WO2011090174A1 - 表面処理銅箔、その製造方法及び銅張積層基板 - Google Patents
表面処理銅箔、その製造方法及び銅張積層基板 Download PDFInfo
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- WO2011090174A1 WO2011090174A1 PCT/JP2011/051131 JP2011051131W WO2011090174A1 WO 2011090174 A1 WO2011090174 A1 WO 2011090174A1 JP 2011051131 W JP2011051131 W JP 2011051131W WO 2011090174 A1 WO2011090174 A1 WO 2011090174A1
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- copper foil
- layer
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- copper
- adhesion
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/002—Alloys based on nickel or cobalt with copper as the next major constituent
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
- H05K3/384—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0154—Polyimide
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12431—Foil or filament smaller than 6 mils
- Y10T428/12438—Composite
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12451—Macroscopically anomalous interface between layers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12472—Microscopic interfacial wave or roughness
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12556—Organic component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12785—Group IIB metal-base component
- Y10T428/12792—Zn-base component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12882—Cu-base component alternative to Ag-, Au-, or Ni-base component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12903—Cu-base component
- Y10T428/1291—Next to Co-, Cu-, or Ni-base component
Definitions
- the present invention relates to a copper foil, a manufacturing method thereof, and a copper-clad laminate using the copper foil.
- the present invention relates to a surface-treated copper foil that is excellent in initial adhesion with an insulating resin, heat-resistant adhesion, chemical resistance, good in circuit processability, and easy in soft etching, and a method for producing the same.
- the present invention further relates to a copper-clad laminate (hereinafter sometimes referred to as CCL) using a surface-treated copper foil.
- a roughening treatment is applied to the bonding surface to be bonded to the insulating resin of the copper foil after the foil formation (hereinafter, sometimes referred to as an untreated copper foil), and zinc (Zn) is further applied to the roughened surface.
- various other measures have been taken, such as plating, nickel (Ni) plating, and the like, and further, chromate treatment or the like on the surface plated with Zn or Ni.
- Patent Document 1 discloses a technique of roughening the surface of an untreated copper foil with a Zn-containing alloy.
- the surface of untreated copper foil bonded to insulating resin is surfaced with an electrolytic solution containing molybdenum and at least one of iron, cobalt, nickel, and tungsten.
- an electrolytic solution containing molybdenum and at least one of iron, cobalt, nickel, and tungsten.
- a surface-treated copper foil that has been treated and further provided with a Ni plating layer or a Zn plating layer or (Ni plating layer + Zn plating layer) on the plating layer has been proposed (for example, see Patent Document 2).
- the roughening treatment layer including the Zn layer described in Patent Documents 1 and 2 is effective in improving the adhesive strength between the copper foil and the insulating resin at a high temperature.
- the zinc layer is bonded between the copper foil and the insulating resin because zinc is easily dissolved in acid.
- the adhesive strength between the copper foil and the insulating resin after the circuit formation is extremely lowered, and the wiring circuit (copper foil) may be peeled off from the insulating resin during use of the circuit board.
- the etching time is shortened and the dissolution and outflow of the Zn layer are kept to a minimum.
- the etching process requires advanced technology and a management system, which reduces circuit board productivity and increases the cost. Invite.
- Patent Documents 1 and 2 cannot satisfy all the adhesive strength, chemical resistance, and etching property with the insulating resin as described above, and the surface treatment that satisfies these characteristics.
- copper foil is not provided. Therefore, CCL satisfying all of adhesive strength, chemical resistance, and etching properties has not been provided.
- Patent Document 3 proposes a CCL made of Ni—Zn alloy plating using a pyrophosphoric acid bath as a plating bath and comprising the surface-treated copper foil and a polyimide film as a surface treatment of the copper foil. ing.
- a pyrophosphoric acid bath By using a pyrophosphoric acid bath, a Ni—Zn alloy layer with excellent film thickness uniformity can be obtained, and even if tin plating is applied to the terminal portion after circuit formation, tin (Sn) is formed at the interface between the circuit and the polyimide substrate. It is recognized that the phenomenon of subduction is unlikely to occur.
- a photosensitive film (resist) is attached to one copper foil surface (surface side) of the laminated substrate.
- An exposure apparatus having an exposure mask mounted on the photosensitive film surface is used to transfer (project) the pattern of the exposure mask onto the photosensitive film by irradiation with exposure light.
- the unexposed portion of the photosensitive film is removed by a development process to form a film resist pattern (etching resist).
- the copper foil in the portion not exposed (exposed) with the film resist pattern is removed (etched) by an etching process to form a wiring on the surface side.
- the film resist pattern used in the etching process is removed from the wiring (copper foil) using, for example, an alkaline aqueous solution.
- a predetermined wiring is also applied to the copper foil on the other surface (back surface side) in the same process as described above.
- a blind via hole is formed to connect the front surface side wiring (copper foil) and the back surface side wiring (copper foil).
- the blind via hole is formed by irradiating the insulating resin exposed on the surface side with a laser beam such as a CO 2 laser. In this laser drilling process, insulating resin flaws (smear) remain on the bottom of the hole (rear wiring). In order to remove the soot, the soot is removed using an oxidizing agent such as a potassium permanganate solution (desmear treatment is performed).
- the object of the present invention is excellent in adhesion between the surface-treated copper foil and an insulating resin such as polyimide after initial and thermal history (hereinafter sometimes referred to as heat-resistant adhesion) and chemical resistance, and blind.
- An object of the present invention is to provide an industrially excellent surface-treated copper foil that satisfies the etching property in the soft etching treatment after forming the via hole.
- Another object of the present invention is to provide a copper-clad laminate that has a strong adhesive strength between the surface-treated copper foil and an insulating resin, particularly polyimide, has chemical resistance in circuit formation, and satisfies soft etching properties. It is to provide.
- the surface-treated copper foil of the present invention is subjected to a roughening treatment with a surface roughness Rz of 1.1 ⁇ m or less on at least one surface of a base material copper foil (untreated copper foil).
- Zn content (wt%) Zn adhesion amount / (Ni adhesion amount + Zn adhesion amount) ⁇ 100 (1)
- the manufacturing method of this invention surface-treated copper foil forms a roughening process surface by the roughening process from which surface roughness Rz is 1.1 micrometers or less with respect to at least one surface of base material copper foil (unprocessed copper foil).
- the Ni—Zn alloy layer is a manufacturing method in which a Zn content of 6 to 30% and a Zn deposition amount of 0.08 mg / dm 2 or more are formed in a content (wt%) represented by Formula 1. is there.
- the copper clad laminate of the present invention is formed by laminating the surface-treated copper foil or the surface-treated copper foil produced by the production method on one or both surfaces of the insulating resin layer.
- FIG. 3 illustrates a process of an embodiment of the present invention. It is a figure which shows the expanded cross section of the roughening copper foil by embodiment of this invention.
- a base material copper foil (untreated copper foil) to be surface-treated is manufactured (FIG. 1, step 1).
- the base material copper foil may be either an electrolytic copper foil or a rolled copper foil.
- it may be expressed simply as a copper foil or a base material copper foil (untreated copper foil).
- the thickness of the untreated copper foil is preferably 5 ⁇ m to 35 ⁇ m. This is because, when the thickness of the copper foil is less than 5 ⁇ m, for example, wrinkles or the like enter at the time of manufacture, and the production of the thin copper foil is costly and not realistic.
- the foil thickness is larger than 35 ⁇ m, it is not preferable because it is out of the specifications for thin and miniaturization such as an IC mounting substrate for driving a liquid crystal display as a display unit of a personal computer, a mobile phone or a PDA.
- the surface of the base copper foil is roughened to improve adhesion with an insulating resin (for example, polyimide) (FIG. 1, steps 2 and 3), and further rust-proofed for the purpose of rust prevention (FIG.
- the surface treatment with FIG. 1, step 4) is performed.
- a roughening treatment mainly made of copper or a copper alloy step 2)
- a roughening treatment made of a Ni—Zn alloy film step 3
- the rust prevention treatment is performed.
- the roughening treatment that improves the adhesion between the copper foil and the insulating resin such as polyimide improves the adhesion as the roughened particles become rougher, that is, as the surface irregularities become rougher. Tend to get worse.
- step 2 first, a roughening treatment for increasing the surface roughness Rz by 0.05 to 0.30 ⁇ m is applied to the surface of the base copper foil (untreated copper foil) by copper or copper alloy.
- a surface-treated copper foil in which Rz after the roughening treatment is 1.1 ⁇ m or less.
- the roughening treatment represented by the surface roughness Ra is performed within a range of increasing 0.02 to 0.05 ⁇ m, and Ra after the roughening treatment is set to 0.35 ⁇ m or less. If the surface roughness after the roughening treatment is less than the above range, the adhesiveness with the insulating resin is deteriorated.
- the reason why the surface roughness Rz is 1.1 ⁇ m or less is that the soft etching property described later is deteriorated when the surface roughness is further increased. That is, by setting the surface roughness Rz after the roughening treatment of the surface-treated copper foil to 1.1 ⁇ m or less, it is possible to obtain a surface-treated copper foil having excellent adhesion to polyimide and excellent soft etching properties.
- the surface roughness Ra and Rz are values measured in accordance with JIS-B-0601.
- the roughened surface of the copper foil has a convex shape that forms the roughened surface, a tip having a width of 0.3 to 0.8 ⁇ m and a height of 0.6 to 1.8 ⁇ m.
- a sharp shape This is because, by using such a shape, the unevenness roughened on the insulating resin when it is attached to the insulating resin can easily bite (anchor effect), and good adhesion can be obtained.
- the width in the convex shape is a length obtained by measuring the root portion of the foil surface, and the height is a length from the foil surface to the end.
- the aspect ratio [height / width] of the convex shape on the roughened surface is set to 1.2 to 3.5.
- the reason why the aspect ratio [height / width] is 1.2 to 3.5 is that if it is less than 1.2, the adhesiveness with the insulating resin is not sufficient, and if the aspect ratio is greater than 3.5, it is roughened. This is because there is a high possibility that the convex portion is missing from the copper foil.
- a Ni—Zn alloy is formed on at least one surface of the roughened copper foil, the Zn content (wt%) represented by the following formula 1 is 6% to 30%, and Zn is deposited to 0.08 mg / dm 2 or more.
- a base copper foil (untreated copper foil) having a surface roughness Rz of 0.8 ⁇ m or less is subjected to a roughening treatment so that the Rz increases by 0.05 to 0.30 ⁇ m.
- a base copper foil having a Ra of 0.03 to 0.30 ⁇ m it is preferable to use a base copper foil having a Ra of 0.03 to 0.30 ⁇ m, and to perform a roughening treatment to increase the Ra by 0.02 to 0.05 ⁇ m.
- the surface roughness is defined because when the Rz of the base material copper foil (untreated copper foil) exceeds 0.8 ⁇ m, unevenness (roughening treatment) is not uniformly formed on the copper foil surface. The reason why the range of the increased roughening treatment is defined is that if it is out of the above range, the soft etching property is adversely affected.
- the roughening treatment that increases the three-dimensional surface area by a laser microscope to three times or more with respect to the two-dimensional surface area is less than three times, the area where the soft etching solution is in contact with the copper foil surface is small and the etching rate is slow. This is because the contact force with the insulating resin is reduced, resulting in a decrease in adhesion.
- the amount of roughening applied to the copper foil is 3.56 to 8.91 g / m 2 (thickness conversion: 0). .4 to 1.0 ⁇ m).
- the reason why the roughening amount is 3.56 to 8.91 g per 1 m 2 is that the base material copper foil (untreated copper foil) has an Rz of 0.05 to 0.30 ⁇ m, or an Ra of 0.02 to 0.8. This is because the optimum range for attaching roughened particles increasing by 05 ⁇ m is obtained.
- step 3 it is preferable to deposit a Ni—Zn alloy on at least one surface of the roughened copper foil so that the Ni deposition amount is 0.45 to 3 mg / dm 2 .
- the amount of adhesion of Ni is defined because it has an effect on the improvement in heat-resistant adhesion and the soft etching property. If the amount of adhesion of Ni is less than 0.45 mg / dm 2 , the improvement in heat-resistant adhesion cannot be expected so much. This is because if it exceeds 3 mg / dm 2 , there is a concern that the soft etching property may be adversely affected.
- controlling the shape of the roughened particles, the surface roughness, and the surface area leads to an increase in surface area, an increase in adhesion due to the anchor effect, and an improvement in heat-resistant adhesion, and a laser.
- the resin residue on the roughened part during desmear treatment at the bottom of the via is reduced, and the amount of rust-proof metal per unit can be reduced by increasing the surface area and control with a narrow management width is possible Thus, the effect of providing good soft etching properties is exhibited.
- the insulating resin used for the copper clad laminate in the embodiment of the present invention is not particularly limited, but is preferably polyimide from the viewpoint of heat resistance and dimensional stability.
- the polyimide constituting the polyimide layer is generally represented by the following general formula (Chemical Formula 1), and is a known method in which a diamine component and an acid dianhydride component are used in substantially equimolar amounts and polymerized in an organic polar solvent. Can be manufactured by.
- Ar 1 is a tetravalent organic group having one or more aromatic rings
- Ar 2 is a divalent organic group having one or more aromatic rings. That is, Ar 1 is an acid dianhydride residue and Ar 2 is a diamine residue.
- an aromatic tetracarboxylic dianhydride represented by O (CO) 2 —Ar 1 — (CO) 2 O is preferable, and the following (Chemical Formula 2) aromatic acid anhydride residue Is given as Ar 1 .
- Acid dianhydrides can be used alone or in admixture of two or more.
- PMDA pyromellitic dianhydride
- BPDA 4,4′-biphenyltetracarboxylic dianhydride
- DBDA 4,4′-benzophenone tetracarboxylic acid
- BTDA 4,4′-diphenylsulfonetetracarboxylic dianhydride
- ODPA 4,4′-oxydiphthalic dianhydride
- an aromatic diamine represented by H 2 N—Ar 2 —NH 2 is preferable, and an aromatic diamine which gives the following (Chemical Formula 3) aromatic diamine residue as Ar 2 is exemplified.
- diaminodiphenyl ether DAPE
- 2′-methoxy-4,4′-diaminobenzanilide MABA
- 2,2′-dimethyl-4,4′-diaminobiphenyl m-TB
- para Phenylenediamine P-PDA
- 1,3-bis (4-aminophenoxy) benzene TPE-R
- 1,3-bis (3-aminophenoxy) benzene APB
- 1,4-bis (4- Aminophenoxy) benzene TPE-Q
- 2,2-bis [4- (4-aminophenoxy) phenyl] propane BAPP
- the solvent used for the polymerization examples include dimethylacetamide, n-methylpyrrolidinone, 2-butanone, diglyme, xylene, and the like. These can be used alone or in combination of two or more.
- the resin viscosity of the polyamic acid (polyimide precursor) obtained by polymerization is preferably in the range of 500 cps to 35000 cps.
- the polyimide layer of the copper clad laminate of the embodiment of the present invention may be composed of a single layer or a plurality of layers, but the dimensional stability of the flexible copper clad laminate or the copper foil In order to make the adhesive strength excellent, it is preferable to have a plurality of layers.
- the coefficient of linear expansion is as low as 30 ⁇ 10 ⁇ 6 [1 / K] or less, preferably in the range of 1 ⁇ 10 ⁇ 6 to 30 ⁇ 10 ⁇ 6 [1 / K]. It is preferable that a resin layer having a linear expansion coefficient is a main polyimide layer (1), and a polyimide layer (2) having a glass transition temperature of 330 ° C. or lower is provided on one or both sides thereof.
- the polyimide layer (2) preferably has a linear expansion coefficient (CTE) exceeding 30 ⁇ 10 ⁇ 6 [1 / K] and a glass transition temperature of 330 ° C. or less, more preferably a polyimide layer. (2) has a linear expansion coefficient of 30 ⁇ 10 ⁇ 6 to 60 ⁇ 10 ⁇ 6 [1 / K] and a glass transition temperature in the range of 200 to 330 ° C.
- CTE linear expansion coefficient
- the thickness of the polyimide layer (1) is 50% or more, preferably 70 to 95% of the total polyimide layer thickness.
- the thickness of the polyimide layer (2) is preferably in the range of 1.2 to 2.5 times the surface roughness (Rz) of the copper foil. When the value of Rz is smaller than 1.2 times, good adhesion and reliability cannot be obtained because the filling property of the polyimide layer into the copper foil is insufficient. On the other hand, if the value of Rz is larger than 2.5 times, cohesive failure occurs in the polyimide layer and the adhesiveness is lowered, which is not preferable.
- the method for forming the polyimide layer is not particularly limited.
- a polyamic acid resin solution that is a polyimide precursor is directly applied to the surface of the surface-treated copper foil, and (b) the resin solution is applied. After removing the contained solvent to some extent at a temperature of 150 ° C. or lower, further, (c) heat treatment is performed at a temperature range of 100 to 450 ° C., preferably 300 to 450 ° C. for about 5 to 40 minutes to dry the solvent and Imidization is preferably performed.
- the thickness of the polyimide layer is preferably in the range of 6 to 60 ⁇ m, and preferably in the range of 9 to 40 ⁇ m. If the thickness of the insulating layer is less than 6 ⁇ m, there is a risk of problems such as wrinkling when transporting in the manufacture of copper-clad laminates. Conversely, if the thickness exceeds 60 ⁇ m, dimensional stability during production of copper-clad laminates and There is a risk of problems in flexibility and the like. In addition, when forming a polyimide layer by multiple layers, what is necessary is just to make it the total thickness be in the said range.
- the copper-clad laminate of the embodiment of the present invention may be a single-sided copper-clad laminate having copper foil only on one side of the polyimide layer, as well as both sides having copper foil on both sides of the polyimide layer.
- a copper-clad laminate may also be used.
- the polyimide layers are faced to each other and bonded by hot pressing, or copper is applied to the polyimide layer of the single-sided copper-clad laminate. It can be obtained, for example, by forming a foil by thermocompression bonding.
- the copper-clad laminate provided by the embodiment of the present invention directly forms a blind via hole by directly irradiating a CO 2 laser having an energy of 50 to 150 mJ / cm 2 , preferably 100 to 120 mJ / cm 2 from the polyimide surface.
- a CO 2 laser having an energy of 50 to 150 mJ / cm 2 , preferably 100 to 120 mJ / cm 2 from the polyimide surface.
- the processing conditions such as the laser type and the amount of irradiation energy are not limited to those described above, and optimized conditions are appropriately selected depending on the resin thickness and resin type.
- a blind via hole is a via that is open on only one side of a printed wiring board, and is described in “Printed Circuit Terminology” edited by the Japan Printed Circuit Industry Association.
- FIG. 1 An untreated electrolytic copper foil was produced using the following plating bath and plating conditions. (Plating bath and plating conditions) Copper sulfate: Copper concentration 50-50g / L Sulfuric acid concentration: 30-70 g / L Chlorine concentration: 0.01-30ppm Liquid temperature: 35-45 ° C Current density: 20-50 A / dm 2 (2) Roughening process: FIG. 1, step 2 Surface treatment was performed in the order of roughening plating 1 and then roughening plating 2 under the following plating bath and electrolytic plating conditions, and a roughening treatment was performed to form a convex shape with a sharp tip.
- Ni—Zn alloy layer forming step Step 3 Ni—Zn alloy plating was performed under the following plating bath and electrolytic plating conditions.
- Nickel sulfate nickel concentration of 0.1 g / L to 200 g / L, preferably 20 g / L to 60 g / L
- Zinc sulfate zinc concentration of 0.01 g / L to 100 g / L, preferably 0.05 g / L to 50 g / L
- Ammonium sulfate 0.1 g / L to 100 g / L, preferably 0.5 g / L to 40 g / L
- Liquid temperature 20-60 ° C pH: 2-7 Current density: 0.3 to 10 A / dm 2
- Step 4 Cr plating
- the alloy layer surface was subjected to Cr treatment.
- Cr treatment chromic anhydride is used, and the chromic anhydride is treated at a liquid temperature of 20 to 50 ° C. and a current density of 0.1 to 20 A / dm 2 in a bath of 0.1 g / L to 100 g / L. Went.
- Silane treatment Step 5
- ⁇ -aminopropyltrimethoxysilane was used, a bath of 0.1 g / L to 10 g / L was used, and the treatment was performed by immersion or spraying at a liquid temperature of 20 to 50 ° C. .
- Synthesis Example 2 DMAc was placed in a reaction vessel equipped with a thermocouple and a stirrer and capable of introducing nitrogen. 2,2′-Dimethyl-4,4′-diaminobiphenyl (m-TB) was dissolved in this reaction vessel with stirring. Next, the diamine component and equimolar pyromellitic dianhydride (PMDA) were added, and then the polymerization reaction was continued for about 3 hours to carry out the polymerization reaction, and the polyamic acid b having a solid concentration of 15% by weight and a solution viscosity of 20000 cps was obtained. A resin solution was obtained. A polyimide film was prepared using the polyamic acid b, and the coefficient of linear expansion was measured to find 13 ⁇ 10 ⁇ 6 [1 / K].
- PMDA equimolar pyromellitic dianhydride
- test piece The untreated copper foil was coated with the above polyamic acid resin by the method shown in each example to obtain a test piece.
- the blind via hole was created on the copper clad laminated board produced by each evaluation sample preparation method on condition of the following. Thereafter, the shape of the created via hole was observed with a 100 ⁇ optical microscope to confirm the via shape and the penetration state to the bottom. After that, the resin layer remaining at the bottom of the via is desmeared under the following conditions to remove the residual resin layer, and the copper foil surface is soft-etched under the following conditions to remove the rust preventive layer and the roughened layer. Then, the copper layer was exposed. Whether or not the copper layer was exposed was confirmed by SEM and EDX. The criteria (calculation method) are shown in Table 1.
- Desmear treatment Swelling: alkaline ethylene glycol solution (immersion time 3 minutes)
- Etching Alkaline KMnO4 aqueous solution (immersion time 6 minutes)
- Reduction 2 wt% sulfuric acid aqueous solution (immersion time 5 minutes)
- Example 1 The same chromate-treated layer and silane-treated layer as in Example 1 were formed on the same base material copper foil (untreated electrolytic copper foil) used in Example 1. A polyimide layer was formed on the copper foil surface in the same manner as in Example 1, and then a double-sided copper-clad laminate was formed. Table 1 shows the initial adhesion of the obtained copper-clad laminate, heat resistance after 150 ° C. and 168 hours, adhesion after chemical resistance test, and via bottom observation results after soft etching.
- Example 2 On the surface of the same base material copper foil (untreated electrolytic copper foil) used in Example 1, a surface treatment layer made of Ni—Zn and a chromate treatment layer having an adhesion amount shown in Table 1 were formed. A silane-treated layer similar to that described above was formed. A polyimide layer was formed on the copper foil surface in the same manner as in Example 1, and then a double-sided copper-clad laminate was obtained. Table 1 shows the initial adhesion of the obtained copper-clad laminate, heat resistance after 150 ° C. and 168 hours, adhesion after chemical resistance test, and via bottom observation results after soft etching.
- Example 8 The surface of the same base material copper foil (untreated electrolytic copper foil) used in Example 10 was subjected to a fine roughening treatment so as to have the increased roughening amount shown in Table 1.
- Table 1 shows the aspect ratio and the surface area ratio.
- a surface treatment layer made of Ni—Zn and a chromate treatment layer shown in Table 1 were formed on this surface, and a silane treatment layer similar to that in Example 1 was formed.
- a polyimide layer was formed on the copper foil surface in the same manner as in Example 1, and then a double-sided copper-clad laminate was obtained.
- Table 1 shows the initial adhesion of the obtained copper-clad laminate, heat resistance after 150 ° C. and 168 hours, adhesion after chemical resistance test, and via bottom observation results after soft etching.
- the judgment criteria shown in Table 1 are ⁇ : good, :: within the criteria, and x: outside the criteria in each evaluation.
- Judgment criteria for each evaluation item are as follows.
- Initial adhesion (kN / m) ⁇ : 1.0 or more, ⁇ : 0.8 or more, less than 1.0, x: less than 0.8
- Chemical resistance [Adhesion after chemical resistance test (kN / m)] ⁇ : 1.0 or more, ⁇ : 0.8 or more and less than 1.0, x: less than 0.8
- Soft etching property via bottom observation result after soft etching) A: removed at a processing time of 60 s, B: removed at a processing time of 90 s, x: not removable at a processing time of 90 s
- Example 5 As shown in Table 1, in Examples 1 to 4, since the alloy composition, the roughened foil roughness, the increased roughening amount, the aspect ratio, and the surface area were within the range, each evaluation item was in a good range. It was. (Comprehensive evaluation ⁇ ) In Example 5, the aspect ratio and the surface area ratio are within the standard range, but the soft etching properties are slightly low because they are 1, 2, 3, and 2 respectively small. (Comprehensive evaluation ⁇ )
- Example 6 although the Ni adhesion amount is within the standard, it is slightly higher at 2.20 mg / dm 2 , so it takes time for soft etching and the soft etching property is slightly low. (Comprehensive evaluation ⁇ )
- Example 7 since the Ni adhesion amount was 3.30 mg / dm 2 higher than in Example 6, the time for the soft etching process was slightly longer than in Example 6. (Comprehensive evaluation ⁇ )
- Example 8 since the Ni adhesion amount is as small as 0.38 mg / dm 2 , the heat-resistant adhesion is slightly low. (Comprehensive evaluation ⁇ )
- the surface-treated copper foil according to the embodiment of the present invention is an industrially excellent surface-treated copper foil that satisfies initial adhesion with polyimide, heat-resistant adhesion, chemical resistance, and soft etching properties. .
- the outstanding surface-treated copper foil which is excellent in adhesiveness with a polyimide and can satisfy chemical resistance and soft etching property industrially can be manufactured.
- the adhesive strength between the insulating resin, particularly polyimide and copper foil is strong, and the circuit has excellent acid resistance and satisfactory etching properties. It has an effect.
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Abstract
Description
本発明は、特に、絶縁樹脂との初期密着性、耐熱密着性、耐薬品性に優れ、回路加工性も良好であり、かつソフトエッチング処理が容易な表面処理銅箔及びその製造方法に関する。
本発明はさらに、表面処理銅箔を用いた銅張積層基板(以下、CCLと記載することがある)に関するものである。
パソコン、携帯電話やPDA(Personal Data Assistant)の表示部である液晶ディスプレイを駆動するIC実装基板においては近時高密度化が進み、その製造過程においては正確な回路構成と、高温処理での熱安定性が要求されている。
そのため、接着強度、耐薬品性、エッチング性を全て満足するCCLは提供されていなかった。
しかしながら、ピロリン酸浴を用いためっきにおいては、めっき皮膜中へ、りん(P)が共析し、共析したPによりめっき皮膜の溶解性が高くなることが知られている。
めっき皮膜の溶解性が高くなるとエッチングによる回路形成に大きく影響し、銅箔をエッチングで回路形成した回路において端子部にSnメッキを行うと、Snめっき液の潜り込み現象(耐薬品性の劣化)を十分に防止できず、Snめっき液により表面処理層が劣化され、配線回路の密着性に悪影響を及ぼす不具合が生ずる。
先ず、積層基板の一方の銅箔表面(表面側)に、感光性フィルム(レジスト)を貼り付ける。該感光性フィルム面に露光マスクを装着した露光装置を用い、露光光の照射によって露光マスクのパターンを感光性フィルム上に転写(投影)する。感光性フィルムのうち露光されていない部分を現像プロセスにて除去しフィルムレジストパターン(エッチングレジスト)を形成する。
次いで、フィルムレジストパターンで覆われていない(露出している)部分の銅箔をエッチング工程にて除去(蝕刻)して、表面側の配線を形成する。その後、エッチング工程で使用済みのフィルムレジストパターンを、例えば、アルカリ水溶液を用いて配線(銅箔)上から除去する。
上述したように表裏面に配線を形成した後、表面側配線(銅箔)と裏面側配線(銅箔)とを導通するためのブラインドビアホールを穿設する。
ブラインドビアホールの穿設は表面側に露出した絶縁樹脂にCO2レーザー等のレーザービームを照射して穴を開ける。このレーザーでの穴あけ工程では穴の底(裏面側配線)に絶縁樹脂の滓(スミア)が残る。この滓を除去するために過マンガン酸カリウム溶液等の酸化性の薬剤を用いて滓を除去する(デスミア処理を行う)。
なお、裏面側の銅箔に配線を形成する工程はブラインドビアホールを穿設した後に行うことも可能である。
また、本発明の他の目的は、前記表面処理銅箔と絶縁樹脂、特にポリイミドとの接着強度が強く、回路形成にあたっては耐薬品性を有し、ソフトエッチング性を満足する銅張積層板を提供することにある。
本発明の表面処理銅箔は、母材銅箔(未処理銅箔)の少なくとも片面に対して、表面粗さRzが1.1μm以下となる粗化処理が施され、該粗化処理表面にNi-Zn合金層が施されており、前記粗化処理は、粗化処理面における幅が0.3~0.8μm、高さが0.6~1.8μmで、アスペクト比[高さ/幅]が1.2~3.5で、先端が尖った凸部形状となる粗化処理で、前記母材銅箔の表面粗さRzが0.05~0.3μm増加する範囲で施され、
前記Ni-Zn合金層は、式1で表される含有率(wt%)でZnが6~30%含有し、Zn付着量が0.08mg/dm2以上である。
前記粗化処理面は、粗化処理面における幅が0.3~0.8μm、高さが0.6~1.8μmで、アスペクト比[高さ/幅]が1.2~3.5で、先端が尖った凸部形状となる粗化処理で、前記母材銅箔の表面粗さRzが0.05~0.3μm増加する範囲に形成し、
前記Ni-Zn合金層は、式1で表される含有率(wt%)でZnが6~30%含有し、Zn付着量が0.08mg/dm2以上となる層に形成する製造方法である。
更に本発明の銅張積層板によれば、絶縁樹脂、特にポリイミドと銅箔との接着強度が強く、回路形成にあたっては耐薬品性を有し、エッチング性を満足することができる。
未処理銅箔の厚みは5μm~35μmが好適である。銅箔の厚みが5μmより薄いと製造時に、例えば、シワなどが入り、薄い銅箔の製造にコストがかかり現実的ではないためである。他方、箔厚が35μmより厚い場合は、パソコン、携帯電話やPDAの表示部である液晶ディスプレイを駆動するIC実装基板等薄型・小型化の仕様から外れるため好ましくない。
本発明の実施の形態では表面処理として、主として銅又は銅合金からなる粗化処理(ステップ2)と、Ni-Zn合金被膜からなる粗化処理(ステップ3)と、その上にCr、Si等の防錆処理(ステップ4)が施される。
銅箔とポリイミドなどの絶縁樹脂との密着性を向上させる粗化処理は、粗化粒子を粗くするほど、すなわち表面の凹凸を粗くするほど密着性は向上するが、ソフトエッチング処理でのエッチング性が悪くなる傾向にある。
ここで、表面粗さRaで表される粗化処理を0.02~0.05μm増加する範囲で行い、粗化処理後のRaを0.35μm以下とすることが好ましい。粗化処理後の表面粗さが上記範囲に満たないと、絶縁樹脂との密着性が悪くなる一方、上記範囲を超え表面が粗くなると後述するソフトエッチング性が悪くなる。
本発明の実施の形態において特に、表面粗さRzが1.1μm以下とするのは、これ以上表面粗さが粗くなると後述するソフトエッチング性を悪くするためである。すなわち、表面処理銅箔の粗化処理後の表面粗さRzを1.1μm以下とすることで、ポリイミドとの密着性に優れ、ソフトエッチング性に優れた表面処理銅箔とすることができる。
なお、表面粗さRa、RzはJIS-B-0601の規定に準じて測定される値である。
また、本発明の実施の形態では、粗化処理面における凸部形状のアスペクト比=[高さ/幅]は1.2~3.5とする。アスペクト比[高さ/幅]を1.2~3.5とする理由は、1.2未満では絶縁樹脂との密着性が十分でなく、アスペクト比が3.5より大きいと、粗化した凸状部分が銅箔より欠落する可能性が高くなり好ましくないからである。
また、Znを0.08mg/dm2以上付着させる。Znを0.08mg/dm2以上付着させる理由は耐熱密着性を改善するためで、0.08mg/dm2未満では耐熱密着性の効果が期待できないためである。
ここで表面粗さを規定するのは、母材銅箔(未処理銅箔)のRzが0.8μmを超えると銅箔表面に対して均一に凹凸(粗化処理)が形成されず、また、増加粗化処理の範囲を規定するのは、上記範囲を外れるとソフトエッチング性に悪影響を及ぼすためである。
二次元表面積に対してレーザーマイクロスコープによる三次元表面積が3倍以上となる粗化処理を施すのは、3倍未満ではソフトエッチング液が銅箔表面と接触する面積が少なく、エッチング速度が遅くなってしまうためであり、また絶縁樹脂との接触面積が少なくなることによる密着力低下が起こるためである。
粗化量を1m2あたり3.56~8.91gとするのは、母材銅箔(未処理銅箔)に、Rzが0.05~0.30μm、又はRaが0.02~0.05μm増加する粗化粒子を付着させるのに最適な範囲となるからである。
本発明の実施の形態において、ステップ3として、粗化処理銅箔の少なくとも片面にNi-Zn合金を、Ni付着量が0.45~3mg/dm2付着させることが好ましい。Niの付着量を規定するのは、耐熱密着性の改善とソフトエッチング性に影響があるためであり、Ni付着量が0.45mg/dm2未満では耐熱密着性の改善がそれほど期待できず、3mg/dm2より多いとソフトエッチング性に悪影響を及ぼすことが懸念されるためである。
が好ましく、下記(化3)芳香族ジアミン残基をAr2として与える芳香族ジアミンが例示される。
上記ポリイミド層(2)の厚みは銅箔の表面粗度(Rz)の1.2~2.5倍の範囲が好ましい。Rzの値が1.2倍より小さいと、ポリイミド層の銅箔への充填性が不十分なため良好な接着性や信頼性が得られない。また、Rzの値が2.5倍より大きいと、ポリイミド層内での凝集破壊が発生し、接着性が低下するため好ましくない。
2層以上にポリイミド層を設ける場合は、(aa)第一のポリアミド酸の樹脂溶液を塗布、乾燥したのち、(bb)第二のポリアミド酸の樹脂溶液を塗布、乾燥し、(cc)以下同様にして第三以下のポリアミド酸の樹脂溶液を順次、塗布、乾燥したのち、(dd)まとめて300~450℃の温度範囲で5~40分間程度の熱処理を行って、イミド化を行うことがよい。
熱処理の温度が100℃より低いとポリイミドの脱水閉環反応が十分に進行せず、反対に450℃を超えると、ポリイミド層及び銅箔が酸化等により劣化するおそれがあり好ましくない。
(1)製箔工程:図1、ステップ1
下記のめっき浴及びめっき条件で未処理電解銅箔を製造した。
(めっき浴及びめっき条件)
硫酸銅:銅濃度が50~80g/L
硫酸濃度:30~70g/L
塩素濃度:0.01~30ppm
液温:35~45℃
電流密度:20~50A/dm2
(2)粗化処理工程:図1、ステップ2
下記めっき浴、電解めっき条件で、粗化めっき1、次いで粗化めっき2 の順で表面処理し、先端が尖った凸部形状となる粗化処理を施した。
硫酸銅:銅濃度が5~10g/dm3
硫酸濃度:30~120g/dm3
液温:20~60℃
電流密度:10~60A/dm2
(粗化めっき2:ステップ2b)
硫酸銅:銅濃度が20~70g/dm3
硫酸濃度:30~120g/dm3
液温:20~65℃
電流密度:5~65A/dm2
下記のめっき浴及び電解めっき条件でNi-Zn合金めっきを施した。
(Ni-Zn合金めっき浴及びめっき条件)
硫酸ニッケル:ニッケル濃度が0.1g/L~200g/L、好ましくは20g/L~60g/L
硫酸亜鉛:亜鉛濃度が0.01g/L~100g/L、好ましくは0.05g/L~50g/L
硫酸アンモニウム:0.1g/L~100g/L、好ましくは0.5g/L~40g/L
液温:20~60℃
pH:2~7
電流密度:0.3~10A/dm2
(Crめっき)
Ni-Zn合金めっき後、該合金層表面にCr処理を施した。
Cr処理としては無水クロム酸を用い、該無水クロム酸を0.1g/L~100g/Lとなる浴で、液温:20~50℃、電流密度:0.1~20A/dm2として処理を行った。
シランカップリング処理としては、γ-アミノプロピルトリメトキシシランを用い、0.1g/L~10g/Lの浴とし、液温:20~50℃にて浸漬もしくはスプレー等の方法により処理を行った。
(ポリアミド酸樹脂の重合)
合成例1.
熱電対及び攪拌機を備えると共に窒素導入が可能な反応容器に、N,N-ジメチルアセトアミド(DMAc)を入れた。この反応容器に2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン(BAPP)を容器中で撹拌しながら溶解させた。次に、ジアミン成分と等モルのピロメリット酸二無水物(PMDA)を加え、その後、約3時間撹拌を続けて重合反応を行い、固形分濃度15重量%、溶液粘度が3000cpsのポリアミド酸aの樹脂溶液を得た。ポリアミド酸aを用いてポリイミドフィルムを作成し、そのガラス転移温度を測定したところ280℃であり、線膨張係数を測定したところ55×10-6[1/K]であった。
熱電対及び攪拌機を備えると共に窒素導入が可能な反応容器に、DMAcを入れた。この反応容器に2,2’-ジメチル-4,4’-ジアミノビフェニル(m-TB)を容器中で撹拌しながら溶解させた。次に、ジアミン成分と等モルのピロメリット酸二無水物(PMDA)を加えその後、約3時間撹拌を続けて重合反応を行い、固形分濃度15重量%、溶液粘度が20000cpsのポリアミド酸bの樹脂溶液を得た。ポリアミド酸bを用いてポリイミドフィルムを作成し、その線膨張係数を測定したところ13×10-6[1/K]であった。
製箔した未処理銅箔に上記ポリアミド酸樹脂を各実施例に示す方法で施し試験片とした。
(1)金属付着量の測定
蛍光X線((株)リガク製ZSXPrimus、分析径:35φ)にて分析した。
(2)表面粗さの測定
接触式表面粗さ測定機((株)小坂研究所製SE1700)にて測定した。
粗化断面(FIBやウルトラミクロトーム等にて加工)の図2に示す、突部のwと幅・高さhを走査型電子顕微鏡(SEM)にて、幅wは箔の付け根の部分の長さを、高さhは箔の付け根から頂きまでの長さを計測し、[高さ/幅]をアスペクト比として算出した。
(4)表面積の算出
レーザーマイクロスコープ((株)キーエンス製VK8500)にて突部を測定し、「表面積比=三次元表面積/二次元表面積」を算出した。
テンシロンテスター(東洋精機製作所製)を使用して、幅1mmの配線を形成し、樹脂側を両面テープによりステンレス板に固定し、銅配線を90度方向に50mm/分の速度で剥離して求めた。判定基準(算出方法)は表1に示す。
ポリイミドと接着後の試験片を、150℃で168時間加熱処理した後の密着性を測定した。熱処理後の密着性の判定基準は初期密着性の90%以上を合格とした。
なお、判定基準(算出方法)は表1に示す。
(7)耐薬品性(酸処理後の密着性)の測定
ポリイミドと接着後の試験片を、水:塩酸=1:1の塩酸溶液に常温で1時間浸漬し、
その後の密着性を測定した。判定基準(算出方法)は表1に示す。
各評価試料作成方法により作成した銅張積層板を、以下の条件によりブラインドビアホールを作成した。その後作成したビアホールの形状を100倍の光学顕微鏡で観察してビア形状および底部までの貫通状態を確認した。その後、ビア底部に残った樹脂層を以下の条件にてデスミア処理を実施し残樹脂層を除去し、銅箔表面を以下の条件でソフトエッチング処理して防錆層および粗化処理層を除去し、銅層を露出させた。銅層が露出したかどうかについてはSEM、EDXにて確認した。判定基準(算出方法)は表1に示す。
装置:CO2ガスレーザー加工機(澁谷工業株式会社製)
ビア径:400μmφ
波長:9.6μm
エネルギー:約115J/cm2
膨潤:アルカリ性エチレングリコール溶液(浸漬時間3分)
エッチング:アルカリ性KMnO4水溶液(浸漬時間6分)
還元:2wt%硫酸水溶液(浸漬時間5分)
薬液:CPE-920(三菱ガス化学株式会社製 10倍希釈)
温度:25℃
処理時間:60s、90s
表面粗さ(Ra)0.08μm、(Rz)0.58μmの母材銅箔(未処理電解銅箔)の表面に粗化形成後の増加粗化量が0.03μm(Ra)、0.15μm(Rz)になるような微細粗化処理を施した。このときの粗化のアスペクト比は1.4で表面積比は3.7であった。
この表面にNi-Znからなる表面処理とクロメート処理層を形成し、3アミノプロピルトリメトキシシラン処理層を形成した。そのときの銅箔表面のニッケル量は0.91mg/dm2、亜鉛量は0.17mg/dm2であった。
この銅箔上に、前記合成例1で製造したポリアミド酸aを用いて硬化後の厚みが2μmとなるように熱可塑性ポリイミド層を形成し、その上に前記合成例2で製造したポリアミド酸bを用いて硬化後の厚みが21μmとなるように低熱膨張性樹脂層を、更にその上に前記ポリアミド酸aを用いて硬化後の厚みが2μmとなるようにポリイミド層を形成し、フレキシブル片面銅張積層板を得た。
得られた銅張積層板の初期密着性は1.2kN/mであり、150℃、168h後の耐熱密着性は1.1kN/mであった。また耐薬品性試験後の密着性は1.2kN/mであった。
この銅張積層板の樹脂面に前記と同様の銅箔をラミネートプレスし、両面銅張積層板を作成し、ラミネートした銅箔面に所定のパターンを形成した後、開口部に前記のレーザー加工およびその後のデスミア処理、ソフトエッチング処理を実施した。その結果、ビア底部の樹脂残り及び防錆金属、粗化部の残渣はなく良好なビア底部性状が得られた。
これらの評価結果を表1に示す。
実施例1で用いたものと同じ母材銅箔(未処理電解銅箔)の表面に、表1に示す増加粗化量になるように微細粗化処理を施した。このときのアスペクト比、表面積比を表1に示す。
この表面に表1に示す付着量のNi-Znからなる表面処理層とクロメート処理層を形成し、実施例1と同様のシラン処理層を形成した。
その銅箔表面に実施例1と同様の方法でポリイミド層を形成し、その後、両面銅張積層板を得た。
得られた銅張積層板の初期密着性、150℃、168h後の耐熱密着性、耐薬品性試験後の密着性、ソフトエッチング後のビア底部観察結果を表1に併記する。
表面粗さ(Ra)0.20μm、(Rz)0.85μmの母材銅箔(未処理電解銅箔)の表面に、表1に示す増加粗化量になるように微細粗化処理を施した。このときのアスペクト比、表面積比を表1に示す。
この表面に表1に示す付着量のNi-Znからなる表面処理層とクロメート処理層を形成し、実施例1と同様のシラン処理層を形成した。
その銅箔表面に実施例1と同様の方法でポリイミド層を形成し、その後、両面銅張積層板を得た。
得られた銅張積層板の初期密着性、150℃、168h後の耐熱密着性、耐薬品性試験後の密着性、ソフトエッチング後のビア底部観察結果を表1に併記する。
実施例1で用いたものと同じ母材銅箔(未処理電解銅箔)の表面に、実施例1と同様のクロメート処理層、シラン処理層を形成した。その銅箔表面に実施例1と同様の方法でポリイミド層を形成し、その後、両面銅張積層板を形成した。得られた銅張積層板の初期密着性、150℃、168h後の耐熱密着性、耐薬品性試験後の密着性、ソフトエッチング後のビア底部観察結果を表1に併記する。
実施例1で用いたものと同じ母材銅箔(未処理電解銅箔)の表面に、表1に示す付着量のNi-Znからなる表面処理層とクロメート処理層を形成し、実施例1と同様のシラン処理層を形成した。その銅箔表面に実施例1と同様の方法でポリイミド層を形成し、その後、両面銅張積層板を得た。得られた銅張積層板の初期密着性、150℃、168h後の耐熱密着性、耐薬品性試験後の密着性、ソフトエッチング後のビア底部観察結果を表1に併記する。
実施例1で用いたものと同じ母材銅箔(未処理電解銅箔)の表面に、表1に示す増加粗化量になるように微細粗化処理を施した。このときのアスペクト比、表面積比を表1に示す。この表面に表1に示す付着量のNi-Znからなる表面処理層とクロメート処理層を形成し、実施例1と同様のシラン処理層を形成した。その銅箔表面に実施例1と同様の方法でポリイミド層を形成し、その後、両面銅張積層板を得た。得られた銅張積層板の初期密着性、150℃、168h後の耐熱密着性、耐薬品性試験後の密着性、ソフトエッチング後のビア底部観察結果を表1に併記する。
実施例10で用いたものと同じ母材銅箔(未処理電解銅箔)の表面に、表1に示す増加粗化量になるように微細粗化処理を施した。このときのアスペクト比、表面積比を表1に示す。この表面に表1に示す付着量のNi-Znからなる表面処理層とクロメート処理層を形成し、実施例1と同様のシラン処理層を形成した。その銅箔表面に実施例1と同様の方法でポリイミド層を形成し、その後、両面銅張積層板を得た。得られた銅張積層板の初期密着性、150℃、168h後の耐熱密着性、耐薬品性試験後の密着性、ソフトエッチング後のビア底部観察結果を表1に併記する。
各評価項目における判断基準は以下のとおりである。
初期密着性(kN/m)
◎:1.0以上、○:0.8以上、1.0未満、×:0.8未満
耐熱密着性〔耐熱性試験後密着性(kN/m)〕
◎:0.9以上、○:0.72以上0.9未満、×:0.72未満
耐薬品性〔耐薬品試験後密着性(kN/m)〕
◎:1.0以上、○:0.8以上1.0未満、×:0.8未満
ソフトエッチング性(ソフトエッチング後のビア底部観察結果)
◎:処理時間60sで除去、○:処理時間90sで除去、×:処理時間90sで除去不可
実施例5は、アスペクト比、表面積比が基準内であるが、それぞれ1、2,3、2と小さめのため、ソフトエッチング性がやや低い。(総合評価○)
また、本発明の表面処理銅箔の製造方法によれば、ポリイミドとの密着性に優れ、耐薬品性、ソフトエッチング性を工業的に満足する優れた表面処理銅箔を製造することができる。
更に、本発明の実施の形態もとづく銅張積層板によれば、絶縁樹脂、特にポリイミドと銅箔との接着強度が強く、回路形成にあたっては耐酸性を有し、エッチング性を満足するといった優れた効果を有するものである。
Claims (10)
- 母材銅箔(未処理銅箔)の少なくとも片面に対して、表面粗さRzが1.1μm以下となる粗化処理が施され、該粗化処理表面にNi-Zn合金層が施された
前記粗化処理は、粗化処理面における幅が0.3~0.8μm、高さが0.6~1.8μmで、アスペクト比[高さ/幅]が1.2~3.5で、先端が尖った凸部形状となる粗化処理で、前記母材銅箔の表面粗さRzが0.05~0.3μm増加する範囲で施され、
前記Ni-Zn合金層は、下記式で表される含有率(wt%)でZnが6~30%含有し、Zn付着量が0.08mg/dm2以上である
表面処理銅箔。
Zn含有率(wt%)=Zn付着量/(Ni付着量+Zn付着量)×100 - 粗化処理表面の二次元表面積に対する三次元表面積の比が、3倍以上である
請求項1に記載の表面処理銅箔。 - 前記Ni-Zn合金層におけるNi付着量が0.45~3mg/dm2である
請求項1又は2に記載の表面処理銅箔。 - 母材銅箔(未処理銅箔)の表面粗さRaが0.3μm以下、Rzが0.8μm以下である請求項1乃至3のいずれかに記載の表面処理銅箔。
- 母材銅箔(未処理銅箔)の少なくとも片面に対して、表面粗さRzが1.1μm以下となる粗化処理で粗化処理表面を形成し、該粗化処理表面にNi-Zn合金層を設ける表面処理銅箔の製造方法であって、前記粗化処理面は、粗化処理面における幅が0.3~0.8μm、高さが0.6~1.8μmで、アスペクト比[高さ/幅]が1.2~3.5で、先端が尖った凸部形状となる粗化処理で、前記母材銅箔の表面粗さRzが0.05~0.3μm増加する範囲に形成し、前記Ni-Zn合金層は、下記式で表される含有率(wt%)でZnが6~30%含有し、Zn付着量が0.08mg/dm2以上となる層に形成する表面処理銅箔の製造方法。
Zn含有率(wt%)=Zn付着量/(Ni付着量+Zn付着量)×100 - 母材銅箔表面に施す粗化処理の粗化量(粗化処理で付着する重量)が、1m2あたり3.56~8.91g(厚さ換算:0.4~1.0μm)である請求項5に記載の表面処理銅箔の製造方法。
- 前記Ni-Zn合金層に、防錆処理を行う、
請求項5または6に記載の製造方法。 - 前記防錆処理を施した層にシランカップリング処理を行う、
請求項7に記載の製造方法。 - 絶縁樹脂層の片面又は両面に請求項1乃至4のいずれかに記載の表面処理銅箔、又は請求項5~8のいずれかに記載の製造方法で製造した表面処理銅箔を張り合わせてなる銅張積層板。
- 絶縁樹脂層がポリイミドからなる請求項9に記載の銅張積層板。
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Also Published As
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CN102713020A (zh) | 2012-10-03 |
JP2011149067A (ja) | 2011-08-04 |
TWI443231B (zh) | 2014-07-01 |
JP4927963B2 (ja) | 2012-05-09 |
KR20120135197A (ko) | 2012-12-12 |
TW201139752A (en) | 2011-11-16 |
EP2527498A1 (en) | 2012-11-28 |
KR101561731B1 (ko) | 2015-10-19 |
US20130040162A1 (en) | 2013-02-14 |
US8852754B2 (en) | 2014-10-07 |
CN102713020B (zh) | 2015-05-13 |
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