a photoinitiator of 0.8%, a polymerized monomer of 4%, and the balance being a solvent.
  • the above photosensitive resin composition is prepared as follows:
  • the pigment dispersion is obtained according to the above mass ratio, and the alkenoic acid copolymer as the alkali-soluble resin is methacrylic acid/mercaptoacrylic acid (2-hydroxyethyl)/mercapto acrylate/mercapto acrylate copolymer.
  • the zirconia pellets have an average particle diameter of 0.3-1.0 mm, are dispersed by a high-speed stirring grinder for 5 hours, remove zirconia beads after the grinding, and add a rest as a photoinitiator. Fragrant bismuth ether.
  • the photosensitive resin composition prepared above is applied onto a transparent glass substrate on which a black matrix is prepared, and after being subjected to a photolithography process such as exposure and development for 20 seconds, a color layer of the color filter can be formed, and the above-mentioned photoresist appearance is performed. Check, the results are shown in Table 1.
  • Example 5 The color filter prepared above was prepared as a display panel, further packaged as a display, and the brightness of the display was detected at the same power. The results are shown in Table 1.
  • Example 5 The color filter prepared above was prepared as a display panel, further packaged as a display, and the brightness of the display was detected at the same power. The results are shown in Table 1.
  • the present embodiment provides a modified nano silica particle, a preparation method thereof, a pigment dispersion containing the modified nano silica, and a photosensitive resin composition.
  • the surface of the modified nano silica particles provided in this embodiment is grafted with an unsaturated double bond, and the modified nano silica particles have an average particle diameter of 50 nm.
  • the preparation method of the above modified nano silica particles comprises the following steps:
  • the quantum dots (CdTe, size 4.5 nm) were dissolved in absolute ethanol to form a quantum dot solution.
  • the nanosilica primary product produced in step 1 was transferred to a constant temperature reactor and aged at 130 ° C for 24 h.
  • the obtained precipitate was filtered, and the obtained cake was washed three times with ethanol, and dried under vacuum to obtain modified nano silica particles.
  • the pigment dispersion provided in this embodiment is prepared by mixing a solute in a solvent and performing a crosslinking reaction, wherein the pigment dispersion has an average particle diameter of 70 nm, and the solute has a pigment dispersion mass of 100% includes: 5% modified nano-silica, 4.5% dispersant, 5% binder resin, 18% pigment, photoinitiator 0.5%; quantum dots (CdTe, size 4.5nm) 0.5%; the rest is 66.5% solvent.
  • the method for preparing the above pigment dispersion comprises the following steps:
  • carbazole dioxazine violet 19 as a pigment Disperbyk-161 as a dispersing agent, propylene glycol monoterpene ether acetate as a solvent, polyvinylpyrrolidone as a binder resin, in a disperser
  • the mixture was mixed at a speed of 500 rpm for 1 hour, and then ground by adding an appropriate amount of zirconia beads.
  • the average particle diameter of the zirconia beads was 0.3-1.0 mm, dispersed by a high-speed stirring grinder for 5 hours, and the zirconia beads were removed after the completion of the grinding. That is, a pigment dispersion liquid is obtained.
  • the modified nano silica prepared in the present example was added under stirring, and the p-benzoylphenoxydiphenyl iodine hexafluorophosphate as an initiator was stirred at 2.5. After h, an exposure crosslinking reaction was carried out under an ultraviolet lamp (GE-B8565) for 45 s to obtain a pigment dispersion.
  • an ultraviolet lamp GE-B8565
  • the photosensitive resin composition provided in the present embodiment comprises, by mass percentage, a pigment dispersion of 40%, an alkali-soluble resin of 5%, a photoinitiator of 0.5%, a polymerized monomer of 2.5%, and the balance being a solvent.
  • the above photosensitive resin composition is prepared as follows:
  • the pigment dispersion is obtained according to the mass ratio described above, and the alkenoic acid copolymer as the alkali-soluble resin is a methacrylic acid/phenyl decyl acrylate/N-phenylmaleimide copolymer having an acid value of 100.
  • the polymerization monomer styrene, propylene glycol monoterpene ether acetate as a solvent, was mixed in a ball mill at a speed of 500 rpm for 3 hours, and then ground by adding an appropriate amount of zirconia beads having an average particle diameter of 0.3.
  • the photosensitive resin composition prepared above is applied onto a transparent glass substrate on which a black matrix is prepared, and after being subjected to a photolithography process such as exposure and development for 20 seconds, a color layer of the color filter can be formed, and the above-mentioned photoresist appearance is performed. Check, the results are shown in Table 1.
  • the color filter prepared above was prepared into a display panel, further packaged as a display, and the brightness of the display was detected at the same power. The results are shown in Table 1. Table 1 Photoresist layer appearance inspection results and display brightness comparison results
  • the photoresist layer of the modified nano-silica prepared by the invention has no collapse and shrinkage, and the photoresist layer without the modified nano-silica added in the comparative example has collapsed and shrunk.
  • the modified nano silica of the invention can be polymerized and crosslinked with the polymerized monomer to form an interpenetrating network type composite structure, which enhances the supporting effect.
  • the brightness of Example 2-5 in which quantum dots were added was significantly improved relative to the comparative example in which quantum dots were not added, and Example 1 was improved, indicating that the addition of quantum dots improves the brightness of the display and saves energy. Has an important role.
  • the modified nano silica particles of the present invention can crosslink with other high molecular substances due to the unsaturated double bonds on the surface thereof, and at the same time, the modified nano silica having the particle diameter of the present invention can be much smaller than the organic pigment.
  • the dispersed particle size after the nano silica particles are added to the pigment paste to be dispersed, will be separated by the steric hindrance effect of the binder resin covered by the pigment surface, and the functional group of the modified nano silica itself Preventing mutual agglomeration, it is suitable for forming a node of a crosslinked network, and connecting the polymer segments to form a network structure.
  • nano silica particles as a crosslinking point
  • crosslinking polymerization of a binder resin containing an unsaturated double bond in the dispersion is initiated to form a network of a polymer resin in the dispersion, thereby
  • the pigment particles play a stronger wrapping and stabilizing effect, effectively reducing the agglomeration and precipitation between the particles.
  • the alkali-soluble resin, the polymerization monomer, the photoinitiator, and other additives are added to the dispersion to form the photosensitive resin composition, in the exposure stage, the polymerized monomers are polymerized and crosslinked to form a network structure, thus in the dispersion.
  • Containing nano-silica The network cross-linking structure of the particles forms an interpenetrating network type composite structure, which penetrates each other and acts together to support each other in the post-baking stage, reducing the thermal expansion of the film, reducing the shrinkage and collapse of the film surface, and effectively enhancing the film. Heat resistance, chemical resistance, mechanical properties and friction resistance; while maintaining transparency and gloss, it does not adversely affect the optical properties of the photosensitive resin itself.

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Abstract

本发明提供一种改性纳米二氧化硅及其制备方法、颜料分散体、感光树脂组合物，属于材料技术领域，其可解决现有的纳米二氧化硅粒子不能与其它高分子物质相互交联、颜料分散体易团聚、成膜性能差的问题。本发明的改性纳米二氧化硅表面接枝有不饱和的双键，其能够与其它高分子物质交联，使得含有所述纳米二氧化硅的颜料分散体能够有效地防止团聚、成膜性好，由含有所述颜料分散体的感光树脂组合物制备得到的膜层的热膨胀小，膜表面的收缩和塌陷现象得到控制，膜的耐热、耐化、机械性能以及耐摩擦的性能得到增强。

Description

改性纳米二氧化硅及其制备方法、 颜料分散体、 感光树脂组合物 技术领域
本发明属于材料技术领域， 具体涉及一种改性纳米二氧化硅 及其制备方法、 包含该改性纳米二氧化硅的颜料分散体、 以及包 含该颜料分散体的感光树脂组合物。 背景技术
目前， 较常见的制备彩色滤光片的方法是颜料分散法， 它具 有工艺筒单， 耐光性、 耐热性、 耐化学性好以及性能稳定等优点。 颜料分散法是把颜料分散在树脂中， 添加碱可溶性树脂、 光聚合 单体、 引发剂以及其他添加剂后， 涂布在已经制备好黑色矩阵的 透明玻璃基板上， 经过曝光、 显影等光刻工艺后便可制成彩色滤 光片的彩色层， 即红、 绿、 蓝三色光阻。
但是， 在颜料分散的过程中， 需要颜料、 分散剂以及粘合树 脂三者的稳定结合， 才能保持制得的颜料色浆在稳定性上有优异 的表现， 其中粘合树脂在体系中起到增加粘度， 形成颜料颗粒之 间的空间位阻效应， 有效地防止团聚现象发生的作用。 但是随着 颜料本身的一次粒径越来越小， 从低于 lOOnm 到目前的低于 50nm, 分散的难度越来越大， 颜料粒子本身表面能的增大导致色 浆中的颜料极易发生团聚， 影响了最终配置成光阻的涂布效果。
包括上述颜料分散物的感光树脂组合物在经过涂布、 曝光显 影之后， 后烘阶段极易发生树脂层的收缩现象， 能够观察到膜表 面的凹陷和侧壁的收缩。 这种收缩会对下一步工序， 如其他有机 膜层的涂布、 ITO的溅射等产生影响。 发明内容
本发明的目的是提供一种改性纳米二氧化硅， 以解决现有技 术方法制得的纳米二氧化硅粒子不能与其它高分子物质相互交联 的问题。 解决本发明技术问题所采用的技术方案是一种改性纳米二氧 化硅， 所述的改性纳米二氧化硅颗粒的表面接枝有不饱和双键， 所述的改性纳米二氧化硅颗粒的平均粒径为 5-50nm。
优选的是， 所述的改性纳米二氧化硅颗粒的平均粒径为 10-20nm。
普通的无机粒子加入到有机颜料组合物中不能防止颜料团 聚； 同时， 不能与颜料组合物中的高分子进行交联形成网状网络 型的复合结构。 本发明的改性纳米二氧化硅粒子由于其表面具有 不饱和双键， 可以与其它高分子物质相互交联， 同时， 具有上述 粒径的改性纳米二氧化硅远小于有机颜料能够分散的粒径， 所述 改性纳米二氧化硅粒子加入到颜料色浆中分散均勾以后， 会被颜 料表面所覆盖的粘合树脂的空间位阻效应隔开， 而改性纳米二氧 化硅本身的不饱和官能团适合形成交联网络的节点， 并将高分子 链段连接起来形成网状结构， 因此既能够有效地阻止纳米二氧化 硅粒子本身的团聚， 又能有效地阻止颜料的团聚。
本发明的另一个目的是提供一种改性纳米二氧化硅的制备方 法， 所述的制备方法包括： 1 )将正硅酸四乙酯加入含有乙烯基的 硅烷偶联剂的溶液中， 例如可以采用滴加的方式或其他相对较为 緩慢的加料方式加入正硅酸四乙酯， 加入完成后继续反应生成初 产物的步骤；
2 )将初产物陈化获得改性纳米二氧化硅颗粒的步骤。
优选的是， 所述的正硅酸四乙酯的质量份数为 15-25份， 所 述的含乙烯基的硅烷偶联剂的质量份数为 3-10份。
优选的是， 在 50-80°C的反应温度下， 将所述的正硅酸四乙酯 在 2-3h内滴加到含有乙烯基的硅烷偶联剂的溶液中， 滴加完成后 继续在该反应温度下反应 6-12h。
优选的是， 在所述的初产物陈化步骤中， 陈化温度为 110-160 °C , 陈化时间为 8-30h。
所述含有乙烯基的硅烷偶联剂的溶液包含所述硅烷偶联剂和 溶剂， 所述硅烷偶联剂的浓度（质量百分比浓度）可以为 2-10%, 优选地为 5-8%。 所述溶剂可以为任何能够溶解所述含有乙烯基的 硅烷偶联剂的溶剂， 例如乙醇、 水、 或其组合， 但不限于此。 此 外， 该溶液还可包含氨水， 以将溶液的 pH值调节在 7-9之间。 优 选的是， 所述的含有乙烯基的硅烷偶联剂为乙烯基三氯硅烷、 乙 烯基三曱氧基硅烷、 乙烯基三乙氧基硅烷、 乙烯基三异两氧基硅 烷、 乙烯基三乙酰氧基硅烷、 Y - (曱基丙烯酰氧基） 丙基三曱氧 基硅烷等中的一种或多种。
含有乙烯基的硅烷偶联剂的加入， 既使纳米二氧化硅粒子表 面带有了不饱和双键基团， 又能够改善二氧化硅粒子本身在有机 溶剂中的分散状态， 一方面增大了粒子之间的位阻效应， 阻止了 其相互团聚， 另一方面其表面的有机基团具有亲油性， 有利于其 在有机溶剂中的分散。 通过调整含有乙烯基的硅烷偶联剂与正硅 酸四乙酯的比例， 以控制纳米二氧化硅粒子表面的双键的数量， 使得纳米二氧化硅粒子表面在交联聚合时不致于聚合太多链段而 引起局部粘度激增， 从而保持一个低度交联的状态， 这样当纳米 二氧化硅粒子投入到颜料分散液中时既能构建以纳米二氧化硅粒 子为节点的交联网络， 又不会影响颜料分散液本身的粘度性质， 使其仍然保持低粘、 稳定的状态， 否则会导致含有该颜料分散液 的感光树脂组合物在涂膜工艺中产生堵塞等。
本发明的另一个目的是提供一种有效防止团聚、 成膜性能好 的颜料分散体， 以解决现有颜料分散体易团聚、 成膜性能差的问 题。
解决本发明技术问题所采用的技术方案是一种颜料分散体， 由溶质在溶剂中分散并发生交联反应制得， 所述的颜料分散体中 固体颗粒的平均粒径为 40-1 OOnm;
所述的溶质以颜料分散体质量为 100%计包括：本发明的改性 纳米二氧化硅 1-5%,分散剂 3-6%,粘合树脂 2-6%,颜料 10-20%, 光引发剂 0.1-0.5%。
在所述颜料分散体中， 所用的溶剂可以为任何能够提供有效 分散作用的有机溶剂， 例如但不限于， 丙二醇单曱醚乙酸酯， 乙 酸乙酯， 乙二醇单曱醚， 正丁醇， 乙氧基丙酸乙酯等。
本发明通过在颜料分散体中加入改性纳米二氧化硅粒子作为 交联点， 引发分散体中含有不饱和双键的粘合树脂发生交联聚合， 在分散体中形成网状的高分子树脂体系， 对颜料颗粒起到更强的 包裹和稳定作用， 从而有效地减少粒子之间的团聚和沉淀的发生。
优选的是， 以颜料分散体质量为 100%计， 所述的溶质还包括 量子点 0.2-1%。
优选的是， 所述量子点的粒径为 l-10nm。
更优选的是，在所述改性纳米二氧化硅合成阶段引入量子点， 具体而言， 将量子点引入含有乙烯基的硅烷偶联剂的溶液中， 然 后向所得溶液中加入正硅酸四乙酯， 经过反应和陈化， 可形成改 性纳米二氧化硅包裹量子点的复合结构。
量子点（Quantum Dot )是把激子在三个空间方向上束缚住的 半导体纳米结构， 通常由半导体材料如 CdS、 CdSe、 CdTe、 ZnSe、 InP、 InAs等组成， 也可以由两种或两种以上的半导体材料组成， 例如 CdSe掺杂 ZnS、 CdSe掺杂 ZnSe等。 量子点的发射光谱可以 通过改变量子点的尺寸大小来控制。 添加量子点的颜料分散体在 制备成彩色滤光片之后， 具有不同发射光谱的量子点吸收背光源 发出的光， 发射出与其所在子像素区域的颜色相近的荧光， 这样 既可以增强观察者所能接收到的光线， 也能提高色域。
优选的是， 所述的分散剂为由亲溶剂型嵌段和具有含氮原子 官能团的嵌段组成的嵌段共聚物。 上述的分散剂的胺值为 80-150mg KOH/g。
进一步优选的是， 所述的嵌段共聚物为丙烯酸类、 聚氨酯类、 聚氨基酰胺类、 聚醚酯、 脂肪族多元羧酸类嵌段共聚物中的一种 或多种。
优选的是， 所述的颜料为偶氮类、 酞菁类、 喹吖啶酮类、 苯 并咪唑酮类、 阴丹士林类、 二噁嗪类中的一种或多种。 按颜色分， 其可以是应用于彩色滤光片的各种颜料， 例如， 蓝色颜料、 绿色 颜料、 红色颜料、 黄色颜料、 紫色颜料、 橙色颜料、 棕色颜料、 黑色颜料等各种颜色的颜料。
优选的是， 所述的粘合树脂具有不饱和双键。
该粘合树脂， 由于分子链中具有不饱和双键可以参加聚合反 应， 从而起到包裹颜料颗粒， 隔绝颗粒之间的团聚， 阻止沉降的 作用。
进一步优选的， 所述的粘合树脂为各自具有不饱和双键的聚 乙烯醇、 羟丙基纤维素、 羧曱基纤维素、 羟乙基纤维素、 曱基纤 维素、 苯乙烯-丙烯酸树脂、 苯乙烯 -丙烯酸-丙烯酸酯树脂、 苯乙 烯 -马来酸半酯树脂、 曱基丙烯酸-曱基丙烯酸酯树脂、 异丁烯-马 来酸树脂、 松香改性马来酸树脂、 聚乙烯吡咯烷酮、 聚烯丙基胺、 聚氯乙烯、 氯化聚丙烯、 聚乙烯亚胺中的一种或多种。
优选的是， 所述的光引发剂为苯偶姻及其衍生物、 苯偶酰类、 烷基苯酮类、 酰基磷氧化物、 二苯曱酮类、 硫杂蒽酮类、 二芳基 碘鎗盐、 三芳基碘鎗盐、 烷基碘鎗盐、 异丙苯茂铁六氟磷酸盐中 一种。 上述的光引发剂能在紫外光区 （250 ~ 400nm )或可见光区 ( 400 ~ 800nm )吸收一定波长的能量， 产生自由基、 阳离子等， 从而引发聚合和交联固化。
本发明所述颜料分散体的制备方法包括以下步骤：
将上述颜料、 分散剂、 粘合树脂和溶剂混合， 形成颜料分散 液； 以及
向所得分散液中加入改性纳米二氧化硅（其可选地包裹量子 点） 和光引发剂， 经光照 （通常为紫外光照射）使其发生交联反 应而得到颜料分散体。
本发明的另一个目的是提供一种感光树脂组合物， 以感光树 脂组合物的总质量为 100%计，该组合物包括：颜料分散体 30-40%, 碱可溶性树脂 1.5-6%, 聚合单体 2-5%, 光引发剂 0.2-0.8%。
优选的是， 所述的碱可溶性树脂为丙烯酸共聚物， 所述的丙 烯酸共聚物的酸值为 50-150。 具有该酸值的丙烯酸共聚物既可以 实现良好的显影效果， 又不会对未显影的部分产生影响。
进一步优选的是， 所述的丙烯酸共聚物选自 （曱基） 丙烯酸 / (曱基） 丙烯酸曱酯共聚物、 （曱基） 丙烯酸 / (曱基） 丙烯酸苯 曱酯共聚物、 （曱基） 丙烯酸 / (曱基） 丙烯酸（2-羟乙酯） I (曱 基） 丙烯酸苯曱酯共聚物、 （曱基） 丙烯酸 / (曱基） 丙烯酸曱酯 / 苯乙烯共聚物、 （曱基）丙烯酸 / (曱基）丙烯酸（2-羟乙酯）/ (曱 基） 丙烯酸苯曱酯 / (曱基） 丙烯酸曱酯共聚物、 （曱基） 丙烯酸 / (曱基） 丙烯酸苯曱酯 /N-苯基马来酰亚胺共聚物， 所述的丙烯酸 共聚物酸值为 60-120。 具有该酸值的丙烯酸共聚物既可以实现良 好的显影效果， 也不会对未显影的部分产生影响。 在本文中， 术 语 "（曱基）丙烯酸"表示丙烯酸和 /或曱基丙烯酸。 同样， "（曱 基） 丙烯酸酯" 表示丙烯酸酯和 /或曱基丙烯酸酯。
所述的聚合单体通常为光聚合单体。 优选的是， 所述的聚合 单体为丙烯酸己基苯基卡必醇酯、 N-乙烯基吡咯烷酮、 丙烯酸（2- 乙基己基卡必醇） 酯、 （曱基） 丙烯酸乙酯、 双酚 A的双（丙烯 酰氧基乙基） 醚、 四 （曱基） 丙烯酸季戊四醇酯、 丙烯腈、 苯乙 烯、 醋酸乙烯酯中的一种或多种。
所述感光树脂组合物中的光引发剂可以选自以上针对颜料分 散体所述的那些光引发剂， 并且可以与颜料分散体中所用的光引 发剂相同或不同。
除了上述组分以外， 所述感光树脂组合物还可以包含添加的 溶剂， 以满足涂布操作对粘度的要求。 所述添加的溶剂可以选自 以上针对颜料分散体所述的那些溶剂， 并且可以与颜料分散体中 所用的溶剂相同或不同。 此外， 所述感光树脂组合物还可以包含 本领域常用的添加剂， 例如流平剂、 光敏剂等。
在本发明中， 混合和分散操作可以选用通常所用的分散机和 混合机， 例如球磨机、 卧式砂磨机、 立式砂磨机、 环型砂磨机、 超微磨碎机、 高压纳米勾质机、 高速混合机、 高速搅拌研磨器、 辊式破碎机、 超声波分散机、 匀质混合机等。
本发明制备了具有不饱和双键的改性纳米二氧化硅， 其可以 与其它高分子物质相互交联； 通过在颜料分散体中引入所述改性 纳米二氧化硅粒子， 使得在分散体中产生交联， 可以对颜料粒子 起到助悬浮的作用， 减少沉降。
向颜料分散体中添加碱可溶性树脂、 聚合单体、 光引发剂以 及其他添加剂制成感光树脂组合物以后， 在曝光阶段， 聚合单体 发生聚合交联形成网状结构， 这样就和所述分散体中的含有纳米 二氧化硅粒子的网状交联结构形成了互穿网络型复合结构， 二者 互相贯通， 共同作用， 从而在后烘阶段互相支撑， 减少膜的热膨 胀， 降低膜表面的收缩和塌陷现象， 有效地增强膜的耐热、 耐化、 机械性能以及耐摩擦的性能； 同时还能保持透明性和光泽度， 对 感光树脂本身的光学性能不产生负面影响。 具体实施方式
为使本领域技术人员更好地理解本发明的技术方案， 下面通 过具体实施方式对本发明作进一步详细描述。
本文所述的平均粒径是采用激光纳米粒度仪（ZS90, 马尔文 仪器公司 （中国） ） 测定的。
本文所述的酸值和胺值是分别采用酸度计通过滴定的方法测 定的。
本文所述的亮度是采用色差仪（ Color i5, 美国 X-rite公司） 测定的， 其光源为脉冲氙灯， D65, 照度范围为 750至 3200勒克 司 （Luxes ) , 检测功率为 20瓦。
对比例和实施例中所用的原料说明如下:
原料 说明
蒽醌红颜料 PR177 DIC公司， ATY-R177 阴丹士林蓝 RS 上海雅联颜料化工有限公司 苯并咪唑酮黄 江西紫荆颜料化学有限公 司， H4G PY151
咔唑二噁，秦紫 19 科莱恩公司， RL COF01 丙二醇单曱醚乙酸酯 陶氏化学公司
2-羟基 -2-曱基 -1-苯基丙酮 汽巴公司， OXE01 双苯曱酰基苯基氧化膦 湖北兴恒康化工科技有限公 司光引发剂， TPO
对苯曱酰基苯氧基二苯基碘鎗六氟 上海乐济生化科技有限公司 磷酸盐 光引发剂， IHT-PI440 羧曱基纤维素 宁波市鄞州海升纤维素衍生 物厂， CMC-1
聚乙烯吡咯烷酮 上海西唐生物科技有限公 司， PVP-K30
曱基丙烯酸 /曱基丙烯酸曱酯共聚物 自制树脂， 分子量 9700, 酸 值 37.9, 固含量 40wt% 曱基丙烯酸 /曱基丙烯酸苯曱酯/ N-苯 定制树脂， 分子量 26600, 酸 基马来酰亚胺共聚物 值 86.3 , 固含量 29.1 wt% 曱基丙烯酸 /曱基丙烯酸曱酯 /苯乙烯 BASF公司， 611树脂 共聚物
曱基丙烯酸 /曱基丙烯酸苯曱酯共聚 迪高公司， TEGO Variplus 物 SK
曱基丙烯酸 /曱基丙烯酸曱酯树脂 自制树脂， 分子量 9700, 酸 值 37.9, 固含量 40wt% 丙烯酸-异丁烯-马来酸酐树脂 自制树脂， 分子量 17500, 酸 值 39.5, 固含量 11.7wt% 曱基丙烯酸 /曱基丙烯酸（2-羟乙酯） 定制树脂， 分子量 8400, 酸
/曱基丙烯酸苯曱酯 /曱基丙烯酸曱酯 值 33.3 , 固含量 37.9wt% 共聚物
丙烯酸己基苯基卡必醇酯 国药集团
曱基丙烯酸乙酯 国药集团
双酚 A型双（丙烯酰氧基乙基） 醚 曰 立 化 成 株 式 会 社
FA-321M
四 （曱基） 丙烯酸季戊四醇酯 国药集团
苯乙烯 国药集团 对比例
本对比例提供一种颜料分散体、 以及包含该颜料分散体的感 光树脂组合物。
本对比例提供的颜料分散体由溶质和溶剂混合及反应制得， 其中， 所述的颜料分散体中固体颗粒的平均粒径为 200nm, 所述 的溶盾以颜料分散体质量为 100%计包括： 市售的改性纳米二氧化 硅（宣城晶瑞新材料有限公司， 型号： JR-NS01A, 粒径约 20nm ) 1%, 分散剂 3%, 粘合树脂 6%, 颜料 20%, 光引发剂 0.1%; 其 余为溶剂。
上述颜料分散体的制备方法包括以下步骤：
按上述的质量分数取作为颜料的蒽醌红颜料 PR177, 作为分 散剂的 Disperbyk-137, 作为溶剂的丙二醇单曱醚乙酸酯， 作为粘 合树脂的曱基两烯酸 /曱基两烯酸苯曱酯共聚物进行混合， 在分散 器中用 500rpm的速度混合 lh, 然后加入适量的氧化锆小球研磨， 所述氧化锆小球平均粒径为 0.3-1.0mm,通过高速搅拌研磨器分散 5h, 研磨结束后除去氧化锆小球， 即得到颜料分散液。
取上述制备的颜料分散液， 在搅拌的条件下加入所述市售的 改性纳米二氧化硅， 作为引发剂的 2-羟基 -2-曱基 -1-苯基丙酮， 在 搅拌 0.5h后， 在紫外灯 （双面精密曝光机 GE-B8565 , 北京正盛 鸿成电子设备有限责任公司）下进行曝光交联反应 30s, 制得颜料 分散体。
本对比例提供的感光树脂组合物以质量百分比计包括： 以上 制备的颜料分散体 32%, 碱可溶性树脂 1.5%, 光引发剂 0.2%, 聚 合单体 2%, 其余为溶剂。
上述的感光树脂组合物制备方法如下：
按上述的质量比取本对比例制备的颜料分散体， 作为碱可溶 性树脂的丙烯酸共聚物为曱基丙烯酸 /曱基丙烯酸曱酯共聚物， 其 酸值为 150,作为聚合单体的丙烯酸己基苯基卡必醇酯，作为溶剂 的丙二醇单曱醚乙酸酯， 在球磨机中用 500rpm的速度混合 3h, 然后加入适量的氧化锆小球研磨， 所述氧化锆小球平均粒径为 0.3-1.0mm, 通过高速搅拌研磨器分散 5h, 研磨结束后除去氧化锆 小球， 加入作为光引发剂的 2-硫基苯并噻唑。
将上述制备的感光树脂组合物涂覆于制备好黑色矩阵的透明 玻璃基板上， 经过 20s 曝光、 显影等光刻工艺后便可制成彩色滤 光片的彩色层 （即光阻层） ， 对上述的光阻外观进行检查， 结果 见表 1。
将上述制备的彩色滤光片制备成显示面板， 进一步封装为显 示器， 在检测功率 20瓦下检测显示器的亮度， 结果见表 1。 实施例 1
本实施例提供一种改性纳米二氧化硅颗粒及其制备方法、 含 有所述改性纳米二氧化硅的颜料分散体和感光树脂组合物。
本实施例提供的改性纳米二氧化硅颗粒的表面接枝有不饱和 双键， 所述的改性纳米二氧化硅颗粒的平均粒径为 5nm。
上述的改性纳米二氧化硅颗粒的制备方法包括以下步骤：
1 )反应生成纳米二氧化硅初产物的步骤
取 40质量份的无水乙醇， 5质量份的去离子水， 6质量份的 25% ( v/v ) 的氨水、 3 质量份的乙烯基三曱氧基硅烷， 在四口烧 瓶中混合均匀， 并升温到 60°C , 然后将 15质量份的正硅酸四乙酯 在 2h内緩慢滴加到烧瓶中， 滴加完成后继续反应 11小时， 生成 纳米二氧化硅初产物。
2 )纳米二氧化硅初产物的陈化步骤
将步骤 1 中生成的纳米二氧化硅初产物转移到恒温反应釜 中， 160°C陈化 8h。将得到的沉淀过滤，所得滤饼用乙醇冲洗三遍， 真空干燥后即得到改性纳米二氧化硅颗粒。
本实施例提供的颜料分散体由溶质在溶剂中混合并发生交联 反应制得， 其中， 所述的颜料分散体中固体颗粒的平均粒径为 50nm, 所述的溶质以颜料分散体质量为 100%计包括： 改性纳米 二氧化硅 1%, 分散剂 3%, 粘合树脂 6%, 颜料 20%, 光引发剂 0.1%; 其余为溶剂 69.9%。 上述颜料分散体的制备方法包括以下步骤： 按上述的质量分数取作为颜料的蒽醌红颜料 PR177, 作为分 散剂的 Disperbyk-137, 作为溶剂的丙二醇单曱醚乙酸酯， 作为粘 合树脂的曱基两烯酸 /曱基两烯酸苯曱酯共聚物进行混合， 在分散 器中用 500rpm的速度混合 lh, 然后加入适量的氧化锆小球研磨， 所述氧化锆小球平均粒径为 0.3-1.0mm,通过高速搅拌研磨器分散 5h, 研磨结束后除去氧化锆小球， 即得到颜料分散液。
取上述制备所得颜料分散液， 在搅拌的条件下加入本实施例 制备的改性纳米二氧化硅， 作为引发剂的 2-羟基 -2-曱基 -1-苯基丙 酮， 在搅拌 0.5h后， 在紫外灯（GE-B8565 )下进行曝光交联反应 30s, 制得颜料分散体。
本实施例提供的感光树脂组合物以质量百分比计包括： 颜料 分散体 32%, 碱可溶性树脂 1.5%, 光引发剂 0.2%, 聚合单体 2%, 其余为溶剂。
上述的感光树脂组合物制备方法如下：
按上述的质量比取颜料分散体， 作为碱可溶性树脂的两烯酸 共聚物为曱基丙烯酸 /曱基丙烯酸曱酯共聚物， 其酸值为 150, 作 为聚合单体的丙烯酸己基苯基卡必醇酯， 作为溶剂的丙二醇单曱 醚乙酸酯， 在球磨机中用 500rpm的速度混合 3h, 然后加入适量 的氧化锆小球研磨， 所述氧化锆小球平均粒径为 0.3-1.0mm, 通过 高速搅拌研磨器分散 5h, 研磨结束后除去氧化锆小球， 加入作为 光引发剂的 2-硫基苯并噻唑。
将上述制备的感光树脂组合物涂覆于制备好黑色矩阵的透明 玻璃基板上， 经过 20s 曝光、 显影等光刻工艺后便可制成彩色滤 光片的彩色层， 对上述的光阻外观进行检查， 结果见表 1。
将上述制备的彩色滤光片制备成显示面板， 进一步封装为显 示器， 在相同的功率下检测显示器的亮度， 结果见表 1。 实施例 2
本实施例提供一种改性纳米二氧化硅颗粒及其制备方法、 含 有所述改性纳米二氧化硅的颜料分散体和感光树脂组合物。
本实施例提供的改性纳米二氧化硅颗粒的表面接枝有不饱和 双键， 所述的改性纳米二氧化硅颗粒的平均粒径为 10nm。
上述的改性纳米二氧化硅颗粒的制备方法包括以下步骤：
1 )反应生成纳米二氧化硅初产物的步骤
在无水乙醇中溶解量子点 （CdTe, 尺寸为 10nm ) , 形成量 子点溶液。
取 20质量份的无水乙醇， 2质量份的去离子水， 2质量份的 25% ( v/v ) 的氨水、 10质量份的乙烯基三氯硅烷， 以及预定量的 所述量子点溶液（其中量子点相对于最终得到的改性纳米二氧化 硅的质量而言为 5% ) , 在四口烧瓶中混合均匀， 并升温到 80°C , 然后将 20质量份的正硅酸四乙酯在 2.5h内緩慢滴加到烧瓶中，滴 加完成后继续反应 6小时， 生成纳米二氧化硅初产物。
2 )纳米二氧化硅初产物陈化步骤
将步骤 1 中生成的纳米二氧化硅初产物转移到恒温反应釜 中， 120°C陈化 12h。 将得到的沉淀过滤， 所得滤饼用乙醇冲洗三 遍， 真空干燥后即得到改性纳米二氧化硅颗粒。
本实施例提供的颜料分散体由溶质在溶剂中混合并发生交联 反应制得， 其中， 所述的颜料分散体中固体颗粒的平均粒径为 lOOnm, 所述的溶质以颜料分散体质量为 100%计包括： 改性纳米 二氧化硅 2%, 分散剂 6%, 粘合树脂 2%, 颜料 10%, 光引发剂 0.3%, 量子点 （CdTe, 尺寸为 10nm ) 0.1%; 其余为溶剂 79.6%。
上述颜料分散体的制备方法包括以下步骤：
按上述的质量分数取作为颜料的阴丹士林蓝 RS,作为分散剂 的 TR-7010 (聚氨酯类） ， 作为溶剂的丙二醇单曱醚乙酸酯， 作 为粘合树脂的羧曱基纤维素进行混合，在分散器中用 500rpm的速 度混合 lh, 然后加入适量的氧化锆小球研磨， 所述氧化锆小球平 均粒径为 0.3-l .Omm, 通过高速搅拌研磨器分散 5h, 研磨结束后 除去氧化锆小球， 即得到颜料分散液。
取上述制备所得颜料分散液， 在搅拌的条件下加入本实施例 制备的改性纳米二氧化硅， 作为引发剂的苯偶酰， 在搅拌 lh后， 在紫外灯 （GE-B8565 ) 下进行曝光交联反应 40s, 制得颜料分散 体。
本实施例提供的感光树脂组合物以质量百分比计包括： 颜料 分散体 30%, 碱可溶性树脂 2%, 光引发剂 0.3%, 聚合单体 5%, 其余为溶剂。
上述的感光树脂组合物制备方法如下：
按上述的质量比取颜料分散体， 作为碱可溶性树脂的两烯酸 共聚物为曱基丙烯酸 /曱基丙烯酸苯曱酯共聚物， 其酸值为 50, 作 为聚合单体的曱基丙烯酸乙酯， 作为溶剂的丙二醇单曱醚乙酸酯， 在球磨机中用 500rpm的速度混合 3h, 然后加入适量的氧化锆小 球研磨， 所述氧化锆小球平均粒径为 0.3-1.0mm, 通过高速搅拌研 磨器分散 5h, 研磨结束后除去氧化锆小球， 加入作为光引发剂的 苯偶酰。
将上述制备的感光树脂组合物涂覆于制备好黑色矩阵的透明 玻璃基板上， 经过 20s 曝光、 显影等光刻工艺后便可制成彩色滤 光片的彩色层， 对上述的光阻外观进行检查， 结果见表 1。
将上述制备的彩色滤光片制备成显示面板， 进一步封装为显 示器， 在相同的功率下检测显示器的亮度， 结果见表 1。 实施例 3
本实施例提供一种改性纳米二氧化硅颗粒及其制备方法、 含 有所述改性纳米二氧化硅的颜料分散体和感光树脂组合物。
本实施例提供的改性纳米二氧化硅颗粒的表面接枝有不饱和 双键， 所述的改性纳米二氧化硅颗粒的平均粒径为 20nm。
上述的改性纳米二氧化硅颗粒的制备方法包括以下步骤：
1 )反应生成纳米二氧化硅初产物的步骤
在无水乙醇中溶解量子点 （CdTe, 尺寸为 lnm ) , 形成量子 点溶液。
取 30质量份的无水乙醇， 10质量份的去离子水， 8质量份的 25% ( v/v ) 的氨水、 5 质量份的乙烯基三乙氧基硅烷， 以及预定 量的所述量子点溶液（其中量子点相对于最终得到的改性纳米二 氧化硅的质量而言约为 23.3% ) , 在四口烧瓶中混合均匀， 并升 温到 50°C , 然后将 25质量份的正硅酸四乙酯在 2.5h内緩慢滴加 到烧瓶中， 滴加完成后继续反应 6 小时， 生成纳米二氧化硅初产 物。
2 )纳米二氧化硅初产物的陈化步骤
将步骤 1 中生成的纳米二氧化硅初产物转移到恒温反应釜 中， 120°C陈化 12h。 将得到的沉淀过滤， 所得滤饼用乙醇冲洗三 遍， 真空干燥后即得到改性纳米二氧化硅颗粒。
本实施例提供的颜料分散体由溶质在溶剂中混合并发生交联 反应制得， 其中， 所述的颜料分散体中固体颗粒的平均粒径为 80nm, 所述的溶质以颜料分散体质量为 100%计包括： 改性纳米 二氧化硅 3%, 分散剂 4%, 粘合树脂 3%, 颜料 14%, 光引发剂 0.4%; 量子点 （CdTe, 尺寸为 lnm ) 0.7%; 其余为溶剂 74.9%。
上述颜料分散体的制备方法包括以下步骤：
按上述的质量分数取作为颜料的苯并咪唑酮黄 H4G PY151 , 作为分散剂的 BYK-130 (聚氨基酰胺， Disperbyk-130 ) , 作为溶 剂的丙二醇单曱醚乙酸酯， 作为粘合树脂的曱基丙烯酸-曱基丙烯 酸曱酯树脂进行混合， 在分散器中用 500rpm的速度混合 lh, 然 后加入适量的氧化锆小球研磨， 所述氧化锆小球平均粒径为 0.3-1.0mm, 通过高速搅拌研磨器分散 5h, 研磨结束后除去氧化锆 小球， 即得到颜料分散液。
取上述制备所得颜料分散液， 在搅拌的条件下加入本实施例 制备的改性纳米二氧化硅， 作为引发剂的双苯曱酰基苯基氧化膦， 在搅拌 2h后， 在紫外灯 （GE-B8565 ) 下进行曝光交联反应 60s, 制得颜料分散体。
本实施例提供的感光树脂组合物以质量百分比计包括： 颜料 分散体 35%, 碱可溶性树脂 3%, 光引发剂 0.4%, 聚合单体 3%, 其余为溶剂。 上述的感光树脂组合物制备方法如下：
按上述的质量比取颜料分散体， 作为碱可溶性树脂的两烯酸 共聚物为曱基丙烯酸 /曱基丙烯酸曱酯 /苯乙烯共聚物， 其酸值为
60, 作为聚合单体的双酚 A的双（丙烯酰氧基乙基） 醚， 作为溶 剂的丙二醇单曱醚乙酸酯， 在球磨机中用 500rpm的速度混合 3h, 然后加入适量的氧化锆小球研磨， 所述氧化锆小球平均粒径为 0.3-1.0mm, 通过高速搅拌研磨器分散 5h, 研磨结束后除去氧化锆 小球， 加入作为光引发剂的双苯曱酰基苯基氧化膦。
将上述制备的感光树脂组合物涂覆于制备好黑色矩阵的透明 玻璃基板上， 经过 20s 曝光、 显影等光刻工艺后便可制成彩色滤 光片的彩色层， 对上述的光阻外观进行检查， 结果见表 1。
将上述制备的彩色滤光片制备成显示面板， 进一步封装为显 示器， 在相同的功率下检测显示器的亮度， 结果见表 1。 实施例 4
本实施例提供一种改性纳米二氧化硅颗粒及其制备方法、 含 有所述改性纳米二氧化硅的颜料分散体和感光树脂组合物。
本实施例提供的改性纳米二氧化硅颗粒的表面接枝有不饱和 双键， 所述的改性纳米二氧化硅颗粒的平均粒径为 20nm。
上述的改性纳米二氧化硅颗粒的制备方法包括以下步骤：
1 )反应生成纳米二氧化硅初产物的步骤
在无水乙醇中溶解量子点 （CdTe, 尺寸为 2nm ) , 形成量子 点溶液。
取 35质量份的无水乙醇， 8质量份的去离子水， 4质量份的 25% ( v/v ) 的氨水、 7 质量份的乙烯基三乙酰氧基硅烷， 以及预 定量的所述量子点溶液（其中量子点相对于最终得到的改性纳米 二氧化硅的质量而言为 25% ) , 在四口烧瓶中混合均勾， 并升温 到 70°C , 然后将 23质量份的正硅酸四乙酯在 2.7h内緩慢滴加到 烧瓶中，滴加完成后继续反应 12小时，生成纳米二氧化硅初产物。
2 )纳米二氧化硅初产物的陈化步骤 将步骤 1 中生成的纳米二氧化硅初产物转移到恒温反应釜 中， 140°C陈化 20h。 将得到的沉淀过滤， 所得滤饼用乙醇冲洗三 遍， 真空干燥后即得到改性纳米二氧化硅颗粒。
本实施例提供的颜料分散体由溶质在溶剂中混合并发生交联 反应制得， 其中， 所述的颜料分散体中固体颗粒的平均粒径为 40nm。 所述的溶质以颜料分散体质量为 100%计包括： 改性纳米 二氧化硅 4%, 分散剂 5%, 粘合树脂 4%, 颜料 16%, 光引发剂 0.1%; 量子点 （CdTe, 尺寸为 2nm ) 1%; 其余为溶剂 69.8%。
上述颜料分散体的制备方法包括以下步骤：
按上述的质量分数取作为颜料的阴丹士林蓝 RS,作为分散剂 的 BYK-131 , 作为溶剂的丙二醇单曱醚乙酸酯， 作为粘合树脂的 异丁烯-马来酸树脂进行混合， 在分散器中用 500rpm的速度混合 lh, 然后加入适量的氧化锆小球研磨， 所述氧化锆小球平均粒径 为 0.3-1.0mm, 通过高速搅拌研磨器分散 5h, 研磨结束后除去氧 化锆小球， 即得到颜料分散液。
取上述制备颜料分散液， 在搅拌的条件下加入本实施例制备 的改性纳米二氧化硅，作为引发剂的安息香双曱醚，在搅拌 3h后， 在紫外灯 （GE-B8565 ) 下进行曝光交联反应 50s, 制得颜料分散 体。
本实施例中提供的感光树脂组合物以质量百分比计包括： 颜 料分散体 38%,碱可溶性树脂 6%,光引发剂 0.8%,聚合单体 4%, 其余为溶剂。
上述的感光树脂组合物制备方法如下：
按上述的质量比取颜料分散体， 作为碱可溶性树脂的两烯酸 共聚物为曱基丙烯酸 /曱基丙烯酸（2-羟乙酯） /曱基丙烯酸苯曱酯 /曱基丙烯酸曱酯共聚物， 其酸值为 120, 作为聚合单体的四 （曱 基） 丙烯酸季戊四醇酯， 作为溶剂的丙二醇单曱醚乙酸酯， 在球 磨机中用 500rpm的速度混合 3h, 然后加入适量的氧化锆小球研 磨， 所述氧化锆小球平均粒径为 0.3-1.0mm, 通过高速搅拌研磨器 分散 5h, 研磨结束后除去氧化锆小球， 加入作为光引发剂的安息 香双曱醚。
将上述制备的感光树脂组合物涂覆于制备好黑色矩阵的透明 玻璃基板上， 经过 20s 曝光、 显影等光刻工艺后便可制成彩色滤 光片的彩色层， 对上述的光阻外观进行检查， 结果见表 1。
将上述制备的彩色滤光片制备成显示面板， 进一步封装为显 示器， 在相同的功率下检测显示器的亮度， 结果见表 1。 实施例 5
本实施例提供一种改性纳米二氧化硅颗粒及其制备方法、 含 有所述改性纳米二氧化硅的颜料分散体和感光树脂组合物。
本实施例提供的改性纳米二氧化硅颗粒的表面接枝有不饱和 双键， 所述的改性纳米二氧化硅颗粒的平均粒径为 50nm。
上述的改性纳米二氧化硅颗粒的制备方法包括以下步骤：
1 )反应生成纳米二氧化硅初产物的步骤
在无水乙醇中溶解量子点 （CdTe, 尺寸为 4.5nm ) , 形成量 子点溶液。
取 25质量份的无水乙醇， 6质量份的去离子水， 5质量份的 25% ( v/v ) 的氨水、 9 质量份的乙烯基三异丙氧基硅烷， 以及预 定量的所述量子点溶液（其中量子点相对于最终得到的改性纳米 二氧化硅的质量而言约为 10% ) , 在四口烧瓶中混合均勾， 并升 温到 50°C , 然后将 18质量份的正硅酸四乙酯在 3h内緩慢滴加到 烧瓶中， 滴加完成后继续反应 8小时， 生成纳米二氧化硅初产物。
2 )纳米二氧化硅初产物的陈化步骤
将步骤 1 中生成的纳米二氧化硅初产物转移到恒温反应釜 中， 130°C陈化 24h。 将得到的沉淀过滤， 所得滤饼用乙醇冲洗三 遍， 真空干燥后即得到改性纳米二氧化硅颗粒。
本实施例提供的颜料分散体由溶质在溶剂中混合并发生交联 反应制得， 其中， 所述的颜料分散体中固体颗粒的平均粒径为 70nm, 所述的溶质以颜料分散体质量为 100%计包括： 改性纳米 二氧化硅 5%, 分散剂 4.5%, 粘合树脂 5%, 颜料 18%, 光引发剂 0.5%; 量子点 （CdTe, 尺寸为 4.5nm ) 0.5%; 其余为溶剂 66.5%。 上述颜料分散体的制备方法包括以下步骤：
按上述的质量分数取作为颜料的咔唑二噁嗪紫 19, 作为分散 剂的 Disperbyk-161 , 作为溶剂的丙二醇单曱醚乙酸酯， 作为粘合 树脂的聚乙烯吡咯烷酮进行混合，在分散器中用 500rpm的速度混 合 lh, 然后加入适量的氧化锆小球研磨， 所述氧化锆小球平均粒 径为 0.3-1.0mm, 通过高速搅拌研磨器分散 5h, 研磨结束后除去 氧化锆小球， 即得到颜料分散液。
取上述制备所得颜料分散液， 在搅拌的条件下加入本实施例 制备的改性纳米二氧化硅， 作为引发剂的对苯曱酰基苯氧基二苯 基碘鎗六氟磷酸盐， 在搅拌 2.5h后， 在紫外灯（GE-B8565 )下进 行曝光交联反应 45s, 制得颜料分散体。
本实施例提供的感光树脂组合物以质量百分比计包括： 颜料 分散体 40%, 碱可溶性树脂 5%, 光引发剂 0.5%, 聚合单体 2.5%, 其余为溶剂。
上述的感光树脂组合物制备方法如下：
按上述的质量比取颜料分散体， 作为碱可溶性树脂的两烯酸 共聚物为曱基丙烯酸 /曱基丙烯酸苯曱酯/ N-苯基马来酰亚胺共聚 物， 其酸值为 100, 作为聚合单体的苯乙烯， 作为溶剂的丙二醇单 曱醚乙酸酯， 在球磨机中用 500rpm的速度混合 3h, 然后加入适 量的氧化锆小球研磨， 所述氧化锆小球平均粒径为 0.3-1.0mm, 通 过高速搅拌研磨器分散 5h, 研磨结束后除去氧化锆小球， 加入作 为光引发剂的对苯曱酰基苯氧基二苯基碘鎗六氟磷酸盐。
将上述制备的感光树脂组合物涂覆于制备好黑色矩阵的透明 玻璃基板上， 经过 20s 曝光、 显影等光刻工艺后便可制成彩色滤 光片的彩色层， 对上述的光阻外观进行检查， 结果见表 1。
将上述制备的彩色滤光片制备成显示面板， 进一步封装为显 示器， 在相同的功率下检测显示器的亮度， 结果见表 1。 表 1光阻层外观检查结果和显示器亮度对比结果
Figure imgf000020_0001
从表 1可知， 添加本发明制备的改性纳米二氧化硅的光阻层 没有出现塌陷和收缩， 而对比例中没有添加改性纳米二氧化硅的 光阻层出现了塌陷和收缩， 说明本发明的改性纳米二氧化硅能与 聚合单体发生聚合交联形成互穿网络型的复合结构， 增强了支撑 作用。 制成显示器后， 添加量子点的实施例 2-5 的亮度明显的相 对于没有添加量子点的对比例和实施例 1 获得较大的提高， 说明 量子点的添加对提高显示器的亮度、 节约能源具有重要的作用。
本发明的改性纳米二氧化硅粒子由于其表面具有不饱和双 键， 可以与其它高分子物质相互交联， 同时， 具有本发明所述粒 径的改性纳米二氧化硅远小于有机颜料能够分散的粒径， 纳米二 氧化硅粒子加入到颜料色浆中分散均勾以后， 会被颜料表面的覆 盖的粘合树脂的空间位阻效应隔开， 而改性纳米二氧化硅本身的 官能团能阻止互相团聚， 因此适合形成交联网络的节点， 将高分 子链段连接起来形成网状结构。
本发明通过在颜料分散体中加入纳米二氧化硅粒子作为交联 点， 引发分散体中含有不饱和双键的粘合树脂的交联聚合， 形成 分散体中高分子树脂网状的体系， 从而对颜料颗粒起到更强的包 裹和稳定作用， 有效的减少粒子之间的团聚和沉淀发生。
向分散体中添加碱可溶性树脂、 聚合单体、 光引发剂以及其 他添加剂制成感光树脂组合物以后， 在曝光阶段， 聚合单体发生 聚合交联形成网状结构， 这样就和分散体中的含有纳米二氧化硅 粒子的网状交联结构形成了互穿网络型的复合结构， 互相贯通， 共同作用， 从而在后烘阶段互相支撑， 减少膜的热膨胀， 降低膜 表面的收缩和塌陷现象， 有效的增强膜的耐热、 耐化、 机械性能 以及耐摩擦的性能； 同时还能保持透明性和光泽度， 对感光树脂 本身的光学性能不产生负面影响。 可以理解的是， 以上实施方式仅仅是为了说明本发明的原理 而采用的示例性实施方式， 然而本发明并不局限于此。 对于本领 域内的普通技术人员而言， 在不脱离本发明的精神和实质的情况 下， 可以做出各种变型和改进， 这些变型和改进也视为本发明的 保护范围。

Claims

权利要求书
1.一种改性纳米二氧化硅颗粒， 其特征在于，
所述的改性纳米二氧化硅颗粒的表面接枝有不饱和双键， 所 述的改性纳米二氧化硅颗粒的平均粒径为 5-50nm。
2.如权利要求 1所述的改性纳米二氧化硅颗粒， 其特征在于， 所述的改性纳米二氧化硅颗粒的平均粒径为 10-20nm。
3.—种如权利要求 1或 2所述的改性纳米二氧化硅颗粒的制 备方法， 其特征在于， 包括：
1 )将正硅酸四乙酯加入含有乙烯基的硅烷偶联剂的溶液中， 反应生成初产物的步骤；
2 )将所述初产物陈化获得改性纳米二氧化硅颗粒的步骤。
4.如权利要求 3 所述的改性纳米二氧化硅颗粒的制备方法， 其特征在于，所述的改性纳米二氧化硅颗粒的平均粒径为 5-50nm。
5.如权利要求 3 所述的改性纳米二氧化硅颗粒的制备方法， 其特征在于， 所述的正硅酸四乙酯的质量份数为 15-25 份， 所述 的含乙烯基的硅烷偶联剂的质量份数为 3-10份；
在 50-80°C的反应温度下， 将所述的正硅酸四乙酯在 2-3h内 滴加到含有乙烯基的硅烷偶联剂的溶液中， 滴加完成后继续在该 反应温度下反应 6-12h;
在所述的初产物陈化步骤中， 陈化温度为 110-160°C , 陈化时 间为 8-30h。
6.如权利要求 3 所述的改性纳米二氧化硅颗粒的制备方法， 其特征在于， 所述的含有乙烯基的硅烷偶联剂为乙烯基三氯硅烷、 乙烯基三曱氧基硅烷、 乙烯基三乙氧基硅烷、 乙烯基三异丙氧基 硅烷、 乙烯基三乙酰氧基硅烷、 Y - (曱基丙烯酰氧基） 丙基三曱 氧基硅烷中的一种或多种。
7.—种颜料分散体， 其特征在于， 该分散体是通过将溶质分 散在溶剂中并发生交联反应而制得的， 所述的颜料分散体中固体 颗粒的平均粒径为 40-100nm;
所述的溶质以颜料分散体质量为 100%计包括： 如权利要求 1 或 2所述的改性纳米二氧化硅 1-5%,分散剂 3-6%,粘合树脂 2-6%, 颜料 10-20%, 光引发剂 0.1-0.5%。
8.如权利要求 7 所述的颜料分散体， 其特征在于， 以颜料分 散体质量为 100%计， 所述的溶盾还包括量子点 0.2-1%。
9.如权利要求 8 所述的颜料分散体， 其特征在于， 所述的量 子点的粒径为 l-10nm。
10.如权利要求 7所述的颜料分散体， 其特征在于， 所述的分 散剂为由亲溶剂型嵌段和具有含氮原子官能团的嵌段组成的嵌段 共聚物。
1 1.如权利要求 10 所述的颜料分散体， 其特征在于， 所述的 嵌段共聚物为丙烯酸类、 聚氨酯类、 聚氨基酰胺类、 聚醚酯、 脂 肪族多元羧酸类嵌段共聚物中的一种或多种。
12.如权利要求 7所述的颜料分散体， 其特征在于， 所述的颜 料为偶氮类、 酞菁类、 喹吖啶酮类、 苯并咪唑酮类、 阴丹士林类、 二噁嗪类中的一种或多种。
13.如权利要求 7所述的颜料分散体， 其特征在于， 所述的粘 合树脂具有不饱和双键。
14.如权利要求 13 所述的颜料分散体， 其特征在于， 所述的 粘合树脂为各自具有不饱和双键的聚乙烯醇、 羟丙基纤维素、 羧 曱基纤维素、 羟乙基纤维素、 曱基纤维素、 苯乙烯-丙烯酸树脂、 苯乙烯 -丙烯酸-丙烯酸酯树脂、 苯乙烯 -马来酸半酯树脂、 曱基丙 烯酸-曱基丙烯酸酯树脂、异丁烯-马来酸树脂、松香改性马来酸树 脂、 聚乙烯吡咯烷酮、 聚烯丙基胺、 聚氯乙烯、 氯化聚丙烯、 聚 乙烯亚胺中的一种或多种。
15.如权利要求 7所述的颜料分散体， 其特征在于， 所述的光 引发剂为苯偶姻及其衍生物、 苯偶酰类、 烷基苯酮类、 酰基磷氧 化物、 二苯曱酮类、 硫杂蒽酮类、 二芳基碘鎗盐、 三芳基碘鎗盐、 烷基碘鎗盐、 异丙苯茂铁六氟磷酸盐中的一种或多种。
16.—种感光树脂组合物， 其特征在于， 以所述感光树脂组合 物的总质量为 100%计， 该组合物包括： 如权利要求 7-15 中任一 项所述的颜料分散体 30-40%, 碱可溶性树脂 1.5-6%, 聚合单体 2-5%, 光引发剂 0.2-0.8%。
17.如权利要求 16 所述的感光树脂组合物， 其特征在于， 所 述的碱可溶性树脂为丙烯酸共聚物， 所述的丙烯酸共聚物的酸值 为 50-150。
18.如权利要求 17 所述的感光树脂组合物， 其特征在于， 所 述的丙烯酸共聚物选自 （曱基） 丙烯酸 / (曱基） 丙烯酸曱酯共聚 物、 （曱基） 丙烯酸 / (曱基） 丙烯酸苯曱酯共聚物、 （曱基） 丙 烯酸 / (曱基）丙烯酸（2-羟乙酯）/ (曱基）丙烯酸苯曱酯共聚物、
(曱基） 丙烯酸 / (曱基） 丙烯酸曱酯 /苯乙烯共聚物、 （曱基） 丙 烯酸 / (曱基）丙烯酸（2-羟乙酯）/ (曱基）丙烯酸苯曱酯 / (曱基） 丙烯酸曱酯共聚物、 以及 （曱基） 丙烯酸 / (曱基） 丙烯酸苯曱酯
/N-苯基马来酰亚胺共聚物， 所述的丙烯酸共聚物酸值为 60-120。
19.如权利要求 16 所述的感光树脂组合物， 其特征在于， 所 述的聚合单体为丙烯酸己基苯基卡必醇酯、 N-乙烯基吡咯烷酮、 丙烯酸（2-乙基己基卡必醇） 酯、 （曱基） 丙烯酸乙酯、 双酚 A 的双 （丙烯酰氧基乙基） 醚、 四 （曱基） 丙烯酸季戊四醇酯、 丙 烯腈、 苯乙烯、 醋酸乙烯酯中的一种或多种。
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