WO2010090184A1 - 位相型回折素子、その製造方法、および撮像装置 - Google Patents
位相型回折素子、その製造方法、および撮像装置 Download PDFInfo
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- WO2010090184A1 WO2010090184A1 PCT/JP2010/051429 JP2010051429W WO2010090184A1 WO 2010090184 A1 WO2010090184 A1 WO 2010090184A1 JP 2010051429 W JP2010051429 W JP 2010051429W WO 2010090184 A1 WO2010090184 A1 WO 2010090184A1
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- liquid crystal
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Images
Classifications
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- G—PHYSICS
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/46—Systems using spatial filters
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
Definitions
- the present invention relates to a phase-type diffractive element used as a low-pass filter for an imaging element or the like in which a large number of light-receiving pixels are periodically formed, such as a charge coupled (CCD) element or a complementary metal oxide semiconductor (CMOS) element.
- CMOS complementary metal oxide semiconductor
- the present invention relates to an image pickup apparatus using the diffraction element.
- an image pickup optical system using an image pickup element such as a CCD element or a CMOS element
- a color light component (moire) different from light generated by a subject accompanying generation of a pseudo signal is generated.
- an optical low-pass filter that limits a high spatial frequency component of subject light is used.
- an optical low-pass filter a birefringent type using separation of an ordinary ray and an extraordinary ray in a birefringent material is often used.
- the most widely used birefringent optical low-pass filter material is an inorganic crystal such as quartz or lithium niobate.
- a birefringent optical low-pass filter using an inorganic crystal is formed into a plate shape by synthesizing a single crystal and performing post-processing such as cutting and polishing. For this reason, there is a drawback that a great deal of time and labor is required for production.
- a photoreactive liquid crystal composition as a material for a birefringent low-pass filter.
- a photoreactive liquid crystal composition it is possible to form a thin film of a photoreactive liquid crystal composition and polymerize the liquid crystal mesogen in a state where the liquid crystal mesogen is inclined obliquely from the normal direction of the thin film to obtain desired optical characteristics, for example, Japanese Patent No. 3592383. It is described in. Alternatively, it is described in, for example, Japanese Patent Application Laid-Open No. 2007-93918, to obtain desired optical characteristics by polymerizing in a state in which the inclination angle from the normal direction of the mesogen is continuously changed in the thickness direction of the thin film. Yes.
- a diffraction grating type element using light separation by diffraction in addition to a method of separating light by birefringence, a diffraction grating type element using light separation by diffraction is also widely used.
- the most common type of diffraction grating type low pass filter is a phase type diffraction element.
- a plate having a periodic concavo-convex shape is formed on the surface using a transparent material such as a resin, and the difference in light phase between the concave portion and the convex portion.
- a phase type diffraction grating using irregularities tends to cause a shadow of the grating because the element surface is not flat.
- a transparent substrate having a front surface and a back surface;
- a solidified liquid crystal layer comprising a continuous film provided on the surface of the transparent substrate and including at least a liquid crystal compound;
- the solidified liquid crystal layer is composed of a first region and a second region formed periodically, The first region is optically anisotropic, the second region is optically isotropic, An in-plane average refractive index is different between the first region and the second region, and a phase type diffraction element is provided.
- an imaging apparatus having at least an imaging element in which a large number of light receiving pixels are periodically formed and using the above-described phase type diffraction element as a low-pass filter.
- the method includes forming a solidified liquid crystal layer on the surface of the transparent substrate directly or via another layer, and forming the solidified liquid crystal layer includes: Forming a liquid crystal material layer containing a photopolymerizable or photocrosslinkable thermotropic liquid crystal compound on the transparent substrate, the mesogen of the thermotropic liquid crystal compound having a predetermined alignment structure; and A part of the liquid crystal material layer is exposed to a first region including a reaction product in which the thermotropic liquid crystal compound is polymerized or cross-linked in the liquid crystal material layer, and the reaction product does not include the reaction product.
- thermotropic liquid crystal compound of: An exposure step of forming a second region containing the thermotropic liquid crystal compound of: Thereafter, the liquid crystal material layer is heated to a temperature equal to or higher than a phase transition temperature at which the thermotropic liquid crystal compound changes from a liquid crystal phase to an isotropic phase, so that a mesogen of the unreacted thermotropic liquid crystal compound in the second region is obtained.
- a high-quality phase-type diffraction element can be realized that can be easily and stably manufactured.
- an imaging apparatus using such a phase type diffraction element as a low-pass filter is realized.
- FIG. 1 is a schematic configuration diagram illustrating an optical system of an imaging device according to one embodiment of the present invention.
- the perspective view which shows schematically the part of the diffraction element concerning 1 aspect of this invention.
- FIG. 3 is a sectional view taken along line II of an example of the diffraction element shown in FIG. 2.
- Sectional drawing along the II line of the other example of the diffraction element shown in FIG. Sectional drawing along the II line of the other example of the diffraction element shown in FIG.
- Schematic shows the part of the diffraction element concerning the other aspect of this invention.
- the schematic diagram which shows the mode of isolation
- FIG. 1 is a schematic configuration diagram illustrating an optical system of an imaging apparatus according to an aspect of the present invention.
- the diffractive element 1 is arranged between the imaging element 10 in which a large number of light receiving pixels are periodically formed and the imaging lens 11.
- the diffractive element 1 includes at least a solidified liquid crystal layer that functions as a diffraction grating and a transparent substrate that supports the solidified liquid crystal layer.
- the diffractive element 1 can be arbitrarily installed as long as desired characteristics can be obtained as a low-pass filter. This is because it is easy to adjust the gap between the solidified liquid crystal layer acting as a diffraction grating and the imaging device to a predetermined value, and it is easy to use the transparent substrate as a protective layer.
- FIG. 2 is a perspective view schematically showing a part of the diffraction element according to one embodiment of the present invention.
- the illustrated diffraction element 1 includes a transparent substrate 2 and a solidified liquid crystal layer 3 formed on the surface.
- the transparent substrate 2 is typically a light transmissive substrate such as a glass plate or a resin plate.
- a material of the glass plate for example, soda lime glass, low alkali borosilicate glass or non-alkali aluminoborosilicate glass can be used.
- a material for the resin plate for example, polycarbonate, polymethyl methacrylate, or polyethylene terephthalate can be used.
- the transparent substrate 2 does not necessarily have to be hard.
- a light transmissive film such as a plastic film or a light transmissive sheet such as a plastic sheet may be used.
- the solidified liquid crystal layer 3 is a continuous film formed using a material containing at least a liquid crystal compound, and includes a first region 3a and a second region 3i that are periodically formed.
- the first region 3a and the second region 3i are arranged in a stripe shape, but the present invention is not limited to this.
- the first region and the second region may be arranged to form a checkered pattern.
- the first region 3a is optically anisotropic
- the second region 3i is optically isotropic.
- the anisotropic region (first region) 3a and the isotropic region (second region) 3i are apparent refraction for the light 12 incident on the film surface from the normal direction.
- the refractive index that is, the in-plane average refractive index is different.
- the apparent refractive index is the same at the same position on the film surface regardless of the polarization component of the light 12 or the polarization state of the light 12.
- Both the first region 3a and the second region 3i that is, any region over the entire surface of the solidified liquid crystal layer 3, is substantially isotropic in the in-plane direction, in other words, substantially has an in-plane birefringence index. It is preferable not to have it. “Substantially free” refers to a state where the in-plane retardation ⁇ nd obtained by the product of the film thickness d of the solidified liquid crystal layer 3 and the in-plane refractive index ⁇ n is less than 10 nm.
- the film has anisotropy in the in-plane direction while having anisotropy in the thickness direction over the entire surface.
- the apparent refractive index is the same in any polarization state.
- the in-plane average refractive index is different between the optically isotropic region 3i and the anisotropic region 3a. Due to the difference in the in-plane average refractive index, a phase difference occurs in the solidified liquid crystal layer 3 with respect to the incident light 12 in both regions. By arranging these two regions periodically, the solidified liquid crystal layer 3 functions as a phase type diffraction grating.
- the solidified liquid crystal layer 3 has optical properties equivalent to any polarization component of the incident light 12.
- the phase difference given by both regions with respect to the incident light 12 is approximately 1 ⁇ 2 with respect to the wavelength of the light beam, the diffraction element of the present embodiment has the highest characteristics.
- the thickness of the solidified liquid crystal layer 3 is about 1 to 30 ⁇ m.
- the optically anisotropic region 3a of the solidified liquid crystal layer 3 may have any structure as long as the in-plane average refractive index is different from the isotropic region 3i. Examples thereof are schematically shown in FIGS. 3 to 5 correspond to cross-sectional views taken along line II of the diffraction element shown in FIG.
- the liquid crystal compound contained in the solidified liquid crystal layer 3 is a rod-like liquid crystal.
- the mesogens in the anisotropic region 3a are fixed in homeotropic orientation (case 1).
- mesogens in the anisotropic region 3a are immobilized in a cholesteric orientation (case 2).
- the liquid crystal compound contained in the solidified liquid crystal layer 3 is a disk-like liquid crystal, and mesogens in the anisotropic region 3a are fixed in homeotropic alignment (case 3).
- the optically anisotropic region 3a has a smaller in-plane average refractive index than the isotropic region 3i. For this reason, it works to advance the phase of the incident light 12.
- the optically anisotropic region 3a has an in-plane average refractive index larger than that of the isotropic region 3i, so that the incident light 12 It works to delay the phase.
- the periodic structure formed in the solidified liquid crystal layer does not necessarily have a one-dimensional shape. Rather, it is preferable that the optically isotropic region 3i and the anisotropic region 3a are arranged in a two-dimensional shape such as a checkered pattern. In this case, it is because it conforms to the structure of the image sensor in which the light receiving elements are usually arranged in a two-dimensional shape.
- the grating formed of the isotropic region 3i and the anisotropic region 3a is a diffractive element substrate so that the incident light 12 can be separated according to the arrangement of the light receiving pixels of the image sensor in the vertical and horizontal directions. It is more preferable to arrange them at an angle of about 45 ° than to arrange them in the vertical and horizontal directions.
- FIG. 6 partially shows one embodiment of the diffraction element having the solidified liquid crystal layer 3 having such an arrangement.
- the diffractive element of this embodiment is used as a low-pass filter suitable for an imaging element in which a large number of light receiving pixels are periodically formed, it is formed by an optically isotropic region 3i and an anisotropic region 3a.
- the period to be applied is preferably 20 ⁇ m or more.
- the “period” refers to the length of a set of both areas in the direction in which the areas 3a and 3i are repeatedly arranged. That is, as shown in FIG. 2, when two regions are arranged in a stripe shape, it means the sum of the width of the region 3a and the width of the region 3i.
- two areas are arranged in a checkered pattern as shown in FIG. 6, it means the sum of the length of one side of the area 3a and the length of one side of the area 3i.
- the pitch of the light receiving pixels in the image sensor is usually formed with a period of 10 ⁇ m or less.
- the period of the region provided in the diffraction element is less than 20 ⁇ m, the light separation width becomes too large with respect to the pitch of the light receiving pixels of such an image sensor.
- FIG. 7 is a cross-sectional view showing how the incident light 12 is separated.
- a separated diffracted light 13 is generated.
- FIG. 8 is a schematic view showing how light is separated.
- FIG. 8A shows a case where a lattice composed of an isotropic region 3i and an anisotropic region 3a is arranged vertically and horizontally, and FIG. 8B shows these two regions. Will be shown in a case where is arranged at approximately 45 °.
- the diffractive element according to one embodiment of the present invention has an in-plane average refractive index that is different between the optically isotropic region 3i and the anisotropic region 3a of the solidified liquid crystal layer 3. 12 is intended to provide a phase difference in both regions. It is not necessary to make the film thickness different between the isotropic region 3i and the anisotropic region 3a, that is, the solidified liquid crystal layer 3 can have a uniform thickness over the entire surface. Of course, the film thickness may be different between the isotropic region 3i and the anisotropic region 3a. However, from the viewpoint of not casting a shadow of the grating on the image sensor, the difference in film thickness between the two regions is It is preferably as small as possible, and more preferably no difference in film thickness.
- an antireflection film may be formed on the surface (back surface) of the transparent substrate 2 where the solidified liquid crystal layer 3 is not formed.
- the antireflection film reduces unnecessary reflected light on the substrate surface, and when the diffractive element of this embodiment is incorporated into the imaging device, the reflected light further causes irregular reflection inside the imaging device, thereby improving the image quality on the imaging device. Decreasing can be suppressed.
- an antistatic film may be provided on the surface of the solidified liquid crystal layer 3 opposite to the transparent substrate 2. With the antistatic film, it is possible to prevent the solidified liquid crystal layer 3 from being charged and to suppress the adhesion of unwanted foreign matter.
- the antistatic film is obtained by forming a conductive thin film such as indium tin oxide on the solidified liquid crystal layer 3.
- the solidified liquid crystal layer 3 is formed, for example, by forming a liquid crystal material layer containing a photopolymerizable or photocrosslinkable thermotropic liquid crystal material on the transparent substrate 2 and subjecting the liquid crystal material layer to pattern exposure and heat treatment. Get by.
- the liquid crystal material layer is obtained, for example, by applying a liquid crystal solution containing a thermotropic liquid crystal compound and a solvent on the transparent substrate 2 and drying the coating film as necessary.
- the mesogen of the thermotropic liquid crystal compound has a predetermined orientation.
- thermotropic liquid crystal compounds examples include alkylcyanobiphenyl, alkoxybiphenyl, alkylterphenyl, phenylcyclohexane, biphenylcyclohexane, phenylbicyclohexane, pyrimidine, cyclohexanecarboxylic acid ester, halogenated cyanophenol ester, alkylbenzoic acid ester, alkylcyano.
- Examples of the solvent include cyclohexanone, ethyl cellosolve acetate, butyl cellosolve acetate, 1-methoxy-2-propyl acetate, diethylene glycol dimethyl ether, ethylbenzene, ethylene glycol diethyl ether, xylene, ethyl cellosolve, methyl-n-amyl ketone, propylene glycol monomethyl ether, Examples include toluene, methyl ethyl ketone, ethyl acetate, methanol, ethanol, isopropyl alcohol, butanol, isobutyl ketone, and petroleum solvents. These solvents can also be used alone or in combination.
- the liquid crystal solution includes, for example, chiral agents, resins, polyfunctional monomers and / or oligomers, photopolymerization initiators, sensitizers, thermal polymerization initiators, chain transfer agents, surfactants, polymerization inhibitors.
- components such as a storage stabilizer and an adhesion improver can be added as long as the composition containing the liquid crystal compound does not lose liquid crystallinity.
- the chiral agent is a low molecular compound having an optically active site, and mainly includes a compound having a molecular weight of 1500 or less.
- the chiral agent is used for the purpose of inducing a helical structure in the positive uniaxial nematic regularity exhibited by the polymerizable liquid crystal material exhibiting nematic regularity. If this purpose is achieved, the type of chiral agent is not particularly limited.
- Arbitrary compounds capable of inducing a desired helical structure without compromising the liquid crystallinity of the polymerizable liquid crystal compound, which are compatible with the polymerizable liquid crystal compound exhibiting nematic regularity in a solution state or a molten state. Can be used as a chiral agent.
- the chiral agent Since it is used for inducing a helical structure in liquid crystal, the chiral agent needs to have at least some chirality in the molecule. Therefore, as the chiral agent used here, for example, a compound having one or more asymmetric carbons, a compound having an asymmetric point on a heteroatom such as a chiral amine or a chiral sulfoxide, or the like Compounds having an optically active site having axial asymmetry such as cumulene and binaphthol are preferred. Specific examples include commercially available chiral nematic liquid crystals (for example, Paliocolor LC756 (manufactured by BASF), chiral dopant liquid crystal S-811 (manufactured by Merck), etc.).
- Paliocolor LC756 manufactured by BASF
- chiral dopant liquid crystal S-811 manufactured by Merck
- the chiral agent depends on the inductive force of the helical structure, the effect can be obtained if it is contained in an amount of about 2 to 30 parts by weight with respect to the thermotropic liquid crystal compound.
- thermoplastic resin either a thermoplastic resin or a thermosetting resin may be used.
- thermoplastic resin include butyral resin, styrene-maleic acid copolymer, chlorinated polyethylene, chlorinated polypropylene, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polyvinyl acetate, polyurethane resin, and polyester resin.
- thermosetting resins examples include epoxy resins, benzoguanamine resins, rosin-modified maleic acid resins, rosin-modified fumaric acid resins, melamine resins, urea resins, and phenol resins.
- a photosensitive resin may be used.
- photosensitive resins include linear polymers having reactive substituents such as hydroxyl groups, carboxyl groups, and amino groups, acrylic compounds having reactive substituents such as isocyanate groups, aldehyde groups, and epoxy groups, methacrylic compounds, and the like.
- a resin in which a photocrosslinkable group such as an acryloyl group, a methacryloyl group, and a styryl group is introduced into a linear polymer by reacting a compound or cinnamic acid can be used.
- a linear polymer containing an acid anhydride such as a styrene-maleic anhydride copolymer and an ⁇ -olefin-maleic anhydride copolymer is used as an acrylic compound or methacrylic compound having a hydroxyl group such as hydroxyalkyl acrylate and hydroxyalkyl methacrylate.
- a resin half-esterified with a compound can also be used.
- Examples of monomers and / or oligomers that are precursors of resins include 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, and polyethylene glycol diacrylate.
- liquid crystal material layer is cured by irradiating light such as ultraviolet rays, for example, a photopolymerization initiator is added to the liquid crystal solution.
- the photopolymerization initiator for example, the following compounds can be used. 4-phenoxydichloroacetophenone, 4-t-butyl-dichloroacetophenone, diethoxyacetophenone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2- Acetophenone series such as methyl-1 [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one Photopolymerization initiator, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin photopolymerization initiators such as benzyldimethyl ketal, benzophenone, benzoylbenzoic acid, benzoylbenzoic acid methyl, 4-phen
- Thioxanthone photopolymerization initiator 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6- Bis (trichloromethyl) -s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -s-triazine, 2-piperonyl-4,6-bis (trichloromethyl) -s-triazine, 2,4-bis (trichloromethyl) -6-styryl -S-triazine, 2- (naphth-1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxy-naphth-1-yl) -4,6-bis (trichloro) Triazine photopolymerization initiators such as methyl) -s-
- the photopolymerization initiator can be used alone or in admixture of two or more.
- the content thereof is preferably 0.1 to 30 parts by weight, more preferably 0.3 to 10 parts by weight with respect to 100 parts by weight of the liquid crystal compound in the liquid crystal solution.
- a sensitizer may be used together with the photopolymerization initiator.
- Sensitizers include ⁇ -acyloxy ester, acylphosphine oxide, methylphenylglyoxylate, benzyl, 9,10-phenanthrenequinone, camphorquinone, ethylanthraquinone, 4,4′-diethylisophthalophenone 3,3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone, and 4,4′-diethylaminobenzophenone can be used in combination.
- the sensitizer can be contained in an amount of 0.1 to 60 parts by weight with respect to 100 parts by weight of the photopolymerization initiator.
- thermal polymerization initiator examples include benzoyl peroxide (BPO), t-butylperoxy-2-ethylhexanate (PBO), di-t-butyl peroxide (PBD), and t-butylperoxyisopropyl carbonate ( PBI), peroxide initiators such as n-butyl-4,4-bis (t-butylperoxy) paralate (PIIV); 2,2′-azobisisobutyronitrile, 2,2′-azobis ( 2-methylbutyronitrile), 1,1′-azobis (cyclohexane-1 carbonitrile), 2,2′-azobis (2-methylpropane), 2,2′-azobis (2-methylbutane), 2,2 '-Azobis (2-methylpentane), 2,2'-azobis (2,3-dimethylbutane), 2,2'-azobis (2-methylhexane), 2,2' Azobis (2,4-dimethylpentane), 2,2'-azobis
- Thermal polymerization initiators can be used alone or in admixture of two or more.
- the content is preferably 0.01 to 5 parts by weight with respect to 100 parts by weight of the liquid crystal compound in the liquid crystal solution.
- the liquid crystal solution may further contain a chain transfer agent such as a polyfunctional thiol.
- a polyfunctional thiol is a compound having two or more thiol groups.
- examples of the polyfunctional thiol include hexanedithiol, decanedithiol, 1,4-butanediol bisthiopropionate, 1,4-butanediol bisthioglycolate, ethylene glycol bisthioglycolate, ethylene glycol bisthiopropioate.
- These polyfunctional thiols can be used alone or in admixture of two or more.
- the polyfunctional thiol can be used in an amount of 0.2 to 30 parts by weight, preferably 0.5 to 15 parts by weight with respect to 100 parts by weight of the liquid crystal compound in the liquid crystal solution.
- surfactant examples include polyoxyethylene alkyl ether sulfate, sodium dodecylbenzenesulfonate, alkali salt of styrene-acrylic acid copolymer, sodium alkylnaphthalene sulfonate, sodium alkyldiphenyl ether disulfonate, monoethanolamine lauryl sulfate.
- Anionic interfaces such as triethanolamine lauryl sulfate, ammonium lauryl sulfate, monoethanolamine stearate, sodium stearate, sodium lauryl sulfate, monoethanolamine of styrene-acrylic acid copolymer, and polyoxyethylene alkyl ether phosphate Activator: polyoxyethylene oleyl ether, polyoxyethylene lauryl ether, polyoxyethylene nonylphenyl ether, Nonionic surfactants such as reoxyethylene alkyl ether phosphates, polyoxyethylene sorbitan monostearate, and polyethylene glycol monolaurate; chaotic surfactants such as alkyl quaternary ammonium salts and their ethylene oxide adducts And alkylbetaines such as alkyldimethylaminoacetic acid betaine, and amphoteric surfactants such as alkylimidazolines. These can be used alone or in admixture of two or more.
- the polymerization inhibitor for example, the following compounds can be used. 2,6-di-t-butyl-p-cresol, 3-t-butyl-4-hydroxyanisole, 2-t-butyl-4-hydroxyanisole, 2,2′-methylenebis (4-methyl-6-t -Butylphenol), 2,2'-methylenebis (4-ethyl-6-t-butylphenol), 4,4'-butylidenebis (3-methyl-6-t-butylphenol), 4,4'-thiobis (3-methyl) -6-t-butylphenol), styrenated phenol, styrenated p-cresol, 1,1,3-tris (2-methyl-4-hydroxy-5-tert-butylphenyl) butane, tetrakis [methylene-3- ( 3 ′, 5′-di-1-butyl-4′-hydroxyphenyl) propionate] methane, octadecyl 3- (3,5-di-t-butyl
- a storage stabilizer may be added in order to increase the stability over time of the viscosity.
- Storage stabilizers include, for example, benzyltrimethyl chloride; quaternary ammonium chlorides such as diethylhydroxyamine; organic acids such as lactic acid and oxalic acid; methyl ethers of the organic acids; t-butylpyrocatechol; tetraethylphosphine and tetraphenylphosphine.
- Organic phosphines such as fins; phosphites; or mixtures containing two or more thereof can be used.
- an adhesion improving agent such as a silane coupling agent may be added in order to improve the adhesion to the substrate.
- silane coupling agent examples include vinyl silanes such as vinyltris ( ⁇ -methoxyethoxy) silane, vinylethoxysilane, and vinyltrimethoxysilane; acrylic silanes and methacrylic silanes such as ⁇ -methacryloxypropyltrimethoxysilane; ⁇ -(3,4-epoxycyclohexyl) ethyltrimethoxysilane, ⁇ - (3,4-epoxycyclohexyl) methyltrimethoxysilane, ⁇ - (3,4-epoxycyclohexyl) ethyltriethoxysilane, ⁇ - (3,4 Epoxy silanes such as -epoxycyclohexyl) methyltriethoxysilane, ⁇ -glycidoxypropyltrimethoxysilane, and ⁇ -glycidoxypropyltriethoxysilane; N- ⁇ (aminoethyl) ⁇
- the silane coupling agent is contained in the liquid crystal solution in an amount of, for example, 0.01 to 100 parts by mass with respect to 100 parts by mass of the thermotropic liquid crystal.
- a solidified liquid crystal layer is formed using a thermotropic liquid crystal compound, a solvent, and a liquid crystal solution containing other additives as required.
- a spin coating method, a slit coating method, a relief printing method, a printing method such as screen printing, planographic printing, reversal printing, and gravure printing; a method in which these printing methods are combined with an offset method; An ink jet method; a bar coating method or the like can be used.
- the surface of the transparent substrate Prior to the application of the liquid crystal solution, the surface of the transparent substrate may be subjected to an alignment treatment such as rubbing.
- an alignment film that regulates the alignment of the liquid crystal compound may be formed on the transparent substrate prior to the application of the liquid crystal solution.
- This alignment film can be obtained, for example, by forming a transparent resin layer such as polyimide on a transparent substrate and performing an alignment treatment such as rubbing on the transparent resin layer.
- This alignment film may be formed using a photo-alignment technique.
- the liquid crystal material layer is formed as a continuous film having a uniform thickness, for example. According to the method described above, as long as the coated surface is sufficiently flat, the liquid crystal material layer can be formed as a continuous film having a uniform thickness.
- the mesogen of the thermotropic liquid crystal compound has a predetermined alignment structure.
- the “predetermined orientation” may be any orientation as long as it does not produce in-plane birefringence.
- the thermotropic liquid crystal compound is a rod-like liquid crystal, and the mesogenic long axis can be in a homeotropic orientation in the normal direction of the liquid crystal material layer (case 1).
- a chiral agent is present in the liquid crystal material layer together with the rod-like thermotropic liquid crystal compound, a cholesteric orientation in which the mesogen is oriented in a spiral shape can be obtained (case 2).
- the thermotropic liquid crystal compound is a disc-like liquid crystal, and homeotropic alignment in which the normal direction of the disc surface of the mesogen is parallel to the normal direction of the liquid crystal material layer can be achieved ( case 3).
- the liquid crystal material layer in which the mesogen of the liquid crystal compound has a predetermined alignment structure is exposed in a predetermined pattern.
- polymerization and / or crosslinking of the thermotropic liquid crystal compound occurs in the region irradiated with light.
- the mesogenic group is fixed. That is, the orientation state is fixed, and a latent image of the pattern is formed.
- all the liquid crystal compounds remain unpolymerized or uncrosslinked.
- na is approximately equal to ⁇ (ne + no) / 2 ⁇ and ni is approximately equal to ⁇ (ne + 2 ⁇ no) / 3 ⁇ .
- rod-like liquid crystals normally have ne> no, na> ni.
- the refractive index in the normal direction of the disc surface of the liquid crystal is ne, and the refractive index in the disc surface direction is no.
- the in-plane average refractive index na of the anisotropic region irradiated with light in the pattern exposure step is approximately equal to no, and the in-plane average of the isotropic region not irradiated with light.
- the refractive index ni is approximately equal to ⁇ (ne + 2 ⁇ no) / 3 ⁇ . Since disc-like liquid crystals usually have no> ne, na> ni.
- the light used for pattern exposure is electromagnetic waves such as ultraviolet rays, visible rays, and infrared rays.
- electromagnetic waves such as electron beams, X-rays, and gamma rays may be used. Only one of them may be used for pattern exposure, or two or more may be used for pattern exposure.
- the pattern exposure step may be performed by any method as long as the predetermined region can be selectively polymerized or crosslinked.
- this pattern exposure step can be performed using a photomask having a predetermined pattern.
- a radiation or light beam such as an electron beam may be scanned over the liquid crystal material layer.
- the liquid crystal material layer is heated to a temperature equal to or higher than the phase transition temperature at which the thermotropic liquid crystal compound changes from the liquid crystal phase to the isotropic phase.
- the mesogenic part of the thermotropic liquid crystal compound which is an unreacted compound is not fixed. Therefore, when the liquid crystal material layer is heated to a temperature higher than the phase transition temperature, the mesogen orientation of the unreacted compound is lowered. For example, the unreacted compound mesogen changes from a liquid crystal phase to an isotropic phase. On the other hand, the mesogen is fixed in the polymerized or crosslinked product of the thermotropic liquid crystal compound. Therefore, in the region irradiated with light, no change occurs in the orientation of the liquid crystal compound, and the region having the orientation corresponding to the exposure pattern is developed.
- the unreacted compound is polymerized and / or crosslinked while maintaining the orientation state of the unreacted mesogen.
- the entire liquid crystal material layer is irradiated with light while maintaining the liquid crystal material layer at a temperature higher than the phase transition temperature at which the thermotropic liquid crystal compound changes from the isotropic phase to the liquid crystal layer.
- the liquid crystal material layer is irradiated with light with an exposure amount sufficient to cause polymerization and / or crosslinking reaction of almost all unreacted compounds.
- polymerization or cross-linking of the unreacted compound occurs, and the mesogen whose orientation state is changed is fixed to fix the pattern.
- a solidified liquid crystal layer in which an isotropic phase region and an anisotropic phase region are formed in a predetermined pattern, that is, a phase difference diffraction grating is obtained.
- a certain liquid crystal compound has a lower first phase transition temperature that changes from an isotropic phase to a liquid crystal phase than a second phase transition temperature that changes from a liquid crystal phase to an isotropic phase. Therefore, in a specific case, the temperature of the liquid crystal material layer at the time of fixing with light may be lower than the heating temperature in the development process. However, normally, from the viewpoint of simplicity, the temperature of the liquid crystal material layer at the time of fixing with light is set to be equal to or higher than the first phase transition temperature.
- the polymerization and / or cross-linking of the unreacted compound may be performed by other methods.
- the unreacted compound ie, the thermotropic liquid crystal compound
- the thermotropic liquid crystal compound is a material that polymerizes and / or crosslinks by heating to a polymerization and / or crosslinking temperature higher than the first phase transition temperature
- Fixing by heating may be performed.
- the liquid crystal material layer is heated to a temperature higher than the polymerization and / or crosslinking temperature to polymerize and / or crosslink the unreacted compound.
- the heating temperature in the development step is, for example, not lower than the first phase transition temperature and lower than the polymerization and / or crosslinking temperature.
- the region that has not been irradiated with light is transferred to an isotropic phase and is substantially non-oriented.
- the orientation is maintained undisturbed.
- polymerization and / or cross-linking proceed while substantially maintaining the respective states, the pattern is fixed, and a phase type diffraction grating is obtained.
- a fixing step by heating and a fixing step by light may be sequentially performed after the developing step.
- a fixing process using light and a fixing process using heating may be sequentially performed.
- a fixing process by heating, a fixing process by light, and a fixing process by heating can be sequentially performed.
- an antireflection film may be formed on the surface (back surface) of the transparent substrate where the solidified liquid crystal layer is not formed.
- the antireflection film can be formed on the back surface of the transparent substrate by a method described in, for example, Japanese Patent No. 3490214, Japanese Patent No. 3965732, Japanese Patent No. 4051740, and the like.
- the antireflection film may be formed after the solidified liquid crystal layer is formed. However, if the solidified liquid crystal layer may be damaged by the formation process of the antireflection film, the antireflection film may be formed before the solidified liquid crystal layer is formed. It is desirable to do this.
- an antistatic film may be formed on the surface of the solidified liquid crystal layer opposite to the transparent substrate.
- the antistatic film can be obtained, for example, by laminating a transparent conductive film such as indium tin oxide on the solidified liquid crystal layer by a resistance heating vapor deposition method, an electron beam vapor deposition method, a sputtering method, an ion plating method or the like.
- a high-quality phase diffraction element can be obtained relatively easily and stably.
- SYMBOLS 10 Imaging device; 11 ... Imaging lens; 1 ... Diffraction element; 2 ... Transparent substrate 3 ... Solidified liquid crystal layer; 3a ... Optically anisotropic area
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Abstract
Description
前記透明基板の表面に設けられ、少なくとも液晶化合物を含む連続膜からなる固体化液晶層とを具備し、
前記固体化液晶層は、周期的に形成された第1の領域と第2の領域とから構成され、
前記第1の領域は光学的に異方性であり、前記第2の領域は光学的に等方性であり、
面内の平均屈折率は、前記第1の領域と前記第2の領域とで異なることを特徴とする位相型回折素子が提供される。
前記透明基板上に、光重合性または光架橋性のサーモトロピック液晶化合物を含み、前記サーモトロピック液晶化合物のメソゲンが所定の配向構造をなしている液晶材料層を形成する成膜工程と、
前記液晶材料層の一部の領域を露光して、前記液晶材料層中に、前記サーモトロピック液晶化合物が重合または架橋した反応生成物を含む第1領域と、前記反応生成物を含まず未反応の前記サーモトロピック液晶化合物を含む第2領域とを形成する露光工程と、
その後、前記サーモトロピック液晶化合物が液晶相から等方相へと変化する相転移温度と等しい温度以上に前記液晶材料層を加熱して、前記第2領域における未反応の前記サーモトロピック液晶化合物のメソゲンの配向を乱して等方相とする現像工程と、
前記第2領域が等方相である状態を維持したまま前記未反応化合物を重合および/または架橋させる定着工程と
を具備することを特徴とする位相型回折素子の製造方法が提供される。
図5においては、固体化液晶層3に含有される液晶化合物は円板状液晶であり、異方性である領域3aでのメソゲンは、ホメオトロピック配向で固定化されている(case 3)。
3…固体化液晶層; 3a…光学的に異方性の領域; 3i…光学的に等方性の領域
12…入射光; 13…回折光; 14…分離された光点。
Claims (24)
- 表面および裏面を有する透明基板と、
前記透明基板の表面に設けられ、少なくとも液晶化合物を含む連続膜からなる固体化液晶層とを具備し、
前記固体化液晶層は、周期的に形成された第1の領域と第2の領域とから構成され、
前記第1の領域は光学的に異方性であり、前記第2の領域は光学的に等方性であり、
面内の平均屈折率は、前記第1の領域と前記第2の領域とで異なることを特徴とする位相型回折素子。 - 前記固体化液晶層は、全面にわたり面内複屈折率を有していないことを特徴とする請求項1に記載の位相型回折素子。
- 前記液晶化合物は棒状液晶であり、前記固体化液晶層における前記第1の領域は、前記液晶化合物のメソゲンがホメオトロピック配向の状態で固定化され、
前記第1の領域の面内の平均屈折率は、前記第2の領域の面内の平均屈折率より小さいことを特徴とする請求項1または2に記載の位相型回折素子。 - 前記液晶化合物は棒状液晶であり、前記固体化液晶層における前記第1の領域は、前記液晶化合物のメソゲンがコレステリック配向の状態で固定化され、
前記第1の領域の面内の平均屈折率は、前記第2の領域の面内の平均屈折率より大きいことを特徴とする請求項1または2に記載の位相型回折素子。 - 前記液晶化合物は円板状液晶であり、前記固体化液晶層における前記第1の領域は、前記液晶化合物のメソゲンがホメオトロピック配向の状態で固定化され、
前記第1の領域の面内の平均屈折率は、前記第2の領域の面内の平均屈折率より大きいことを特徴とする請求項1または2に記載の位相型回折素子。 - 前記第1の領域と前記第2の領域との組によって形成される周期は20μm以上であることを特徴とする請求項1乃至5のいずれか1項に記載の位相型回折素子。
- 前記周期的に形成された第1の領域および第2の領域は、市松模様を構成していることを特徴とする請求項1乃至6のいずれか1項に記載の位相型回折素子。
- 前記固体化液晶層の厚さは、全面にわたって均一であることを特徴とする請求項1乃至7のいずれか1項に記載の位相型回折素子。
- 前記透明基板の前記裏面に反射防止膜を具備することを特徴とする請求項1乃至8のいずれか1項に記載の位相型回折素子。
- 前記固体化液晶層の前記透明基板とは反対の面に、帯電防止膜を有することを特徴とする請求項1乃至9のいずれか1項に記載の位相型回折素子。
- 前記帯電防止膜は、酸化インジウムスズであることを特徴とする請求項10に記載の位相型回折素子。
- 少なくとも、多数の受光画素が周期的に形成された撮像素子を有し、
請求項1乃至11のいずれか1項に記載の位相型回折素子をローパスフィルタとして用いてなる撮像装置。 - 透明基板の表面上に直接あるいは他の層を介して固体化液晶層を形成することを含み、前記固体化液晶層の形成は、
前記透明基板上に、光重合性または光架橋性のサーモトロピック液晶化合物を含み、前記サーモトロピック液晶化合物のメソゲンが所定の配向構造をなしている液晶材料層を形成する成膜工程と、
前記液晶材料層の一部の領域を露光して、前記液晶材料層中に、前記サーモトロピック液晶化合物が重合または架橋した反応生成物を含む第1領域と、前記反応生成物を含まず未反応の前記サーモトロピック液晶化合物を含む第2領域とを形成する露光工程と、
その後、前記サーモトロピック液晶化合物が液晶相から等方相へと変化する相転移温度と等しい温度以上に前記液晶材料層を加熱して、前記第2領域における未反応の前記サーモトロピック液晶化合物のメソゲンの配向を乱して等方相とする現像工程と、
前記第2領域が等方相である状態を維持したまま前記未反応化合物を重合および/または架橋させる定着工程と
を具備することを特徴とする位相型回折素子の製造方法。 - 前記サーモトロピック液晶化合物は棒状液晶を含み、前記液晶材料層における前記メソゲンの所定の配向構造はホメオトロピック配向であることを特徴とする請求項13に記載の製造方法。
- 前記サーモトロピック液晶化合物は棒状液晶であり、前記液晶材料層はキラル剤をさらに含有し、前記メソゲンの所定の配向構造はコレステリック配向であることを特徴とする請求項13に記載の製造方法。
- 前記サーモトロピック液晶化合物は円盤状液晶を含み、前記液晶材料層における前記メソゲンの所定の配向構造はホメオトロピック配向であることを特徴とする請求項13に記載の製造方法。
- 前記定着工程における前記サーモトロピック液晶化合物の前記重合および/または架橋は、光照射によって誘起することを特徴とする請求項13乃至16のいずれか1項に記載の製造方法。
- 前記サーモトロピック液晶化合物は、前記相転移温度よりも高い重合および/または架橋温度に加熱することによって重合および/また架橋する材料であり、
前記現像工程において、前記重合および/または架橋温度未満であって前記相転移温度以上の温度に前記液晶材料層を加熱することにより前記メソゲンの配向を乱し、
前記定着工程において、前記液晶材料層を前記重合および/または架橋温度以上の温度に加熱することにより、前記未重合および未架橋のサーモトロピック液晶化合物を重合および/または架橋させることを特徴とする請求項13乃至16のいずれか1項に記載の製造方法。 - 前記定着工程において加熱する温度は、200℃以上であることを特徴とする請求項18に記載の製造方法。
- 前記液晶材料層を均一な厚さを有している連続膜として形成することを特徴とする請求項13乃至19のいずれか1項に記載の製造方法。
- 前記固体化液晶層を形成する前に、前記透明基板の表面上に配向膜を形成する工程をさらに具備することを特徴とする請求項13乃至20のいずれか1項に記載の製造方法。
- 前記成膜工程の前に、前記透明基板の裏面に反射防止膜を形成する工程をさらに具備することを特徴とする請求項13乃至21のいずれか1項に記載の製造方法。
- 前記定着工程の前記固体化液晶層の上に、帯電防止膜を形成する工程をさらに具備することを特徴とする請求項13乃至22のいずれか1項に記載の製造方法。
- 前記帯電防止膜の形成は、酸化インジウムスズの薄層を形成することによって行なわれることを特徴とする請求項23に記載の製造方法。
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- 2009-02-03 JP JP2009022727A patent/JP2010181473A/ja active Pending
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2010
- 2010-02-02 CN CN2010800065773A patent/CN102308233A/zh active Pending
- 2010-02-02 WO PCT/JP2010/051429 patent/WO2010090184A1/ja active Application Filing
- 2010-02-02 EP EP10738516A patent/EP2395376A4/en not_active Withdrawn
- 2010-02-02 KR KR1020117018082A patent/KR20110112395A/ko not_active Application Discontinuation
- 2010-02-03 TW TW099103154A patent/TW201100874A/zh unknown
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2011
- 2011-07-29 US US13/137,240 patent/US20110285956A1/en not_active Abandoned
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Cited By (10)
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WO2012160740A1 (ja) * | 2011-05-20 | 2012-11-29 | 株式会社有沢製作所 | 光回折素子、光ピックアップ及び光回折素子の製造方法 |
CN103547950A (zh) * | 2011-05-20 | 2014-01-29 | 株式会社有泽制作所 | 光衍射元件、光拾取器及光衍射元件的制造方法 |
JPWO2012160740A1 (ja) * | 2011-05-20 | 2014-07-31 | 株式会社有沢製作所 | 光回折素子、光ピックアップ及び光回折素子の製造方法 |
JP6008847B2 (ja) * | 2011-05-20 | 2016-10-19 | 株式会社有沢製作所 | 光ピックアップおよび光回折素子の製造方法 |
US9594276B2 (en) | 2011-05-20 | 2017-03-14 | Arisawa Mfg. Co., Ltd. | Optical diffraction element, optical pickup, and optical diffraction element manufacturing method |
WO2013143199A1 (zh) * | 2012-03-31 | 2013-10-03 | 福州大学 | 基于led的双面光栅立体显示装置及其制作方法 |
JPWO2014083836A1 (ja) * | 2012-11-30 | 2017-01-05 | パナソニックIpマネジメント株式会社 | 集光装置、固体撮像素子および撮像装置 |
JP2020512578A (ja) * | 2017-03-21 | 2020-04-23 | マジック リープ, インコーポレイテッドMagic Leap,Inc. | 組み合わせられた視野のための異なる回折格子を有するスタックされた導波管 |
US11803003B2 (en) | 2017-03-21 | 2023-10-31 | Magic Leap, Inc. | Stacked waveguides having different diffraction gratings for combined field of view |
TWI696887B (zh) * | 2018-05-22 | 2020-06-21 | 日商斯庫林集團股份有限公司 | 光罩檢查裝置以及光罩檢查方法 |
Also Published As
Publication number | Publication date |
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CN102308233A (zh) | 2012-01-04 |
EP2395376A1 (en) | 2011-12-14 |
EP2395376A4 (en) | 2012-10-24 |
KR20110112395A (ko) | 2011-10-12 |
TW201100874A (en) | 2011-01-01 |
JP2010181473A (ja) | 2010-08-19 |
US20110285956A1 (en) | 2011-11-24 |
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