WO2003035637A1 - 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process - Google Patents
5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process Download PDFInfo
- Publication number
- WO2003035637A1 WO2003035637A1 PCT/JP2002/010938 JP0210938W WO03035637A1 WO 2003035637 A1 WO2003035637 A1 WO 2003035637A1 JP 0210938 W JP0210938 W JP 0210938W WO 03035637 A1 WO03035637 A1 WO 03035637A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- derivatives
- polymers
- dioxolan
- methylene
- general formula
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
- C07D317/72—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 spiro-condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
- C07D317/10—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings
- C07D317/14—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D317/18—Radicals substituted by singly bound oxygen or sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
- C07D317/10—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings
- C07D317/32—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D317/34—Oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D317/00—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms
- C07D317/08—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3
- C07D317/10—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings
- C07D317/32—Heterocyclic compounds containing five-membered rings having two oxygen atoms as the only ring hetero atoms having the hetero atoms in positions 1 and 3 not condensed with other rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D317/42—Halogen atoms or nitro radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F24/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Heterocyclic Compounds That Contain Two Or More Ring Oxygen Atoms (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02777914.9A EP1447403B1 (en) | 2001-10-23 | 2002-10-22 | 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process |
KR1020097021321A KR101000596B1 (ko) | 2001-10-23 | 2002-10-22 | 5-메틸렌-1,3-디옥솔란-4-온 유도체, 그의 제조방법, 상기 유도체를 중합하여 수득되는 중합체, 레지스트 조성물, 및 패턴 형성 방법 |
KR1020047005997A KR100943786B1 (ko) | 2001-10-23 | 2002-10-22 | 5-메틸렌-1,3-디옥솔란-4-온 유도체, 그의 제조방법, 상기유도체를 중합하여 수득되는 중합체, 레지스트 조성물, 및패턴 형성 방법 |
US10/492,207 US7316884B2 (en) | 2001-10-23 | 2002-10-22 | 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process |
JP2003538153A JP4481005B2 (ja) | 2001-10-23 | 2002-10-22 | 5−メチレン−1,3−ジオキソラン−4−オン誘導体、その製造方法、上記誘導体を重合して得られる重合体、レジスト組成物、および、パターン形成方法 |
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001324824 | 2001-10-23 | ||
JP2001/324824 | 2001-10-23 | ||
JP2002006354 | 2002-01-15 | ||
JP2002/6354 | 2002-01-15 | ||
JP2002/159847 | 2002-05-31 | ||
JP2002159847 | 2002-05-31 | ||
JP2002225066 | 2002-08-01 | ||
JP2002/225066 | 2002-08-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003035637A1 true WO2003035637A1 (en) | 2003-05-01 |
Family
ID=27482637
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2002/010938 WO2003035637A1 (en) | 2001-10-23 | 2002-10-22 | 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process |
Country Status (7)
Country | Link |
---|---|
US (1) | US7316884B2 (ja) |
EP (1) | EP1447403B1 (ja) |
JP (2) | JP4481005B2 (ja) |
KR (1) | KR100943786B1 (ja) |
CN (2) | CN100453539C (ja) |
TW (1) | TWI291953B (ja) |
WO (1) | WO2003035637A1 (ja) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007093909A (ja) * | 2005-09-28 | 2007-04-12 | Fujifilm Corp | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
WO2007058345A1 (ja) * | 2005-11-21 | 2007-05-24 | Jsr Corporation | 感放射線性樹脂組成物 |
JP2008203588A (ja) * | 2007-02-21 | 2008-09-04 | Jsr Corp | 感放射線性樹脂組成物、スペーサーとその製法および液晶表示素子 |
JP2010061117A (ja) * | 2008-08-07 | 2010-03-18 | Sumitomo Chemical Co Ltd | 化学増幅型ポジ型レジスト組成物 |
WO2010084997A1 (ja) * | 2009-01-26 | 2010-07-29 | 国立大学法人徳島大学 | 立体規則性の高い多官能性ポリマー及びその製造方法 |
JP2012131988A (ja) * | 2010-12-02 | 2012-07-12 | Rohm & Haas Electronic Materials Llc | ポリマー、フォトレジスト組成物、およびフォトリソグラフィパターンを形成する方法 |
JP2012155314A (ja) * | 2011-01-07 | 2012-08-16 | Sumitomo Chemical Co Ltd | レジスト組成物 |
WO2012133352A1 (ja) * | 2011-03-31 | 2012-10-04 | Jsr株式会社 | フォトレジスト組成物 |
JP2014063150A (ja) * | 2012-08-31 | 2014-04-10 | Sumitomo Chemical Co Ltd | レジスト組成物及びレジストパターンの製造方法 |
JP2015043079A (ja) * | 2013-07-24 | 2015-03-05 | Jsr株式会社 | 感放射線性樹脂組成物、レジストパターン形成方法、重合体、化合物及び化合物の製造方法 |
JPWO2013047117A1 (ja) * | 2011-09-29 | 2015-03-26 | Jsr株式会社 | フォトレジスト組成物、レジストパターン形成方法及び重合体 |
WO2020049963A1 (ja) * | 2018-09-07 | 2020-03-12 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100549051C (zh) * | 2003-06-26 | 2009-10-14 | 捷时雅株式会社 | 光刻胶聚合物组合物 |
JP2007522262A (ja) * | 2003-06-26 | 2007-08-09 | シミックス・テクノロジーズ・インコーポレイテッド | フォトレジストポリマー |
US7250475B2 (en) * | 2003-06-26 | 2007-07-31 | Symyx Technologies, Inc. | Synthesis of photoresist polymers |
EP1649322A4 (en) | 2003-07-17 | 2007-09-19 | Honeywell Int Inc | PLANARIZATION FILMS FOR ADVANCED MICROELECTRONIC DEVICES AND APPLICATIONS AND METHODS FOR PRODUCING SAID FILMS |
EP1637928B1 (en) | 2004-09-15 | 2012-05-02 | Dongjin Semichem Co., Ltd | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same |
US8828651B2 (en) * | 2005-07-25 | 2014-09-09 | Nissan Chemical Industries, Ltd. | Positive-type photosensitive resin composition and cured film manufactured therefrom |
JP4762630B2 (ja) * | 2005-08-03 | 2011-08-31 | 東京応化工業株式会社 | レジスト組成物およびレジストパターン形成方法 |
WO2007094474A1 (ja) * | 2006-02-17 | 2007-08-23 | Kuraray Co., Ltd. | 第3級アルコール誘導体、高分子化合物およびフォトレジスト組成物 |
US8771924B2 (en) * | 2006-12-26 | 2014-07-08 | Fujifilm Corporation | Polymerizable composition, lithographic printing plate precursor and lithographic printing method |
EP2450746A1 (en) | 2007-08-10 | 2012-05-09 | Fujifilm Corporation | Positive resist composition and pattern forming method using the composition |
US8637623B2 (en) * | 2008-02-25 | 2014-01-28 | Daicel Chemical Industries, Ltd. | Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition |
KR101875983B1 (ko) * | 2010-09-30 | 2018-07-06 | 제이에스알 가부시끼가이샤 | 감방사선성 수지 조성물, 중합체 및 화합물 |
EP2472326A1 (en) * | 2010-12-31 | 2012-07-04 | Rohm and Haas Electronic Materials LLC | Polymers, photoresist compositions and methods of forming photolithographic patterns |
EP2472325A1 (en) * | 2010-12-31 | 2012-07-04 | Rohm and Haas Electronic Materials LLC | Polymers, photoresist compositions and methods of forming photolithographic patterns |
EP2472324A1 (en) | 2010-12-31 | 2012-07-04 | Rohm and Haas Electronic Materials LLC | Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns |
US9256125B2 (en) | 2013-03-30 | 2016-02-09 | Rohm And Haas Electronic Materials, Llc | Acid generators and photoresists comprising same |
JP6319001B2 (ja) * | 2014-09-08 | 2018-05-09 | Jsr株式会社 | 感放射線性樹脂組成物及びレジストパターン形成方法 |
JP6721823B2 (ja) * | 2016-01-05 | 2020-07-15 | Jsr株式会社 | 感放射線性樹脂組成物、レジストパターン形成方法、重合体及び化合物 |
JP6969889B2 (ja) * | 2016-05-13 | 2021-11-24 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
WO2019187803A1 (ja) * | 2018-03-30 | 2019-10-03 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
WO2020137918A1 (ja) * | 2018-12-28 | 2020-07-02 | 富士フイルム株式会社 | 有機溶剤現像用ネガ型感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0337214A (ja) * | 1989-07-04 | 1991-02-18 | Hitachi Chem Co Ltd | 低収縮性ラジカル重合性熱硬化樹脂組成物 |
JPH10316609A (ja) * | 1997-05-20 | 1998-12-02 | Kuraray Co Ltd | 2−ヒドロキシ−5−ノルボルネン−2−カルボン酸の製造方法 |
JP2001089511A (ja) * | 1999-09-27 | 2001-04-03 | Dainippon Ink & Chem Inc | 活性エネルギー線硬化型樹脂組成物 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU606313A1 (ru) | 1970-03-11 | 1984-02-15 | Предприятие П/Я М-5927 | Способ получени замещенных 5-метилен-1,3-диоксолан-4-онов |
JPS58176618A (ja) * | 1982-04-10 | 1983-10-17 | Toyo Contact Lens Co Ltd | 含水性コンタクトレンズおよびその製造法 |
JP2881969B2 (ja) | 1990-06-05 | 1999-04-12 | 富士通株式会社 | 放射線感光レジストとパターン形成方法 |
JP2867847B2 (ja) | 1993-08-26 | 1999-03-10 | 株式会社クラレ | 5−メチレン−1,3−ジオキソラン−4−オン類の製造方法 |
EP0640579B1 (en) * | 1993-08-26 | 1998-04-22 | Kuraray Co., Ltd. | Process for producing optically active 2-norbornanone |
JP3751065B2 (ja) | 1995-06-28 | 2006-03-01 | 富士通株式会社 | レジスト材料及びレジストパターンの形成方法 |
JP3297272B2 (ja) | 1995-07-14 | 2002-07-02 | 富士通株式会社 | レジスト組成物及びレジストパターンの形成方法 |
KR100261022B1 (ko) | 1996-10-11 | 2000-09-01 | 윤종용 | 화학증폭형 레지스트 조성물 |
JP3712218B2 (ja) | 1997-01-24 | 2005-11-02 | 東京応化工業株式会社 | 化学増幅型ホトレジスト組成物 |
JP3546679B2 (ja) | 1997-01-29 | 2004-07-28 | 住友化学工業株式会社 | 化学増幅型ポジ型レジスト組成物 |
JP3819531B2 (ja) | 1997-05-20 | 2006-09-13 | 富士通株式会社 | レジスト組成物及びレジストパターン形成方法 |
KR100273172B1 (ko) * | 1998-08-01 | 2001-03-02 | 윤덕용 | 아크릴 측쇄에 디옥사스피로환기 유도체를 갖는 화합물을 이용한 포토레지스트 |
GB2348879B (en) * | 1999-04-16 | 2004-03-31 | Hydron Ltd | Process |
TW538056B (en) | 2000-07-11 | 2003-06-21 | Samsung Electronics Co Ltd | Resist composition comprising photosensitive polymer having lactone in its backbone |
KR100749494B1 (ko) * | 2001-04-03 | 2007-08-14 | 삼성에스디아이 주식회사 | 화학증폭형 네가티브 포토레지스트용 중합체 및 포토레지스트 조성물 |
-
2002
- 2002-09-27 TW TW091122267A patent/TWI291953B/zh not_active IP Right Cessation
- 2002-10-22 WO PCT/JP2002/010938 patent/WO2003035637A1/ja active Application Filing
- 2002-10-22 EP EP02777914.9A patent/EP1447403B1/en not_active Expired - Lifetime
- 2002-10-22 US US10/492,207 patent/US7316884B2/en not_active Expired - Lifetime
- 2002-10-22 CN CNB021465800A patent/CN100453539C/zh not_active Expired - Lifetime
- 2002-10-22 JP JP2003538153A patent/JP4481005B2/ja not_active Expired - Lifetime
- 2002-10-22 CN CN2005100908050A patent/CN1737000B/zh not_active Expired - Lifetime
- 2002-10-22 KR KR1020047005997A patent/KR100943786B1/ko active IP Right Grant
-
2009
- 2009-11-11 JP JP2009257911A patent/JP5243390B2/ja not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0337214A (ja) * | 1989-07-04 | 1991-02-18 | Hitachi Chem Co Ltd | 低収縮性ラジカル重合性熱硬化樹脂組成物 |
JPH10316609A (ja) * | 1997-05-20 | 1998-12-02 | Kuraray Co Ltd | 2−ヒドロキシ−5−ノルボルネン−2−カルボン酸の製造方法 |
JP2001089511A (ja) * | 1999-09-27 | 2001-04-03 | Dainippon Ink & Chem Inc | 活性エネルギー線硬化型樹脂組成物 |
Non-Patent Citations (1)
Title |
---|
See also references of EP1447403A4 * |
Cited By (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4524237B2 (ja) * | 2005-09-28 | 2010-08-11 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
JP2007093909A (ja) * | 2005-09-28 | 2007-04-12 | Fujifilm Corp | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
WO2007058345A1 (ja) * | 2005-11-21 | 2007-05-24 | Jsr Corporation | 感放射線性樹脂組成物 |
JP4821776B2 (ja) * | 2005-11-21 | 2011-11-24 | Jsr株式会社 | 感放射線性樹脂組成物 |
JP2008203588A (ja) * | 2007-02-21 | 2008-09-04 | Jsr Corp | 感放射線性樹脂組成物、スペーサーとその製法および液晶表示素子 |
JP2010061117A (ja) * | 2008-08-07 | 2010-03-18 | Sumitomo Chemical Co Ltd | 化学増幅型ポジ型レジスト組成物 |
WO2010084997A1 (ja) * | 2009-01-26 | 2010-07-29 | 国立大学法人徳島大学 | 立体規則性の高い多官能性ポリマー及びその製造方法 |
CN102292360A (zh) * | 2009-01-26 | 2011-12-21 | 国立大学法人德岛大学 | 立构规整度高的多官能聚合物及其制造方法 |
JP5496114B2 (ja) * | 2009-01-26 | 2014-05-21 | 国立大学法人徳島大学 | 立体規則性の高い多官能性ポリマー及びその製造方法 |
CN102292360B (zh) * | 2009-01-26 | 2014-07-02 | 国立大学法人德岛大学 | 立构规整度高的多官能聚合物及其制造方法 |
US8703890B2 (en) | 2009-01-26 | 2014-04-22 | The University Of Tokushima | Polyfunctional polymer of high stereoregularity and method for producing the same |
JP2012131988A (ja) * | 2010-12-02 | 2012-07-12 | Rohm & Haas Electronic Materials Llc | ポリマー、フォトレジスト組成物、およびフォトリソグラフィパターンを形成する方法 |
JP2012155314A (ja) * | 2011-01-07 | 2012-08-16 | Sumitomo Chemical Co Ltd | レジスト組成物 |
WO2012133352A1 (ja) * | 2011-03-31 | 2012-10-04 | Jsr株式会社 | フォトレジスト組成物 |
JP5862657B2 (ja) * | 2011-03-31 | 2016-02-16 | Jsr株式会社 | フォトレジスト組成物 |
JPWO2013047117A1 (ja) * | 2011-09-29 | 2015-03-26 | Jsr株式会社 | フォトレジスト組成物、レジストパターン形成方法及び重合体 |
JP2014063150A (ja) * | 2012-08-31 | 2014-04-10 | Sumitomo Chemical Co Ltd | レジスト組成物及びレジストパターンの製造方法 |
JP2015043079A (ja) * | 2013-07-24 | 2015-03-05 | Jsr株式会社 | 感放射線性樹脂組成物、レジストパターン形成方法、重合体、化合物及び化合物の製造方法 |
WO2020049963A1 (ja) * | 2018-09-07 | 2020-03-12 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
CN112639620A (zh) * | 2018-09-07 | 2021-04-09 | 富士胶片株式会社 | 感光化射线性或感放射线性树脂组合物、抗蚀剂膜、图案形成方法、电子器件的制造方法 |
JPWO2020049963A1 (ja) * | 2018-09-07 | 2021-08-26 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
JP7039715B2 (ja) | 2018-09-07 | 2022-03-22 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 |
US12001140B2 (en) | 2018-09-07 | 2024-06-04 | Fujifilm Corporation | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device |
Also Published As
Publication number | Publication date |
---|---|
KR20040058226A (ko) | 2004-07-03 |
EP1447403B1 (en) | 2016-02-03 |
CN1737000A (zh) | 2006-02-22 |
JP2010077440A (ja) | 2010-04-08 |
KR100943786B1 (ko) | 2010-02-23 |
EP1447403A4 (en) | 2010-10-27 |
CN1737000B (zh) | 2013-04-24 |
EP1447403A1 (en) | 2004-08-18 |
US20040248031A1 (en) | 2004-12-09 |
JP4481005B2 (ja) | 2010-06-16 |
CN1413992A (zh) | 2003-04-30 |
JP5243390B2 (ja) | 2013-07-24 |
TWI291953B (ja) | 2008-01-01 |
CN100453539C (zh) | 2009-01-21 |
US7316884B2 (en) | 2008-01-08 |
JPWO2003035637A1 (ja) | 2005-02-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2003035637A1 (en) | 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process | |
KR970059179A (ko) | 중합가능한 디케토피롤로피롤 및 이것으로 제조한 중합체 | |
TW200613902A (en) | Photosensitive compositions based on polycyclic polymers for low stress, high temperature films | |
TW200621811A (en) | Fluorinated monomer having cyclic structure, making method, polymer, photoresist composition and patterning process | |
ES2130404T3 (es) | Copolimeros y polimeros olefinicos amorfos, metodos de preparacion y derivados de los mismos. | |
DE69805071T2 (de) | Zweistufige lösungspolymerisation von hochmolekularen poly(phosphorestern) | |
EP1270602A4 (en) | CATALYST FOR POLYMERIZATION OF VINYL COMPOUNDS AND PROCESS FOR PRODUCING VINYL POLYMER | |
TW200500384A (en) | Novel thiol compound, copolymer and method for producing the copolymer | |
JP2004518447A5 (ja) | ||
Sata et al. | Polymerization of N‐carbazolylacetylene by various transition metal catalysts and polymer properties | |
Cho et al. | Anionic polymerization of 4-(9-carbazolyl) methylstyrene | |
Okamoto et al. | Synthesis, Methanolysis, and Asymmetric Polymerization of meta-and para-substituted Triphenylmethyl Methacrylates | |
JP2008280378A (ja) | 共重合体、その製造方法及び共重合触媒 | |
TW200602806A (en) | Radiation-sensitive resin composition, interlayer insulation film, microlens and process for producing them | |
ATE282662T1 (de) | Flammschutzmittel, flammgeschützte harzzusammensetzung sowie daraus geformte gegenstände | |
Inoue et al. | Heat-resistant polymers prepared from [(4'-(2-vinyl)-4-biphenylyl) oxy] pentachlorocyclotriphosphazene | |
Kakuchi et al. | Chirality Induction in Cyclopolymerization. 1. Cyclocopolymerization of 1, 4-Bis [O-(4-vinylbenzoyl)]-2, 3-O-isopropylidene-L-threitol with Styrene | |
KR970069999A (ko) | 벤족사졸계 비선형 광학 유도체 및 이들로부터 얻어진 고분자 | |
EP1149825A3 (en) | Ester compounds, polymers, resist compositions and patterning process | |
Watanabe et al. | Polymerization of N‐alkyl‐substituted itaconimides and N‐(alkyl‐substituted phenyl) itaconimides and characterization of the resulting polymers | |
TW200613917A (en) | Polymer, resist composition and patterning process | |
WO2003045915A1 (fr) | Compose de bisimide, generateur d'acide et composition de reserve contenant ledit compose, procede de formation de motif au moyen de ladite composition | |
US6777532B2 (en) | Polymers and oligomers, their synthesis, and electronic devices incorporating same | |
KR970059833A (ko) | 화학 증폭형 레지스트용 베이스 수지및 그 제조 방법 | |
Haba et al. | (2S, 4S)-2, 4-Pentanediol as the acyclic template for asymmetric induction in cyclocopolymerization |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 2003538153 Country of ref document: JP |
|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): JP KR US |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LU MC NL PT SE SK TR |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
WWE | Wipo information: entry into national phase |
Ref document number: 10492207 Country of ref document: US Ref document number: 1020047005997 Country of ref document: KR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2002777914 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 2002777914 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020097021321 Country of ref document: KR |