WO2011089943A1 - 金属の表面処理剤 - Google Patents
金属の表面処理剤 Download PDFInfo
- Publication number
- WO2011089943A1 WO2011089943A1 PCT/JP2011/050242 JP2011050242W WO2011089943A1 WO 2011089943 A1 WO2011089943 A1 WO 2011089943A1 JP 2011050242 W JP2011050242 W JP 2011050242W WO 2011089943 A1 WO2011089943 A1 WO 2011089943A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- metal
- silver
- surface treatment
- general formula
- group
- Prior art date
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 38
- 239000002184 metal Substances 0.000 title claims abstract description 38
- -1 benzotriazole compound Chemical class 0.000 claims abstract description 21
- 238000010438 heat treatment Methods 0.000 claims abstract description 16
- 239000003112 inhibitor Substances 0.000 claims abstract description 16
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 10
- YXIWHUQXZSMYRE-UHFFFAOYSA-N benzothiazolyl mercaptan Natural products C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims abstract description 9
- 239000012964 benzotriazole Substances 0.000 claims abstract description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 26
- 229910052709 silver Inorganic materials 0.000 claims description 26
- 239000004332 silver Substances 0.000 claims description 26
- 239000012756 surface treatment agent Substances 0.000 claims description 25
- 238000002845 discoloration Methods 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 19
- 125000000217 alkyl group Chemical group 0.000 claims description 15
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- 239000001257 hydrogen Substances 0.000 claims description 13
- 229910001316 Ag alloy Inorganic materials 0.000 claims description 12
- 229910052783 alkali metal Inorganic materials 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- 150000001340 alkali metals Chemical class 0.000 claims description 10
- 150000002431 hydrogen Chemical class 0.000 claims description 8
- 125000003277 amino group Chemical group 0.000 claims description 6
- 239000004094 surface-active agent Substances 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 125000003342 alkenyl group Chemical group 0.000 claims description 5
- 239000002585 base Substances 0.000 claims description 5
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 238000004381 surface treatment Methods 0.000 abstract description 15
- 230000000694 effects Effects 0.000 abstract description 13
- 230000006866 deterioration Effects 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 238000002310 reflectometry Methods 0.000 abstract description 3
- 239000006185 dispersion Substances 0.000 abstract 1
- 238000007747 plating Methods 0.000 description 11
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 9
- 229910000679 solder Inorganic materials 0.000 description 9
- 239000007788 liquid Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 239000006174 pH buffer Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000000314 lubricant Substances 0.000 description 4
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 235000015165 citric acid Nutrition 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 2
- 0 CC1(C*2CCC2)CCC2N=NN(*)C2CC1 Chemical compound CC1(C*2CCC2)CCC2N=NN(*)C2CC1 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 239000010974 bronze Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 2
- 238000004649 discoloration prevention Methods 0.000 description 2
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 2
- 229910000397 disodium phosphate Inorganic materials 0.000 description 2
- 235000019800 disodium phosphate Nutrition 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910001385 heavy metal Inorganic materials 0.000 description 2
- VUVZASHBYYMLRC-UHFFFAOYSA-N heptane-2,3-diol Chemical compound CCCCC(O)C(C)O VUVZASHBYYMLRC-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 2
- 231100000989 no adverse effect Toxicity 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000003002 pH adjusting agent Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000001632 sodium acetate Substances 0.000 description 2
- 235000017281 sodium acetate Nutrition 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- 150000003918 triazines Chemical class 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- ALSTYHKOOCGGFT-KTKRTIGZSA-N (9Z)-octadecen-1-ol Chemical compound CCCCCCCC\C=C/CCCCCCCCO ALSTYHKOOCGGFT-KTKRTIGZSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- HXQHRUJXQJEGER-UHFFFAOYSA-N 1-methylbenzotriazole Chemical compound C1=CC=C2N(C)N=NC2=C1 HXQHRUJXQJEGER-UHFFFAOYSA-N 0.000 description 1
- LPFZJDLQTAOHCU-UHFFFAOYSA-N 2,6-bis(sulfanyl)-1,3-dihydrotriazine-4-thione Chemical compound SN1NC(S)=CC(=S)N1 LPFZJDLQTAOHCU-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 1
- JXLJLMGBTDHWLJ-UHFFFAOYSA-N 3h-1,3-benzothiazole-2-thione;potassium Chemical compound [K].C1=CC=C2SC(=S)NC2=C1 JXLJLMGBTDHWLJ-UHFFFAOYSA-N 0.000 description 1
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 description 1
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical class C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- PQIJHIWFHSVPMH-UHFFFAOYSA-N [Cu].[Ag].[Sn] Chemical compound [Cu].[Ag].[Sn] PQIJHIWFHSVPMH-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- OWBTYPJTUOEWEK-UHFFFAOYSA-N butane-2,3-diol Chemical compound CC(O)C(C)O OWBTYPJTUOEWEK-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- QCIYAEYRVFUFAP-UHFFFAOYSA-N hexane-2,3-diol Chemical compound CCCC(O)C(C)O QCIYAEYRVFUFAP-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- GPJPBLLWYCLERP-UHFFFAOYSA-N n-(benzotriazol-1-ylmethyl)-n-octyloctan-1-amine Chemical compound C1=CC=C2N(CN(CCCCCCCC)CCCCCCCC)N=NC2=C1 GPJPBLLWYCLERP-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 229940055577 oleyl alcohol Drugs 0.000 description 1
- XMLQWXUVTXCDDL-UHFFFAOYSA-N oleyl alcohol Natural products CCCCCCC=CCCCCCCCCCCO XMLQWXUVTXCDDL-UHFFFAOYSA-N 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035807 sensation Effects 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- HELHAJAZNSDZJO-OLXYHTOASA-L sodium L-tartrate Chemical compound [Na+].[Na+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O HELHAJAZNSDZJO-OLXYHTOASA-L 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 235000011083 sodium citrates Nutrition 0.000 description 1
- 239000001433 sodium tartrate Substances 0.000 description 1
- 229960002167 sodium tartrate Drugs 0.000 description 1
- 235000011004 sodium tartrates Nutrition 0.000 description 1
- VLDHWMAJBNWALQ-UHFFFAOYSA-N sodium;3h-1,3-benzothiazole-2-thione Chemical compound [Na+].C1=CC=C2SC(S)=NC2=C1 VLDHWMAJBNWALQ-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 235000011044 succinic acid Nutrition 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910000969 tin-silver-copper Inorganic materials 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/14—Nitrogen-containing compounds
- C23F11/149—Heterocyclic compounds containing nitrogen as hetero atom
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/16—Sulfur-containing compounds
- C23F11/165—Heterocyclic compounds containing sulfur as hetero atom
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
Definitions
- the present invention relates to a surface treatment agent for metal, particularly silver or silver alloy.
- a material is often used in which copper or nickel is plated on the surface of brass or phosphor bronze and then silver is plated thereon. Since silver is a good conductor of electricity and heat, silver is used as a plating for connectors and lead frames as described above. However, the silver plating material is easily discolored in the air, and in particular, corrodes in an atmosphere containing sulfur and changes its color to brown or blue-black, resulting in poor electrical contact.
- One method for solving this problem is the surface treatment method. That is, the surface of the silver plating is treated with a treatment liquid to prevent deterioration in appearance and increase in contact resistance due to discoloration.
- a conventional surface treatment method for a silver plating material for example, as disclosed in Patent Document 1, a silver plating material is treated in a solution containing an inhibitor.
- the effect of preventing discoloration due to corrosion of the silver plating is recognized, the effect of preventing the discoloration is not perfect, and there is a problem that the discoloration is still partially depending on the atmosphere.
- Patent Document 2 discloses a surface treatment liquid and a surface treatment method for preventing discoloration due to corrosion of a silver plating material and further imparting lubricity to the plating surface.
- the surface treatment liquid contains one or more selected from the group consisting of a specific benzotriazole compound, mercaptobenzothiazole compound, and triazine compound as an inhibitor, and further contains a lubricant and an emulsifier. contains. Since the surface treatment liquid is not adjusted for pH, it is considered that the surface treatment is performed at pH 8.8 to 8.9. When used in a connector, it provides lubricity as well as preventing discoloration. However, the effect of preventing discoloration is not sufficient, and the heat resistance is not sufficient.
- a light emitting diode (LED) device is a diode that emits light by flowing a forward current through a pn junction of a semiconductor and recombining electrons and holes in the junction region, and has a simple structure and directly emits electric energy. Since it is converted into energy, conversion efficiency and reliability are high, and it has already been widely put into practical use. In recent years, the use of white light-emitting diodes has attracted attention as a new light source and lighting fixture to replace incandescent and fluorescent lamps from the viewpoint of energy saving and environmental conservation.
- This light-emitting diode device is designed such that a pedestal of a lead frame is processed, an LED chip is placed at a position surrounded by a reflective portion, and light emitted from the LED chip is efficiently extracted by the reflective portion. Further, the LED chip is sealed with a resin such as an epoxy resin as necessary.
- This light-emitting diode device has been put into practical use as a light source, but has various problems to be improved.
- One of them is a problem of improving the reflectance of the reflecting portion.
- silver, aluminum, or a gold film is known as a material having excellent light reflectance (Patent Documents 3 and 4).
- silver is known as the most suitable material as a reflecting material because of high glossiness and reflectance.
- JP-A-5-311492 Japanese Patent Laid-Open No. 9-249977 JP 2005-56941 A JP-A-9-293904
- the present invention has a high effect of preventing discoloration even when exposed to heat treatment in an LED manufacturing process or the like and a high-temperature sensation environment given at the time of use, has excellent wire bonding characteristics, and does not deteriorate reflectance due to surface treatment. It aims at providing a surface treating agent.
- the present invention A group consisting of a benzotriazole compound represented by the following general formula (1), a mercaptobenzothiazole compound represented by the following general formula (2), and a triazine compound represented by the following general formula (3) as an inhibitor
- a metal surface treatment agent wherein one or two or more compounds selected from the above are dissolved or dispersed in water and the pH is adjusted to 4-7.
- R 1 represents hydrogen, a substituted or unsubstituted alkyl group
- R 2 represents an alkali metal, hydrogen, a substituted or unsubstituted alkyl group.
- R 3 represents an alkali metal or hydrogen.
- R 4 represents —SH, an amino group substituted with an alkyl group, an alkenyl group or an aryl group, or an alkyl-substituted imidazolylalkyl group
- R 5 and R 6 represent —NH 2 , —SH or —SM (M Represents an alkali metal).
- the surface of the metal treated with the surface treating agent is heat-treated at 200 ° C. for 10 minutes, and is further excellent in anti-discoloration property even after heat treatment at 120 ° C. for 6 hours.
- the base material which has a metal on the surface as described in said (5).
- the metal surface treated with the surface treating agent of the present invention has a high anti-discoloration effect even after heat treatment, is excellent in wire bonding characteristics, and does not deteriorate reflectance due to the surface treatment.
- the surface treatment agent of the present invention is water-soluble and does not contain an organic solvent or heavy metal, so that it is excellent in safety and does not cause unevenness in processing or poor appearance of spots. Further, the contact resistance is low and the solder wettability is also good.
- the inhibitor contained in the surface treatment agent of the present invention is selected from one or more of the following compounds, that is, benzotriazole compounds, mercaptobenzothiazole compounds, and triazine compounds. These inhibitors react with the metal to form a thin protective film on the metal surface, and the inside of the metal is protected by this film. As a result, the corrosion resistance (discoloration resistance) of the metal surface is improved.
- the benzotriazole-based compound used in the present invention has the general formula (1) (In the formula, R 1 represents hydrogen, a substituted or unsubstituted alkyl group, and R 2 represents an alkali metal, hydrogen, a substituted or unsubstituted alkyl group.) It is represented by
- the substituted or unsubstituted alkyl group represented by R 1 is preferably an alkyl group having 1 to 24 carbon atoms, and the substituted or unsubstituted alkyl group represented by R 2 also has 1 to 24 carbon atoms.
- R 1 is preferably an alkyl group having 1 to 24 carbon atoms
- R 2 also has 1 to 24 carbon atoms.
- an amino group, a mercapto group, a hydroxyl group etc. are preferable.
- the amino group may be substituted with an alkyl group having 1 to 24 carbon atoms.
- Preferred examples of the compound represented by the general formula (1) include, for example, benzotriazole (both R 1 and R 2 are hydrogen), 1-methylbenzotriazole (R 1 is hydrogen, R 2 is methyl), tolyl Triazole (R 1 is methyl, R 2 is hydrogen), 1- (N, N-dioctylaminomethyl) benzotriazole (R 1 is hydrogen, R 2 is N, N-dioctylaminomethyl) and the like.
- the mercaptobenzothiazole compound used in the present invention has the general formula (2) (In the formula, R 3 represents an alkali metal or hydrogen.) It is represented by Preferred examples of the compound represented by the general formula (2) include mercaptobenzothiazole, mercaptobenzothiazole sodium salt, mercaptobenzothiazole potassium salt, and the like. In the general formula (2), when R 3 is an alkali metal, the mercaptobenzothiazole compound is easily dissolved in water.
- Triazine compounds are represented by the general formula (3) [Wherein R 4 represents —SH, an amino group substituted with an alkyl group, an alkenyl group or an aryl group, or an alkyl-substituted imidazolylalkyl group; R 5 and R 6 represent —NH 2 , —SH or —SM (M Represents an alkali metal). ] It is represented by In the general formula (3), the alkyl group or alkenyl group which is a substituent of the amino group represented by R 4 is preferably an alkyl group or alkenyl group having 1 to 24 carbon atoms, and the aryl group is preferably a phenyl group.
- Preferred examples of the compound represented by the general formula (3) include the following.
- alkali metal salts such as Na or K.
- R 5 and R 6 are —SM, the triazine compound is easily dissolved in water.
- Inhibitors are dissolved or dispersed in water.
- the amount of the inhibitor added is in the range of 0.001 to 1 wt%, and more preferably 0.001 to 0.1 wt%. If it is less than 0.001 wt%, no treatment effect is observed, and if it exceeds 1 wt%, an adverse effect on contact resistance is observed.
- Pure water is preferably used, and the pH is adjusted to 4 to 7 after dissolving or dispersing the inhibitor.
- the pH adjuster it is preferable to use organic acids such as phosphoric acid, acetic acid, citric acid, tartaric acid, oxalic acid, malic acid, and succinic acid.
- organic acids such as phosphoric acid, acetic acid, citric acid, tartaric acid, oxalic acid, malic acid, and succinic acid.
- the pH is low, the effect of preventing discoloration is increased, but the stability of the liquid is deteriorated. In addition, the solubility of the inhibitor also deteriorates.
- the pH is 4 to 7, and more preferably 5 to 6.
- the surface treatment agent of the present invention may contain a surfactant for the purpose of dissolving the inhibitor in an aqueous solution, increasing the wettability of the metal surface to facilitate the penetration of the solution, and cleaning the metal surface. it can.
- the surface treatment agent of the present invention can contain a dissolution aid for the purpose of dissolving the inhibitor in an aqueous solution.
- a surfactant a natural alcohol surfactant is preferable because it is excellent in biodegradability and has little adverse effect on the environment. Alkylphenol ethylene oxide adducts and higher alcohol ethylene oxide adducts, which are less decomposed by acid or alkali, can be preferably used.
- ethylene glycol ethers such as methyl glycol, isopropyl glycol and butyl glycol
- propylene glycol ethers such as methyl propylene glycol, propyl propylene glycol and butyl propylene glycol can be preferably used.
- a pH buffer agent is mentioned as a component which may be further contained.
- the pH buffer serves to keep the pH of the solution constant and to control the adsorptivity of the inhibitor.
- Examples of the pH buffer include sodium hydrogen phosphate, acetic acid, sodium acetate, citric acid, sodium citrate, tartaric acid, sodium tartrate and the like. In view of cost, ease of use, etc., citric acid, sodium acetate and the like are preferable.
- the surface treating agent of the present invention does not contain a lubricant.
- a surface treatment agent used for connector applications that are connection parts for electronic equipment, it is necessary to impart lubricity to the metal surface, and the lubricant is included, but this is not used for connectors but for LED reflectors, etc.
- the surface treating agent of the present invention does not need to be provided with lubricity, and does not contain a lubricant because it may adversely affect wire bonding characteristics.
- the treatment method may be any method such as immersing the material to be treated in the surface treatment agent, spraying or applying the surface treatment agent, but immersion is preferred.
- immersion conditions the immersion may be performed at a temperature of 15 to 60 ° C. for 5 seconds or longer, for example, 5 seconds to 1 minute, and then washed with water and dried. By washing with water, appearance defects such as processing unevenness and stains are eliminated.
- the material to be treated is a base material having a metal on the surface
- the metal include silver, silver alloy, copper, brass, phosphor bronze, and iron.
- it can be suitably used as a surface treatment agent for silver and silver alloys that are easily discolored.
- the silver alloy include alloys of silver and gold, platinum, copper, palladium, indium, tin, zinc, ruthenium, rhodium, bismuth and the like.
- the film which consists of a surface treating agent is formed in the metal surface by processing the base material which has a metal on the surface using the surface treating agent of this invention.
- the surface treating agent of the present invention is an aqueous solution, and does not contain an organic solvent or heavy metal, and thus is excellent in safety.
- a metal surface having a film made of a surface treatment agent obtained by treatment with the surface treatment agent of the present invention has only excellent anti-discoloration properties after, for example, heat treatment at 200 ° C. for 10 minutes and heat treatment at 120 ° C. for 6 hours.
- the contact resistance is low, the solder wettability is good, the wire bonding characteristics are excellent, and the reflectance is not deteriorated by the surface treatment. Therefore, the metal surface treatment agent of the present invention can be suitably used as a surface treatment agent for a reflective material of an LED having silver or a silver alloy on its surface.
- Example 1 As a substrate to be treated, a pure copper substrate having a silver plating thickness of 4 ⁇ m was used, immersed in a surface treatment agent having the following composition at 40 ° C. for 30 seconds, then washed with water, and dried with warm air using a dryer. Surface treatment was performed.
- Triazine-2,4,6-trithiol 0.01 wt%
- Surfactant Oleyl alcohol ethoxylate 0.01 wt%
- Dissolving aid 1% by weight of butyl propylene glycol pH buffer: Sodium hydrogen phosphate 1wt% Using phosphoric acid as a pH adjuster and adjusting to pH 5.5
- the base material after the surface treatment of Example 1 was subjected to a hydrogen sulfide gas test (hydrogen sulfide concentration: 3 ppm, temperature: based on JIS H8502) without heat treatment. 40 ° C., humidity: 80% RH, test time: 4 hours), and the appearance was visually observed.
- Examples 2-8, Comparative Examples 1-8 Surface of the substrate to be treated in the same manner as in Example 1 except that the inhibitors and pH buffers in Example 1 were changed to the compounds and concentrations shown in Table 1 and the pH was changed to the values shown in Table 1 using phosphoric acid. The treatment was performed and evaluated in the same manner as in Example 1. The results are shown in Table 1.
- contact resistance was measured at a DC of 7.4 mA, an open-circuit voltage of 20 mV, and a load of 2.5 to 50 g.
- the criteria for determining contact resistance are as follows. ⁇ : Contact resistance is less than 0.02 ⁇ ⁇ : Contact resistance is 0.02 ⁇ or more (2) Solder wettability Solder wettability is 265 ° C in a tin-silver-copper alloy solder bath. The time required to reach 0 was measured and evaluated. The heat treatment was performed at 200 ° C. for 10 minutes and then at 120 ° C.
- the criteria for determining solder wettability are as follows. ⁇ : Time required for buoyancy to become less than 0.2 seconds ⁇ : Time required for buoyancy to become 0 or more 0.2 seconds (3) Wire bonding characteristics Wire bonding characteristics are gold wire After bonding, the wire was pulled at 500 ⁇ m / sec and cut, and evaluated at the cutting position of the wire. The criteria for judging wire bonding characteristics are as follows. ⁇ : Wire cut ⁇ : Peeled at the bonding surface between the wire and the sample (4) Reflectance The reflectance was evaluated by measuring the reflectance at 450 to 900 nm of the sample before and after the heat treatment with an ultraviolet-visible spectrophotometer. The heat treatment was performed at 200 ° C.
- the criteria for determining the reflectance are as follows. ⁇ : The reflectivity is 90% or more at 450 to 900 nm. X: Wavelength with a reflectance of less than 90% exists at 450 to 900 nm.
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Abstract
Description
近年、省エネルギー、延いては環境保全の観点からこれまでの白熱電球や蛍光灯に代わる新たな光源、照明器具として白色光発光ダイオードの利用が注目されている。
この発光ダイオードデバイスは、リードフレームの台座を加工し、反射部に囲まれた位置にLEDチップを載置し、LEDチップの発光を反射部で効率的に取り出す設計となっている。また必要に応じて前記LEDチップをエポキシ樹脂等の樹脂により封止する構成となっている。
これまで光反射率の優れた材料としては銀やアルミニウム、あるいは金の皮膜が有用な材料として知られている(特許文献3、4)。中でも銀は光沢度、反射率が高く反射材として最も好適な材料として知られている。
しかし、銀皮膜の光反射性能の改善、あるいは酸化による変色、特に高温環境下での変色による光反射性能の低下に対する対策については、まだ有効な技術開発がなされておらず、特に車載用、照明用等に用いられる高輝度が要求される白色光源としての利用促進に資する上でこうした改善が要望されている。
即ち、LED製造工程等での加熱処理や、使用時に与えられる高温環境下に曝されても変色防止効果が高く、ワイヤーボンディング特性に優れ、表面処理による反射率の劣化がない表面処理剤が要望されている。
すなわち本発明は、
(1)インヒビターとして下記一般式(1)で示されるベンゾトリアゾール系化合物、下記一般式(2)で示されるメルカプトベンゾチアゾール系化合物、及び下記一般式(3)で示されるトリアジン系化合物からなる群から選ばれた1種もしくは2種以上の化合物を水に溶解または分散させ、pHを4~7に調整したことを特徴とする金属の表面処理剤。
(2)更に界面活性剤を含有することを特徴とする前記(1)記載の金属の表面処理剤。
(3)前記金属が、銀または銀合金であることを特徴とする前記(1)又は(2)記載の金属の表面処理剤。
(4)表面に銀または銀合金を有するLED反射材に用いることを特徴とする前記(1)~(3)のいずれかに記載の金属の表面処理剤。
(5)前記(1)~(3)のいずれかに記載の金属の表面処理剤を用いて処理されたことを特徴とする表面に金属を有する基材。
(6)前記表面処理剤を用いて処理された金属の表面は、200℃で10分間の熱処理を行い、更に120℃で6時間の熱処理を行った後も変色防止性に優れることを特徴とする前記(5)記載の表面に金属を有する基材。
(7)前記基材が表面に銀または銀合金を有するLED反射材であることを特徴とする前記(5)又は(6)に記載の表面に金属を有する基材。
この一般式(1)で表わされる化合物のうち好ましいものを挙げると、例えば、ベンゾトリアゾール(R1,R2とも水素)、1-メチルベンゾトリアゾール(R1が水素、R2がメチル)、トリルトリアゾール(R1がメチル、R2が水素)、1-(N,N-ジオクチルアミノメチル)ベンゾトリアゾール(R1が水素、R2がN,N-ジオクチルアミノメチル)などである。
で表わされる。
この一般式(2)で表わされる化合物のうち好ましいものを挙げると、例えばメルカプトベンゾチアゾール、メルカプトベンゾチアゾールのナトリウム塩、メルカプトベンゾチアゾールのカリウム塩などがある。一般式(2)においてR3がアルカリ金属の場合メルカプトベンゾチアゾール系化合物の水への溶解が容易となる。
で表わされる。
一般式(3)中のR4が表すアミノ基の置換基である前記アルキル基、又はアルケニル基としては炭素数1~24のアルキル基、アルケニル基が好ましく、アリール基としてはフェニル基が好ましい。
pHが低いと変色防止効果が高くなるが、液の安定性が悪くなる。また、インヒビターの溶解性も悪くなる。逆にpHが高いと液の安定性はよくなるが、変色防止効果が低くなる。変色防止効果と液の安定性から、pHは4~7であり、pH5~6がより好ましい。
界面活性剤としては、天然アルコール系界面活性剤が、生分解性に優れ、環境に対する悪影響が少ないため好ましい。酸やアルカリでの分解が少ないアルキルフェノールエチレンオキシド付加物や高級アルコールエチレンオキシド付加物を好ましく用いることができる。
溶解助剤としては、メチルグリコール、イソプロピルグリコール、ブチルグリコールなどのエチレングリコール系エーテルや、メチルプロピレングリコール、プロピルプロピレングリコール、ブチルプロピレングリコールなどのプロピレングリコールエーテル系等を好ましく用いることができる。
pH緩衝剤は、溶液のpHを一定にし、インヒビターの吸着性をコントロールする働きをする。pH緩衝剤としてはリン酸水素ナトリウム、酢酸、酢酸ナトリウム、クエン酸、クエン酸ナトリウム、酒石酸、酒石酸ナトリウム等が挙げられる。コスト、使いやすさ等を考慮すると、クエン酸、酢酸ナトリウム等が好ましい。
本発明の表面処理剤は潤滑剤を含有しない。電子機器用接続部品であるコネクター用途に用いる表面処理剤の場合は、金属表面に潤滑性を付与することが必要であり潤滑剤を含有させるが、コネクタ用途ではなく、LED反射材等に用いる本発明の表面処理剤は、潤滑性付与する必要がなく、又潤滑性を付与することでワイヤーボンディング特性に悪影響を与える可能性があるので、潤滑剤を含有しない。
水洗することにより、処理ムラやシミ等の外観不良がなくなる。
このように本発明の表面処理剤を用いて表面に金属を有する基材を処理することにより、金属表面に表面処理剤からなる皮膜が形成される。
したがって本発明の金属の表面処理剤は、表面に銀または銀合金を有するLEDの反射材の表面処理剤として好適に用いることができる。
実施例1
被処理基材として、純銅基板に4μmの厚さの銀メッキを行ったものを用い、以下に示す組成の表面処理剤に40℃で30秒浸漬し、その後水洗し、ドライヤーにより温風乾燥させ、表面処理を行った。
表面処理剤組成
インヒビター:トリアジン-2,4,6-トリチオール
0.01wt%
界面活性剤:オレイルアルコールエトキシレート 0.01wt%
溶解助剤:ブチルプロピレングリコール 1wt%
pH緩衝剤:リン酸水素ナトリウム 1wt%
pH調整剤としてリン酸を用い、pH5.5に調整
実施例1の表面処理後の基材について、熱処理をしないで、JIS H 8502に基づき、硫化水素ガス試験(硫化水素濃度:3ppm、温度:40℃、湿度:80%RH、試験時間:4時間)を行い、外観の肉眼観察を行った。また、熱風循環式乾燥機で200℃×10分間の加熱処理を行った後に更に120℃×6時間の加熱処理を行い、加熱処理後の基材について熱処理しない場合と同様の硫化水素ガス試験を行い、外観の肉眼観察を行った。
評価基準
○:肉眼観察にて、めっき表面の変色なし
△:肉眼観察にて、めっき表面が薄い青色に変色
×:肉眼観察にて、めっき表面が濃い青黒色に変色
結果を表1に示す。
実施例1におけるインヒビター及びpH緩衝剤を表1記載の化合物及び濃度に変更し、pHをリン酸を用いて表1に示す値とした以外は実施例1と同様にして被処理基材の表面処理を行い、実施例1と同様に評価した。
結果を表1に示す。
(1)接触抵抗
接触抵抗は直流7.4mA、開放電圧20mV、荷重2.5~50gで測定した。接触抵抗の判断基準は以下の通りである。
○:接触抵抗が0.02Ω未満
×:接触抵抗が0.02Ω以上
(2)はんだ濡れ性
はんだ濡れ性は265℃の錫-銀-銅合金のはんだ槽に熱処理前後のサンプルを漬け、浮力が0になるまでに要した時間を測定して評価した。熱処理は200℃で10分間の後、更に120℃で6時間行った。はんだ濡れ性の判断基準は以下の通りである。
○:浮力が0になるまでに要した時間が0.2秒未満
×:浮力が0になるまでに要した時間が0.2秒以上
(3)ワイヤーボンディング特性
ワイヤーボンディング特性は金線のワイヤーを接合した後にワイヤーを500μm/秒で引っ張って切断し、ワイヤーの切断位置で評価した。ワイヤーボンディング特性の判断基準は以下の通りである。
○:ワイヤーが切断
×:ワイヤーとサンプルの接合面で剥離
(4)反射率
反射率は熱処理前後のサンプルの450~900nmでの反射率を紫外可視分光光度計で測定することで評価した。また、熱処理は200℃で10分間の後、更に120℃で6時間行った。反射率の判断基準は以下の通りである。
○:450~900nmですべて反射率が90%以上である。
×:450~900nmで反射率が90%未満の波長が存在する。
Claims (7)
- インヒビターとして下記一般式(1)で示されるベンゾトリアゾール系化合物、下記一般式(2)で示されるメルカプトベンゾチアゾール系化合物、及び下記一般式(3)で示されるトリアジン系化合物からなる群から選ばれた1種もしくは2種以上の化合物を水に溶解または分散させ、pHを4~7に調整したことを特徴とする金属の表面処理剤。
(式中、R1は水素、置換又は無置換のアルキル基を表わし、R2はアルカリ金属、水素、置換又は無置換のアルキル基を表わす。)
(式中、R3はアルカリ金属又は水素を表わす。)
〔式中、R4は-SH、アルキル基,アルケニル基又はアリール基で置換されたアミノ基、又はアルキル置換イミダゾリルアルキル基を、R5、R6は-NH2、-SH又は-SM(Mはアルカリ金属を表わす)を表わす。〕 - 更に界面活性剤を含有することを特徴とする請求項1記載の金属の表面処理剤。
- 前記金属が、銀または銀合金であることを特徴とする請求項1又は2記載の金属の表面処理剤。
- 表面に銀または銀合金を有するLED反射材に用いることを特徴とする請求項1~3のいずれかに記載の金属の表面処理剤。
- 請求項1~3のいずれかに記載の金属の表面処理剤を用いて処理されたことを特徴とする表面に金属を有する基材。
- 前記表面処理剤を用いて処理された金属の表面は、200℃で10分間の熱処理を行い、更に120℃で6時間の熱処理を行った後も変色防止性に優れることを特徴とする請求項5記載の表面に金属を有する基材。
- 前記基材が表面に銀または銀合金を有するLED反射材であることを特徴とする請求項5又は6に記載の表面に金属を有する基材。
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CN113403652B (zh) * | 2021-06-17 | 2022-01-14 | 深圳市联合蓝海黄金材料科技股份有限公司 | 保护膜电解液、镀金银饰及其制备方法 |
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JPH09249977A (ja) * | 1996-03-13 | 1997-09-22 | Nikko Kinzoku Kk | 銀めっき材の表面処理液およびそれを用いる表面処理方法 |
JP2007266343A (ja) * | 2006-03-29 | 2007-10-11 | Toyoda Gosei Co Ltd | 発光装置 |
JP2008045215A (ja) * | 1999-01-25 | 2008-02-28 | Chemical Denshi:Kk | 金属表面処理剤及び金属層の表面処理方法 |
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JP2550436B2 (ja) * | 1990-10-23 | 1996-11-06 | 株式会社ジャパンエナジー | 銅の変色防止液 |
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JP2007266349A (ja) * | 2006-03-29 | 2007-10-11 | Matsushita Electric Ind Co Ltd | 半導体装置用導電部材、半導体装置用パッケージおよびそれらの製造方法 |
JP2009120437A (ja) * | 2007-11-14 | 2009-06-04 | Niigata Univ | シロキサンをグラフト化したシリカ及び高透明シリコーン組成物並びに該組成物で封止した発光半導体装置 |
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JPH09249977A (ja) * | 1996-03-13 | 1997-09-22 | Nikko Kinzoku Kk | 銀めっき材の表面処理液およびそれを用いる表面処理方法 |
JP2008045215A (ja) * | 1999-01-25 | 2008-02-28 | Chemical Denshi:Kk | 金属表面処理剤及び金属層の表面処理方法 |
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TW201134982A (en) | 2011-10-16 |
TWI537422B (zh) | 2016-06-11 |
CN102713007A (zh) | 2012-10-03 |
JP5995305B2 (ja) | 2016-09-21 |
JPWO2011089943A1 (ja) | 2013-05-23 |
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