WO2009022578A1 - 素子構造およびその製造方法 - Google Patents
素子構造およびその製造方法 Download PDFInfo
- Publication number
- WO2009022578A1 WO2009022578A1 PCT/JP2008/064026 JP2008064026W WO2009022578A1 WO 2009022578 A1 WO2009022578 A1 WO 2009022578A1 JP 2008064026 W JP2008064026 W JP 2008064026W WO 2009022578 A1 WO2009022578 A1 WO 2009022578A1
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- WO
- WIPO (PCT)
- Prior art keywords
- cured
- polyimide
- polyimide layer
- substrate
- forming
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/0802—Details
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00261—Processes for packaging MEMS devices
- B81C1/00269—Bonding of solid lids or wafers to the substrate
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P1/00—Details of instruments
- G01P1/02—Housings
- G01P1/023—Housings for acceleration measuring devices
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/12—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by alteration of electrical resistance
- G01P15/123—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by alteration of electrical resistance by piezo-resistive elements, e.g. semiconductor strain gauges
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1064—Mounting in enclosures for surface acoustic wave [SAW] devices
- H03H9/1071—Mounting in enclosures for surface acoustic wave [SAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the SAW device
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/30—Piezoelectric or electrostrictive devices with mechanical input and electrical output, e.g. functioning as generators or sensors
- H10N30/302—Sensors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/01—Packaging MEMS
- B81C2203/0118—Bonding a wafer on the substrate, i.e. where the cap consists of another wafer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/03—Bonding two components
- B81C2203/032—Gluing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
- G01P2015/0822—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass
- G01P2015/0825—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass
- G01P2015/0828—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass the mass being of the paddle type being suspended at one of its longitudinal ends
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24322—Composite web or sheet
- Y10T428/24331—Composite web or sheet including nonapertured component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24562—Interlaminar spaces
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31623—Next to polyamide or polyimide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31721—Of polyimide
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Acoustics & Sound (AREA)
- Pressure Sensors (AREA)
- Micromachines (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Laminated Bodies (AREA)
Abstract
第1の基板5の表面に、厚みが均等となるようにポリイミド樹脂を塗布した後、加熱して、半硬化状態のポリイミド層を形成する。その後、そのポリイミド層をキュアして、硬化状態の第1のポリイミド層6Aを形成する。また、第2の基板7Aの表面に、ポリイミド樹脂を厚みが均等となるように塗布した後に、加熱して、半硬化状態のポリイミド層を形成する。その後、そのポリイミド層をキュアして、硬化状態の第2のポリイミド層6Bを形成する。それら硬化状態の第1と第2のポリイミド層6A,8Aを、互いに押圧するように加圧し、かつ、接合温度に加熱して接合一体化する。これにより、第1の基板5と第2の基板7Aは、ポリイミド層6A,8Aの接合体であるポリイミド層11Aを介して接合一体化する。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009528085A JPWO2009022578A1 (ja) | 2007-08-10 | 2008-08-05 | 素子構造およびその製造方法 |
EP08792212A EP2178127A4 (en) | 2007-08-10 | 2008-08-05 | DEVICE STRUCTURE AND METHOD FOR THE PRODUCTION THEREOF |
US12/493,380 US7998556B2 (en) | 2007-08-10 | 2009-06-29 | Element structure and method for producing the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007208873 | 2007-08-10 | ||
JP2007-208873 | 2007-08-10 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/493,380 Continuation US7998556B2 (en) | 2007-08-10 | 2009-06-29 | Element structure and method for producing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009022578A1 true WO2009022578A1 (ja) | 2009-02-19 |
Family
ID=40350632
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/064026 WO2009022578A1 (ja) | 2007-08-10 | 2008-08-05 | 素子構造およびその製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7998556B2 (ja) |
EP (1) | EP2178127A4 (ja) |
JP (1) | JPWO2009022578A1 (ja) |
WO (1) | WO2009022578A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021536158A (ja) * | 2019-07-19 | 2021-12-23 | 中芯集成電路(寧波)有限公司 | 薄膜バルク音響波共振器及びその製造方法 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2977885A1 (fr) * | 2011-07-12 | 2013-01-18 | Commissariat Energie Atomique | Procede de realisation d'une structure a electrode enterree par report direct et structure ainsi obtenue |
JP6103906B2 (ja) * | 2012-12-06 | 2017-03-29 | スカイワークスフィルターソリューションズジャパン株式会社 | 弾性波装置と封止体 |
WO2015013828A1 (en) | 2013-08-02 | 2015-02-05 | Motion Engine Inc. | Mems motion sensor and method of manufacturing |
US20170030788A1 (en) | 2014-04-10 | 2017-02-02 | Motion Engine Inc. | Mems pressure sensor |
US11674803B2 (en) | 2014-06-02 | 2023-06-13 | Motion Engine, Inc. | Multi-mass MEMS motion sensor |
CA3004760A1 (en) | 2014-12-09 | 2016-06-16 | Motion Engine Inc. | 3d mems magnetometer and associated methods |
DE102015215530B4 (de) * | 2015-08-14 | 2018-11-22 | Continental Automotive Gmbh | Herstellungsverfahren zum Herstellen eines elektromechanischen Aktors und elektromechanischer Aktor |
US10301171B1 (en) | 2017-11-13 | 2019-05-28 | Globalfoundries Singapore Pte. Ltd. | Wafer level packaging for MEMS device |
US10793421B2 (en) * | 2017-11-13 | 2020-10-06 | Vanguard International Semiconductor Singapore Pte. Ltd. | Wafer level encapsulation for MEMS device |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0682474A (ja) | 1992-09-01 | 1994-03-22 | Hitachi Ltd | 半導体容量式加速度センサ |
JPH06132414A (ja) | 1992-02-18 | 1994-05-13 | Nec Yamagata Ltd | 半導体装置の封着方法 |
JPH08317670A (ja) * | 1995-05-22 | 1996-11-29 | Canon Inc | 微小アクチュエイタ、その製造方法、およびそれを用いた振動ジャイロ |
JPH1019924A (ja) * | 1996-07-05 | 1998-01-23 | Murata Mfg Co Ltd | 小型電子部品 |
JP2000031349A (ja) * | 1998-03-17 | 2000-01-28 | Denso Corp | 半導体装置およびその製造方法 |
JP2002231920A (ja) | 2001-02-06 | 2002-08-16 | Olympus Optical Co Ltd | 固体撮像装置及びその製造方法 |
JP2005158975A (ja) * | 2003-11-25 | 2005-06-16 | Murata Mfg Co Ltd | 電子部品及びその製造方法 |
JP2006179679A (ja) * | 2004-12-22 | 2006-07-06 | Fujikura Ltd | フレキシブルプリント配線板及びその製造方法 |
JP2006189418A (ja) * | 2004-12-06 | 2006-07-20 | Denso Corp | センサ装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07280832A (ja) * | 1994-04-15 | 1995-10-27 | Nippondenso Co Ltd | 加速度検出装置 |
US6287940B1 (en) * | 1999-08-02 | 2001-09-11 | Honeywell International Inc. | Dual wafer attachment process |
JP2001305152A (ja) * | 2000-04-18 | 2001-10-31 | Fuji Electric Co Ltd | 半導体センサチップおよびその製造方法、半導体センサチップを備えた半導体センサ |
US7573723B2 (en) * | 2003-02-21 | 2009-08-11 | Alcatel-Lucent Usa Inc. | Method for attaching chips in a flip-chip arrangement |
CN100565848C (zh) * | 2005-08-05 | 2009-12-02 | 株式会社村田制作所 | 电子组件制造方法和电子组件 |
-
2008
- 2008-08-05 WO PCT/JP2008/064026 patent/WO2009022578A1/ja active Application Filing
- 2008-08-05 EP EP08792212A patent/EP2178127A4/en not_active Withdrawn
- 2008-08-05 JP JP2009528085A patent/JPWO2009022578A1/ja active Pending
-
2009
- 2009-06-29 US US12/493,380 patent/US7998556B2/en active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06132414A (ja) | 1992-02-18 | 1994-05-13 | Nec Yamagata Ltd | 半導体装置の封着方法 |
JPH0682474A (ja) | 1992-09-01 | 1994-03-22 | Hitachi Ltd | 半導体容量式加速度センサ |
JPH08317670A (ja) * | 1995-05-22 | 1996-11-29 | Canon Inc | 微小アクチュエイタ、その製造方法、およびそれを用いた振動ジャイロ |
JPH1019924A (ja) * | 1996-07-05 | 1998-01-23 | Murata Mfg Co Ltd | 小型電子部品 |
JP2000031349A (ja) * | 1998-03-17 | 2000-01-28 | Denso Corp | 半導体装置およびその製造方法 |
JP2002231920A (ja) | 2001-02-06 | 2002-08-16 | Olympus Optical Co Ltd | 固体撮像装置及びその製造方法 |
JP2005158975A (ja) * | 2003-11-25 | 2005-06-16 | Murata Mfg Co Ltd | 電子部品及びその製造方法 |
JP2006189418A (ja) * | 2004-12-06 | 2006-07-20 | Denso Corp | センサ装置 |
JP2006179679A (ja) * | 2004-12-22 | 2006-07-06 | Fujikura Ltd | フレキシブルプリント配線板及びその製造方法 |
Non-Patent Citations (1)
Title |
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See also references of EP2178127A4 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021536158A (ja) * | 2019-07-19 | 2021-12-23 | 中芯集成電路(寧波)有限公司 | 薄膜バルク音響波共振器及びその製造方法 |
JP7130841B2 (ja) | 2019-07-19 | 2022-09-05 | 中芯集成電路(寧波)有限公司 | 薄膜バルク音響波共振器及びその製造方法 |
US11923826B2 (en) | 2019-07-19 | 2024-03-05 | Ningbo Semiconductor International Corporation | Film bulk acoustic resonator and fabrication method thereof |
Also Published As
Publication number | Publication date |
---|---|
US7998556B2 (en) | 2011-08-16 |
US20090297770A1 (en) | 2009-12-03 |
JPWO2009022578A1 (ja) | 2010-11-11 |
EP2178127A4 (en) | 2012-07-18 |
EP2178127A1 (en) | 2010-04-21 |
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