WO2008020507A1 - Procédé de récupération d'un abrasif à partir d'un rejet liquide de boue d'abrasif et appareil associé - Google Patents

Procédé de récupération d'un abrasif à partir d'un rejet liquide de boue d'abrasif et appareil associé Download PDF

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Publication number
WO2008020507A1
WO2008020507A1 PCT/JP2007/062046 JP2007062046W WO2008020507A1 WO 2008020507 A1 WO2008020507 A1 WO 2008020507A1 JP 2007062046 W JP2007062046 W JP 2007062046W WO 2008020507 A1 WO2008020507 A1 WO 2008020507A1
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WO
WIPO (PCT)
Prior art keywords
abrasive
waste liquid
dispersion
slurry waste
abrasive slurry
Prior art date
Application number
PCT/JP2007/062046
Other languages
English (en)
Japanese (ja)
Inventor
Hideo Nakamura
Katsuhiro Kobayashi
Itsuo Matsumoto
Original Assignee
Asahi Glass Company, Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Company, Limited filed Critical Asahi Glass Company, Limited
Priority to JP2008529824A priority Critical patent/JPWO2008020507A1/ja
Publication of WO2008020507A1 publication Critical patent/WO2008020507A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/01—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with flat filtering elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/62—Regenerating the filter material in the filter
    • B01D29/66—Regenerating the filter material in the filter by flushing, e.g. counter-current air-bumps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
    • B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
    • B02C19/00—Other disintegrating devices or methods
    • B02C19/06—Jet mills
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/02—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
    • B24B55/03—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant designed as a complete equipment for feeding or clarifying coolant

Definitions

  • the present invention relates to a method and an apparatus for recovering an abrasive from an abrasive slurry waste liquid, and in particular, an abrasive when polishing a glass substrate using an abrasive slurry using cerium oxide as an abrasive.
  • the present invention relates to a recovery method and apparatus for recovering cerium oxide from slurry waste liquid.
  • Flat panel displays such as liquid crystal displays (LCDs), plasma displays (PDs), inorganic and organic electrification displays, and field emission displays (FEDs) use glass substrates of various compositions as glass substrates And very high quality is required. Therefore, the glass substrate is mirror-polished using an abrasive slurry, and cerium oxide, which can be mirror-polished even though the hardness is lower than that of the glass substrate, is preferably used as the abrasive. .
  • the glass function may be damaged by polishing scraps or the like mixed just by polishing as the polishing function deteriorates and becomes unusable. For this reason, abrasive slurries that have been used several times are usually discarded as industrial waste.
  • Patent Documents 1 to 3 include techniques related to recovery and reuse of abrasives such as cerium oxide.
  • Patent Document 1 the discharged water discharged from the glass polishing force is processed by a first-stage centrifuge to separate the water and to form an acid-cerium concentrate, and this cerium oxide concentrate The solution is treated with a second-stage centrifuge to recover cerium oxide.
  • Patent Document 2 states that by adding hydrochloric acid and hydrogen peroxide to a used abrasive and heating it. The abrasive is recovered from the resulting waste liquid.
  • Patent Document 3 the abrasive slurry waste liquid is filtered to remove coarse impurities, and the abrasive is recovered by filtering with an ultrafilter having a UF (ultrafiltration membrane) with a pore size of 2 to: LOOnm. Is.
  • UF ultrafiltration membrane
  • Patent Document 1 Japanese Patent Application Laid-Open No. 2004-306210
  • Patent Document 2 Japanese Patent Laid-Open No. 2003-211356
  • Patent Document 3 Japanese Patent Laid-Open No. 10-118899
  • the abrasive in the slurry slurry waste liquid is mixed with silica and polishing waste (such as cullet and iron powder in the supply pipe) generated during polishing and aggregates with each other to reduce viscosity. It exists as an agglomerate having. Therefore, as in Patent Document 1, only by centrifugation, silica and polishing debris cannot be separated with high accuracy even if water can be separated, so that a large amount of silica and polishing debris remains in the recovered abrasive. is there.
  • Patent Document 2 in the case of a chemical recovery method using hydrochloric acid and hydrogen peroxide, the risk of contamination (remaining) of hydrochloric acid and hydrogen peroxide in the recovered abrasive is high. In order to recover the wastewater, there is a disadvantage that it must be washed repeatedly with water. Further, as described in Patent Document 3, even when the filtration process is performed in multiple stages, as described above, the abrasive in the abrasive slurry waste liquid exists as a viscous aggregate, so that the filtration filter can be installed within a short time. It is clogged and cannot be used as a real device.
  • the particle diameter of cerium oxide is about 0.5 to 5 / ⁇ ⁇ , it is clogged in a short time even if it is filtered with a filter having a pore diameter of 50 m. Therefore, a great deal of time and labor is required for maintenance to eliminate the clogging of the filter.
  • the present invention has been made in view of such circumstances, and the abrasive slurry is recovered by efficiently removing the small-diameter foreign matter and the large-diameter foreign matter mixed by the abrasive slurry liquid power polishing at a high removal rate.
  • An object of the present invention is to provide a method and an apparatus for recovering an abrasive from an abrasive slurry waste liquid that can be easily maintained and the maintenance of the recovery apparatus is easy.
  • the present invention agglomerates and aggregates an abrasive, a small foreign matter smaller than the particle size of the abrasive, and a large foreign matter larger than the particle size of the abrasive.
  • a recovery method for recovering an abrasive from an abrasive slurry waste liquid wherein the abrasive slurry waste liquid is subjected to a mechanical dispersion treatment, and the dispersion-treated dispersion liquid is subjected to filtration treatment.
  • a method for recovering an abrasive slurry which is characterized by a waste slurry slurry.
  • the dispersion step mechanical dispersion treatment is performed to disperse the abrasive, small-diameter foreign matter, and large-diameter foreign matter constituting the aggregates in the abrasive slurry waste liquid.
  • “dispersing the abrasive, small-diameter foreign matter, and large-diameter foreign matter constituting the aggregate” means to disperse the aggregate for the purpose of loosening the aggregate and decomposing it into an abrasive, small-diameter foreign matter, and large-diameter foreign matter.
  • the abrasive can be effectively classified from the small-diameter foreign matter through the dispersion step and the filtration step.
  • “classifying the abrasive and the small-diameter foreign material by classification” means that the cyclone treatment is performed for the purpose of classifying the abrasive and the small-diameter foreign material, and does not mean that the small-diameter foreign material can be completely classified.
  • the abrasive, the small foreign matter smaller than the particle size of the abrasive, and the large foreign matter larger than the particle size of the abrasive are present as agglomerated aggregates. Slurry waste liquid power These abrasives can be recovered by removing these foreign substances with a high removal rate that is more efficient, and clogging of the filtration filter during filtration can be suppressed, reducing the number of equipment maintenance and maintenance. Becomes easier. Also, since no chemical treatment is used, there is no risk of chemical substances remaining as contaminants in the recovered abrasive.
  • the abrasive is cerium oxide having a particle size of 0.5 to 5 ⁇ m.
  • the present invention is particularly effective because there is a fear of supply.
  • the dispersing step is a high-pressure collision treatment in which the abrasive slurry waste liquid is made into two or more high-pressure jet streams and the high-pressure jet streams collide with each other. To do.
  • a mechanical dispersion treatment method there are various dispersion methods such as a bead mill method.
  • Abrasive slurry, small-diameter foreign matter, and agglomerated aggregates of large-diameter foreign matter are used for dispersing abrasive slurry.
  • High-pressure collision treatment is particularly effective, in which Lee's waste liquid is made into two or more high-pressure jet streams and the high-pressure jet streams collide with each other.
  • an ultrasonic wave is applied to the dispersion liquid and Z or the filtration filter. It is characterized by performing a given ultrasonic treatment.
  • the filtration efficiency can be improved by filtering while applying ultrasonic waves to the dispersion and Z or filtration filter to be filtered. That is, by applying ultrasonic waves to the dispersion, it is possible to prevent the abrasive, small-diameter foreign matter, and large-diameter foreign matter dispersed in the dispersion step from aggregating again. In addition, by applying ultrasonic waves to the filtration filter, it is difficult to clog the filtration filter. Therefore, it is particularly preferable to apply ultrasonic waves to both the dispersion and the filter.
  • the filtration step is characterized by performing a backwash process in which the filter is intermittently backwashed with backwash water.
  • the filter is further less likely to be clogged.
  • the present invention is a recovery device for recovering an abrasive from an abrasive slurry waste liquid, wherein the abrasive slurry waste liquid is two or more high-pressure jet streams, A high-pressure jet disperser that causes the high-pressure jet flow to collide with each other, and an ultrasonic wave is applied to the dispersion and Z or filtration filter dispersed by the high-pressure jet disperser, and the dispersion is filtered by the filtration filter.
  • An ultrasonic filter, and the ultrasonic filter There is provided an abrasive slurry recovery apparatus for waste slurry slurry, characterized by comprising a cyclone for classifying particles in a filtrate filtered by an excess machine.
  • the abrasive recovery apparatus since the abrasive slurry waste liquid is sequentially processed by the high-pressure jet disperser, the ultrasonic filter, and the cyclone, the abrasive slurry waste liquid power is efficiently and at a high soot removal rate. These foreign substances and the like can be removed to recover the abrasive.
  • the present invention removes foreign substances etc. from the abrasive slurry waste liquid with high V soot removal efficiency by performing dispersion treatment, filtration treatment and classification treatment on the abrasive slurry waste liquid mixed with foreign substances etc. by polishing.
  • the abrasive can be recovered.
  • FIG. 1 is an overall configuration diagram of an abrasive recovery device of the abrasive slurry waste liquid power according to the present invention.
  • FIG. 2 is an explanatory diagram of the particle size distribution of the abrasive, small-diameter foreign matter, and large-size foreign matter contained in the abrasive slurry waste liquid.
  • FIG. 3 is an explanatory diagram for explaining a high-pressure jet disperser.
  • FIG. 4 is an explanatory diagram for explaining the effect of each treatment in a high-pressure jet disperser, an ultrasonic filtration device, and a cyclone.
  • FIG. 5 is an explanatory diagram for explaining the dispersion effect by the high-pressure jet disperser.
  • FIG. 6 is an explanatory diagram for explaining the effect of combining a high-pressure jet disperser and an ultrasonic filtration device.
  • FIG. 7 is an explanatory diagram for explaining the effect of combining a high-pressure jet disperser, an ultrasonic filtration device, and a cyclone.
  • Polishing machine 22 ... polishing pad, 24 ... abrasive slurry slurry, 26 ... waste hopper, 28 ... waste pipe, 30 ... high pressure jet disperser, 32 ... ultrasonic filter, 34 ... cyclone, 36 ... Waste liquid tank, 38 ... Supply piping, 40 ... Dispersion vessel, 4 2 ... Jet nozzle, 44 ... Drain pipe, 46 ... High pressure pump, 48 ... Dispersion liquid, 50 ... Filtration tank, 52 'Sanka Noreb, 54 ⁇ Noreb, 56 ⁇ ⁇ Yumigo, 60 pump, 60 ⁇ Filtration Container, 62 ... Filtration filter, 64 Ultrasonic oscillator, 66 ...
  • FIG. 1 is an overall configuration diagram of an abrasive recovery device 10 from an abrasive slurry waste liquid according to the present invention.
  • a glass substrate 14 is polished by a polishing machine 12 using cerium oxide as an abrasive. This is an example of recovering the abrasive A from the abrasive slurry waste liquid 24.
  • the polishing machine 12 rotates the glass substrate 14 placed and fixed on the rotary table 16. Then, while supplying abrasive slurry from the nozzle 18, the polishing tool 20 rotating from above the rotary table 16 is pressed to polish the glass substrate 14 with the polishing pad 22.
  • the configuration of the polishing machine 12 is not particularly limited to the above configuration, and various types of polishing machines can be used.
  • the used abrasive slurry waste liquid 24 used for polishing is sent to the recovery device 10 via a waste liquid hopper 26 through a waste liquid pipe 28.
  • the abrasive slurry waste liquid 24 includes abrasive A, silica particles having a smaller particle diameter than abrasive A generated by polishing (hereinafter referred to as “small-diameter foreign matter B”), and particles from abrasive A generated by polishing.
  • a large-diameter cullet aggregates with iron or the like hereinafter referred to as “large-diameter foreign matter C” t ⁇ ⁇ ) in the abrasive supply pipe, and exists as a viscous aggregate D.
  • the particle size distributions of abrasive A, small-diameter foreign matter B, and large-diameter foreign matter C are such that abrasive A (cerium oxide) is in the range of 0.5 to 5 ⁇ m, and small diameter.
  • abrasive A cerium oxide
  • Foreign object B is smaller than 0.5 m
  • large-diameter foreign object C is larger than 5 ⁇ m.
  • the particle size is the maximum particle size of each particle. If the abrasive slurry is reused while the silica particles, which are the small-diameter foreign matter B, remain, “sagging” occurs and the polishing performance decreases.
  • the recovery device 10 is mainly composed of a high-pressure jet disperser 30, an ultrasonic filter 32, and a cyclone 34. These devices 30, 32, 34 are pipes and tanks. Are connected continuously via Hereinafter, the configuration of the recovery apparatus 10 and the recovery method (process flow) until the polishing slurry A is recovered from the abrasive slurry waste liquid 24 will be described.
  • the abrasive slurry waste liquid 24 stored in the waste liquid tank 36 of the recovery device 10 by the waste liquid pipe 28 through the waste liquid hopper 26 is sent to the high-pressure jet disperser 30 through the supply pipe 38.
  • a pair of jet nozzles 42, 42 are disposed opposite to each other in the longitudinal direction of a dispersion container 40, which is a sealed container formed in a pressure-resistant cylindrical shape.
  • a discharge pipe 44 for discharging the dispersion liquid 48 subjected to the dispersion treatment is connected to the side surface of the central portion of the dispersion container 40.
  • the supply pipe 38 is provided with a high-pressure pump 46, and the supply pipe 38 is branched on the discharge side of the high-pressure pump 46 and connected to the pair of jet nozzles 42 and 42 described above. .
  • This causes the abrasive slurry waste liquids 24 to collide with each other as a high-pressure jet flow in the dispersion container 40, and the impact energy causes the aggregate D in the abrasive slurry waste liquid 24 as shown in FIG. 4 (A). Is distributed.
  • the ejection pressure of the abrasive slurry waste liquid 24 ejected from the jet nozzle 42 is 50 to: LOOMPa is more preferable, and 50 to 70 MPa is more preferable.
  • FIG. 5 shows the results of a sedimentation test of the abrasive slurry waste liquid 24 and the dispersion liquid 48 obtained by dispersing the abrasive slurry waste liquid 24 with the high-pressure jet disperser 30.
  • Fig. 5 (A) shows the case where the abrasive slurry waste liquid 24 was stirred with a 360 rpm stirring blade, placed in a test tube and allowed to stand for 15 minutes.
  • FIG. 5 (B) shows a case where the dispersion liquid 48 is stirred in the same manner and then placed in a test tube and allowed to stand for 15 minutes.
  • Fig. 5 shows the results of a sedimentation test of the abrasive slurry waste liquid 24 and the dispersion liquid 48 obtained by dispersing the abrasive slurry waste liquid 24 with the high-pressure jet disperser 30.
  • Fig. 5 (A) shows the case where the abrasive slurry waste liquid 24 was stirred with a 360 rpm stirring blade
  • FIG. 5 (C) shows a case where an unused abrasive slurry was stirred in the same manner and then placed in a test tube and allowed to stand for 15 minutes.
  • abrasive slurry waste liquid 24 in which abrasive A, small-diameter foreign matter B, and large-diameter foreign matter C exist as viscous agglomerates D remains a cloudy solution after stirring.
  • solid-liquid separation did not work.
  • FIG. 5 (B) in the case of the dispersion liquid 48 in which the abrasive slurry waste liquid 24 is dispersed by the high-pressure jet disperser 30, solid-liquid separation is performed at approximately the middle position of the test tube.
  • an ultrasonic disperser As a disperser, an ultrasonic disperser, a bead mill disperser, or the like can be used in addition to the above-described high-pressure jet disperser as long as it is a mechanical disperser. Most preferred is the high-pressure jet disperser 30.
  • the dispersion 48 that has been subjected to the dispersion treatment by the high-pressure jet disperser 30 is sent to the filtration tank 50 through the discharge pipe 44.
  • the three-way valve 52 provided in the discharge pipe 44 is switched, and the dispersion liquid 48 is returned to the waste liquid tank 36 again (a line indicated by a broken line). You can pass through. Therefore, it is preferable to set the number of dispersion treatments (Pass number) according to the difficulty of dispersion of the aggregate D.
  • Pass number the valve 54 provided in the waste liquid pipe 28 is once closed.
  • the dispersion liquid 48 sent to the filtration tank 50 is supplied to the ultrasonic filtration device 32 by the filtration pump 58 via the supply pipe 56 as shown in FIG.
  • the ultrasonic filtration device 3 2 is divided into a filtration chamber 60A (upper chamber in FIG. 1) and a filtrate chamber 60B (lower chamber in FIG. 1), and a filtration chamber 60A.
  • An ultrasonic oscillator 64 that oscillates ultrasonic waves toward the filter 62 is provided above the filter.
  • the output is 500 to 1000 W, more preferably 500 to 800 W, and the frequency is preferably 15 to 25 kHz, more preferably 17 to 22 kHz.
  • a return pipe 68 having a nozzle 66 is connected to the side wall of the filtration chamber 60A, and the dispersion 48 supplied to the filtration chamber 60A is circulated to the filtration tank 50 through the return pipe 68.
  • a filtrate pipe 74 for feeding the filtrate 70 filtered by the filter 62 to the cyclone tank 72 is connected, and a first valve 76 is provided in the middle of the pipe 74. It is done.
  • the filtrate pipe 74 is branched upstream of the first valve and connected to the wash water tank 82 via the second valve 78 and the backwash pump 80. Wash water for washing the filter 62 is stored in the wash water tank 82.
  • the first pump 76 is opened and the second pump 78 is closed, and the filtration pump 58 is driven. . to this
  • the dispersion 48 stored in the filtration tank 50 is circulated through the filtration chamber 60A and the return pipe 68, and receives the ultrasonic waves oscillated by the ultrasonic oscillator 64 while being filtered by the filtration filter 62. Filter dispersion 48.
  • the pore size of the filter 62 it is preferable to use a filter having a diameter of about 10 m, for example, the abrasive A and the small-diameter foreign matter B in the dispersion 48 but not the large-diameter foreign matter C.
  • a filter having a diameter of about 10 m for example, the abrasive A and the small-diameter foreign matter B in the dispersion 48 but not the large-diameter foreign matter C.
  • ultrasonic waves are oscillated with respect to the dispersion 48 and the filtration filter 62 in the filtration container 60, whereby the abrasive A, the small-diameter foreign matter B, and the large-diameter foreign matter dispersed by the high-pressure jet disperser 30 are used. It is possible to prevent C from aggregating again. Further, the filtration filter 62 is vibrated by the ultrasonic wave, and the clogging of the filtration filter 62 can be suppressed.
  • the filtration process is continued for a long time, the filtration pressure increases, so it is preferable to back-wash the filtration filter 62.
  • backwashing the filtration pump 58 is stopped, the first valve 76 is closed, and the second valve 78 is opened, and the backwash pump 80 is driven.
  • the filter passes through the filtration filter 62 in the opposite direction to the washing hydraulic filtration process stored in the washing water tank 82, and the filtration filter 62 is backwashed, so that the filtration pressure can be reduced.
  • FIG. 6 shows the present invention in which the abrasive slurry waste liquid 24 is subjected to dispersion treatment with a high-pressure jet disperser 30 and then filtered with an ultrasonic filtration device 32, and the abrasive slurry waste liquid 24 is treated with an ultrasonic filtration device.
  • This is a comparison of the filtration performance with the comparative example subjected to direct filtration treatment.
  • the pore size of the filter 62 used was reduced to 10 ⁇ m, which is slightly larger than 5 ⁇ m, which is the upper limit of the cerium oxide particle size.
  • the filtration flow rate in the present invention decreases from about 1500 (mL Z minutes) immediately after the start of filtration to about 800 (mLZ minutes) after 60 minutes. It was stable at 800 (mLZ min).
  • the filtration flow rate in the comparative example was a low flow rate of about 100 (mLZ minute) immediately after the start of filtration, and remained at about 100 (mLZ minute) thereafter. From this result, the abrasive slurry waste liquid 24 is preliminarily dispersed with the high-pressure jet disperser 30 and then filtered with the ultrasonic filtration device 32. It was about 8 times that of the comparative example that was filtered by. As shown in FIG.
  • the filtrate 70 that has been filtered and sent to the cyclone tank 72 is supplied to the three-liquid separation type cyclone 34 by the cyclone pump 86 through the supply pipe 84. .
  • the filtrate 70 supplied to the upper part of the cyclone tower 88 flows as a swirling flow in the cyclone tower 88 by the discharge pressure (0.6 MPa) of the cyclone pump 86.
  • the filtrate 70 receives centrifugal force, and the abrasive A having a high specific gravity falls while gathering on the inner peripheral wall side of the cyclone tower 88, while the small-diameter foreign substance B having a low specific gravity is placed in the center of the cyclone tower 88. Ascend while gathering.
  • the high specific gravity liquid containing the abrasive A is discharged from the bottom of the cyclone tower 88, and the low specific gravity liquid containing the small-diameter foreign matter B is discharged from the top.
  • the intermediate specific gravity liquid in which the abrasive A and the small-diameter foreign matter B are mixed is returned to the cyclone tank 72 through the circulation pipe 90, and repeatedly classified by the cyclone.
  • the high specific gravity liquid is stored in the abrasive slurry recovery tank 92 and reused as an abrasive slurry.
  • the low specific gravity liquid is stored in the small-diameter foreign substance tank 94.
  • FIG. 7 shows the present invention in which the abrasive slurry waste liquid 24 is classified by the cyclone 34 after filtering the filtrate 70 after passing through the high-pressure jet disperser 30 and the ultrasonic filtration device 32, and the abrasive slurry waste liquid 24 is circulated.
  • This is a result of examining classification performance by comparing Comparative Example 1 classified directly with Cron 34 and Comparative Example 2 classified with Cyclone 34 after passing through only the ultrasonic filter 32.
  • the classification performance was determined by examining the silica content in the liquid stored in the abrasive slurry collection tank 92.
  • the silica content contained in the abrasive slurry waste liquid 24 is 195 mg / L, and the silica content in the unused abrasive slurry is approximately 60 mgZL. Accordingly, the silica 135 mgZL in the abrasive slurry waste liquid 24 is generated by polishing the glass substrate 14.
  • the abrasive A, the small foreign matter B smaller than the particle size of the abrasive A, and the large foreign matter C larger than the particle size of the abrasive A are aggregated and exist as an aggregate D.
  • the polishing agent A is recovered from the polishing agent slurry waste liquid 24 when the glass substrate 14 is polished by a polishing machine using cerium oxide as the polishing agent A.
  • the present invention can be applied to the case where other abrasives are used, and the abrasives used for objects to be polished other than glass substrates, such as semiconductor substrates.
  • the present invention is particularly suitable for recovering an abrasive slurry waste liquid acid cerium when a glass substrate is polished by using an abrasive slurry containing cerium oxide as an abrasive.
  • an abrasive slurry containing cerium oxide as an abrasive.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Food Science & Technology (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Treatment Of Sludge (AREA)
  • Disintegrating Or Milling (AREA)
  • Separation Of Solids By Using Liquids Or Pneumatic Power (AREA)

Abstract

Selon l'invention, on enlève de façon efficace d'un rejet liquide de boue d'abrasif non seulement les matières étrangères de petit diamètre mais également les matières étrangères de grand diamètre mélangées au cours du polissage pour de cette manière parvenir à récupérer l'abrasif. On parvient à récupérer l'abrasif à partir d'un rejet liquide de boue d'abrasif en utilisant un appareil de récupération comprenant une machine à disperser à jet à haute pression pouvant générer une collision mutuelle des rejets liquides de boue d'abrasif lors de l'injection d'un jet à haute pression dans une cuve de dispersion ; un tamis ultrasonique pouvant, lorsqu'on applique des ondes ultrasoniques à la dispersion liquide obtenue par dispersion au moyen de la machine à disperser à jet à haute pression et/ou un filtre barrière, tamiser la dispersion liquide sur le filtre barrière ; et un cyclone pouvant classifier le filtrat liquide obtenu en tamisant au moyen du tamis ultrasonique.
PCT/JP2007/062046 2006-08-16 2007-06-14 Procédé de récupération d'un abrasif à partir d'un rejet liquide de boue d'abrasif et appareil associé WO2008020507A1 (fr)

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JP2008529824A JPWO2008020507A1 (ja) 2006-08-16 2007-06-14 研磨剤スラリー廃液からの研磨剤回収方法及び装置

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KR (1) KR20090009266A (fr)
CN (1) CN101500754A (fr)
TW (1) TW200810880A (fr)
WO (1) WO2008020507A1 (fr)

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WO2014162708A1 (fr) * 2013-04-04 2014-10-09 株式会社クラレ Appareil de régénération de suspension, procédé de régénération de suspension et suspension régénérée
JP2016215284A (ja) * 2015-05-14 2016-12-22 株式会社ディスコ 研磨装置
CN110585772A (zh) * 2019-10-24 2019-12-20 哈尔滨万鑫石墨谷科技有限公司 一种浆料过滤系统及过滤方法
TWI718753B (zh) * 2019-03-12 2021-02-11 大陸商上海新昇半導體科技有限公司 漿料回收系統及其清潔方法

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