WO2005108459A1 - 液状エポキシ樹脂組成物 - Google Patents
液状エポキシ樹脂組成物 Download PDFInfo
- Publication number
- WO2005108459A1 WO2005108459A1 PCT/JP2005/008525 JP2005008525W WO2005108459A1 WO 2005108459 A1 WO2005108459 A1 WO 2005108459A1 JP 2005008525 W JP2005008525 W JP 2005008525W WO 2005108459 A1 WO2005108459 A1 WO 2005108459A1
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- WO
- WIPO (PCT)
- Prior art keywords
- epoxy resin
- resin composition
- liquid epoxy
- component
- aromatic diamine
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
- C08G59/5033—Amines aromatic
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/2612—Auxiliary members for layer connectors, e.g. spacers
- H01L2224/26152—Auxiliary members for layer connectors, e.g. spacers being formed on an item to be connected not being a semiconductor or solid-state body
- H01L2224/26175—Flow barriers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/14—Layer or component removable to expose adhesive
- Y10T428/1452—Polymer derived only from ethylenically unsaturated monomer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/14—Layer or component removable to expose adhesive
- Y10T428/1462—Polymer derived from material having at least one acrylic or alkacrylic group or the nitrile or amide derivative thereof [e.g., acrylamide, acrylate ester, etc.]
Definitions
- the present invention relates to a connection electrode section for a semiconductor package such as a BGA (ball-grid 'array) or CSP (chip-scale' package or chip-size 'package) or a semiconductor component such as a semiconductor element.
- a liquid epoxy used to fill the gap between the semiconductor component and the circuit board and seal it with resin in the flip-chip connection method that electrically connects the opposing electrodes of the semiconductor component and the circuit board via bumps).
- the liquid resin composition used for the underfill is generally Since a thermosetting resin composition mainly composed of epoxy resin or the like is used, it does not melt, has high adhesive strength, does not decompose, or is insoluble in solvents after being cured by heating. There was a problem that repairs could not be easily performed. Therefore, once underfill is performed, for example, a problem arises in that an electronic component device having a defective electrical connection is scrapped and must be discarded. This means that, in recent years, as resilience has been required for global environmental protection, it is necessary to avoid waste as much as possible, and it is possible to repair even underfill. Is required.
- an epoxy resin is used as a main component, a capsule-type curing agent coated with a thermoplastic resin as a curing agent, and an acrylic resin as a repair-imparting agent.
- An electronic component bonding adhesive using a resin has been disclosed (see Patent Document 1).
- thermosetting resin a thermosetting resin
- thermoplastic resin such as polymethyl methacrylate
- inorganic filler an inorganic filler
- coupling agent a coupling agent
- Patent Document 1 JP-A-7-102225
- Patent Document 2 JP 2001-81439A
- Patent Document 3 JP-A-10-204259
- the adhesive for bonding electronic components described in Patent Document 1 has thixotropic properties and thus is suitable for fluidity as an underfill. It is desirable that the fill has such flow characteristics that the shear rate dependence is not observed.
- the adhesive described in Patent Document 2 obtained by uniformly stirring and mixing generally has a high viscosity in accordance with the molecular weight of the thermoplastic resin. After mixing the prepared inorganic filler, the viscosity increased, and it was difficult to say that the low viscosity required for the underfill could be achieved.
- the thermoplastic resin is used for electronic parts.
- thermosetting resin composition described in Patent Document 3 does not describe the effect on the physical properties such as the glass transition point of the cured product which is important for the reliability of the connected mounting structure. It is insufficient as an adhesive material for underfill.
- the present invention has been made in view of such circumstances, and it is possible to remove a residue near room temperature even in an electronic component device having an electrical connection failure once underfilled. It is an object of the present invention to provide a low-viscosity liquid epoxy resin composition which is highly easy to repair and has a highly reliable electronic component device having a connected mounting structure.
- the liquid epoxy resin composition of the present invention has a state in which a connection electrode portion provided on a semiconductor component and a connection electrode portion provided on a circuit board are opposed to each other.
- the present inventor has set forth an epoxy resin composition which is an underfill material for sealing a gap between a circuit board and a semiconductor component (such as a semiconductor device or a semiconductor element).
- a semiconductor component such as a semiconductor device or a semiconductor element.
- the inventor of the present invention has found that a cured product of a specific epoxy resin composition is solvated with a specific solvent and subsequently swells. It has been found that a reduction in force occurs, the cured body can be mechanically peeled, and the semiconductor element (flip chip) can be repaired (Japanese Patent Application Laid-Open No. 2003-119251).
- the present inventor has repeatedly studied an epoxy resin composition which is an underfill material for resin sealing a gap between a circuit board and a semiconductor component.
- an organic additive [component (D)] is blended together with the above components (A) to (C)
- the cured product of the epoxy resin composition is solvated with a specific solvent, and swelling occurs continuously.
- the coating strength of the cured resin, which is the sealing resin, and the adhesive strength are reduced, and the cured product can be mechanically peeled off, and the resin residue remaining on the circuit board can be easily removed at room temperature or the like.
- the present inventors have found that repair of semiconductor components such as the above becomes easier, and arrived at the present invention.
- the present invention includes the following aspects.
- An epoxy resin composition for sealing a gap with a semiconductor component with a resin which comprises the following component (D) in addition to the following components (A) to (C): ⁇ Fat composition.
- Aromatic diamine curing agent power as component (B) The liquid epoxy resin according to the above 1, which is at least one of an aromatic diamine represented by the following general formula (1) and a derivative thereof: Composition. [0016] [Formula 1]
- X is hydrogen and / or CnH 2n ⁇ (n is 1 to 10
- rn is a positive number from 1 to 4.
- R 1 to R 4 are hydrogen
- m is a positive number from 1 to 4.
- R s ⁇ ! s is hydrogen
- Hffi's S which may be the same or different
- the aromatic diamine curing agent as the component (B) is a monoepoxy compound having one epoxy group in one molecule, and 2,2'-ditrifluoromethyl-4, 4.
- the inorganic filler as the component (C) is a spherical silica powder having an average particle diameter of 10 m or less, the surface of which is coated with an organic silane compound represented by the following general formula (3).
- ⁇ 1 is a valence other than hydrogen, and ⁇ 1 is at least
- liquid epoxy resin composition according to the above item 9 which is an organosilane compound represented by the following general formula (4), which is represented by the following general formula (4).
- ⁇ 1 is a monovalent organic group other than hydrogen, and ⁇ is a divalent organic group.
- a 1 ft * element is a monovalent, and at least
- the organic additive as the component (D) is at least one of spherical thermoplastic resin particles having an average particle diameter of 10 m or less and spherical crosslinked resin particles having an average particle diameter of 10 ⁇ m or less.
- the liquid epoxy resin composition according to any one of (1) to (1) above.
- the spherical polymethyl methacrylate particles have a weight average molecular weight of from 100,000 to 5,000.
- liquid epoxy resin composition according to the above 13 which is a spherical crosslinked polymethyl metharylate particle having a glass transition temperature of 100 ° C. or higher.
- liquid epoxy resin composition according to any one of the above items 1 to 15, wherein the semiconductor component is a semiconductor element.
- liquid epoxy resin composition according to any one of 1 to 15 above, wherein the semiconductor component is a semiconductor device.
- the present invention provides an organic additive [(D) component] together with the components (A) to (C), which is used for sealing the gap between the circuit board and the semiconductor component.
- It is a liquid epoxy resin composition containing: Therefore, even after the liquid epoxy resin composition has a low viscosity and hardens without generating voids due to filling, the liquid epoxy resin composition easily swells with a specific organic solvent at room temperature. As a result, the strength of the cured body is significantly reduced, and the cured body can be easily peeled off from the adherend (such as an electrode). Therefore, the electronic component device obtained by resin sealing using the liquid epoxy resin composition of the present invention has excellent connection reliability, and a connection failure has occurred due to a displacement between electrodes and the like. Even if the electronic component device itself An electronic component device having excellent repairability can be obtained without discarding the components.
- aromatic diamine curing agent (B) an aromatic diamine represented by the following general formula (1) and its derivative, or a general formula (2) described below:
- a fluorinated aromatic diamine or a derivative thereof is preferred because the effect of rapid swelling and ease of repair can be exhibited.
- aromatic diamine curing agent [component (B)] a monoepoxy compound containing one epoxy group in one molecule and 2,2′-ditrifluoromethyl-4,4 Use of the reaction product with '-diaminobiphenyl enhances solvation and swelling, and enables good repair.
- aromatic diamine curing agent [component (B)] at least one of an aromatic diamine represented by the following general formula (1) and a derivative thereof, or a general formula (2)
- component (A) a prepolymer obtained by reacting this with a liquid epoxy resin
- the curing rate can be further increased. Improvement can be achieved.
- it since it can be formed in a state from liquefaction to viscous paste in advance, it is possible to easily obtain a liquid epoxy resin composition without the need for complicated steps in the measurement at the time of mixing and the subsequent dispersion step. .
- the above-mentioned inorganic filler [component (C)] is a spherical silica powder having a specific average particle diameter, the surface of which is coated with a specific organosilane compound or a specific organic titanium compound,
- the effect is that the viscosity of the composition can be reduced or the thixotropy can be reduced.
- FIG. 1 is a cross-sectional view schematically showing one example of an electronic component device of the present invention.
- FIG. 2 is a cross-sectional view schematically showing another example of the electronic component device of the present invention.
- the liquid epoxy resin composition of the present invention comprises a liquid epoxy resin (A component), an aromatic diamine curing agent (B component), an inorganic filler (C component), and an organic additive. It is obtained by blending (D component).
- the liquid state refers to a liquid state showing fluidity at 25 ° C. That is, it refers to those having a viscosity in the range of 0.1 OlmPa-s to 10,000 Pa's at 25 ° C.
- the measurement of the viscosity can be performed using, for example, an EMD-type rotational viscometer.
- the liquid epoxy resin (A component) is not particularly limited as long as it is a liquid epoxy resin containing two or more epoxy groups in one molecule.
- a liquid epoxy resin containing two or more epoxy groups in one molecule for example, bisphenol A type, Various liquid epoxy resins such as bisphenol F type, hydrogenated bisphenol A type, bisphenol AF type and phenol novolak type, and derivatives thereof, polyhydric alcohol and epichlorohydrinka Induced liquid epoxy resins and derivatives thereof Glycidylamine type, hydantoin type, aminophenol type, arin type, toluidine type, etc.
- the aromatic diamine curing agent (component B) has a function of curing the liquid epoxy resin (component A), and it is preferable to use at least one of aromatic diamine and a derivative thereof. At least one of a fluorine-containing aromatic diamine and a derivative thereof; It is preferable to use it from the viewpoint of solvation with a specific solvent and subsequent swelling.
- the aromatic diamine in at least one of the above aromatic diamines and derivatives thereof is p-phenylenediamine, m-phenylenediamine, 2,5 toluenediamine, 2,4 toluenediamine, 4,6 dimethyl m-diamine.
- Aromatic mononuclear diamines such as phenylenediamine, 2,4 diaminomesitylene, 4, 4 'diamino diphenyl ether, 3, 3'- diamino diphenyl ether, 3, 4' diamino diphenyl ether, 4, 4 'diaminodiphenylmethane, 3, 3'-diaminodiphenylmethane, 4, 4 'diaminodiphenylsulfone, 3, 3'-diaminodiphenylsulfone, 4, 4 '-diaminodiphenyl-sulfide, 3, 3'-diaminodiphenyl -Risulfide, 4, 4'-Diaminobenzophenone, 3,3'-Aromatic dinuclear diamine such as diaminobenzophenone, 1,4-bis Aromatic trinuclear diamines such as 4 aminophenoxy) benzene, 1,4 bis (3 aminophen
- an aromatic diamine represented by the following general formula (1) and a derivative thereof as the aromatic diamine curing agent (component B) is advantageous in pot life at room temperature. Is also preferably used.
- X is hydrogen and / or C n H E " ⁇ 1 ( n is a 1 to 1 0
- m is a positive number from 1 to 4.
- R 1 is hydrogen
- R 1 to R 4 are hydrogen or a monovalent organic group.
- the monovalent organic group include a saturated alkyl group and aryl group represented by -Cn H2n + 1 (n is a positive number from 1 to 10), -CH2CH (OH) CH2-OCn. 3 alkoxy substituted represented by H2n + 1 - 2 hydroxypropyl group, CH2 CH (OH) CH2- O- R 9 (.
- R 9 is Ari Le group) 3 Ariru substituted represented by - 2-hydroxypropyl group and the like Is raised. Then, the Ri ⁇ R 4 may be different be the same as each other.
- the fluorinated aromatic diamine in at least one of the above fluorinated aromatic diamines and derivatives thereof is not particularly limited as long as it is a fluorinated aromatic diamine having a primary amino group.
- aromatic diamine curing agent component B
- at least one of a fluorine-containing aromatic diamine represented by the following general formula (2) and a derivative thereof can be used at room temperature. Is preferably used because the pot life is longer.
- R s to R S are hydrogen
- R 5 to R 8 are hydrogen or a monovalent organic group.
- the monovalent organic group include a saturated alkyl group and aryl group represented by -Cn H2n + 1 (n is a positive number from 1 to 10), -CH2CH (OH) CH2-OCn. 3-alkoxy-substituted 1-hydroxypropyl group represented by H2n + 1, 3-aryl-substituted 2-hydroxypropyl represented by CH2 CH (OH) CH2—O—R 10 (R 10 is an aryl group) And the like.
- R 5 to R 8 may be the same or different from each other.
- 2,2′-ditrifluoromethyl-4,4′-diaminobihue having the smallest active hydrogen equivalent as the aromatic diamine curing agent (component B).
- the use of p-phenylene or m-phenylenediamine, which also has the lowest active hydrogen equivalent, can reduce the amount of compounding and is a one-part solvent-free epoxy resin composition. It is preferable from the viewpoint that the viscosity of the material can be reduced.
- the aromatic diamine curing agent (component B) the above-mentioned fluorinated aromatic diamine, particularly 2,2′-ditrifluoromethyl-1,4,4′-diaminobiphenyl, in one molecule
- a compound obtained by reacting a monoepoxy compound having one epoxy group with a solvate is preferably used from the viewpoint that the solvation and swelling property are enhanced and good repair is possible.
- the reaction between the above-mentioned fluorinated aromatic diamine and a monoepoxy compound having one epoxy group in one molecule is generally carried out by charging a predetermined amount of each component into a reaction vessel without a catalyst and adding nitrogen to the reaction vessel. The reaction is carried out by heating to about 60 to 120 ° C. in an air stream until the epoxy groups are consumed. And, in this way, for example, N, N, N ′, N′—4-substituted fluorine-containing aromatic diamine compound is can get.
- the monoepoxy conjugate is not particularly limited as long as it is an epoxy compound containing one epoxy group in one molecule.
- the mixing ratio of the liquid epoxy resin (component A) and the aromatic diamine curing agent (component B) is based on one epoxy group of the liquid epoxy resin (component A).
- the number of active hydrogens in the aromatic diamine curing agent (component B) is preferably set in the range of 0.4 to 1.6. More preferably, it is in the range of 0.6 to 1.2. That is, when the number of active hydrogens per epoxy group exceeds 1.6, the viscosity of the liquid epoxy resin composition tends to increase, and when it is less than 0.4, the liquid epoxy resin composition tends to increase. This is because the glass transition temperature of the cured product tends to decrease.
- the aromatic diamine represented by the above general formula (1) and its aromatic diamine
- the polyfunctional aliphatic liquid epoxy resin By pre-reacting at least one of the derivatives or at least one of the fluorine-containing aromatic diamine represented by the above general formula (2) and the derivative thereof with the polyfunctional aliphatic liquid epoxy resin to form a prepolymer, the polyfunctional is obtained. It is possible to reduce the possibility of generation of voids due to evaporation and volatilization of low boiling point compounds contained in aliphatic liquid epoxy resin and the like.
- the prepolymer is, for example, at least one of an aromatic diamine represented by the general formula (1) and a derivative thereof, or a fluorine-containing aromatic diamine represented by the general formula (2) and a derivative thereof. And a polyfunctional aliphatic liquid epoxy compound having two or more epoxy groups in one molecule.
- a predetermined amount of each component is charged into a reaction vessel without a catalyst, and the mixture is heated to about 60 to 120 ° C under a nitrogen stream. And a reaction is carried out until a predetermined molecular weight is reached, thereby preparing a prepolymer.
- the prepolymer preferably has a molecular weight of about 400 to 5,000 in terms of polystyrene equivalent weight average molecular weight.
- a prepolymer is used to form a volatile low-boiling low molecular weight compound. It is possible to prevent voids in the underfill sealing resin layer due to evaporation and volatilization of the resin.
- polyfunctional aliphatic liquid epoxy resin examples include ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, butanediol diglycidyl ether, neopentyl glycol diglycidyl ether, diglycidyl diphosphorus, and triglycidyl diglycidyl ether.
- Examples include aliphatic diols and triols such as methylolpropane diglycidyl ether, trimethylolpropane triglycidyl ether, glycerin diglycidyl ether, and glycerin triglycidyl ether, and polyfunctional glycidyl ethers of aliphatic polyfunctional alcohols.
- various known curing accelerators can be used to shorten the curing time.
- an acidic catalyst such as salicylic acid
- a Lewis acid such as copper acetyl acetate and zinc acetyl acetate. These may be used alone or in combination of two or more.
- the blending amount of the curing accelerator is not particularly limited, but a desired curing can be performed with respect to the mixture of the liquid epoxy resin (A component) and the aromatic diamine curing agent (B component). It is preferable to appropriately set the ratio so that the speed can be obtained. For example, as an index of the curing speed, the amount of gelling can be easily determined while measuring the gelling time with a hot plate. As an example, it is preferable to set the content in the range of 0.01 to 3% by weight in the whole liquid epoxy resin composition.
- the inorganic filler (C component) used together with the liquid epoxy resin (A component) and the aromatic diamine curing agent (B component) includes silica powder such as synthetic silica and fused silica, alumina, and silicon nitride. , Aluminum nitride, boron nitride, magnesia, calcium silicate, magnesium hydroxide, aluminum hydroxide, titanium oxide and the like.
- silica powder such as synthetic silica and fused silica, alumina, and silicon nitride.
- spherical silica powder because the effect of reducing the viscosity of the liquid epoxy resin composition is large.
- the inorganic filler It is preferable to use those having a maximum particle size of 24 / zm or less. Further, those having an average particle diameter of 10 m or
- 5 / zm is preferably used. Further, it is preferable to use one having a specific surface area of 1 to 4 m 2 / g by the BET method.
- the maximum particle size and the average particle size can be measured using, for example, a laser diffraction / scattering type particle size distribution analyzer.
- the surface is coated with an organosilane conjugate represented by the following general formula (3) and has an average particle diameter of 10 ⁇ m or less.
- an organosilane conjugate represented by the following general formula (3)
- Spherical silica particles are used, and the above-mentioned surface-coated spherical silica particles having an average particle diameter of 1 to 5 m are particularly preferable.
- ⁇ is a monovalent ⁇ including a raido group.
- the aminosilane cup represented by the following general formula (4) is included.
- Spherical silica particles having an average particle diameter of 10 ⁇ m or less, the surface of which is coated with a ring agent are preferably used, and particularly preferably spherical silica particles having an average particle diameter of 1 to 5 / ⁇ .
- the dispersibility can be improved and the viscosity can be reduced by the interaction such as wettability with the liquid epoxy resin (component (1)). It is planned.
- ct 1 is a monovalent organic group other than hydrogen
- ⁇ is a divalent organic group.
- organosilane conjugate represented by the general formula (3) examples include, for example, N-2 (aminoethyl) -3aminopropyl-methyldimethoxysilane and N-2 (aminoethyl) 3aminopro. Pill-triethoxysilane, N-2 (aminoethyl) 3-aminopropyl-trimethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane and the like. These may be used alone or in combination of two or more.
- spherical silica particles having an average particle diameter of 10 ⁇ m or less, the surface of which is coated with an organic titanium compound represented by the following general formula (5) are preferably used. Particularly preferred are spherical silica particles having an average particle diameter of 1 to 5 m coated on the surface.
- ⁇ 1 is -valent of hydrogen and 0 1 is at least
- the base is a monovalent, including the Uleid Tomb.
- organotitanium conjugate represented by the general formula (5) examples include, for example, isopropyl triisostearoyl titanate, isopropyl tris (dioctyl pyrophosphate) titanate, and isopropyl tris (dioctyl pyrophosphate) titanate , Isopropyl tri (N-aminoethyl monoaminoethyl) titanate, tetraoctyl bis (ditridecyl phosphite) titanate, tetra (2,2-diallyloxymethyl-1-butyl) bis (ditridecyl) phosphite titanate, Bis (dioctyl pyrophosphate) oxyacetate titanate, bis (dioctyl pyrophosphate) ethylene titanate and the like can be mentioned. These may be used alone or in combination of two or more.
- Spherical silica particles whose surface is coated with such an organosilane compound or an organotitanium conjugate are produced, for example, as follows. That is, using the above-mentioned organosilane compound or organotitanium compound, and using a conventionally known technique such as a treatment for an inorganic filler such as a vapor spray method or a wet method, spherical silica particles whose surface is coated with the compound are used. It is made.
- the surface can also be obtained by dissolving in an aqueous alcohol solution or solvent and subjecting it to a surface treatment.
- the amount of the inorganic filler (component C) to be blended is 10 to 8 with respect to the entire liquid epoxy resin composition. It is preferable to set it in the range of 0% by weight, particularly preferably 30 to 70% by weight. In other words, if the amount is less than 10% by weight, the effect of reducing the linear expansion coefficient of the liquid epoxy resin composition cured product may be small, and if it exceeds 80% by weight, the liquid epoxy resin composition may not be effective. This is because the viscosity of the product tends to increase.
- the organic additive (D component) used together with the liquid epoxy resin (A component), the aromatic diamine curing agent (B component) and the inorganic filler (C component) includes the liquid epoxy resin (A Component) is a component which is melted by hardening or heat treatment so as to be incompatible with each other to form a domain structure.
- a Component is a component which is melted by hardening or heat treatment so as to be incompatible with each other to form a domain structure.
- spherical thermoplastic resin particles, spherical crosslinked resin particles and the like are used. These may be used alone or in combination of two or more.
- the spherical thermoplastic resin particles include particles which also have strength such as polyacrylic resin, polyethersulfone resin, ethylene-butyl acetate copolymer, polyamide resin, and butadiene-styrene copolymer. These may be used alone or in combination of two or more.
- the spherical thermoplastic resin particles those having an average particle diameter of 10 m or less are preferably used, and those having an average particle diameter of 1 to 5 / ⁇ are particularly preferably used.
- the average particle diameter can be measured using, for example, a laser diffraction / scattering type particle size distribution analyzer as described above.
- spherical polymethyl methacrylate particles are particularly preferably used, and more preferably spherical polymethyl methacrylate particles having a weight average molecular weight of 100,000 or more are used. Among them, spherical polymethyl methacrylate particles having a weight average molecular weight of 100,000 to 5,000, 000 are particularly preferably used. The upper limit of the weight average molecular weight is usually 10,000,000.
- the spherical polymethyl methacrylate particles also include epoxy group-containing polymethyl methacrylate particles, carboxy group-containing polymethyl methacrylate particles, polymethyl methacrylate-poly acrylate copolymer particles, and the like. It is the purpose.
- spherical crosslinked resin particles particularly, spherical crosslinked polymethylmetharylate particles are preferably used. More preferably, spherical cross-linked polymethyl methacrylate particles having a glass transition temperature of 100 ° C. or higher are used. As described above, the filling temperature is set high by using the spherical cross-linked polymethyl methacrylate particles having a glass transition temperature of 100 ° C or higher. Therefore, the effect that the sealing time can be shortened at a low viscosity can be obtained.
- the above glass transition temperature is a value measured by a thermomechanical analysis (TMA) device.
- the amount of such an organic additive (D component) is not particularly limited as long as the effects of the present invention can be obtained, but is set in the range of 2 to 20% by weight of the whole liquid epoxy resin composition. Particularly preferred is 3 to 15% by weight. That is, if the amount of the organic additive is less than 2% by weight, the effect of improving the repairability of the cured liquid epoxy resin composition may not be obtained. ⁇ This is the force that tends to increase the viscosity of the resin composition.
- a reactive diluent may be appropriately blended for the purpose of decreasing viscosity, etc., as described in the description of prepolymer, this reactive diluent is volatile. Since it may contain a low boiling point compound, it must be used at the prescribed curing temperature of the liquid epoxy resin composition which is an underfill resin. It is preferable to use the volatile low-boiling compound after removing it in advance. Further, when the reactive diluent itself is volatile, voids are easily generated in the sealing resin layer at a predetermined curing temperature of the liquid epoxy resin thread and the underfill resin, As such, the use of such reactive diluents is limited.
- Examples of the reactive diluent include n-butyldaricidyl ether, arylglycidyl ether, 2-ethylhexylglycidylether, styrene oxide, phenylglycidylether, cresylglycidylether, laurylglycidylether, p sec Butylphenol glycidyl ether, norphenylglycidyl ether, glycidyl ether of rubinol, glycidyl methacrylate, bulcyclohexene monoepoxide, pinene oxide, glycidyl ether of tertiary carboxylic acid, diglycidyl ether, (poly) Glycidyl ether of ethylene glycol, glycidyl ether of (poly) propylene glycol, phenolic product of bisphenol A with propylene oxide, bisphenol A type epoxy resin and polymerized fat Partial
- the liquid epoxy resin composition of the present invention contains a flame retardant such as antimony trioxide, antimony pentoxide, and brominated epoxy resin, a flame retardant auxiliary, silicone resin, and the like.
- a flame retardant such as antimony trioxide, antimony pentoxide, and brominated epoxy resin
- a flame retardant auxiliary, silicone resin and the like.
- a low-stressing agent such as a resin, a coloring agent, and the like can be appropriately compounded without departing from the gist of the present invention.
- the liquid epoxy resin composition of the present invention can be produced, for example, as follows. That is, each component such as the liquid epoxy resin (A component), the aromatic diamine curing agent (B component), the inorganic filler (C component), the organic additive (D component) and, if necessary, the curing accelerator.
- the desired one-part solvent-free liquid epoxy resin is obtained by mixing and dispersing under a high shearing force such as a three-roll or homomixer, and optionally defoaming under reduced pressure.
- a composition can be manufactured.
- a liquid epoxy resin in particular, a polyfunctional aliphatic liquid epoxy resin, and at least one of the aromatic diamine represented by the general formula (1) and a derivative thereof or the general formula (1)
- these components are preliminarily reacted as described above.
- the desired one-part solvent-free liquid epoxy resin composition can be produced in the same manner as described above.
- the semiconductor component is a semiconductor element (flip chip)
- the connection electrode portion (solder bump) 3 provided on the semiconductor element 1 and the wiring circuit A semiconductor element (flip chip) 1 is mounted on a wiring circuit board 2 with the connection electrode portion (solder pad) 5 provided on the substrate 2 facing the same, and the wiring circuit board 2 and the semiconductor
- An electronic component device in which a gap with the element (flip chip) 1 is resin-sealed by the sealing resin layer 4 that also has the above-mentioned liquid epoxy resin composition power is manufactured.
- the semiconductor component is a semiconductor device (semiconductor package), as shown in FIG. 2, the connection electrode portion (solder bump) 13 provided on the semiconductor package 11 and the wiring circuit board 12
- the semiconductor package 11 is mounted on the printed circuit board 12 with the provided connection electrode portions (solder pads) 15 facing each other, and the gap between the printed circuit board 12 and the semiconductor package 11 is formed by the liquid epoxy.
- An electronic component device that is resin-sealed by the sealing resin layer 14 that also has a resin composition power is manufactured.
- liquid epoxy resin composition When filling the gap between the semiconductor element (flip chip) 1 and the wiring circuit board 2 or the gap between the semiconductor package 11 and the wiring circuit board 12 with the liquid epoxy resin composition, After the epoxy resin composition is filled in a syringe, the liquid epoxy resin composition is extruded and applied to one end of the semiconductor element (flip chip) 1 or one end of the semiconductor package 11 with a force of one dollar. Fill.
- liquid viscosity decreases when filling and sealing on a hot plate heated to about 60 to 120 ° C, making it easier to fill and seal. Become. Further, if the printed circuit board 2 is inclined, the filling and sealing are further facilitated.
- the gap distance between the semiconductor element (flip chip) 1 and the printed circuit board 2 is generally 30 It is about -300 ⁇ m.
- the gap distance between the semiconductor package 11 and the wiring circuit board 12 is generally about 200 to 300;
- the cured epoxy resin composition of the resin sealing portion of the electronic component device thus obtained swells with a specific organic solvent even after being cured, and the adhesive strength is reduced.
- the component device can be repaired.
- ketone solvents As the specific organic solvent, ketone solvents, glycol diether solvents, nitrogen-containing solvents, and the like are preferable. These may be used alone or in combination of two or more.
- ketone solvents include acetophenone, isophorone, ethyl n-butyl ketone, diisobutyl ketone, getyl ketone, cyclohexyl ketone, di-propyl ketone, methyl oxide, methyl n amyl ketone, methyl isobutyl ketone, methyl ethyl ketone, and methyl cyclohexane.
- Xanone, methyl n-heptyl ketone, and holone These may be used alone or in combination of two or more.
- glycol ether-based solvents examples include ethylene glycol getyl ether, ethylene glycol dibutyl ether, ethylene glycolone resin methine oleate, ethylene glycol diole cholesterol methine oleate, and diethylene glycol olecolate. Athenole, ethylene glycolone dibutylbutyrene, diethylene glycol dimethyl ether, triethylene glycol dimethyl ether and the like. These may be used alone or in combination of two or more.
- nitrogen-containing solvent examples include N, N'-dimethylformamide, N, N'-dimethylacetoamide, N-methyl-2-pyrrolidone, N, N'-dimethylsulfoxide, hexamethylphosphortriamide and the like. Is raised. These may be used alone or in combination of two or more.
- a hot plate or the like is used to heat a semiconductor component (a semiconductor element such as a flip chip or a semiconductor package) or a repaired portion of a printed circuit board, and the semiconductor component is heated. Is removed.
- heating temperature at this time heating is performed at a temperature of about + 50 ° C. or more from the glass transition temperature of the cured product of the epoxy resin composition of the present invention, and the melting point of the joining metal such as solder or more is obtained.
- the cured product can be easily cohesively broken or separated from one another (semiconductor component or wiring circuit board) in a state where both are adhered.
- the organic solvent is applied directly or the absorbent obtained by impregnating the organic solvent into absorbent cotton is brought into contact with the residual portion of the cured epoxy resin composition of the printed circuit board at room temperature, more preferably, glass transition.
- the printed circuit board and the mounting part can be reused.
- the semiconductor component to which the residue of the cured product of the liquid epoxy resin composition has adhered is immersed in the above-mentioned organic solvent taken in a predetermined container at room temperature to swell the cured product and remove the semiconductor component to thereby re-use the semiconductor component. Can be used.
- the above organic solvent may be directly applied to the entire repaired portion of the printed circuit board or coated with absorbent cotton impregnated with the organic solvent, which requires a long-term treatment.
- the semiconductor component can be removed from the wiring circuit board after the cured product is swelled by gradually penetrating the organic solvent from the end of the semiconductor component to reduce the strength and adhesion of the cured product.
- n is 0 or more positive ⁇ MS 99%, viscosity 22dPa ⁇ s
- 2,2′-Ditrifluoromethyl-1,4,4′-diaminobiphenyl represented by the above structural formula (c) is charged into a reaction vessel at a ratio of 1 mol and butyldaricidyl ether at a ratio of 0.5 mol,
- the average active hydrogen equivalent is 49.4 g / eq . ]
- Spherical silica particles whose surface has been treated by vapor spraying with 3-aminopropyltriethoxysilane (maximum particle diameter 6 ⁇ m, average particle diameter 2 ⁇ m, specific surface area 2.lm 2 / g) .
- Spherical silica particles whose surface has been surface-treated by vapor spraying using isopropyl triisostearoyl titanate (organic titanium compound) (maximum particle diameter 6 ⁇ m, average particle diameter 2 m, specific surface area 2. lm 2 / g).
- Spherical polymethylmetharylate particles (average particle diameter 4 ⁇ m, maximum particle diameter 10 ⁇ m, weight average molecular weight 3,000,000).
- Spherical polymethyl metharylate particles (average particle size 3.3 m, maximum particle size 20 ⁇ m, weight Average molecular weight 1,750,000).
- Spherical polymethylmetharylate particles (average particle diameter 4 ⁇ m, maximum particle diameter 10 ⁇ m, weight average molecular weight 400,000).
- Spherical polymethyl methacrylate particles (average particle diameter 3.4 m, maximum particle diameter 20 ⁇ m, weight average molecular weight 400,000).
- Spherical crosslinked polymethyl methacrylate particles (average particle diameter 2.6 m, maximum particle diameter 5 ⁇ m, glass transition temperature 120 ° C).
- liquid epoxy resin compositions of Examples and Comparative Examples thus obtained, the viscosity at 25 ° C. was measured using an EMD type rotational viscometer, and the needle inner diameter was 0.56 mm. was filled into a polypropylene syringe having a needle.
- a silicon chip (thickness: 370 / ⁇ , size: 10 mm XI Omm) having 64 Sn—3Ag—0.5Cu solder bump electrodes with a diameter of 200 / zm was prepared, and copper wiring with a diameter of 300 m was prepared.
- 1 mm thick FR-4 glass epoxy wiring circuit with 64 pads (board side electrodes) Copper wiring pads (board side electrodes) coated with 63Sn-37Pb solder paste on the board and soldering the silicon chip After mounting the chip on the substrate with the bump electrodes facing each other, the chip was soldered through a heating reflow furnace at 260 ° C for 5 seconds. The gap between the silicon chip and the circuit board was 210 ⁇ m.
- the temperature was gradually cooled to room temperature, and then the presence or absence of voids in the sealing resin layer that filled and sealed the gap between the printed circuit board and the semiconductor element was observed with an ultrasonic flaw detector. Then, a force when no void was observed was evaluated as ⁇ , a case where one or two voids were observed was evaluated as ⁇ , and a case where more voids were observed was evaluated as X.
- the conduction failure rate of the electronic component device immediately after resin sealing was measured. After that, the above electronic component device was subjected to a temperature cycle test at 40 ° C for 10 minutes and 125 ° C for 10 minutes using a thermal test device, and the electrical continuity after 1000 cycles was examined. The conduction failure rate (%) was calculated for all 64 copper wiring pads (board-side electrodes) on the board.
- the silicon chip was peeled off from the electronic component device on a hot plate heated to 200 ° C, and after returning to room temperature, the epoxy resin composition remaining at the connection was cured.
- Absorbent cotton containing an equivalent solvent mixture of N, N'-dimethylformamide and diethylene glycol dimethyl ether was allowed to stand in the residue of the body, and allowed to stand at room temperature (22 ° C) for 1 hour.
- the cotton wool is removed, the well is thoroughly wiped with methanol, the cured epoxy resin composition is peeled off, and the peelable electronic component device is again supplied with the solder paste to the pad portion of the wiring circuit board, and after melting the solder,
- a silicon chip was mounted on a wiring circuit board, and electrical conductivity was examined. Thereafter, the resin was sealed and the repairability (rework) was evaluated in the same manner as described above.
- liquid epoxy resin compositions of all Examples have a long pot life and are excellent as a one-part solventless liquid epoxy resin composition of Voidless in combination with low viscosity. .
- the formed sealing resin layer is excellent in the rigidity without voids and poor conduction.
- the liquid epoxy resin composition of the comparative example was inferior in repairability as compared with the power example product which had no conduction failure and was a void dress.
- liquid epoxy resin compositions of Examples and Comparative Examples Using the thus obtained liquid epoxy resin compositions of Examples and Comparative Examples, the viscosity at 25 ° C. was measured using an EMD type rotational viscometer, and the needle inner diameter was 0.56 mm. was filled into a polypropylene syringe having a needle.
- a CSP package (package height lmm, size 10mm XI Omm) having 64 Sn—3Ag—0.5Cu solder bump electrodes with a diameter of 200 / zm was prepared, and copper wiring with a diameter of 300m was prepared.
- the CSP package was soldered through a heating reflow furnace at 260 ° C for 5 seconds.
- the gap between the CSP package and the circuit board is 250 ⁇ m.
- the temperature was gradually cooled to room temperature, and then the presence or absence of voids in the sealing resin layer that was filled and sealed with the gap between the printed circuit board and the CSP knockage was observed with an ultrasonic flaw detector. Then, a force when no voids were observed was evaluated as ⁇ , a case where one or two voids were observed was evaluated as ⁇ , and a case where more voids were observed was evaluated as X.
- the conduction failure rate of the electronic component device immediately after resin sealing was measured. After that, the above electronic component device was subjected to a temperature cycle test at 40 ° C for 10 minutes and 125 ° C for 10 minutes using a thermal test device, and the electrical continuity after 1000 cycles was examined. The conduction failure rate (%) was calculated for all 64 copper wiring pads (board-side electrodes) on the board.
- the CSP package was also peeled off on a hot plate heated to 200 ° C, and the CSP package was peeled off and returned to room temperature, but a cured product of the epoxy resin composition remaining at the connection portion Absorbent cotton containing a mixed solvent of equal amounts of N, N'-dimethylformamide and diethylene glycol dimethyl ether was allowed to stand in the residue portion of, and allowed to stand at room temperature (22 ° C) for 1 hour.
- the cotton wool is removed, the well is thoroughly wiped with methanol, the cured epoxy resin composition is peeled off, and the peelable electronic component device is again supplied with the solder paste to the pad portion of the wiring circuit board, and after melting the solder,
- the CSP package was mounted on a printed circuit board and the electrical conductivity was examined. After that, in the same manner as above, After sealing, the repairability (rework) property was evaluated.
- the cured epoxy resin composition can be completely peeled off and the electrical connection is complete, the cured body can be peeled off with a small amount of the cured resin, but the electrical connection is complete.
- the cured product remains slightly and can be peeled off, but the electrical connection is incomplete.
- the cured epoxy resin composition can hardly be peeled off and the electrical connection is incomplete. Is X.
- Viscosity (at 25, C) 250 370 ⁇ 80
- the liquid epoxy resin compositions of all Examples have a long pot life and, in combination with low viscosity, are excellent as a one-part solventless liquid epoxy resin composition of Voidless. .
- the formed sealing resin layer is free from voids and poor conduction, has a good drop impact resistance test result, and has excellent repairability. it is obvious.
- the liquid epoxy resin composition of the comparative example was inferior in repairability as compared with the power example product in which there was no conduction failure and was voidless.
- the present invention relates to a semiconductor package such as a BGA (ball-grid 'array) or CSP (chip-scale' package or chip-size 'package) or a connection electrode portion of a semiconductor component such as a semiconductor element.
- a semiconductor package such as a BGA (ball-grid 'array) or CSP (chip-scale' package or chip-size 'package) or a connection electrode portion of a semiconductor component such as a semiconductor element.
- the gap between the semiconductor component and the circuit board provides a liquid epoxy resin composition used for filling and resin sealing.
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- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
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- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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US11/596,414 US20070196612A1 (en) | 2004-05-11 | 2005-05-10 | Liquid epoxy resin composition |
Applications Claiming Priority (4)
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JP2004-141586 | 2004-05-11 | ||
JP2004141586 | 2004-05-11 | ||
JP2004357099A JP2005350647A (ja) | 2004-05-11 | 2004-12-09 | 液状エポキシ樹脂組成物 |
JP2004-357099 | 2004-12-09 |
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JP (1) | JP2005350647A (ja) |
WO (1) | WO2005108459A1 (ja) |
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